公开(公告)号：US20240328027A1

公开(公告)日：2024-10-03

申请号：US17909476

申请日：2020-03-11

申请人： GREEN RESOURCE CO., LTD.

发明人： Jong Beom LEE ,  Jong Soo LEE ,  Byounggook KWON

IPC分类号： C23C14/08 ,  C23C14/02 ,  C23C14/10 ,  C23C14/24 ,  C23C14/58

CPC分类号： C30B1/023 ,  C23C14/022 ,  C23C14/081 ,  C23C14/083 ,  C23C14/10 ,  C23C14/24 ,  H01J37/32495

摘要： A method for manufacturing a coating material formed on an inner surface of a chamber is provided. The method includes: i) providing a substrate including at least one material selected from the group consisting of SiC, SiO2, and Al2O3; ii) providing a first coating portion including SiOx (0.1≤x≤2 as a molar ratio) or AlOy (0.1≤y≤1.5 as a molar ratio) on the substrate; iii) providing a second coating portion including YOz (0.1≤z≤1.5 as a molar ratio) on the first coating portion; iv) providing a laminate in which the first coating portion and the second coating portion are repeatedly stacked; and v) heating the laminate to provide a coating layer of a single crystalline layer by a solid-state reaction between the first coating portion and the second coating portion.

公开(公告)号：US20240271266A1

公开(公告)日：2024-08-15

申请号：US18108325

申请日：2023-02-10

申请人： Applied Materials, Inc.

发明人： Chengyu LIU ,  Xianmin TANG

IPC分类号： C23C14/00 ,  C23C14/10 ,  C23C14/34 ,  H01J37/317

CPC分类号： C23C14/0036 ,  C23C14/10 ,  C23C14/345 ,  C23C14/3485 ,  C23C14/3492 ,  H01J37/3178 ,  H01J2237/2001

摘要： Methods for forming an airgap within a structure of a substrate, comprising anisotropically depositing a layer of SiO2 on a top surface of the substrate to form a cap over the structure and the airgap disposed between the cap and a bottom surface of the structure via reactive negative ion sputtering of a silicon (Si) target in a presence of diatomic oxygen in an inert carrier gas, wherein the target is pulsed at a voltage of less than or equal to about −200 V at a pulse rate of greater than about 10 KHz. A substrate having an airgap is also disclosed.

公开(公告)号：US20240191099A1

公开(公告)日：2024-06-13

申请号：US18528916

申请日：2023-12-05

申请人： CORNING INCORPORATED

发明人： Kaveh Adib ,  Robert Alan Bellman ,  Philip Simon Brown ,  Theresa Chang ,  Christine Marie Mahoney Fahey ,  Dean Joseph Mastropietro ,  James Joseph Price ,  Shu Yuan

IPC分类号： C09D183/04 ,  C03C17/245 ,  C03C17/25 ,  C03C17/34 ,  C09D5/00 ,  C09D5/16 ,  C23C14/10 ,  C23C14/22 ,  C23C14/58 ,  C23C18/12

CPC分类号： C09D183/04 ,  C03C17/245 ,  C03C17/25 ,  C03C17/3417 ,  C03C17/3435 ,  C09D5/006 ,  C09D5/1693 ,  C23C14/10 ,  C23C14/221 ,  C23C14/5846 ,  C23C18/1208 ,  C23C18/1295 ,  C03C2217/732 ,  C03C2217/78 ,  C03C2218/11 ,  C03C2218/151 ,  C03C2218/32

摘要： Coated articles are described herein that include a surface-modifying layer that is fluorine-free. In aspects, the surface-modifying layer comprises a partial silica-like network having a ratio of Si—O—Si bonds to Si atoms in the anti-fingerprint coating from about 2 to about 3. Additionally or alternatively, the surface-modifying layer further comprises an alkyl silane at the exterior surface and bonded to a Si—O group in the silica-like network. Methods include evaporating a functionalized polyhedral oligomeric silsesquioxane onto a first major surface. Methods include impinging an ion beam on the first major surface. Alternatively, methods include disposing and heating a solution comprising a polysilazane or a polyhedral oligomeric silsesquioxane on a first major surface. In aspects, methods include reacting material at the first major surface with a alkyl silane.

