公开(公告)号：US09851639B2

公开(公告)日：2017-12-26

申请号：US13436881

申请日：2012-03-31

申请人： Robert David Allen ,  Phillip Joe Brock ,  Masaki Fujiwara ,  Kazuhiko Maeda ,  Hoa D. Truong

发明人： Robert David Allen ,  Phillip Joe Brock ,  Masaki Fujiwara ,  Kazuhiko Maeda ,  Hoa D. Truong

IPC分类号： G03F7/004 ,  C08F228/02 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20

CPC分类号： G03F7/0397 ,  C08F228/02 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/11 ,  G03F7/2041

摘要： A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second repeat unit of capable of forming the photogenerated acid, and iii) a third repeat unit comprising a norbornyl ester, wherein a norbornyl ring of the norbornyl ester comprises a monovalent substituent having the formula *-L′-C(CF3)2(OH). L′ is a divalent linking group comprising at least one carbon and the starred bond of L′ is linked to the norbornyl ring. The first repeat unit, second repeat unit, and the third repeat unit are covalently bound repeat units of the PAG polymer.

公开(公告)号：US20130260313A1

公开(公告)日：2013-10-03

申请号：US13436881

申请日：2012-03-31

申请人： Robert David Allen ,  Phillip Joe Brock ,  Masaki Fujiwara ,  Kazuhiko Maeda ,  Hoa D. Truong

发明人： Robert David Allen ,  Phillip Joe Brock ,  Masaki Fujiwara ,  Kazuhiko Maeda ,  Hoa D. Truong

IPC分类号： G03F7/20 ,  G03F7/004 ,  C08F228/02

CPC分类号： G03F7/0397 ,  C08F228/02 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/11 ,  G03F7/2041

摘要： A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second repeat unit of capable of forming the photogenerated acid, and iii) a third repeat unit comprising a norbornyl ester, wherein a norbornyl ring of the norbornyl ester comprises a monovalent substituent having the formula *-L′-C(CF3)2(OH). L′ is a divalent linking group comprising at least one carbon and the starred bond of L′ is linked to the norbornyl ring. The first repeat unit, second repeat unit, and the third repeat unit are covalently bound repeat units of the PAG polymer.

摘要翻译： 产生光酸的聚合物（PAG聚合物）包括i）能够与光生酸反应形成含羧酸的重复单元的第一重复单元，ii）能够形成光生酸的第二重复单元，和iii） 包含降冰片基酯的第三重复单元，其中降冰片基酯的降冰片基环包含具有式* -L'-C（CF 3）2（OH）的一价取代基。 L'是包含至少一个碳的二价连接基团，L'的星形键与降冰片基环连接。 第一重复单元，第二重复单元和第三重复单元是PAG聚合物的共价键重复单元。

公开(公告)号：US09141856B2

公开(公告)日：2015-09-22

申请号：US13814813

申请日：2012-07-05

申请人： Kazuhiko Maeda

发明人： Kazuhiko Maeda

IPC分类号： G06K9/00 ,  G06F17/30

CPC分类号： G06K9/00577 ,  G06F17/30247 ,  G06K9/00288 ,  G06K9/00362

摘要： In an image evaluation apparatus, a clothing recognition unit performs, for each person appearing in each of images included in an image group generated by an image group generation unit, recognition of clothing that the person is wearing. An image event evaluation unit, according to types of clothing recognized by the clothing recognition unit and a frequency of appearance of each type of clothing in the images in the image group, collectively evaluates the images included in the image group.

摘要翻译： 在图像评价装置中，服装识别单元对于由图像组生成单元生成的图像组中包含的每个图像中的每个人执行对该人穿着的服装的识别。 图像事件评估单元根据由服装识别单元识别的服装的类型和图像组中的图像中的各种服装的出现次数，共同评估包括在图像组中的图像。

公开(公告)号：US08691491B2

公开(公告)日：2014-04-08

申请号：US13094281

申请日：2011-04-26

申请人： Shinichi Sumida ,  Haruhiko Komoriya ,  Kazuhiko Maeda

发明人： Shinichi Sumida ,  Haruhiko Komoriya ,  Kazuhiko Maeda

IPC分类号： G03F7/004

CPC分类号： C08F20/30 ,  C08F14/18 ,  C08F20/28 ,  C08F216/1408 ,  C08F220/24 ,  C08F220/30 ,  C09D125/16 ,  C09D133/16 ,  Y10S430/108 ,  Y10S430/111 ,  C08F2/00

摘要： A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n≦6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.

