公开(公告)号：US5730804A

公开(公告)日：1998-03-24

申请号：US772570

申请日：1996-12-26

申请人： Hisashi Gomi ,  Masahide Itoh ,  Shimpei Jinnouchi ,  Towl Ikeda

发明人： Hisashi Gomi ,  Masahide Itoh ,  Shimpei Jinnouchi ,  Towl Ikeda

IPC分类号： B01J4/00 ,  C23C16/44 ,  C23C16/448 ,  C23C16/455 ,  C23C16/52 ,  F17C7/04 ,  H01L21/205 ,  H01L21/28 ,  H01L21/285 ,  H01L21/304 ,  C23C16/00

CPC分类号： C23C16/4408 ,  B01J4/00 ,  C23C16/4407 ,  C23C16/4481 ,  C23C16/52 ,  F17C7/04 ,  F17C2221/012 ,  F17C2221/016 ,  F17C2223/0153 ,  F17C2227/044 ,  F17C2250/032 ,  F17C2250/043 ,  F17C2250/0636 ,  F17C2270/0518 ,  Y02E60/321

摘要： A process gas supply apparatus according to the invention comprises a supply pipe line connecting a supply source containing an organic aluminum metallic compound in a liquid state, to a process device for forming a film on an object using the organic aluminum metallic compound, a force-feed device for force-feeding, through the supply pipe line, the organic aluminum metallic compound contained in the supply source, a vaporizing device provided across the supply pipe line for vaporizing the force-fed organic aluminum metallic compound of the liquid state, a purge gas introduction device connected to the supply pipe line for introducing a pressurized purge gas into the supply pipe line, a solvent introduction device connected to the supply pipe line for introducing into the supply pipe line a solvent for dissolving the organic aluminum metallic compound, an exhaustion device connected to the supply pipe line for exhausting the supply pipe line by a negative pressure, and a control device having a plurality of valves arranged across the supply pipe line, and controlling the flow of fluids flowing through the supply pipe line by opening and closing the valves.

摘要翻译： 根据本发明的工艺气体供给装置包括：将含有液态的有机铝金属化合物的供给源与使用有机铝金属化合物在物体上形成膜的处理装置连接的供给管线， 用于强制供给的供给装置，通过供给管线，包含在供给源中的有机铝金属化合物，设置在供给管路两侧的用于使强制供给的液态有机铝金属化合物蒸发的蒸发装置，吹扫 气体引入装置，连接到供给管线，用于将加压的净化气体引入供给管线;溶剂引入装置，连接到供给管线，用于向供给管线引入用于溶解有机铝金属化合物的溶剂， 连接到供给管线的装置，用于通过负压排出供给管线，以及控制装置 e具有跨过供给管线布置的多个阀，并且通过打开和关闭阀来控制流过供给管线的流体的流动。

公开(公告)号：US5788747A

公开(公告)日：1998-08-04

申请号：US788702

申请日：1997-01-24

申请人： Takashi Horiuchi ,  Sensho Kobayashi ,  Masahide Itoh ,  Hisashi Gomi

发明人： Takashi Horiuchi ,  Sensho Kobayashi ,  Masahide Itoh ,  Hisashi Gomi

IPC分类号： C23C16/44 ,  B01D50/00 ,  H01L21/205 ,  H01L21/285

CPC分类号： B01D50/00 ,  Y10S438/905 ,  Y10S438/909

摘要： An exhaust system for a film forming apparatus including an exhaust pipe passage connected to an exhaust port of the film forming apparatus for forming a film on a object by using vaporized gas of an organic metal compound. The film forming apparatus includes a pressure transfer unit provided for the exhaust pipe passage and arranged to transfer, through the exhaust pipe passage, gas in the film forming apparatus as exhaust gas. A cooling mechanism is provided for the pressure transfer unit and arranged to cool the pressure transfer unit to a temperature lower than a temperature, at which the organic metal compound is decomposed, so as to prevent precipitation of the organic metal compound contained in the exhaust gas introduced into the pressure transfer unit. A removing unit is disposed at an intermediate position of the exhaust pipe passage, downstream from the pressure transfer unit, so as to remove the organic metal compound contained in the exhaust gas which is introduced through the exhaust pipe passage.

