公开(公告)号：US20060044730A1

公开(公告)日：2006-03-02

申请号：US11209332

申请日：2005-08-23

Applicant: Hirofumi Yamaguchi ,  Kei Sato ,  Toshikatsu Kashiwaya

Inventor： Hirofumi Yamaguchi ,  Kei Sato ,  Toshikatsu Kashiwaya

IPC: H01H47/00

CPC classification number: H01J1/312 ,  B82Y10/00 ,  C04B35/493 ,  C04B35/499 ,  C04B2235/3206 ,  C04B2235/3213 ,  C04B2235/3255 ,  C04B2235/3256 ,  C04B2235/3258 ,  C04B2235/3267 ,  C04B2235/3279 ,  C04B2235/3298 ,  C04B2235/5445 ,  C04B2235/768 ,  C04B2235/79 ,  H01J29/04 ,  H01J31/127 ,  H01J2201/3125 ,  H01J2201/317 ,  H01J2329/0484 ,  H01J2329/0492

Abstract: [Problems] To provide a dielectric component which remedies the degradation of amount of electron emission of an electron emitter. [Means to Solve the Problems] Provided is a dielectric composition which, when applied to an electron emitter, enables suppression of reduction of electron emission quantity with passage of time. The dielectric composition contains, as a primary component, a PMN-PZ-PT ternary solid solution composition represented by the following formula PbxBip(Mgy/3Nb2/3)aTib-zMzZrcO3 [wherein x, p, and y satisfy the following relations: 0.85≦x≦1.05, 0.02≦p≦0.1, and 0.8≦y≦1.0; a, b, and c are decimal numbers falling within a region formed by connecting the following five points (0.550, 0.425, 0.025), (0.550, 0.150, 0.300), (0.100, 0.150, 0.750), (0.100, 0.525, 0.375), and (0.375, 0.425, 0.200); z satisfies the following relation: 0.02≦z≦0.10; and M is at least one element selected from among Nb, Ta, Mo, and W], and contains Ni in an amount of 0.05 to 2.0 wt. % as reduced to NiO.

Abstract translation: [问题]提供补偿电子发射体的电子发射量的劣化的电介质成分。 解决问题的手段提供一种电介质组合物，当应用于电子发射体时，可以抑制电子发射量随时间的减少。 电介质组合物含有作为主要成分的由下式表示的PMN-PZ-PT三元固溶体组合物Pb（Mg y / y） 3 Nb 2/3 3）a z z z z z z z z z z z z z z z z z z z z z z z z z z z z z z z z z z z z z z z z z z / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / 其中x，p和y满足以下关系：0.85 <= x <= 1.05,0.02 <= p <= 0.1，0.8 <= y <= 1.0; a，b，c是分别连接以下五个点（0.550,0.425,0.025），（0.550,0.150,0.300），（0.100,0.150,0.7050），（0.100,0.525,0.375），（0.100,0.525,0.375）， ）和（0.375,0.425,0.200）; z满足以下关系：0.02 <= z <= 0.10; 并且M是选自Nb，Ta，Mo和W中的至少一种元素，并且含有0.05-2.0重量％的Ni。 ％减少到NiO。

公开(公告)号：US20030226961A1

公开(公告)日：2003-12-11

申请号：US10459828

申请日：2003-06-11

Inventor： Mark J. Hagmann

IPC: H01J003/14

CPC classification number: H01J1/304 ,  H01J1/34 ,  H01J2201/317

Abstract: An improved device, method, and system efficiently couple high-frequency energy from radiation-assisted field emission. A radiation source radiates an emitting surface with an electromagnetic field. The electromagnetic field reduces the potential barrier at the emitting surface, allowing electrons to tunnel from the surface. The tunneling electrons produce a current. The electron tunneling current oscillates in response to the oscillations of the electromagnetic field radiation. Two or more electromagnetic fields of different frequencies radiate the emitting surface, causing photomixing. The electron tunneling current oscillates in response to the difference of the frequencies of the electromagnetic fields.

