-
公开(公告)号：US20160272806A1
公开(公告)日：2016-09-22
申请号：US15035891
申请日：2014-11-10
发明人： Yoshihiro KUDO , Taichi NAKAZAWA , Takuzo AIDA , Yasuhiro ISHIDA , Shingo TAMESUE , Masataka OHTANI
IPC分类号： C08L33/02
CPC分类号： C08L33/02 , C08F220/10 , C08J3/075 , C08J2333/02 , C08K3/011 , C08K3/34 , C08L33/06
摘要： An organic/inorganic composite hydrogel can be prepared only through mixing at a room temperature and that has high modulus of elasticity and a self-supporting property that allows a shape to be maintained in water, and a method produces the hydrogel. A hydrogel forming composition that is capable of forming a hydrogel having a self-supporting property, includes: a water-soluble organic polymer having an organic acid structure, an organic acid salt structure, or an organic acid anion structure; a silicate salt; a dispersant for the silicate salt; and a compound having or generating divalent or higher valent positive charge; a hydrogel formed of the composition, and a method for producing the hydrogel.
摘要翻译： 有机/无机复合水凝胶只能通过在室温下混合并且具有高弹性模量和允许形状保持在水中的自支撑性能而制备，并且该方法产生水凝胶。 能够形成具有自支撑性的水凝胶的水凝胶形成组合物包括：具有有机酸结构，有机酸盐结构或有机酸阴离子结构的水溶性有机聚合物; 硅酸盐; 硅酸盐分散剂; 和具有或产生二价或更高价正电荷的化合物; 由所述组合物形成的水凝胶，以及所述水凝胶的制造方法。
-
92.发明授权Polyimide precursor modified with dicarboxylic acid anhydride, imidized polyimide and liquid crystal aligning agent using it 有权用二羧酸酐改性的聚酰亚胺前体，酰亚胺化聚酰亚胺和使用它的液晶取向剂公开(公告)号：US09447240B2
公开(公告)日：2016-09-20
申请号：US14114409
申请日：2012-04-27
申请人： Hideo Suzuki , Takahiro Noda
发明人： Hideo Suzuki , Takahiro Noda
IPC分类号： G02F1/1337 , B32B27/28 , C08G73/10 , C07D301/03 , C07D303/12 , C07D307/00 , C07D493/18 , C07D493/22
CPC分类号： C08G73/10 , C07D493/18 , C07D493/22 , C08G73/101 , C08G73/1014 , G02F1/133723
摘要： To provide a polyimide precursor and/or polyimide which has an excellent solubility in various organic solvents, and with which a liquid crystal alignment film can be obtained which is excellent in a rubbing resistance and which is hardly deteriorated even by irradiation with backlight.A polyimide precursor having its terminal amino group modified with at least one alicyclic epoxydicarboxylic acid anhydride selected from the group consisting of compounds of the formulae [1] and [2], or a polyimide obtained by imidizing it: wherein Y is a C1-2 alkylene or an oxygen atom, and R1 is a hydrogen atom or an organic group represented by —X1—X2—X3 , wherein X1 is a single bond or —CH2—, X2 is a single bond or —O—, and X3 is a C1-20 alkyl group, a C1-20 haloalkyl group or a C1-20 alkyl group containing a cyano group.
-
公开(公告)号：US20160266492A1
公开(公告)日：2016-09-15
申请号：US15030049
申请日：2014-10-17
CPC分类号： G03F7/09 , C08F220/56 , C08L3/02 , D01D5/003 , D01F1/10 , D01F2/28 , D01F6/26 , G03F7/038 , C08F220/20
摘要： The invention provides a fiber containing (A) a polymer compound containing a structural unit having, in a side chain, at least one kind of organic group selected from a hydroxy group, a hydroxymethyl group and an alkoxymethyl group having 1-5 carbon atoms, and (B) a photoacid generator.