摘要翻译： 一种用于成膜设备的排气系统，包括连接到成膜设备的排气口的排气管通道，用于通过使用有机金属化合物的气化气体在物体上形成膜。 成膜装置包括设置在排气管路上的压力传递单元，其设置成通过排气管道将成膜装置中的气体作为废气传递。 为压力传递单元设置冷却机构，将压力传递单元冷却到低于有机金属化合物分解温度的温度，以防止废气中含有的有机金属化合物析出 引入压力传送单元。 除气单元设置在排气管通道的中间位置，位于压力传送单元的下游，以去除通过排气管通道引入的废气中包含的有机金属化合物。

公开(公告)号：US20070107845A1

公开(公告)日：2007-05-17

申请号：US11623573

申请日：2007-01-16

申请人： Shigeru Ishizawa ,  Hiroaki Saeki ,  Yoshimitsu Tamura ,  Shigetoshi Hosaka ,  Masahide Itoh ,  Kazushi Tahara ,  Yasushi Kodashima

发明人： Shigeru Ishizawa ,  Hiroaki Saeki ,  Yoshimitsu Tamura ,  Shigetoshi Hosaka ,  Masahide Itoh ,  Kazushi Tahara ,  Yasushi Kodashima

IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/00

CPC分类号： H01L21/67751 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/67184 ,  H01L21/67201

摘要： A semiconductor processing system includes an intermediate structure disposed between an atmospheric pressure entrance transfer chamber and a vacuum common transfer chamber. The intermediate structure includes a transfer passage for a target substrate to pass therein. The transfer passage includes a first buffer chamber a middle transfer chamber and a second buffer chamber detachably connected. An additional processing apparatus is detachably connected to the middle transfer chamber. The intermediate structure is selectively arranged in first or second state. In the first state, the additional processing apparatus performs a vacuum process, while the first buffer chamber is a load-lock chamber. In the second state, the additional processing apparatus performs an atmospheric pressure process, while the second buffer chamber is a load-lock chamber.

摘要翻译： 半导体处理系统包括设置在大气压入口传送室和真空公共传送室之间的中间结构。 中间结构包括用于目标基板的传送通道。 传送通道包括第一缓冲室，中间传送室和可拆卸地连接的第二缓冲室。 附加处理装置可拆卸地连接到中间传送室。 中间结构选择性地布置在第一或第二状态。 在第一状态下，附加处理装置执行真空处理，而第一缓冲室是装载锁定室。 在第二状态下，附加处理装置进行大气压处理，而第二缓冲室是装载锁定室。

公开(公告)号：US06741356B1

公开(公告)日：2004-05-25

申请号：US09664723

申请日：2000-09-19

申请人： Hiroshi Ishiwata ,  Toyohiko Yatagai ,  Masahide Itoh

发明人： Hiroshi Ishiwata ,  Toyohiko Yatagai ,  Masahide Itoh

IPC分类号： G01B902

CPC分类号： G01B9/04 ,  G01B9/02024 ,  G01B9/02087 ,  G01B2290/70 ,  G02B21/14

摘要： A detection apparatus includes a differential interference contrast microscope, a device for changing the amount of retardation between the two polarized components, a device for photographing the image of an object to be observed, and a device for performing a calculation with respect to the image captured by this photographing device. In the detection apparatus, amounts of retardation between two polarized components split in an illumination optical system of the differential interference contrast microscope are detected to form two differential interference contrast images relative to the object in which the amounts of retardation between the polarized components are equal, but have different signs. Subsequently, in the two differential interference contrast images, a differential calculation and a summed calculation are performed with regard to respective corresponding pixels to obtain a differential image and a summed image. The ratio of image information between the differential image and the summed image is calculated, and from the result of this calculation, image information in a predetermined range is extracted. In this way, the phase of the object can be detected.

摘要翻译： 检测装置包括差分干涉对比显微镜，用于改变两个偏振分量之间的延迟量的装置，用于拍摄待观察对象的图像的装置和用于对所捕获的图像进行计算的装置 通过该拍摄装置。 在检测装置中，检测在微分干涉对比显微镜的照明光学系统中分离的两个偏振分量之间的延迟量，以相对于偏振分量之间的相位量相等的对象形成两个差分干涉对比图像， 但有不同的迹象。 随后，在两个差分干涉对比图像中，针对各个对应的像素执行差分计算和相加计算，以获得差分图像和相加图像。 计算差分图像和求和图像之间的图像信息的比率，并从该计算结果中提取预定范围内的图像信息。 以这种方式，可以检测物体的相位。

