Photo semiconductor device
    1.
    发明授权
    Photo semiconductor device 失效
    照片半导体器件

    公开(公告)号:US4740819A

    公开(公告)日:1988-04-26

    申请号:US680118

    申请日:1986-06-30

    CPC分类号: H01L31/1075

    摘要: Disclosed is a photo-detective semiconductor device having, on a predetermined semiconductor substrate, at least a first semiconductor layer which exhibits a first conductivity type, a second semiconductor layer which is disposed on said first semiconductor layer, which has a forbidden band gap greater than that of said first semiconductor layer and which exhibits the first conductivity type, and a p-n junction which is formed by a region disposed in said second semiconductor layer and exhibiting a second conductivity type; characterized by comprising a third semiconductor layer which is disposed on said second semiconductor layer, which exhibits the first conductivity type and which has a surface protective function. The third semiconductor layer is usually made of a group III-V compound semiconductor of a quaternary system. By way of example, in a case where the first semiconductor layer is formed of InGaAsP and where the second semiconductor layer is formed of InP, the third semiconductor layer is made of InGaAsP, InGaAs or the like. A photo-detective semiconductor device of low dark current can be provided.

    摘要翻译: 公开了一种光检测半导体器件,其在预定半导体衬底上具有至少第一导电类型的第一半导体层,设置在所述第一半导体层上的禁止带隙大于第二半导体层的第二半导体层, 所述第一半导体层的表面具有第一导电类型,以及pn结,其由设置在所述第二半导体层中并呈现第二导电类型的区域形成; 其特征在于包括:第三半导体层,其设置在所述第二半导体层上,其具有第一导电类型并具有表面保护功能。 第三半导体层通常由四元系的III-V族化合物半导体制成。 作为示例,在第一半导体层由InGaAsP形成且第二半导体层由InP形成的情况下,第三半导体层由InGaAsP,InGaAs等构成。 可以提供低暗电流的光检测半导体器件。

    Light emitting semiconductor device and a method for making the same
    7.
    发明授权
    Light emitting semiconductor device and a method for making the same 失效
    发光半导体器件及其制造方法

    公开(公告)号:US4017881A

    公开(公告)日:1977-04-12

    申请号:US612282

    申请日:1975-09-11

    摘要: In a method for making a light emitting device having hemispherical dome type geometry, a p-conductivity type and then an n-conductivity type layer are successively grown epitaxially on a substrate made of a mixed compound semiconductor crystal having a band gap wider than the two above-mentioned layers. A surface portion of these epitaxially grown layers, which is not covered by a mask deposited on the n-conductivity type layer at a position where a p-n junction is to be formed, is doped with p-conductivity type impurities so that a small n-conductivity type region is surrounded by a region converted into p-conductivity type. The other side of the crystal is formed into a hemispherical shape so that the n-conductivity type region is located at the central portion of the hemisphere.

    摘要翻译: 在制造具有半球形圆顶型几何形状的发光器件的方法中,p型导电型和n型导电型层在由混合化合物半导体晶体制成的衬底上外延连续地生长,所述混合化合物半导体晶体的带隙宽于二 上述层。 这些外延生长层的表面部分未被掩模在沉积在n导电型层上的p型结的位置处的掩模覆盖,其中p型结被掺杂有p导电型杂质, 导电类型区域被转换为p导电型的区域包围。 晶体的另一侧形成为半球形状,使得n导电型区域位于半球的中心部分。

    Single mode optical fiber device including a short lens optical fiber
    9.
    发明授权
    Single mode optical fiber device including a short lens optical fiber 失效
    单模光纤装置包括短透镜光纤

    公开(公告)号:US5257335A

    公开(公告)日:1993-10-26

    申请号:US824078

    申请日:1992-01-23

    CPC分类号: G02B6/264 G02B6/262

    摘要: An optical terminal structure includes a single mode optical fiber having a short length, and a cylindrical member in which the single mode optical fiber is fixed. The cylindrical member has the co-axis as that of a core of the single mode optical fiber. Each of both facets of the cylindrical member is polished to have a mirror surface. The core and a clad of the single mode optical fiber have refractive indexes so that the normalized frequency in operation state of the single mode optical fiber becomes at most 2.405 as a value converted at a wavelength in use of 1.28 .mu.m. The wavelength in use is preferably in the range of 1.29 to 1.33 .mu.m.

    Monolithic light emitting diode array
    10.
    发明授权
    Monolithic light emitting diode array 失效
    单片发光二极管阵列

    公开(公告)号:US4984035A

    公开(公告)日:1991-01-08

    申请号:US178648

    申请日:1988-04-07

    IPC分类号: B41J2/45 H01L27/15 H01L33/00

    摘要: A monolithic light emitting diode array includes: at least one mixed crystal layer formed on a substrate by an epitaxial growth to provide a P-N junction at the boundary surface thereof; row of a plurality of light emitting diode portions each having the P-N junction; at least one forward mesa etching groove provided along the row of a plurality of light emitting diode portions on the at least one mixed crystal layer; a plurality of reverse mesa etching grooves provided so to be orthogonal to the at least one forward mesa etching groove and positioned between the plurality of light emitting diode portions on the at least one mixed crystal layer; a plurality of individual electrodes having electrode portions extending respectively to the plurality of light emitting diode portions so as to cross the at least one forward mesa etching groove, and a common electrode provided on a back surface of said substrate. Each of the emitting diode portions is surrounded by the forward and reverse mesa etching grooves so that the manufacturing thereof becomes easier and the characteristic thereof is improved.

    摘要翻译: 单片发光二极管阵列包括:通过外延生长在衬底上形成的至少一个混晶层,以在其边界表面提供P-N结; 行的多个发光二极管部分,每个具有P-N结; 沿着所述至少一个混晶层上的多个发光二极管部分的行设置的至少一个前台面蚀刻槽; 多个反向台面蚀刻槽,设置成与所述至少一个前台面蚀刻槽正交,并位于所述至少一个混晶层上的所述多个发光二极管部分之间; 多个单独电极,具有分别延伸到所述多个发光二极管部分以与所述至少一个前台面蚀刻槽交叉的电极部分和设置在所述基板的背面上的公共电极。 每个发光二极管部分被正向和反向台面蚀刻槽包围,使得其制造变得更容易并且其特性得到改善。