摘要翻译： 由式1表示的含氟化合物，其中R 1为甲基或三氟甲基，R 2和R 3各自独立地为氢原子或含有（a）具有直链，支链或环的烃基的基团 形成并具有1-25的碳原子数或（b）芳族烃基，所述基团任选地含有氟原子，氧原子和羰基键中的至少一个，l是0-2的整数， m和n各自独立地为1-5的整数，以满足m + n＆nlE; 6的表达式，并且当R 1，R 2和R 3中的至少一个为多个时，R 1，R 2和 R3可以彼此相同或不同。

公开(公告)号：US08435717B2

公开(公告)日：2013-05-07

申请号：US12527362

申请日：2008-02-14

申请人： Yuji Hagiwara ,  Jonathan Joachim Jodry ,  Satoru Narizuka ,  Kazuhiko Maeda

发明人： Yuji Hagiwara ,  Jonathan Joachim Jodry ,  Satoru Narizuka ,  Kazuhiko Maeda

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/038 ,  G03C1/675 ,  G03C1/73

CPC分类号： C07C69/003 ,  C07C69/74 ,  C07C309/12 ,  C07C381/12 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.

摘要翻译： 由下式（1）表示的磺酸鎓盐可用作抗蚀剂组合物的优异的放射敏感酸发生剂。 可以通过使用含有该磺酸鎓盐的抗蚀剂组合物形成良好的图案。 在式（1）中，R 1表示一价有机基团，Q +表示锍阳离子或碘鎓阳离子。

公开(公告)号：US20120040294A1

公开(公告)日：2012-02-16

申请号：US13264285

申请日：2010-04-20

申请人： Kazuhiko Maeda ,  Takamasa Kitamoto ,  Haruhiko Komoriya ,  Satoru Narizuka ,  Yoshimi Isono ,  Kazunori Mori

发明人： Kazuhiko Maeda ,  Takamasa Kitamoto ,  Haruhiko Komoriya ,  Satoru Narizuka ,  Yoshimi Isono ,  Kazunori Mori

IPC分类号： G03F7/20 ,  C08K5/05 ,  C09D135/02

CPC分类号： C08F20/22 ,  G03F7/11 ,  G03F7/2041

摘要： Disclosed is a top coating composition formed on a resist film, for protecting the resist film, the top coating composition being a top coating composition for photoresist, characterized by containing a fluorine-containing polymer having a repeating unit represented by the following general formula (1). This composition is capable of controlling developing solution solubility and has a high water repellency. [In the formula, R1 represents a hydrogen atom, fluorine atom, methyl group or trifluoromethyl group, R2 represents a heat-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W is a bivalent linking group.]

摘要翻译： 公开了一种形成在抗蚀剂膜上的用于保护抗蚀剂膜的顶部涂料组合物，该顶部涂料组合物是用于光致抗蚀剂的顶部涂料组合物，其特征在于含有具有由以下通式（1）表示的重复单元的含氟聚合物 ）。 该组合物能够控制显影溶液的溶解度并具有高斥水性。 [式中，R1表示氢原子，氟原子，甲基或三氟甲基，R2表示热不稳定保护基，R3表示氟原子或含氟烷基，W表示二价连接基。

公开(公告)号：US20100304303A1

公开(公告)日：2010-12-02

申请号：US12740780

申请日：2008-10-31

申请人： Kazuhiko Maeda ,  Yoshimi Isono ,  Satoru Narizuka

发明人： Kazuhiko Maeda ,  Yoshimi Isono ,  Satoru Narizuka

IPC分类号： G03F7/004 ,  C07C271/24 ,  G03F7/20

CPC分类号： C07C309/59 ,  C07C309/12 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D207/46 ,  C09D133/14 ,  C09D133/16 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： Disclosed is a fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound having a structure represented by the following general formula (A). In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group; and a indicates 1 or 0. A photoacid generator containing the above fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound shows high sensitivity to an ArF excimer laser or the like, presents no concerns about human body accumulation, can generate an acid (photoacid) of sufficiently high acidity, and exhibits high solubility in a resist solvent and good compatibility with a resist resin.

摘要翻译： 公开了具有由以下通式（A）表示的结构的氟化磺酸盐或含氟磺酸基化合物。 在该式中，n表示1〜10的整数， R表示取代或未取代的C1-C20直链，支链或环状烷基，取代或未取代的C1-C20直链，支链或环状烯基，取代或未取代的C6-C15芳基或C4-C15杂芳基; a表示1或0.含有上述含氟磺酸盐或含氟磺酸基的化合物的光酸产生剂对ArF准分子激光等具有高灵敏度，不关于人体积累，可产生酸（ 光酸），并且在抗蚀剂溶剂中表现出高溶解性和与抗蚀剂树脂的良好相容性。

公开(公告)号：US07728103B2

公开(公告)日：2010-06-01

申请号：US12533024

申请日：2009-07-31

申请人： Hiroshi Saegusa ,  Satoru Narizuka ,  Kazuhiko Maeda

发明人： Hiroshi Saegusa ,  Satoru Narizuka ,  Kazuhiko Maeda

IPC分类号： C08G63/06

CPC分类号： C07C217/90 ,  C08G73/1039

摘要： Polymer compounds obtained by polymerization of a fluorine-containing polymerizable monomer represented by the formula [1] in which A represents a single bond, oxygen atom, sulfur atom, CO, CH2, SO, SO2, C(CH3)2, NHCO, C(CF3)2, phenyl, or aliphatic ring; “a” and “b” each independently represent an integer of 0-2, and 1≦a+b≦4. This fluorine-containing polymerizable monomer can be used as an effective polymerizable monomer, which can exhibit water repellency, oil repellency, low water absorptive property, heat resistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index property, low dielectric property, etc., and can be used for advanced polymer material fields.