摘要翻译： 本发明提供一种含有（A）含有结构单元的高分子化合物的纤维，所述结构单元在侧链具有至少一种选自羟基，羟甲基和具有1-5个碳原子的烷氧基甲基的有机基团， 和（B）光致酸发生剂。
-
公开(公告)号：US09434856B2
公开(公告)日：2016-09-06
申请号：US14400258
申请日：2013-05-10
IPC分类号： C08G18/08 , C09D179/04 , C09D4/00 , H01L51/52 , C08G73/02 , C08G73/06 , C09D133/14 , H01L51/00 , H01L51/50
CPC分类号： C09D179/04 , C08G73/026 , C08G73/0273 , C08G73/0644 , C09D4/00 , C09D133/14 , H01L51/0035 , H01L51/0043 , H01L51/50 , H01L51/5253 , H01L51/5262 , C08L39/00
摘要： Provided is a film-forming composition containing organic monomers represented by formula (A) that are capable of providing triazine ring-containing polymers, crosslinking agents, and linear polymers, which contain a repeating unit structure represented by formula (1). Thus, a film-forming composition that is suitable as an embedding material can be provided, said film-forming composition: including triazine ring-containing polymers that are capable of achieving, by polymer alone, high heat resistance, high transparency, a high refractive index, high solubility and low volume shrinkage; and is capable of minimizing occurrences of cracks when embedding films are manufactured. Furthermore, a solvent-free film-forming composition that does not contain any solvents conducive to organic electroluminescent film degradation, can be cured at a low temperature, and is suitable for forming top-emission type organic electroluminescent elements, can be provided.
-
公开(公告)号：US20160218013A1
公开(公告)日：2016-07-28
申请号：US14914160
申请日：2014-08-27
发明人： Tomoya OHASHI , Shigeo KIMURA , Yuki USUI , Hiroto OGATA
IPC分类号： H01L21/308 , H01L21/311 , H01L21/306 , H01L21/027
CPC分类号： H01L21/3086 , C08F8/14 , C08F220/32 , G03F7/038 , G03F7/094 , G03F7/40 , H01L21/0273 , H01L21/30604 , H01L21/31111 , H01L21/31138 , H01L21/31144 , C08F220/26 , C08F220/14 , C08F220/18
摘要： A pattern forming method which uses a resist underlayer film having resistance to a basic aqueous hydrogen peroxide solution. A pattern forming method including: a first step of applying a resist underlayer film-forming composition containing a solvent and a polymer having a weight average molecular weight of 1,000 to 100,000 and an epoxy group on a semiconductor substrate that may have an inorganic film on the surface, followed by baking, to form a resist underlayer film; a second step of forming a resist pattern on the resist underlayer film; a third step of dry etching the resist underlayer film using the resist pattern as a mask to expose a surface of the inorganic film or the semiconductor substrate; and a forth step of wet etching the inorganic film or the semiconductor substrate using the dry-etched resist underlayer film as a mask and a basic aqueous hydrogen peroxide solution.
摘要翻译： 使用对碱性过氧化氢水溶液具有耐性的抗蚀剂下层膜的图案形成方法。 一种图案形成方法，包括：第一步，在含有无机膜的半导体衬底上涂覆含有溶剂和重均分子量为1,000〜100,000的聚合物的抗蚀剂下层膜形成组合物和环氧基， 表面，然后烘烤，形成抗蚀剂下层膜; 在抗蚀剂下层膜上形成抗蚀剂图案的第二步骤; 使用抗蚀剂图案作为掩模来干蚀刻抗蚀剂下层膜以暴露无机膜或半导体衬底的表面的第三步骤; 以及使用干蚀刻抗蚀剂下层膜作为掩模和碱性过氧化氢水溶液湿法蚀刻无机膜或半导体衬底的第四步骤。
-
公开(公告)号：US09382381B2
公开(公告)日：2016-07-05
申请号：US14411261
申请日：2013-06-27
发明人： Daisuke Maeda , Kei Yasui , Masaaki Ozawa
IPC分类号： C08G69/42 , C08G69/26 , C08L77/06 , C08L77/10 , C08J5/18 , C08G69/48 , C09D177/10 , C08G69/32 , C08G18/60
CPC分类号： C08G69/26 , C08G18/603 , C08G69/32 , C08G69/48 , C08J5/18 , C08J2377/06 , C08L77/06 , C08L77/10 , C09D177/10
摘要： An aromatic polyamide, which is obtained by reacting a benzene tricarboxylic acid or a derivative thereof with a diamine compound in the presence of a terminally blocked compound having a crosslinkable group and a functional group that is reactive with a benzene tricarboxylic acid such as 1-amino-2-propanol or a derivative thereof as expressed by scheme (1), and which has a weight average molecular weight of 1,000-100,000 in terms of polystyrene as determined by gel permeation chromatography, has good solubility in organic solvents, while maintaining heat resistance and transparency. A thick film can be formed using a film-forming composition that contains this aromatic polyamide.
