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    193nm laser and inspection system
    1.
    发明授权
    193nm laser and inspection system 有权

    公开(公告)号：US10439355B2

    公开(公告)日：2019-10-08

    申请号：US15901388

    申请日：2018-02-21

    Applicant: KLA-Tencor Corporation

    Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  John Fielden

    IPC: G01N21/95 ,  G02B17/08 ,  H01S3/23 ,  H01S3/00 ,  H01S3/30 ,  H01S3/10 ,  H01S3/067 ,  H01S3/16 ,  H01S3/11 ,  G02F1/35 ,  G02F1/39

    Abstract: An optical inspection system that utilizes sub-200 nm incident light beam to inspect a surface of an object for defects is described. The sub-200 nm incident light beam is generated by combining first light having a wavelength of about 1109 nm with second light having a wavelength of approximately 234 nm. An optical system includes optical components configured to direct the incident light beam to a surface of the object, and image relay optics are configured to collect and relay at least two channels of light to a sensor, where at least one channel includes light reflected from the object, and at least one channel includes light transmitted through the object. The sensor is configured to simultaneously detect both the reflected and transmitted light. A laser for generating the sub-200 nm incident light beam includes a fundamental laser, two or more harmonic generators, a frequency doubler and a two frequency mixing stages.

    183NM Laser And Inspection System
    7.
    发明申请
    183NM Laser And Inspection System 有权
    183NM激光检测系统

    公开(公告)号：US20160099540A1

    公开(公告)日：2016-04-07

    申请号：US14872890

    申请日：2015-10-01

    Applicant: KLA-Tencor Corporation

    Inventor： Yung-Ho Alex Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Vladimir Dribinski ,  John Fielden ,  Jidong Zhang

    IPC: H01S3/109 ,  H01S3/108 ,  H01S5/40 ,  G01N21/88 ,  H01S5/00 ,  G02B21/10 ,  G02B21/16 ,  G02B21/36 ,  H01S3/10 ,  H01S5/06

    CPC classification number: H01F17/0006 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G02B21/10 ,  G02B21/16 ,  G02B21/361 ,  G02F1/353 ,  G02F2001/3507 ,  G02F2001/354 ,  H01F17/04 ,  H01F27/292 ,  H01S3/0092 ,  H01S3/10007 ,  H01S3/10084 ,  H01S3/1083 ,  H01S3/109 ,  H01S5/0071 ,  H01S5/0085 ,  H01S5/0604 ,  H01S5/4012

    Abstract: A laser assembly for generating laser output light at an output wavelength of approximately 183 nm includes a fundamental laser, an optical parametric system (OPS), a fifth harmonic generator, and a frequency mixing module. The fundamental laser generates fundamental light at a fundamental frequency. The OPS generates a down-converted signal at a down-converted frequency. The fifth harmonic generator generates a fifth harmonic of the fundamental light. The frequency mixing module mixes the down-converted signal and the fifth harmonic to produce the laser output light at a frequency equal to a sum of the fifth harmonic frequency and the down-converted frequency. The OPS generates the down-converted signal by generating a down-converted seed signal at the down-converted frequency, and then mixing the down-converted seed signal with a portion of the fundamental light. At least one of the frequency mixing, frequency conversion or harmonic generation utilizes an annealed, deuterium-treated or hydrogen-treated CLBO crystal.

    Abstract translation: 用于在大约183nm的输出波长处产生激光输出光的激光组件包括基本激光器，光学参数系统（OPS），五次谐波发生器和频率混合模块。 基本激光器产生基频的基本光。 OPS以降频转换的频率产生降频转换的信号。 五次谐波发生器产生基波的五次谐波。 频率混合模块混合下变频信号和第五谐波，以产生等于五次谐波频率和下变频频率之和的频率的激光输出光。 OPS通过在下变频的频率处产生下变频的种子信号，然后将下变频的种子信号与基本光的一部分混合来产生下变频信号。 频率混合，频率转换或谐波产生中的至少一种利用退火，氘处理或氢处理的CLBO晶体。

    Laser Repetition Rate Multiplier And Flat-Top Beam Profile Generators Using Mirrors And/Or Prisms
    8.
    发明申请
    Laser Repetition Rate Multiplier And Flat-Top Beam Profile Generators Using Mirrors And/Or Prisms 有权
    激光重复率乘法器和平顶波束轮廓发生器使用镜子和/或棱镜

    公开(公告)号：US20150372446A1

    公开(公告)日：2015-12-24

    申请号：US14596738

    申请日：2015-01-14

    Applicant: KLA-Tencor Corporation

    Inventor： Yung-Ho Alex Chuang ,  Xiaoxu Lu ,  Justin Dianhuan Liou ,  J. Joseph Armstrong ,  Yujun Deng ,  John Fielden

    IPC: H01S3/10

    CPC classification number: H01S3/10046 ,  G03F7/70025 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/08004 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/083 ,  H01S3/10 ,  H01S3/10061 ,  H01S2301/20 ,  H01S2301/203 ,  H01S2301/206

    Abstract: A repetition rate (pulse) multiplier includes one or more beam splitters and prisms forming one or more ring cavities with different optical path lengths that delay parts of the energy of each pulse. A series of input laser pulses circulate in the ring cavities and part of the energy of each pulse leaves the system after traversing the shorter cavity path, while another part of the energy leaves the system after traversing the longer cavity path, and/or a combination of both cavity paths. By proper choice of the ring cavity optical path length, the repetition rate of an output series of laser pulses can be made to be a multiple of the input repetition rate. The relative energies of the output pulses can be controlled by choosing the transmission and reflection coefficients of the beam splitters. Some embodiments generate a time-averaged output beam profile that is substantially flat in one dimension.

