摘要:
A method for generating model files of target devices of an integrated circuit includes providing the target devices; providing a device target set for the target devices, wherein the device target set comprises target values of parameters of the target devices; determining a nearest known model related to the target devices, wherein the nearest known model comprises a first model file; performing a sensitivity analysis to determine sensitive parameters in the first model file; modifying the sensitive parameters in the first model file to generate a second model file; and determining a fitness value of a circuit simulated using the second model file with values of parameters in the device target set.
摘要:
A method for generating model files of target devices of an integrated circuit includes providing the target devices; providing a device target set for the target devices, wherein the device target set comprises target values of parameters of the target devices; determining a nearest known model related to the target devices, wherein the nearest known model comprises a first model file; performing a sensitivity analysis to determine sensitive parameters in the first model file; modifying the sensitive parameters in the first model file to generate a second model file; and determining a fitness value of a circuit simulated using the second model file with values of parameters in the device target set.
摘要:
An integrated circuit includes a first diffusion area for a first type transistor. The first type transistor includes a first drain region and a first source region. A second diffusion area for a second type transistor is spaced from the first diffusion area. The second type transistor includes a second drain region and a second source region. A gate electrode continuously extends across the first diffusion area and the second diffusion area in a routing direction. The first metallic layer is electrically coupled with the first source region. The first metallic layer and the first diffusion area overlap with a first distance. A second metallic layer is electrically coupled with the first drain region and the second drain region. The second metallic layer and the first diffusion area overlap with a second distance. The first distance is larger than the second distance.
摘要:
A method of forming an integrated circuit including forming a first diffusion area and a second diffusion area on a substrate, wherein the first diffusion area is configured for a first type transistor, the second diffusion area is configured for a second type transistor. The method further includes forming first source and drain regions in the first diffusion area. The method further includes forming second source and drain regions in the second diffusion area. The method further includes forming a gate electrode extending across the first diffusion area and the second diffusion area. The method further includes forming a first metallic layer, a second metallic layer, and a third metallic layer. The first metallic layer is electrically coupled with the first source region. The second metallic layer is electrically coupled with the first and second drain regions. The third metallic layer is electrically coupled with the second source region.
摘要:
A method of testing a sleep support member, the method including: identifying the sleep support member; determining a tested comfort/support value for the identified sleep support member before the identified sleep support member is provided to a customer; and determining whether the tested comfort/support value is within a predetermined tolerance level of a goal comfort/support value for the identified sleep support member. An apparatus for testing a sleep support member, the apparatus including: an identification unit configured to identify the sleep support member; a comfort/support testing unit configured to determine a tested comfort/support value for the identified sleep support member before the identified sleep support member is provided to a customer; and an analysis unit configured to determine whether the tested comfort/support value is within a predetermined tolerance level of a goal comfort/support value for the identified sleep support member.
摘要:
A computer system including a control logic and a storage coupled to the control logic. The storage includes a plurality of bitcells and bitlines used to transfer data between the control logic and the bitcells. The control logic provides an address of a target bitcell to the storage. Within a single clock cycle, the storage uses the address to activate the target bitcell, to precharge bitlines coupled to the target bitcell, and to access the target bitcell.
摘要:
A device for adaptively controlling a voltage supplied to circuitry in close proximity to the device, comprising a processing module and a first tracking element coupled to the processing module. The first tracking element produces a first value indicative of a first estimated speed associated with the circuitry. The device also comprises a second tracking element coupled to the processing module. The second tracking element produces a second value indicative of a second estimated speed associated with the circuitry. The processing module compares each of the first and second values to respective target values and causes a voltage output to be adjusted based on the comparisons. The first and second tracking elements comprise a plurality of transistors, at least some of the transistors selectively provided with a transistor bias voltage to adjust transistor speed.
摘要:
A method of forming a transistor (70) in a semiconductor active area (78). The method forms a gate structure (G2) in a fixed relationship to the semiconductor active area thereby defining a first source/drain region (R1) adjacent a first gate structure sidewall and a second source/drain region (R2) adjacent a second sidewall gate structure. The method also forms a lightly doped diffused region (801) formed in the first source/drain region and extending under the gate structure, wherein the lightly doped diffused region comprises a varying resistance in a direction parallel to the gate structure.
摘要:
A compact data line arrangement (600) includes “twisted” data line pairs (604a-604c) disposed in a first direction. Each twisted data line pair (604a-604c) includes an upper segment pair (608a-608f) that is connected to a lower segment pair (610a-610f) by a twist structure (612a-612c). The upper and lower segment pairs (608a-608f and 610a-610f) can be formed with a first pitch using phase-shifted lithography. The twist structures (612a-612c) are formed from a second conductive layer, and have a greater pitch than the first pitch. The twist structures (612a-612c) are generally arranged in a second direction that is perpendicular to the first direction. Selected twist structures (612b) are offset in the first direction with respect to adjacent twist structures (612a and 612c). The offset twist structures (612a-612c) allow supplemental conductive lines (618) to be formed from the first conductive layer that extend in the first direction, between adjacent offset twist structures (612a and 612b).
摘要:
A dynamic random access memory (DRAM) includes a Y-select circuit (218) that connects a pair of bit lines (204a and 204b) to a pair of sense nodes (210a and 210b). The Y-select circuit (218) provides a first impedance in a read operation, and a second impedance that is lower than the first impedance, in a write operation. Changes in Y-select circuit (218) impedance are achieved by driving transistors (N210a and N210b) within the Y-select circuit (218) with a first voltage during a read operation, and a second voltage during a write operation.