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    Exposure system, method of forming pattern using the same and method of manufacturing display substrate using the same
    3.
    发明授权
    Exposure system, method of forming pattern using the same and method of manufacturing display substrate using the same 有权
    曝光系统，使用其形成图案的方法以及使用其制造显示基板的方法

    公开(公告)号：US08982326B2

    公开(公告)日：2015-03-17

    申请号：US13652911

    申请日：2012-10-16

    Applicant: Samsung Display Co., Ltd.

    Inventor： Jong-Kwang Lee ,  Min Kang ,  Jin-Ho Ju ,  Bong-Yeon Kim

    IPC: G03B27/72 ,  G03F1/30 ,  G03F7/20

    CPC classification number: G03F7/70575 ,  G03F1/30 ,  G03F7/70283

    Abstract: An exposure system includes an exposure apparatus and a phase shift mask. The exposure apparatus emits a multi-wavelength light including a plurality of wavelengths different from each other. The phase shift mask includes a transparent substrate and a light blocking layer. The transparent substrate includes a first surface, and a second surface opposite to the first surface. The multi-wavelength light is incident into the first surface. The transparent substrate further includes a recess which extends from the second surface toward the first surface. The light blocking layer includes a first opening which exposes the second surface of the transparent substrate, and a second opening which is spaced apart from the first opening and exposes the recess of the transparent substrate.

    Abstract translation: 曝光系统包括曝光装置和相移掩模。 曝光装置发射包括彼此不同的多个波长的多波长光。 相移掩模包括透明基板和遮光层。 透明基板包括第一表面和与第一表面相对的第二表面。 多波长光入射到第一表面。 透明基板还包括从第二表面朝向第一表面延伸的凹槽。 遮光层包括暴露透明基板的第二表面的第一开口和与第一开口间隔开并暴露透明基板的凹部的第二开口。

    Patterning method using surface plasmon
    9.
    发明授权
    Patterning method using surface plasmon 有权
    使用表面等离子体的图案化方法

    公开(公告)号：US09436091B2

    公开(公告)日：2016-09-06

    申请号：US14444255

    申请日：2014-07-28

    Applicant: Samsung Display Co., Ltd.

    Inventor： Yong Son ,  Min Kang ,  Bong-Yeon Kim ,  Dong-Eon Lee ,  Hyun-joo Lee

    IPC: G03F7/20

    CPC classification number: G03F7/2016 ,  G03F7/70375

    Abstract: A method for forming a fine pattern includes forming an etching target material layer on a substrate, forming a first photoresist layer on the etching target material layer, forming a metal pattern on the first photoresist layer, the metal pattern having a plurality of lines and thin film lines alternately arranged, the lines having predetermined linewidth and thickness and are spaced apart from each other by a predetermined distance, exciting surface plasmons in the metal pattern by light irradiation to produce a surface plasmon resonance that exposes a fine first pattern shape in the first photoresist layer, forming a first photoresist pattern by removing the metal pattern and developing the first photoresist layer, and etching the etching target material layer by using the first photoresist pattern as a mask.

    Abstract translation: 一种形成精细图案的方法包括在基板上形成蚀刻目标材料层，在蚀刻靶材料层上形成第一光致抗蚀剂层，在第一光致抗蚀剂层上形成金属图案，金属图案具有多条线和薄的 薄膜线交替布置，线具有预定的线宽和厚度并且彼此隔开预定距离，通过光照射激发金属图案中的表面等离子体激元，以产生表面等离子体共振，其在第一 光致抗蚀剂层，通过去除金属图案和显影第一光致抗蚀剂层形成第一光致抗蚀剂图案，并且通过使用第一光致抗蚀剂图案作为掩模来蚀刻蚀刻目标材料层。

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