公开(公告)号：US20240183022A1

公开(公告)日：2024-06-06

申请号：US18285411

申请日：2022-04-21

申请人： JX NIPPON MINING METALS CORPORATION

发明人： Atsushi NARA

IPC分类号： C23C14/10 ,  C23C14/34 ,  C23C14/58

CPC分类号： C23C14/10 ,  C23C14/3407 ,  C23C14/5806

摘要： Provided is a layered body having lower resistivity (higher conductivity) and higher transmittance than conventional ITO films. A layered body obtained by layering an ITO film and an oxide film, wherein the layered body has a surface resistance of 40 Ω/sq. or less and a visible light average transmittance of 90% or higher, and a ratio of a film thickness of the ITO film and a film thickness of the oxide film (film thickness of the ITO film/film thickness of the oxide film) is less than 15. A layered body obtained by layering an ITO film and an oxide film, wherein R2/R1≤1.0 is satisfied when a surface resistance of the layered body that underwent atmosphere annealing at 220° C. is R1, and a surface resistance of the layered body that underwent atmosphere annealing at 550° C. is R2.

公开(公告)号：US20240044022A1

公开(公告)日：2024-02-08

申请号：US18255968

申请日：2020-12-08

申请人： Nippon Telegraph and Telephone Corporation

发明人： Yuya Uzumaki ,  Takeshi Komatsu ,  Akihiro Kono ,  Sayumi Sato

IPC分类号： C25B9/50 ,  C25B11/02 ,  C25B11/052 ,  C25B11/087 ,  C30B25/02 ,  C23C14/18 ,  C23C14/10 ,  C23C14/58

CPC分类号： C25B9/50 ,  C25B11/02 ,  C25B11/052 ,  C25B11/087 ,  C30B25/02 ,  C23C14/18 ,  C23C14/10 ,  C23C14/5853

摘要： Provided is a semiconductor photoelectrode that exhibits a catalytic function with light irradiation to cause an oxidation-reduction reaction. The semiconductor photoelectrode includes: a conductive or insulating substrate; a semiconductor thin film disposed on the surface of the substrate; a catalyst layer disposed on the surface of the semiconductor thin film; a light transmission layer disposed in a lattice shape on the surface of the catalyst layer; and a protective layer disposed to cover the rear surface of the substrate and the side surfaces of the substrate and the semiconductor thin film. The semiconductor photoelectrode having another configuration includes a second semiconductor thin film disposed between the semiconductor thin film and the catalyst layer.

公开(公告)号：US11872392B2

公开(公告)日：2024-01-16

申请号：US17536360

申请日：2021-11-29

申请人： Medtronic, Inc.

发明人： Darren A. Janzig ,  Andrew J. Thom ,  Chris J. Paidosh ,  Brad C. Tischendorf ,  Gerald G. Lindner

IPC分类号： A61N1/05 ,  H01R13/187 ,  H01R24/58 ,  A61N1/375 ,  B23K26/21 ,  B23K20/02 ,  C23C14/10 ,  C23C14/18 ,  C23C14/34 ,  H01R43/02 ,  B23K101/38 ,  B23K103/00 ,  B23K103/16 ,  H01R107/00

CPC分类号： A61N1/05 ,  A61N1/3752 ,  B23K20/026 ,  B23K26/21 ,  C23C14/10 ,  C23C14/18 ,  C23C14/34 ,  H01R13/187 ,  H01R24/58 ,  H01R43/0221 ,  A61B2562/227 ,  B23K2101/38 ,  B23K2103/172 ,  B23K2103/52 ,  B23K2103/54 ,  H01R2107/00 ,  H01R2201/12 ,  Y10T156/10

摘要： A medical device lead connector includes electrically conducting contact rings spaced apart by an electrically insulating ring and in axial alignment. The electrically conducting contact ring and the insulating ring having an interface bond on an atomic level.

公开(公告)号：US20230243029A1

公开(公告)日：2023-08-03

申请号：US18185955

申请日：2023-03-17

申请人： Thin Film Service, Inc.

发明人： Ollivier Lefevre

IPC分类号： C23C14/06 ,  C23C14/24 ,  C23C14/35 ,  C23C16/50 ,  C23C14/50 ,  C23C14/10

CPC分类号： C23C14/0611 ,  C23C14/10 ,  C23C14/24 ,  C23C14/35 ,  C23C14/505 ,  C23C14/0641 ,  C23C16/50 ,  Y10T428/30

摘要： A tetrahedral amorphous hydrogenated carbon and amorphous siloxane hybrid diamond-like nanocomposite composition can include: tetrahedral amorphous hydrogenated carbon (ta-C:H); and amorphous siloxane (a-Si:O), wherein the ta-C:H and a-Si:O are in an interpenetrating network. A method of forming a tetrahedral amorphous hydrogenated carbon and amorphous siloxane hybrid diamond-like nanocomposite can include: providing a source of H, C, O, and Si as a liquid precursor; providing evaporated precursor into a vacuum chamber; forming a plasma with an RF plasma generator and/or a thermal plasma generator; and depositing, on a rotating biased substrate, a collimated layer of the tetrahedral amorphous hydrogenated carbon and amorphous siloxane hybrid diamond-like nanocomposite having tetrahedral amorphous hydrogenated carbon (ta-C:H) and amorphous siloxane (a-Si:O), wherein the ta-C:H and a-Si:O are in an interpenetrating network. A RF rotating electrode is also provided.

