Abstract:
A multilayer substrate device formed from a base substrate (12) and alternating metalization layers (14) and dielectric layers (16). Each layer is formed without firing. Vias (44) may extend through one of the dielectric layers (16) such that two metalization layers (14) surrounding the dielectric layers (16) make contact with each other. The vias (44) may be formed by placing pillars (40) on top of a metalization layer (14), forming a dielectric layer (16) on top of the metalization layer (14) and surrounding the pillars (40), and removing the pillars (40). Dielectric layers (16) may be followed by other dielectric layers (16) and metalization layers (14) may be followed by other metalization layers (14).
Abstract:
Nanolaminates are formed by alternating deposition, e.g., by combustion chemical vapor deposition (CCVD), layers of resistive material (11) and layers of dielectric material (12). Outer resistive material layers (11) are patterned to form discrete patches of resistive material. Electrical pathways between opposed patches of resistive material (11) on opposite sides of the laminate (10) act as capacitors. Electrical pathways horizontally through resistive material layers (11), which may be connected by via plated holes (14), act as resistors.
Abstract:
Processes for fabricating a multi-layer circuit assembly and a multi-layer circuit assembly fabricated by such processes are provided. The process includes (a) providing a substrate at least one area of which comprises a plurality of vias, these area(s) having a via density of 500 to 10,000 holes/square inch (75 to 1550 holes/square centimeter); (b) applying a dielectric coating onto all exposed surfaces of the substrate to form a conformal coating thereon; and (c) applying a layer of metal to all surfaces of the substrate. Additional processing steps such as circuitization may be included.
Abstract:
The invention provides a production method capable of forming a thin film resistance element having a thickness and a shape controlled in a high accuracy in a printed circuit board (core material). The production method of a thin film resistance element formed on a printed circuit board, has the steps of forming a thin film resistance layer having a predetermined thickness on the printed circuit board through an insulation layer by a dry process used in producing a semiconductor, forming an electrically conductive layer on the thin resistance layer, and etching the electrically conductive layer selectively so as to make, at least, a pair of electrically conductive pads, resulting in the thin film resistance element having a predetermined value of resistivity between the pair of electrically conductive pads. Thereby, it is possible to form the thin film resistance element having a thickness and a shape controlled in a high accuracy on the printed circuit board (core material).
Abstract:
To form thin film electrical components, a thin film having desired electrical properties is deposited on a substrate of dissimilar material. Thermal energy from a computer guided laser is used to remove selected portions of the thin film. In accordance with one aspect of the invention, the thin film is an electrically conducting material, such as platinum or doped platinum, and the substrate is metal foil, such as copper foil. The thermal energy from the laser ablates away portions of the thin film. In accordance with another aspect of the invention, a layer of zero valence metal is deposited on a dielectric material substrate which has a melting point or decomposition temperature substantially above that of the zero valence metal. The zero valence metal layer is patterned to form electronic circuitry components by computer guided laser which provides sufficient thermal energy to boil away selected portions of the zero valence metal layer. In one preferred embodiment, electronic circuitry is formed from a three-layer composite comprising nickel foil; a dielectric material, such as silica deposited on the foil; and a zinc layer deposited on the dielectric material. The zinc layer, having a boiling point substantially below the melting points of the dielectric material and the nickel foil, is patterned by laser-derived thermal energy.
Abstract:
A multilayer wiring board (101) comprises: a metal substrate (102) as a core, a condenser dielectric layer (102a) formed to cover the metal layer (102) and a condenser electrode metal layer (104) formed to cover the condenser dielectric layer (102a), so that a condenser is defined by the metal substrate (102), the condenser dielectric layer (102a) and the condenser electrode metal layer (104). The condenser dielectric layer (102a) is provided with a first contact hole (102b) to communicate with the metal substrate (102) and the condenser electrode metal layer (104) is provided with a second contact hole (104b) to communicate with the first contact hole, the diameter of the second contact hole (104b) being larger than that of the first contact hole (102b). An insulating layer (111) is formed on the condenser electrode metal layer (104) and is provided with a via hole to communicate with the metal substrate through the second and first contact holes (102b,104b). A metal substrate contact metal layer (112a) is formed on an inner wall of the via hole, so that the metal substrate contact metal layer (112a) comes into electrical contact with the metal substrate (102).
Abstract:
Electrode layers (1, 2) are arranged on both sides of a dielectric layer (3) facing each other so as to configure a capacitor. Lead electrodes (4, 5) are formed in the electrode layers (1, 2). A penetrating electrode (6) that is insulated from the electrode layers (1, 2) is formed. An electronic component (10) configured in this manner is mounted on a wiring board, and a semiconductor chip can be mounted thereon. Along with connecting the semiconductor chip to the wiring board via the penetrating electrode (6), the semiconductor chip or the wiring board is connected to the lead electrodes (4, 5). In this manner, while suppressing the size increase of a mounted area, the capacitor or the like can be arranged near the semiconductor chip. Thus, the semiconductor chip is driven with high frequency more easily.
Abstract:
The specification describes of multilevel printed circuit boards and a process for their manufacture in which capacitors and other passive components are buried between levels (11,23) of the multilevel board. The capacitor in the multilevel structure is designed so that access is conveniently provided to connect from the parallel plate electrodes (12,18) of the interlevel capacitor to the board surface or to another board level using plated through hole interconnects (25).
Abstract:
A flexible circuit carrier (1) including at least one layer of polymer dielectric material (2), at least one layer of conductive material (3) thereover, each layer having two major surfaces, at least one of said layers having at least one aperture therein, wherein at least one layer has a material (4) coated on at least a portion thereof having a Young's Modulus of from 100 to 200 GPa, a dielectric constant (between 45 MHz and 20 GHz) of from 8 to 12, and a Vickers hardness of from 2000 to 9000 kg/mm2 namely diamond-like carbon.