Abstract translation: 改进的装置，方法和系统有效地耦合来自辐射辅助场发射的高频能量。 辐射源用电磁场辐射发射表面。 电磁场减少了发射表面的势垒，使电子从表面传播。 隧道电子产生电流。 电子隧道电流响应于电磁场辐射的振荡而振荡。 两个或更多个不同频率的电磁场辐射发射表面，引起光混合。 电子隧道电流响应于电磁场的频率的差异而振荡。

公开(公告)号：US5967873A

公开(公告)日：1999-10-19

申请号：US909259

申请日：1997-08-11

Applicant: Mario Rabinowitz

Inventor： Mario Rabinowitz

IPC: H01J1/304 ,  H01J9/02 ,  H01J29/04

CPC classification number: H01J29/04 ,  H01J1/304 ,  H01J9/022 ,  H01J9/025 ,  H01J2201/317 ,  H01J2237/3146 ,  H01J2329/00

Abstract: Method and apparatus are presented for the generation, regeneration, and transplantation of field enhancing whiskers to provide for an improved cathode in flat panel displays in particular, and in other applications. Such applications comprise devices in which there is an emissive cathode structure for producing electrons. There are dear advantages for the instant invention in the case of a flat panel display which requires a relatively large cathode area, because the present invention avoids excessive power loss due to radiation and conduction loss by permitting operation of the cathode at a significantly lower temperature than if it operated solely as a thermionic emitter. The combination of moderately elevated temperature and enhanced electric field allows the advantages of thermo-field assisted emission.

Abstract translation: 提出了用于产生，再生和移植场增强晶须的方法和装置，以在平板显示器，特别是在其它应用中提供改进的阴极。 这种应用包括其中存在用于产生电子的发射阴极结构的装置。 在需要相对较大的阴极面积的平板显示器的情况下，本发明具有亲爱的优点，因为本发明通过允许阴极以比显着更低的温度操作来避免由于辐射和传导损耗而导致的功率损耗过大 如果它仅作为热离子发射器运行。 中等温度和增强电场的组合允许热场辅助发射的优点。

公开(公告)号：US5697827A

公开(公告)日：1997-12-16

申请号：US584373

申请日：1996-01-11

Applicant: Mario Rabinowitz

Inventor： Mario Rabinowitz

IPC: H01J1/304 ,  H01J9/02 ,  H01J29/04

CPC classification number: H01J29/04 ,  H01J1/304 ,  H01J9/022 ,  H01J9/025 ,  H01J2201/317 ,  H01J2237/3146 ,  H01J2329/00

Abstract: Method and apparatus are presented for the generation, regeneration, and transplantation of field enhancing whiskers to provide for an improved cathode in flat panel displays in particular, and in other applications. Such applications comprise devices in which there is an emissive cathode structure for producing electrons. There are dear advantages for the instant invention in the case of a flat panel display which requires a relatively large cathode area, because the present invention avoids excessive power loss due to radiation and conduction loss by permitting operation of the cathode at a significantly lower temperature than if it operated solely as a thermionic emitter. The combination of moderately elevated temperature and enhanced electric field allows the advantages of thermo-field assisted emission.

Abstract translation: 提出了用于产生，再生和移植场增强晶须的方法和装置，以在平板显示器，特别是在其它应用中提供改进的阴极。 这种应用包括其中存在用于产生电子的发射阴极结构的装置。 在需要相对较大的阴极面积的平板显示器的情况下，本发明具有亲爱的优点，因为本发明通过允许阴极以比显着更低的温度操作来避免由于辐射和传导损耗而导致的功率损耗过大 如果它仅作为热离子发射器运行。 中等温度和增强电场的组合允许热场辅助发射的优点。

公开(公告)号：US5616926A

公开(公告)日：1997-04-01

申请号：US509286

申请日：1995-07-31

Applicant: Hiroyuki Shinada ,  Shingo Kimura ,  Katsuhiro Kuroda ,  Satoru Fukuhara ,  Takashi Ohshima

Inventor： Hiroyuki Shinada ,  Shingo Kimura ,  Katsuhiro Kuroda ,  Satoru Fukuhara ,  Takashi Ohshima