公开(公告)号：US08906193B2

公开(公告)日：2014-12-09

申请号：US12651165

申请日：2009-12-31

申请人： Kenetsu Mizusawa ,  Keiki Ito ,  Masahide Itoh

发明人： Kenetsu Mizusawa ,  Keiki Ito ,  Masahide Itoh

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  F17D1/04 ,  G05D11/13

CPC分类号： F17D1/04 ,  C23C16/45512 ,  C23C16/45561 ,  C23C16/52 ,  G05D11/132 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/67069 ,  H01L21/67253 ,  Y10T137/0329 ,  Y10T137/0335 ,  Y10T137/0352 ,  Y10T137/2496 ,  Y10T137/87346

摘要： A gas supply unit, for supplying a gas into a processing chamber in which a substrate is processed, includes a plurality of gas supply sources, a mixing line for mixing a plurality of gases supplied from the gas supply sources to make a gaseous mixture, a multiplicity of branch lines for branching the gaseous mixture to be supplied to a multiplicity of places in the processing chamber, and an additional gas supply unit for supplying a specified additional gas to a gaseous mixture flowing in at least one branch line. The gas supply unit also includes pressure gauges and valves for adjusting gas flow rates in the branch lines, respectively, and a pressure ratio controller for controlling that gaseous mixtures branched into the branch lines to have a specified pressure ratio by adjusting opening degrees of the valves based on measurement results obtained by using the pressure gauges.

摘要翻译： 用于将气体供给到其中处理基板的处理室中的气体供给单元包括多个气体供给源，用于混合从气体供给源供给的多个气体以形成气体混合物的混合管线， 用于将要供应到处理室中的多个位置的气体混合物进行分支的分支管线的多个，以及用于向在至少一条分支管线中流动的气体混合物供应特定附加气体的附加气体供应单元。 气体供应单元还包括用于分别调节分支管线中的气体流量的压力计和阀，以及压力比控制器，用于通过调节阀的开度来控制分支成分支管路的气体混合物以具有规定的压力比 基于通过使用压力计获得的测量结果。

公开(公告)号：US20100163112A1

公开(公告)日：2010-07-01

申请号：US12651165

申请日：2009-12-31

申请人： Kenetsu Mizusawa ,  Keiki Ito ,  Masahide Itoh

发明人： Kenetsu Mizusawa ,  Keiki Ito ,  Masahide Itoh

IPC分类号： F17D3/00

CPC分类号： F17D1/04 ,  C23C16/45512 ,  C23C16/45561 ,  C23C16/52 ,  G05D11/132 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/67069 ,  H01L21/67253 ,  Y10T137/0329 ,  Y10T137/0335 ,  Y10T137/0352 ,  Y10T137/2496 ,  Y10T137/87346

摘要： A gas supply unit, for supplying a gas into a processing chamber in which a substrate is processed, includes a plurality of gas supply sources, a mixing line for mixing a plurality of gases supplied from the gas supply sources to make a gaseous mixture, a multiplicity of branch lines for branching the gaseous mixture to be supplied to a multiplicity of places in the processing chamber, and an additional gas supply unit for supplying a specified additional gas to a gaseous mixture flowing in at least one branch line. The gas supply unit also includes pressure gauges and valves for adjusting gas flow rates in the branch lines, respectively, and a pressure ratio controller for controlling that gaseous mixtures branched into the branch lines to have a specified pressure ratio by adjusting opening degrees of the valves based on measurement results obtained by using the pressure gauges.

摘要翻译： 用于将气体供给到其中处理基板的处理室中的气体供给单元包括多个气体供给源，用于混合从气体供给源供给的多个气体以形成气体混合物的混合管线， 用于将要供应到处理室中的多个位置的气体混合物进行分支的分支管线的多个，以及用于向在至少一条分支管线中流动的气体混合物供应特定附加气体的附加气体供应单元。 气体供应单元还包括用于分别调节分支管线中的气体流量的压力计和阀，以及压力比控制器，用于通过调节阀的开度来控制分支成分支管路的气体混合物以具有规定的压力比 基于通过使用压力计获得的测量结果。

公开(公告)号：US20060124169A1

公开(公告)日：2006-06-15

申请号：US11296209

申请日：2005-12-08

申请人： Kenetsu Mizusawa ,  Keiki Ito ,  Masahide Itoh

发明人： Kenetsu Mizusawa ,  Keiki Ito ,  Masahide Itoh

IPC分类号： E03B1/00 ,  G05D11/00

CPC分类号： F17D1/04 ,  C23C16/45512 ,  C23C16/45561 ,  C23C16/52 ,  G05D11/132 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/67069 ,  H01L21/67253 ,  Y10T137/0329 ,  Y10T137/0335 ,  Y10T137/0352 ,  Y10T137/2496 ,  Y10T137/87346

摘要： A gas supply unit, for supplying a gas into a processing chamber in which a substrate is processed, includes a plurality of gas supply sources, a mixing line for mixing a plurality of gases supplied from the gas supply sources to make a gaseous mixture, a multiplicity of branch lines for branching the gaseous mixture to be supplied to a multiplicity of places in the processing chamber, and an additional gas supply unit for supplying a specified additional gas to a gaseous mixture flowing in at least one branch line. The gas supply unit also includes pressure gauges and valves for adjusting gas flow rates in the branch lines, respectively, and a pressure ratio controller for controlling that gaseous mixtures branched into the branch lines to have a specified pressure ratio by adjusting opening degrees of the valves based on measurement results obtained by using the pressure gauges.