摘要翻译： A表示单键，氧原子，硫原子，CO，CH 2，SO，SO 2，C（CH 3）2，NHCO，C的式[1]表示的含氟聚合性单体聚合得到的高分子化合物 （CF 3）2，苯基或脂族环; “a”和“b”各自独立地表示0-2的整数，1＆nlE; a + b＆nlE; 4。 该含氟聚合性单体可以用作有效的可聚合单体，其可以具有防水性，拒油性，低吸水性，耐热性，耐候性，耐腐蚀性，透明性，光敏性，低折射率性，低介电性 等，可用于高级聚合物材料领域。

公开(公告)号：US20100035185A1

公开(公告)日：2010-02-11

申请号：US12527362

申请日：2008-02-14

申请人： Yuji Hagiwara ,  Jonathan Joachim Jodry ,  Satoru Narizuka ,  Kazuhiko Maeda

发明人： Yuji Hagiwara ,  Jonathan Joachim Jodry ,  Satoru Narizuka ,  Kazuhiko Maeda

IPC分类号： G03F7/004 ,  C07C69/003 ,  C07C69/74 ,  C07D207/00 ,  G03F7/20

CPC分类号： C07C69/003 ,  C07C69/74 ,  C07C309/12 ,  C07C381/12 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.

摘要翻译： 由下式（1）表示的磺酸鎓盐可用作抗蚀剂组合物的优异的放射敏感酸发生剂。 可以通过使用含有该磺酸鎓盐的抗蚀剂组合物形成良好的图案。 在式（1）中，R 1表示一价有机基团，Q +表示锍阳离子或碘鎓阳离子。

公开(公告)号：US07589142B2

公开(公告)日：2009-09-15

申请号：US10527604

申请日：2003-09-17

申请人： Kazuhiko Maeda ,  Toshio Takemoto ,  Masakazu Fujii ,  Yasuharu Fukui ,  Yoshihiro Urata

发明人： Kazuhiko Maeda ,  Toshio Takemoto ,  Masakazu Fujii ,  Yasuharu Fukui ,  Yoshihiro Urata

IPC分类号： C08L77/00 ,  C08L35/06 ,  C08L39/04

CPC分类号： C08L55/02 ,  C08F210/00 ,  C08F279/04 ,  C08L25/08 ,  C08L25/12 ,  C08L33/20 ,  C08L35/06 ,  C08L51/04 ,  C08L77/00 ,  C08L77/02 ,  C08L77/06 ,  C08L2205/02 ,  C08L2205/03 ,  C08L2205/035 ,  C08L2666/02 ,  C08L2666/14 ,  C08L2666/04 ,  C08L2666/24

摘要： A polyamide resin/rubber-reinforced styrene-based resin composition, particularly, a polyamide resin/ABS resin composition, excellent in the balance between impact strength and fluidity as well as in the heat resistance, chemical resistance and paintability, as well as a shaped article thereof, are provided. The resin composition comprises 100 parts by weight of a thermoplastic resin comprising (A) from 79.5 to 20 parts by weight of a polyamide resin, (B) from 20 to 79.5 parts by weight of a polymer obtained by grafting an aromatic vinyl-based monomer and a vinyl cyanide-based monomer to a specific rubber-like polymer, (C) from 0.5 to 60 parts by weight of an unsaturated carboxylic acid-modified copolymer obtained by copolymerizing an unsaturated carboxylic acid, an aromatic vinyl-based monomer and a vinyl cyanide-based monomer, and (D) from 0 to 50 parts by weight of a copolymer obtained by copolymerizing an aromatic vinyl-based monomer and a vinyl cyanide-based monomer (with the proviso that the total of (A), (B), (C) and (D) is 100 parts by weight), and if desired, further comprises (E) from 0.05 to 150 parts by weight of an inorganic filler.

摘要翻译： 聚酰胺树脂/橡胶增强苯乙烯类树脂组合物，特别是聚酰胺树脂/ ABS树脂组合物，其冲击强度和流动性之间的平衡以及耐热性，耐化学性和可涂饰性以及成形品 其制品。 树脂组合物包含100重量份的热塑性树脂，其包含（A）79.5-20重量份的聚酰胺树脂，（B）20至79.5重量份通过将芳族乙烯基类单体 和氰化乙烯基类单体相对于特定的橡胶状聚合物，（C）0.5〜60重量份通过使不饱和羧酸，芳族乙烯基类单体和乙烯基单体共聚得到的不饱和羧酸改性共聚物 氰化物类单体，（D）0〜50重量份通过使芳族乙烯基系单体和乙烯基氰系单体共聚得到的共聚物（前提条件是（A），（B） ，（C）和（D）为100重量份），如果需要，还包含（E）0.05至150重量份的无机填料。