IPC: H01J1/304 ,  H01J3/02

CPC classification number: H01J1/304 ,  H01J2201/317 ,  H01J2237/06316

Abstract: A Schottky emission cathode has a filament, a needle-shaped piece of single crystal refractory metal which is attached to the filament and has a flat crystal surface at a tip thereof, and an adsorbed layer including at least one kind of a metal other than the single crystal refractory metal on the flat crystal surface. The piece of single crystal refractory metal is heated by passing a current through the filament and electrons are extracted by an electric field applied on a tip of the needle-shaped piece of single crystal refractory metal. The tip of the needle-shaped piece of single crystal refractory metal as a radius of curvature of a value to produce an energy width among electrons extracted from the tip not exceeding a predetermined value when the electric field is sufficient to prevent the flat crystal surface from collapsing during operation of the cathode.

Abstract translation: 肖特基发射阴极具有长丝，单晶耐火金属针形片，其附着于灯丝并且在其顶端具有平坦的晶体表面，并且包括至少一种金属以外的吸附层， 单晶难熔金属在平面晶面上。 通过使电流通过灯丝来加热单晶难熔金属片，并通过施加在针状单晶耐火金属片的尖端上的电场来提取电子。 针状单晶难熔金属片的尖端作为曲率半径值，以在电场足以防止平坦晶体表面产生从尖端提取的电子之间的能量不超过预定值时 在阴极运行期间塌陷。

公开(公告)号：US5461280A

公开(公告)日：1995-10-24

申请号：US830977

申请日：1992-02-10

Applicant: Robert C. Kane

Inventor： Robert C. Kane

IPC: H01J1/304 ,  H01J1/34 ,  H01J40/14 ,  H01J40/16

CPC classification number: H01J40/14 ,  H01J1/3042 ,  H01J1/34 ,  H01J2201/317

Abstract: A cold cathode field emission device employs photon energy and electric field induced electron emission enhancement to provide subthreshold photoelectric emission; and, alternatively, photon-enhanced cold cathode field emission.

Abstract translation: 冷阴极场发射器件采用光子能量和电场感应电子发射增强来提供亚阈值光电发射; 以及光子增强型冷阴极场发射。

公开(公告)号：US09490098B1

公开(公告)日：2016-11-08

申请号：US14992870

申请日：2016-01-11

Applicant: Applied Physics Technologies, Inc.

Inventor： William A. Mackie ,  Gerald G. Magera

IPC: H01J1/146 ,  H01J1/148 ,  H01J19/10 ,  H01J1/14

CPC classification number: H01J1/148 ,  H01J1/14 ,  H01J1/146 ,  H01J19/10 ,  H01J37/06 ,  H01J2201/196 ,  H01J2201/2889 ,  H01J2201/30484 ,  H01J2201/317 ,  H01J2237/06316

Abstract: An electron source is made from mixed-metal carbide materials of high refractory nature. Producing field-enhanced thermionic emission, i.e., thermal-field or extended Schottky emission, from these materials entails the use of a certain low work function crystallographic direction, such as, for example, (100), (210), and (310). These materials do not naturally facet because of their refractory nature. The disclosed electron source made from transition metal carbide material is especially useful when installed in a scanning electron microscope (SEM) performing advanced imaging applications that require a high brightness, high beam current source.

Abstract translation: 电子源由具有高耐火性质的混合金属碳化物材料制成。 从这些材料产生场强增强的热离子发射，即热场或延伸的肖特基发射需要使用某种低功函数的晶体学方向，例如（100），（210）和（310） 。 这些材料由于其耐火性质而不自然而然。 所披露的由过渡金属碳化物材料制成的电子源在安装在需要高亮度，远光束电流源的先进成像应用的扫描电子显微镜（SEM）中是特别有用的。

公开(公告)号：US07250727B2

公开(公告)日：2007-07-31

申请号：US11143417

申请日：2005-06-02

Applicant: John W. Lewellen ,  John Noonan

Inventor： John W. Lewellen ,  John Noonan

IPC: H01J7/24

CPC classification number: H01J37/065 ,  H01J3/021 ,  H01J37/073 ,  H01J37/305 ,  H01J2201/317 ,  H01J2237/303 ,  H01J2237/3104 ,  H01J2237/3132

Abstract: Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus electron source generates an e-beam. The e-beam is transported through a series of steering magnets to steer the beam. At least one refocusing magnet is provided to refocus the e-beam. A final steering magnet bends the e-beam to focus on a target, such as a weld joint or a deposition target.

