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公开(公告)号：US11328894B2
公开(公告)日：2022-05-10
申请号：US16047987
申请日：2018-07-27
发明人： Weiming Ren , Xuedong Liu , Xuerang Hu , Xinan Luo , Zhongwei Chen
IPC分类号： H01J37/153 , H01J37/147 , H01J37/05 , H01J37/14 , H01J37/244 , H01J37/28
摘要： Systems and methods are provided for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus. Embodiments of the present disclosure provide a dispersion device comprising an electrostatic deflector and a magnetic deflector configured to induce a beam dispersion set to cancel the dispersion generated by the beam separator. The combination of the electrostatic deflector and the magnetic deflector can be used to keep the deflection angle due to the dispersion device unchanged when the induced beam dispersion is changed to compensate for a change in the dispersion generated by the beam separator. In some embodiments, the deflection angle due to the dispersion device can be controlled to be zero and there is no change in primary beam axis due to the dispersion device.
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公开(公告)号：US11315237B2
公开(公告)日：2022-04-26
申请号：US14952067
申请日：2015-11-25
发明人： Wei Fang
IPC分类号： G06T7/00 , G06T7/30 , G01N23/2251
摘要： An image is obtained by using a charged particle beam, and a design layout information is generated to select patterns of interest. Grey levels among patterns can be compared with each other to identify abnormal, or grey levels within one pattern can be compared to a determined threshold grey level to identify abnormal.
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公开(公告)号：US10380731B1
公开(公告)日：2019-08-13
申请号：US14697066
申请日：2015-04-27
IPC分类号： H01J37/28 , G06T7/00 , H01J37/22 , G01N23/2251
摘要： A method and system for inspecting defects saves scanned raw data as an original image so as to save time for repeated scanning and achieve faster defect inspection and lower false rate by reviewing suspicious defects and other regions of interest in the original image by using the same or different image-processing algorithm with the same or different parameters.
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公开(公告)号：US20190214225A1
公开(公告)日：2019-07-11
申请号：US16241910
申请日：2019-01-07
发明人： Hsuan-Bin HUANG , Chun-Liang LU , Chin-Fa TU , Wen-Sheng LIN , Youjin WANG
摘要： A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.
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公开(公告)号：US20190170671A1
公开(公告)日：2019-06-06
申请号：US16147277
申请日：2018-09-28
发明人： Guochong WENG , Youjin WANG , Chiyan KUAN , Chung-Shih PAN
IPC分类号： G01N23/2251 , H05F3/02 , H01J37/28 , H01J37/02 , H01J37/20
CPC分类号： G01N23/2251 , H01J37/026 , H01J37/20 , H01J37/28 , H01J2237/004 , H01J2237/0041 , H01J2237/0044 , H01J2237/2007 , H01J2237/2008 , H01J2237/202 , H01J2237/2448 , H01J2237/2602 , H01J2237/2811 , H01J2237/2813 , H05F3/02
摘要： A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.
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公开(公告)号：US20190074157A1
公开(公告)日：2019-03-07
申请号：US16174146
申请日：2018-10-29
发明人： Xuedong LIU , Weiming REN , Shuai LI , Zhongwei CHEN
IPC分类号： H01J37/147 , H01J37/04 , H01J37/28 , H01J37/153
CPC分类号： H01J37/147 , H01J37/04 , H01J37/153 , H01J37/28 , H01J2237/061 , H01J2237/083 , H01J2237/1532 , H01J2237/1534 , H01J2237/2817
摘要： One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
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公开(公告)号：US10088438B2
公开(公告)日：2018-10-02
申请号：US15339421
申请日：2016-10-31
发明人： Guochong Weng , Youjin Wang , Chiyan Kuan , Chung-Shih Pan
摘要： A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.
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公开(公告)号：US10032600B2
公开(公告)日：2018-07-24
申请号：US15404618
申请日：2017-01-12
发明人： Shuai Li
IPC分类号： H01J37/143 , H01J37/28 , H01J3/20 , H01J37/09
摘要： This invention provides a charged particle source, which comprises an emitter and means for generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
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公开(公告)号：US09991147B2
公开(公告)日：2018-06-05
申请号：US14531263
申请日：2014-11-03
发明人： Yi-Xiang Wang , Juying Dou , Kenichi Kanai
IPC分类号： H01L21/683 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/28 , H01J37/317
CPC分类号： H01L21/6831 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/28 , H01J37/3174 , H01J2237/0044 , H01J2237/2008
摘要： A wafer grounding apparatus and method adaptable to a charged particle beam apparatus is disclosed. A wafer substrate is supported by a wafer mount. A pulse current pin is arranged to be in contact with a backside film formed on a backside of the wafer substrate. A grounding pulse generator provides at least one pulse to drive the pulse current pin such that dielectric breakdown occurring at the backside film leads to establishment of a current path through the backside films. Accordingly, a current flows in the wafer substrate through this current path and then flows out of the wafer substrate via at least one current return path formed from capacitive coupling between the wafer substrate and the wafer mount.
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公开(公告)号：US09953803B2
公开(公告)日：2018-04-24
申请号：US15049524
申请日：2016-02-22
CPC分类号： H01J37/20 , H01J37/06 , H01J37/222 , H01J37/3045 , H01J2237/202 , H01J2237/2826 , H01L22/12
摘要： A calibration method for calibrating the position error in the point of interest induced from the stage of the defect inspection tool is achieved by controlling the deflectors directly. The position error in the point of interest is obtained from the design layout database.
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