摘要翻译： 一种芳香族聚酰胺，其通过苯三甲酸或其衍生物与二胺化合物在具有交联基团的末端封闭化合物和与苯三羧酸如1-氨基反应的官能团存在下反应而得到 -2-丙醇或其衍生物，其通过凝胶渗透色谱法测定的聚苯乙烯重均分子量为1,000-100,000，在有机溶剂中具有良好的溶解性，同时保持耐热性 和透明度。 可以使用含有该芳族聚酰胺的成膜组合物形成厚膜。
-
97.发明申请RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER WHICH CONTAINS NITROGEN-CONTAINING RING COMPOUND 审中-公开含有含氮环氧化合物的聚合物的抗静电膜形成组合物公开(公告)号：US20160186006A1
公开(公告)日：2016-06-30
申请号：US14910787
申请日：2014-08-01
IPC分类号： C09D167/06 , G03F7/09 , H01L21/027 , C09D5/00
CPC分类号： C09D167/06 , C08G59/1438 , C08G59/226 , C08G59/26 , C08G59/4207 , C08G63/58 , C08G63/6858 , C09D5/006 , C09D163/00 , G03F7/091 , H01L21/0276 , C08L63/00
摘要： The present invention provides a resist underlayer film that has a wide focus position range within which a good resist shape can be obtained. A resist underlayer film-forming composition for lithography comprising a linear polymer that is obtained by a reaction of a diepoxy group-containing compound (A) with a dicarboxyl group-containing compound (B). The linear polymer has structures of the following formulae (1), (2), and (3) derived from the diepoxy group-containing compound (A) or the dicarboxyl group-containing compound (B): The linear polymer preferably contains a polymer obtained by a reaction of two diepoxy group-containing compounds (A) each having structures of Formulae (1) and (2) with a dicarboxyl group-containing compound (B) having a structure of Formula (3), or a polymer obtained by a reaction of a diepoxy group-containing compound (A) having a structure of Formula (1) with two dicarboxyl group-containing compounds (B) each having structures of Formulae (2) and (3).
摘要翻译： 本发明提供一种抗蚀剂下层膜，其具有可以获得良好的抗蚀剂形状的宽对焦位置范围。 一种用于光刻的抗蚀剂下层膜形成组合物，其包含通过含二环氧基的化合物（A）与含二羧基化合物（B）的反应获得的线性聚合物。 线性聚合物具有由含有二环氧基的化合物（A）或含二羧基化合物（B）得到的下式（1），（2）和（3）的结构：线性聚合物优选含有聚合物 或者由具有式（3）的结构的含二羧基化合物（B）的反应得到的具有式（1）和（2）的结构的两个含二环氧基的化合物（A） 具有式（1）结构的含二环氧基的化合物（A）与具有式（2）和（3）结构的两个含有二羧基的化合物（B）反应。
-
公开(公告)号：US20160160079A1
公开(公告)日：2016-06-09
申请号：US14908934
申请日：2014-07-31
IPC分类号： C09D179/04
CPC分类号： C09D179/04 , C08G73/026 , C08G73/0273 , C08G73/0644 , C08K3/042 , C08K3/043 , C08K3/044 , C08K3/045 , C09D7/40 , C08K3/04 , C08L63/00 , C08K7/24 , C08K3/041
摘要： A carbon material dispersed film formation composition including: a polymer that includes a triazine ring-containing repeating unit structure, such as that represented by formula (17) for example; a cross-linking agent; and a carbon material. The carbon material is well dispersed in the composition, and therefore by using this composition, a cured film in which the carbon material is well dispersed can be produced.