    Abstract translation: 重复率（脉冲）乘法器包括一个或多个分束器和棱镜，其形成具有延迟每个脉冲的能量部分的不同光程长度的一个或多个环形腔。 一系列输入激光脉冲在环形腔中循环，并且每个脉冲的能量的一部分在穿过较短腔体路径之后离开系统，而另一部分能量在穿过较长腔体路径后离开系统，和/或组合 两个腔道。 通过适当选择环腔光程长度，激光脉冲的输出系列的重复率可以是输入重复率的倍数。 可以通过选择分束器的透射和反射系数来控制输出脉冲的相对能量。 一些实施例产生在一个维度上基本上平坦的时间平均的输出光束轮廓。

    Semiconductor inspection and metrology system using laser pulse multiplier
    9.
    发明授权
    Semiconductor inspection and metrology system using laser pulse multiplier 有权
    半导体检测和计量系统采用激光脉冲倍增器

    公开(公告)号：US09151940B2

    公开(公告)日：2015-10-06

    申请号：US13711593

    申请日：2012-12-11

    Applicant: KLA-Tencor Corporation

    Inventor： Yung-Ho Alex Chuang ,  Justin Dianhuan Liou ,  J. Joseph Armstrong ,  Yujun Deng

    IPC: H01S3/00 ,  G02B17/00 ,  G02B27/00 ,  C23C16/00

    CPC classification number: H01S3/005 ,  C23C16/00 ,  G02B17/00 ,  G02B17/0848 ,  G02B27/00 ,  G02B27/108 ,  H01S3/00 ,  H01S3/10

    Abstract: A pulse multiplier includes a beam splitter and one or more mirrors. The beam splitter receives a series of input laser pulses and directs part of the energy of each pulse into a ring cavity. After circulating around the ring cavity, part of the pulse energy leaves the ring cavity through the beam splitter and part of the energy is recirculated. By selecting the ring cavity optical path length, the repetition rate of an output series of laser pulses can be made to be a multiple of the input repetition rate. The relative energies of the output pulses can be controlled by choosing the transmission and reflection coefficients of the beam splitter. This pulse multiplier can inexpensively reduce the peak power per pulse while increasing the number of pulses per second with minimal total power loss.

    Abstract translation: 脉冲倍增器包括分束器和一个或多个反射镜。 分束器接收一系列输入激光脉冲并将每个脉冲的能量的一部分引导到环形腔中。 在环形腔周围循环后，部分脉冲能量通过分束器离开环形空腔，部分能量被再循环。 通过选择环腔光路长度，可以将输出系列激光脉冲的重复率设为输入重复率的倍数。 可以通过选择分束器的透射和反射系数来控制输出脉冲的相对能量。 该脉冲倍增器可以以最小的总功率损耗来降低每脉冲的峰值功率，同时增加每秒的脉冲数。

    193NM laser and inspection system
    10.
    发明授权
    193NM laser and inspection system 有权
    193NM激光和检测系统

    公开(公告)号：US08929406B2

    公开(公告)日：2015-01-06

    申请号：US14158615

    申请日：2014-01-17

    Applicant: KLA-Tencor Corporation

    Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Vladimir Dribinski ,  Yujun Deng ,  John Fielden

    IPC: H01S3/30 ,  H01S3/00 ,  G01N21/84

    CPC classification number: H01S3/1083 ,  G01N21/84 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G02F1/3534 ,  G02F1/3536 ,  G02F1/39 ,  G02F2001/3507 ,  G02F2201/16 ,  H01S3/0078 ,  H01S3/0092 ,  H01S3/0602 ,  H01S3/067

    Abstract: A laser for generating an output wavelength of approximately 193.4 nm includes a fundamental laser, an optical parametric generator, a fourth harmonic generator, and a frequency mixing module. The optical parametric generator, which is coupled to the fundamental laser, can generate a down-converted signal. The fourth harmonic generator, which may be coupled to the optical parametric generator or the fundamental laser, can generate a fourth harmonic. The frequency mixing module, which is coupled to the optical parametric generator and the fourth harmonic generator, can generate a laser output at a frequency equal to a sum of the fourth harmonic and twice a frequency of the down-converted signal.

    Abstract translation: 用于产生约193.4nm的输出波长的激光器包括基本激光器，光参量发生器，第四谐波发生器和混频模块。 耦合到基本激光器的光学参数发生器可以产生下变频信号。 可以耦合到光学参数发生器或基本激光器的第四谐波发生器可以产生四次谐波。 耦合到光参量发生器和第四谐波发生器的混频模块可产生频率等于下变频信号频率的四次谐波和两倍的频率的激光输出。

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