摘要:
A flip chip type semiconductor device is provided with a semiconductor chip (10) with a plurality of pad electrodes on one surface. A solder electrode (9) is connected to each pad electrode, and a metallic post (16b) is connected to each solder electrode (9). The surface of the semiconductor chip (10) on a side on which the pad electrodes are provided is coated with an insulating resin layer (11) and whole the pad electrode and solder electrode (9) and part of the metallic post (16b) are buried in the insulating resin layer (11). The remaining portion of the metallic post (16b) is projected from the insulating resin layer (11) to form a protrusion. Then, an outer solder electrode (13) is formed so as to cover this protrusion (16b). The outer solder electrodes (13) are arranged in a matrix on the insulating resin layer (11). The height of the protrusion is made 7 to 50% of the distance between an end of the outer solder electrode (13) and the surface of the insulating resin layer (11).
摘要:
A flip chip type semiconductor device is provided with a semiconductor chip (10) with a plurality of pad electrodes on one surface. A solder electrode (9) is connected to each pad electrode, and a metallic post (16b) is connected to each solder electrode (9). The surface of the semiconductor chip (10) on a side on which the pad electrodes are provided is coated with an insulating resin layer (11) and whole the pad electrode and solder electrode (9) and part of the metallic post (16b) are buried in the insulating resin layer (11). The remaining portion of the metallic post (16b) is projected from the insulating resin layer (11) to form a protrusion. Then, an outer solder electrode (13) is formed so as to cover this protrusion (16b). The outer solder electrodes (13) are arranged in a matrix on the insulating resin layer (11). The height of the protrusion is made 7 to 50% of the distance between an end of the outer solder electrode (13) and the surface of the insulating resin layer (11).
摘要:
Fine pitch contacts (42, 44, 46, 48) are achieved by using traces (70, 72, 74, 76) that extend to the contacts without requiring capture pads at the contact pads. Capture pads are desirably avoided because they have a diameter greater than the line to which they are attached. Preferably, adjacent contact pads are present in the same opening in the dielectric. The traces (70, 72, 74, 76) to the contact pads (42, 44, 46, 48) are in a line so that no widening is required where the lines make contact to the contact pads. The lines (70, 72, 74, 76) can be widened before they get to the contact pads but at the contact pads, they are substantially at the minimum width for the line. Thus, the contact pads can be at a pitch much lower than if capture pads were used.
摘要:
An integrated circuit device in a wafer level package (WLP) includes ball grid array (BGA) balls fabricated with cavities filled with adhesives for improved solder joint reliability.
摘要:
An integrated device (e.g., integrated package) that includes a base portion for the integrated device, a first die (206) (e.g., first wafer level die), and a second die (208) (e.g., second wafer level die). The base portion includes a first inorganic dielectric layer (203), a first set of interconnects (280) located in the first inorganic dielectric layer, a second dielectric layer (202) different from the first inorganic dielectric layer, and a set of redistribution metal layers (230,240,250,260) in the second dielectric layer. The first die is coupled to a first surface of the base portion. The second die is coupled to the first surface of the base portion, the second die is electrically coupled to the first die through the first set of interconnects (280).