公开(公告)号：US10573493B2

公开(公告)日：2020-02-25

申请号：US15070847

申请日：2016-03-15

Applicant: APPLIED MATERIALS, INC.

Inventor： Valentin N. Todorow ,  Samer Banna ,  Ankur Agarwal ,  Zhigang Chen ,  Tse-Chiang Wang ,  Andrew Nguyen ,  Martin Jeff Salinas ,  Shahid Rauf

IPC: C23C16/00 ,  H01L21/326 ,  H01J37/32 ,  B44C1/22 ,  C23C16/505

Abstract: Methods and apparatus for plasma processing are provided herein. In some embodiments, a plasma processing apparatus includes a process chamber having an interior processing volume; a first RF coil disposed proximate the process chamber to couple RF energy into the processing volume; and a second RF coil disposed proximate the process chamber to couple RF energy into the processing volume, the second RF coil disposed coaxially with respect to the first RF coil, wherein the first and second RF coils are configured such that RF current flowing through the first RF coil is out of phase with RF current flowing through the RF second coil.

公开(公告)号：US09514933B2

公开(公告)日：2016-12-06

申请号：US14587131

申请日：2014-12-31

Applicant: Applied Materials, Inc.

Inventor： Yu Lei ,  Srinivas Gandikota ,  Seshadri Ganguli ,  Bo Zheng ,  Rajkumar Jakkaraju ,  Martin Jeff Salinas ,  Benjamin Schmiege

IPC: H01L21/02 ,  H01L21/311 ,  H01L21/3205 ,  H01L21/3213 ,  C23C16/455 ,  H01L21/285

CPC classification number: H01L21/0228 ,  C23C16/45551 ,  H01L21/0217 ,  H01L21/02175 ,  H01L21/02183 ,  H01L21/02186 ,  H01L21/02194 ,  H01L21/28562 ,  H01L21/31116 ,  H01L21/31122 ,  H01L21/32051 ,  H01L21/32136

Abstract: Provided are atomic layer deposition methods to deposit a film using a circular batch processing chamber with a plurality of sections separated by gas curtains so that each section independently has a process condition.

Abstract translation: 提供了使用具有由气帘分开的多个部分的圆形间歇处理室沉积膜的原子层沉积方法，使得每个部分独立地具有工艺条件。

公开(公告)号：US10010912B2

公开(公告)日：2018-07-03

申请号：US14276289

申请日：2014-05-13

Applicant: APPLIED MATERIALS, INC.

Inventor： Jared Ahmad Lee ,  Dmitry Lubomirsky ,  Martin Jeff Salinas ,  Andrew Nguyen ,  Tom K. Cho ,  Eric A. Englhardt ,  Fernando Silveira

IPC: F16K51/02 ,  B08B9/032 ,  F16K3/02 ,  H01L21/67

CPC classification number: B08B9/0325 ,  F16K3/02 ,  F16K51/02 ,  H01L21/67017 ,  H01L21/67253 ,  Y10T137/0419 ,  Y10T137/4259

Abstract: Methods and apparatus for particle reduction in throttle gate valves used in substrate process chambers are provided herein. In some embodiments, a gate valve for use in a process chamber includes a body having an opening disposed therethrough from a first surface to an opposing second surface of the body; a pocket extending into the body from a sidewall of the opening; a gate movably disposed within the pocket between a closed position that seals the opening and an open position that reveals the opening and disposes the gate completely within the pocket; and a plurality of gas ports disposed in the gate valve configured to direct a gas flow into a portion of the gate valve fluidly coupled to the opening.

公开(公告)号：US10468282B2

公开(公告)日：2019-11-05

申请号：US15963758

申请日：2018-04-26

Applicant: Applied Materials, Inc.

Inventor： Jared Ahmad Lee ,  Martin Jeff Salinas ,  Paul B. Reuter ,  Imad Yousif ,  Aniruddha Pal

IPC: H01L21/677 ,  C23C16/455 ,  C23C16/458 ,  H01L21/687 ,  H01L21/67 ,  H01L21/306

Abstract: Embodiments of the present invention provide an apparatus for transferring substrates and confining a processing environment in a chamber. One embodiment of the present invention provides a hoop assembly for using a processing chamber. The hoop assembly includes a confinement ring defining a confinement region therein, and three or more lifting fingers attached to the hoop. The three or more lifting fingers are configured to support a substrate outside the inner volume of the confinement ring.

公开(公告)号：US09857027B2

公开(公告)日：2018-01-02

申请号：US14476215

申请日：2014-09-03

Applicant: APPLIED MATERIALS, INC.

Inventor： Martin Jeff Salinas ,  Youqun Dong ,  David Thompson ,  Mei Chang

IPC: C23C16/44 ,  G05D9/12 ,  F24F6/02 ,  F17C6/00 ,  C23C16/448 ,  G05D9/02

CPC classification number: F17C6/00 ,  C23C16/4481 ,  F24F6/025 ,  G05D9/02 ,  G05D9/12 ,  Y10T137/6416 ,  Y10T137/7306

Abstract: Methods and apparatus for chemical delivery are provided herein. In some embodiments, a first reservoir holds a first volume of fluid, receives a carrier gas, and outputs the carrier gas together with vapor derived from the first volume of fluid. A second reservoir holds a second volume of fluid and is capable of delivering a part of the second volume of fluid to the first reservoir. A self-regulating tube extends from the first reservoir to a region above the second volume of fluid in the second reservoir.

公开(公告)号：US20150194298A1

公开(公告)日：2015-07-09

申请号：US14587131

申请日：2014-12-31

Applicant: Applied Materials, Inc.

Inventor： Yu Lei ,  Srinivas Gandikota ,  Seshadri Ganguli ,  Bo Zheng ,  Rajkumar Jakkaraju ,  Martin Jeff Salinas ,  Benjamin Schmiege

IPC: H01L21/02 ,  H01L21/3213 ,  H01L21/311 ,  H01L21/3205

CPC classification number: H01L21/0228 ,  C23C16/45551 ,  H01L21/0217 ,  H01L21/02175 ,  H01L21/02183 ,  H01L21/02186 ,  H01L21/02194 ,  H01L21/28562 ,  H01L21/31116 ,  H01L21/31122 ,  H01L21/32051 ,  H01L21/32136

Abstract: Provided are atomic layer deposition methods to deposit a film using a circular batch processing chamber with a plurality of sections separated by gas curtains so that each section independently has a process condition.

Abstract translation: 提供了使用具有由气帘分开的多个部分的圆形间歇处理室沉积膜的原子层沉积方法，使得每个部分独立地具有工艺条件。