COMPOSITE PATTERNING DEVICES FOR SOFT LITHOGRAPHY
    1.
    发明公开
    COMPOSITE PATTERNING DEVICES FOR SOFT LITHOGRAPHY 有权
    VERBUNDSTRUKTURIERUNGSVORRICHTUNGENFÜRWEICHE LITHOGRAFIE

    公开(公告)号:EP1742893A2

    公开(公告)日:2007-01-17

    申请号:EP05756327.2

    申请日:2005-04-27

    IPC分类号: C04B24/38 C04B28/14

    摘要: The present invention provides methods, devices and device components for fabricating patterns on substrate surfaces, particularly patterns comprising structures having microsized and/or nanosized features of selected lengths in one, two or three dimensions. The present invention provides composite patterning devices comprising a plurality of polymer layers each having selected mechanical properties, such as Young's Modulus and flexural rigidity, selected physical dimensions, such as thickness, surface area and relief pattern dimensions, and selected thermal properties, such as coefficients of thermal expansion, to provide high resolution patterning on a variety of substrate surfaces and surface morphologies.

    摘要翻译: 本发明提供了用于在衬底表面上制造图案的方法,装置和器件组件,特别是包括具有一维,二维或三维尺寸选定长度的微小尺寸和/或纳米尺寸特征的结构的图案。 本发明提供了包括多个聚合物层的复合图案形成装置,每个聚合物层各自具有选择的机械性能,例如杨氏模量和弯曲刚度,所选择的物理尺寸,例如厚度,表面积和浮雕图案尺寸,以及选定的热性能,例如系数 的热膨胀,以在各种基材表面和表面形态上提供高分辨率图案。

    DEVICES AND METHODS FOR PATTERN GENERATION BY INK LITHOGRAPHY
    7.
    发明公开
    DEVICES AND METHODS FOR PATTERN GENERATION BY INK LITHOGRAPHY 审中-公开
    器件和方法模式生成BY INK光刻

    公开(公告)号:EP2100192A2

    公开(公告)日:2009-09-16

    申请号:EP07863549.7

    申请日:2007-10-26

    IPC分类号: G03F9/00 G03F7/00 G03B27/04

    摘要: The present invention provides methods, devices and device components for fabricating patterns on substrate surfaces, particularly patterns comprising structures having microsized and/or nanosized features of selected lengths in one, two or three dimensions and including relief and recess features with variable height, depth or height and depth. Composite patterning devices comprising a plurality of polymer layers each having selected mechanical and thermal properties and physical dimensions provide high resolution patterning on a variety of substrate surfaces and surface morphologies. Gray-scale ink lithography photomasks for gray-scale pattern generation or molds for generating embossed relief features on a substrate surface are provided. The particular shape of the fabricated patterned can be manipulated by varying the three-dimensional recess pattern on an elastomeric patterning device which is brought into conformal contact with a substrate to localize patterning agent to the recess portion of the pattern.