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16 条记录 (耗时 0.027 秒)

    METHOD FOR ROUGHENING SURFACE USING WET TREATMENT
    4.
    发明申请
    METHOD FOR ROUGHENING SURFACE USING WET TREATMENT 审中-公开

    公开(公告)号：US20190092681A1

    公开(公告)日：2019-03-28

    申请号：US15760597

    申请日：2016-09-15

    申请人： NISSAN CHEMICAL INDUSTRIES, LTD.

    发明人： Keisuke HASHIMOTO ,  Yasunobu SOMEYA ,  Takahiro KISHIOKA ,  Rikimaru SAKAMOTO

    IPC分类号： C03C15/00 ,  C09D125/02 ,  C09D161/18 ,  C09D7/40

    摘要： A method for roughening a surface of a substrate, including: applying a composition containing inorganic particles and organic resin to the surface of the substrate and drying and curing the composition to form an organic resin layer; and etching the substrate by a solution containing hydrogen fluoride, hydrogen peroxide, or an acid, to roughen the surface. Preferably, the solution contains hydrogen fluoride and ammonium fluoride or hydrogen peroxide and ammonia, the resin layer contains a ratio of the particles to the resin of 5 to 50 parts by mass to 100 parts by mass, and the composition is a mixture of silica sol wherein silica is dispersed as the inorganic particles in organic solvent or titanium oxide sol wherein titanium oxide is dispersed, with a solution of the organic resin. The method is applied to a light extraction layer of an LED or a low-reflective glass of a solar cell.

    CATIONICALLY POLYMERIZABLE RESIST UNDERLAYER FILM-FORMING COMPOSITION
    5.
    发明申请
    CATIONICALLY POLYMERIZABLE RESIST UNDERLAYER FILM-FORMING COMPOSITION 审中-公开

    公开(公告)号：US20180081274A1

    公开(公告)日：2018-03-22

    申请号：US15563834

    申请日：2016-03-18

    申请人： NISSAN CHEMICAL INDUSTRIES, LTD.

    发明人： Hiroto OGATA ,  Shigeo KIMURA ,  Yuki USUI ,  Tomoya OHASHI ,  Takahiro KISHIOKA

    IPC分类号： G03F7/11 ,  C09D163/00

    CPC分类号： G03F7/11 ,  C08G59/20 ,  C09D163/00 ,  G03F7/091

    摘要： There is provided a composition for forming a resist underlayer film for lithography that can be used as an underlayer anti-reflective coating that decreases the reflection of irradiated light during exposure from a semiconductor substrate toward the photoresist layer that is formed on the semiconductor substrate and in particular, can be suitably used as a flattening film for flattening a semiconductor substrate having a recess and a project by embedding, in a lithography process for production of a semiconductor device. A resist underlayer film-forming composition for lithography comprising (A) an alicyclic epoxy compound having an alicyclic skeleton and one or more epoxy groups, and a light absorption moiety, in the molecule, (B) a thermal acid generator, and (C) a solvent.

    RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING COPOLYMER THAT HAS TRIAZINE RING AND SULFUR ATOM IN MAIN CHAIN
    6.
    发明申请
    RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING COPOLYMER THAT HAS TRIAZINE RING AND SULFUR ATOM IN MAIN CHAIN 有权
    含有共轭聚合物的抗静电膜形成组合物在主链中具有TRIAZINE RING和SUFFUR ATOM

    公开(公告)号：US20170038687A1

    公开(公告)日：2017-02-09

    申请号：US15106861

    申请日：2014-12-10

    申请人： NISSAN CHEMICAL INDUSTRIES, LTD.

    发明人： Hiroto OGATA ,  Takahiro KISHIOKA ,  Yoshiomi HIROI ,  Tomoya OHASHI ,  Yuki USUI

    IPC分类号： G03F7/11 ,  C09D167/02 ,  C09D181/04

    CPC分类号： G03F7/11 ,  C08G63/6856 ,  C08G63/6886 ,  C09D167/02 ,  C09D167/025 ,  C09D181/04 ,  G03F7/091 ,  G03F7/094

    摘要： A resist underlayer film-forming composition containing a copolymer having a structural unit of Formula (1) and a structural unit of Formula (2), a cross-linkable compound, a cross-linking catalyst, and a solvent. wherein A is a divalent organic group containing a triazine ring, X1 is an —S— group or an —O— group, Q is a linear, branched, or cyclic hydrocarbon group having a carbon atom number of 1 to 15, the hydrocarbon group may have at least one sulfur atom or oxygen atom in a main chain and at least one hydroxy group as a substituent, n is 0 or 1, R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is a divalent group having at least one sulfur atom or oxygen atom, and when X1 is an —O— group, Z is a divalent group having at least one sulfur atom.