Abstract translation: 包括电子束焊接和用于薄膜沉积的电子束蒸发的光束处理方法是用新的大功率长焦点电子源来实现的。 大功率长焦点电子源产生电子束。 电子束通过一系列转向磁铁传送以转向光束。 提供至少一个重新聚焦磁体以重新聚焦电子束。 最终的转向磁铁将电子束弯曲成对准目标，例如焊接接头或沉积靶。

公开(公告)号：US20060061285A1

公开(公告)日：2006-03-23

申请号：US11143417

申请日：2005-06-02

Applicant: John Lewellen ,  John Noonan

Inventor： John Lewellen ,  John Noonan

IPC: H01J23/08

CPC classification number: H01J37/065 ,  H01J3/021 ,  H01J37/073 ,  H01J37/305 ,  H01J2201/317 ,  H01J2237/303 ,  H01J2237/3104 ,  H01J2237/3132

Abstract: Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus electron source generates an e-beam. The e-beam is transported through a series of steering magnets to steer the beam. At least one refocusing magnet is provided to refocus the e-beam. A final steering magnet bends the e-beam to focus on a target, such as a weld joint or a deposition target.

Abstract translation: 包括电子束焊接和用于薄膜沉积的电子束蒸发的光束处理方法是用新的大功率长焦点电子源来实现的。 大功率长焦点电子源产生电子束。 电子束通过一系列转向磁铁传送以转向光束。 提供至少一个重新聚焦磁体以重新聚焦电子束。 最终的转向磁铁将电子束弯曲成对准目标，例如焊接接头或沉积靶。

公开(公告)号：US20030178583A1

公开(公告)日：2003-09-25

申请号：US10392228

申请日：2003-03-18

Inventor： Bert Jan Kampherbeek ,  Marco Jan-Jaco Wieland ,  Pieter Kruit

IPC: G21G005/00 ,  H01L029/06 ,  H01L029/12 ,  G21K005/04 ,  G03F007/20

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  H01J1/304 ,  H01J1/34 ,  H01J37/073 ,  H01J37/3175 ,  H01J2201/317 ,  H01J2237/06333 ,  H01J2237/31779

Abstract: The present invention relates to the use of an electron source in a lithography system for producing a plurality of electron beams directed towards an object to be processed, said electron source comprising a plurality of field emitters, characterized in that said electron source comprises a semiconductor layer with a plurality of tips, said use including the steps of: producing a plurality of light spots on said electron source, producing one light spot on one field emitter; exciting electrons to a conduction band (Ec) by light from a light spot within said field emitter by a photo-electric effect; accelerating said electrons in said conduction band (Ec) towards said tips and tunnelling them outside tips in order to generate electrons for said plurality of electron beams, causing tips to generate electrons for said electron beam having a spot smaller than 100 nm on an object to be processed, each spot of light triggering an electron beam from one tip.

Abstract translation: 本发明涉及在光刻系统中使用电子源来制造指向待处理物体的多个电子束，所述电子源包括多个场致发射体，其特征在于，所述电子源包括半导体层 具有多个尖端，所述用途包括以下步骤：在所述电子源上产生多个光点，在一个场发射器上产生一个光斑; 通过光电效应使来自所述场发射器内的光点的光激发电子到导带（Ec）; 将所述导带（Ec）中的所述电子加速朝向所述尖端并将其隧穿到外部尖端，以便为所述多个电子束产生电子，从而使得针对具有小于100nm的点的所述电子束产生电子， 被处理，每个光点从一个尖端触发电子束。