摘要翻译： 用于将气体供给到其中处理基板的处理室中的气体供给单元包括多个气体供给源，用于混合从气体供给源供给的多个气体以形成气体混合物的混合管线， 用于将要供应到处理室中的多个位置的气体混合物进行分支的分支管线的多个，以及用于向在至少一条分支管线中流动的气体混合物供应特定附加气体的附加气体供应单元。 气体供应单元还包括用于分别调节分支管线中的气体流量的压力计和阀，以及压力比控制器，用于通过调节阀的开度来控制分支成分支管路的气体混合物以具有规定的压力比 基于通过使用压力计获得的测量结果。

公开(公告)号：US20050118000A1

公开(公告)日：2005-06-02

申请号：US10505168

申请日：2003-02-28

申请人： Shigeru Kasai ,  Masahide Itoh ,  Shunro Nagasawa

发明人： Shigeru Kasai ,  Masahide Itoh ,  Shunro Nagasawa

IPC分类号： B65D85/86 ,  B65G49/00 ,  B65G49/07 ,  H01L21/00 ,  H01L21/673 ,  H01L21/677 ,  H01L21/687 ,  B65G1/00

CPC分类号： H01L21/67161 ,  H01L21/67126 ,  H01L21/68707

摘要： A treatment subject receiving vessel body 72 comprises a portable vessel main body 92, a treatment subject support member 100 installed in the vessel main body and capable of supporting a plurality of treatment subjects W, a joint port 96 formed in one side surface of the vessel main body and communicating with the interior of the vessel main body, an openable/closable gate valve 94 installed in the joining port, and an exhaust port 108 made openable/closable to be capable of exhausting the vessel main body. When the gate valve and exhaust port are closed, the vessel main body is brought to the sealed state.

摘要翻译： 受治疗对象接收血管体72包括便携式容器主体92，安装在容器主体中并能够支撑多个治疗对象W的治疗对象支撑构件100，形成在容器的一个侧表面中的接合口96 主体并与容器主体的内部连通，安装在连接口中的可开闭的闸阀94和能够排出容器主体的可打开/关闭的排气口108。 当闸阀和排气口关闭时，容器主体处于密封状态。

公开(公告)号：US5969855A

公开(公告)日：1999-10-19

申请号：US729410

申请日：1996-10-11

申请人： Hiroshi Ishiwata ,  Toyohiko Yatagai ,  Masahide Itoh

发明人： Hiroshi Ishiwata ,  Toyohiko Yatagai ,  Masahide Itoh

IPC分类号： G02B21/14 ,  G02B21/36 ,  G02B21/06

CPC分类号： G02B21/367 ,  G02B21/14

摘要： A microscope apparatus that has an electronic image pickup device arranged on an image surface of an imaging optical system, a component for separating light from a light source into two portions, a device for changing a phase difference between the two portions of light, a device for storing information on the images picked up by the image pickup device, and information processor for processing the information of images. The images are picked up by the electronic image pickup device as the phase difference is changed, and the information on the images is multiplied by a periodic function, as a weight function, which is given the phase difference as variable, and a resultant product is integrated so that a differential interference microscope apparatus capable of accurately obtaining a phase distribution of the object or a phase-contrast microscope apparatus capable of effectively enhancing a resolving power without lowering an image contrast is obtained.

摘要翻译： 一种具有配置在摄像光学系统的图像表面上的电子摄像装置的显微镜装置，将光源从光源分离成两部分的部件，用于改变两部分光之间的相位差的装置， 用于存储由图像拾取装置拾取的图像的信息，以及用于处理图像信息的信息处理器。 当相位差改变时，由电子摄像装置拾取图像，并将关于图像的信息乘以周期函数作为加权函数，其给出相位差作为可变，并且得到的乘积为 可以获得能够精确地获得物体的相位分布的微分干涉显微镜装置，或能够有效地提高分辨能力而不降低图像对比度的相位差显微镜装置。