    摘要翻译： 其中A为含有三嗪环的二价有机基团，X1为-S-基或-O-基团，Q为碳原子数为1〜15的直链，支链或环状烃基，烃基 可以在主链和至少一个羟基作为取代基具有至少一个硫原子或氧原子，n为0或1，R 1和R 2各自独立地为C 1-3亚烷基或单键，Z为 具有至少一个硫原子或氧原子的二价基团，当X 1为-O-基时，Z为具有至少一个硫原子的二价基团。

    CELL CULTURE VESSEL
    7.
    发明申请
    CELL CULTURE VESSEL 审中-公开
    细胞培养基

    公开(公告)号：US20160115435A1

    公开(公告)日：2016-04-28

    申请号：US14896639

    申请日：2014-06-09

    申请人： NISSAN CHEMICAL INDUSTRIES, LTD.

    发明人： Ayako OTANI ,  Taito NISHINO ,  Yoshiomi HIROI ,  Takahiro KISHIOKA ,  Tomoyuki OZAWA

    IPC分类号： C12M1/00

    摘要： The present invention is to provide a cell culture vessel comprising a copolymer which contains a recurring unit containing an organic group of the following formula (a) and a recurring unit containing an organic group of the following formula (b) being coated onto a surface thereof, a method for manufacturing the same and a method for manufacturing a cell aggregate using the same (wherein Ua1, Ua2, Ub1, Ub2 and Ub3, and An− are as defined in the present specification and the claims).

    摘要翻译： 本发明提供一种包含共聚物的细胞培养容器，该共聚物含有含有下式（a）的有机基团的重复单元和含有下式（b）的有机基团的重复单元， （其中Ua1，Ua2，Ub1，Ub2和Ub3以及An-如本说明书和权利要求中所定义）的制造方法及其制造方法。

    POLYMER AND COMPOSITION INCLUDING SAME, AND ADHESIVE COMPOSITION
    9.
    发明申请
    POLYMER AND COMPOSITION INCLUDING SAME, AND ADHESIVE COMPOSITION 审中-公开
    包括它们的聚合物和组合物，以及粘合剂组合物

    公开(公告)号：US20160222262A1

    公开(公告)日：2016-08-04

    申请号：US15097399

    申请日：2016-04-13

    申请人： NISSAN CHEMICAL INDUSTRIES, LTD.

    发明人： Mamoru TAMURA ,  Takuya OHASHI ,  Takahiro KISHIOKA ,  Tomoyuki ENOMOTO

    IPC分类号： C09J179/04 ,  C08G73/06

    CPC分类号： C09J179/04 ,  C08G59/26 ,  C08G59/3236 ,  C08G73/06 ,  C08G73/0633 ,  C08G73/0638 ,  C08G73/0677 ,  C08K5/04 ,  C08K5/07 ,  C09D11/10 ,  C09D11/102 ,  C09J11/06 ,  C09J163/00 ,  G03F7/09 ,  G03F7/094 ,  G03F7/11 ,  H01L21/02118 ,  H01L21/02282 ,  H01L23/293 ,  H01L2924/0002 ,  H01L2924/00

    摘要： There is provided a novel polymer, a composition containing the polymer, and a novel adhesive composition containing the polymer from which a cured film having desired properties is obtained. A polymer comprising a structural unit of Formula (1): wherein Q is a bivalent group, R1 is a C1-10 alkylene group, a C2-10 alkenylene group or C2-10 alkynylene group, a C6-14 arylene group, a C4-10 cyclic alkylene group, etc., or a polymer comprising a structural unit of Formula (6): wherein Q4 is an allyl group, a vinyl group, an epoxy group, or a glycidyl group, and R5 is a bivalent organic group having a main chain containing only carbon atom or at least one of oxygen atom, nitrogen atom and sulfur atom in addition to carbon atom, a composition comprising the polymer, and an adhesive composition comprising the polymer and a solvent.

    摘要翻译： 提供了一种新型聚合物，含有该聚合物的组合物，以及含有聚合物的新型粘合剂组合物，由此得到具有所需性能的固化膜。 一种包含式（1）的结构单元的聚合物：其中Q是二价基团，R1是C1-10亚烷基，C2-10亚烯基或C2-10亚炔基，C6-14亚芳基，C4 -10环状亚烷基等，或包含式（6）的结构单元的聚合物：其中Q4是烯丙基，乙烯基，环氧基或缩水甘油基，R5是具有式 除了碳原子以外，仅含有碳原子或氧原子，氮原子和硫原子中的至少一个的主链，包含聚合物的组合物和包含该聚合物和溶剂的粘合剂组合物。