公开(公告)号：US20230212063A1

公开(公告)日：2023-07-06

申请号：US18112031

申请日：2023-02-21

申请人： CORNING INCORPORATED

发明人： Shandon Dee Hart ,  Guangli Hu ,  Charles Andrew Paulson ,  James Joseph Price

IPC分类号： C03C17/22 ,  C03C3/085 ,  C03C3/091 ,  C03C3/095 ,  C23C14/00 ,  C23C14/08 ,  C23C14/10 ,  C23C14/35 ,  C23C14/06 ,  G02B1/11

CPC分类号： C03C17/225 ,  C03C3/085 ,  C03C3/091 ,  C03C3/095 ,  C23C14/08 ,  C23C14/10 ,  C23C14/0042 ,  C23C14/352 ,  C23C14/0676 ,  G02B1/11 ,  C03C2217/78 ,  C03C2217/91 ,  C03C2217/281 ,  C03C2217/732 ,  C03C2218/155

摘要： Disclosed herein are coated articles which may include a substrate and an optical coating that includes one or more layers of deposited material. At least a portion of the optical coating may include a residual compressive stress of more than 100 MPa. The coated article may include a strain-to-failure of 0.4% or more as measured by a Ring-on-Ring Tensile Testing Procedure. The optical coating may include a maximum hardness of 8 GPa or more and an average photopic transmission of 50% or greater.

公开(公告)号：US11693155B2

公开(公告)日：2023-07-04

申请号：US16548135

申请日：2019-08-22

申请人： SK Innovation Co., Ltd. ,  SK IE Technology Co., Ltd.

发明人： Jong Nam Ahn ,  Tae Sug Jang ,  Byoung Sun Ko ,  Jin Su Park ,  Ho Chul Yoon

IPC分类号： C09D1/00 ,  G02B1/111 ,  G02B1/14 ,  G02B1/18 ,  C09D5/00 ,  C23C14/34 ,  C23C14/00 ,  C23C14/06 ,  C23C14/08 ,  C23C14/10 ,  C09D183/06

CPC分类号： G02B1/111 ,  C09D1/00 ,  C09D5/002 ,  C09D5/006 ,  C09D183/06 ,  C23C14/0036 ,  C23C14/0694 ,  C23C14/083 ,  C23C14/10 ,  C23C14/3464 ,  G02B1/14 ,  G02B1/18 ,  Y10T428/31 ,  Y10T428/31504 ,  Y10T428/31511 ,  Y10T428/31663 ,  Y10T428/31678 ,  C09D183/06 ,  C09D1/00 ,  C09D5/002 ,  C09D5/006

摘要： Provided is a hard coating film in which a hard coating layer having a water contact angle of 90° or less, a conductive layer, and a low refractive index layer are laminated on a substrate, the film having excellent hardness, anti-curling property, antireflection performance, antifouling performance, and antistatic performance.

公开(公告)号：US11650361B2

公开(公告)日：2023-05-16

申请号：US16722325

申请日：2019-12-20

申请人： VIAVI Solutions Inc.

发明人： Scott Rowlands ,  Georg J. Ockenfuss ,  Tim Gustafson ,  Marius Grigonis

IPC分类号： G02B5/20 ,  G02B1/115 ,  G02B1/00 ,  C23C14/34 ,  C23C28/00 ,  C23C14/08 ,  C23C14/06 ,  C23C14/10

CPC分类号： G02B5/208 ,  C23C14/0694 ,  C23C14/081 ,  C23C14/083 ,  C23C14/10 ,  C23C14/34 ,  C23C28/345 ,  G02B1/007 ,  G02B1/115 ,  G02B5/20

摘要： An optical filter may include a set of optical filter layers disposed onto a substrate. The set of optical filter layers may include a first subset of optical filter layers comprising a first material with a first refractive index. The first material may comprise at least silicon and hydrogen. The set of optical filter layers may include a second subset of optical filter layers comprising a second material with a second refractive index. The second material is different from the first material and the second refractive index is less than the first refractive index. The set of optical filter layers may include a third subset of optical filter layers comprising a third material different from the first material and the second material.