摘要翻译： 1.一种碳材料分散膜形成用组合物，其特征在于，含有具有三嗪环的重复单元结构的聚合物，例如由式（17）表示的聚合物; 交联剂; 和碳材料。 碳材料良好地分散在组合物中，因此通过使用该组合物，可以制造其中碳材料分散良好的固化膜。
-
公开(公告)号：US09348222B2
公开(公告)日：2016-05-24
申请号：US12996684
申请日：2009-07-07
IPC分类号： G03F7/023 , G03F7/09 , C08F2/48 , C08F212/32 , C09D125/08 , G02B3/00 , G03F7/40
CPC分类号： G03F7/0233 , C08F2/48 , C08F212/32 , C09D125/08 , G02B3/0012 , G03F7/094 , G03F7/40 , C08F220/06 , C08F212/08 , C08F212/14
摘要： There is provided a positive resist composition excellent in transparency, heat resistance, and refractive index particularly for forming a microlens and for forming a planarization film; and a microlens and a planarization film formed from the positive resist composition. A positive resist composition comprising a component (A): an alkali-soluble polymer comprising a unit structure having a biphenyl structure; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; and a component (C): a solvent. The positive resist composition wherein the alkali-soluble polymer as the component (A) is a polymer comprising a unit structure of Formula (1): where when the total number of unit structures constituting the polymer (A) is assumed to be 1.0, the ratio n1 of the unit structure of Formula (1) constituting the polymer (A) satisfies 0.3≦n1≦1.0.
摘要翻译： 提供了特别用于形成微透镜和形成平坦化膜的透明性，耐热性和折射率优异的正性抗蚀剂组合物; 以及由正性抗蚀剂组合物形成的微透镜和平坦化膜。 一种正性抗蚀剂组合物，其包含组分（A）：包含具有联苯结构的单元结构的碱溶性聚合物; 成分（B）：具有被光解以产生碱溶性基团的有机基团的化合物; 和组分（C）：溶剂。 作为组分（A）的碱溶性聚合物是包含式（1）的单元结构的聚合物的正性抗蚀剂组合物：其中假设构成聚合物（A）的单元结构的总数为1.0时， 构成聚合物（A）的式（1）的单元结构的比n1满足0.3＆lt; nlE; n1＆nlE; 1.0。
-
100.发明申请ANILINE DERIVATIVE, CHARGE-TRANSPORTING VARNISH AND ORGANIC ELECTROLUMINESCENT DEVICE 审中-公开电荷衍生，电荷运输变压器和有机电致发光器件公开(公告)号：US20160141507A1
公开(公告)日：2016-05-19
申请号：US14899854
申请日：2014-06-17
发明人： Naoki NAKAIE , Taichi NAKAZAWA
IPC分类号： H01L51/00 , C07C209/10 , C07C211/54
CPC分类号： H01L51/0059 , C07C209/10 , C07C211/54 , C07C211/58 , C07C211/61 , C07C2603/24 , C07C2603/26 , H01L51/5056 , H01L51/5088
摘要： Provided is an aniline derivative represented by formula (1). (In formula (1), R1 represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group having 6-20 carbon atoms, a heteroaryl group, or a group represented by formula (2), and R2-R55 independently represent a hydrogen atom, a halogen atom, a nitro group, a cyano group, an aldehyde group, a hydroxy group, a thiol group, a carboxylic acid group, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, etc.)
摘要翻译： 提供由式（1）表示的苯胺衍生物。 （式（1）中，R 1表示烷基，烯基，炔基，碳原子数为6〜20的芳基，杂芳基或式（2）所示的基团，R2-R55独立地 表示氢原子，卤素原子，硝基，氰基，醛基，羟基，硫醇基，羧酸基，烷基，烯基，炔基，芳基， 杂芳基等）
-
-
-
-
-
-
-
-
-
搜索结果
1887 条记录 (耗时 0.06 秒)
