公开(公告)号：US08172949B2

公开(公告)日：2012-05-08

申请号：US12718699

申请日：2010-03-05

申请人： Tomoyuki Kudo ,  Jun Ozawa ,  Hiroshi Nakamura ,  Kazunori Kazama ,  Tsuyoshi Moriya ,  Hiroyuki Nakayama ,  Hiroshi Nagaike

发明人： Tomoyuki Kudo ,  Jun Ozawa ,  Hiroshi Nakamura ,  Kazunori Kazama ,  Tsuyoshi Moriya ,  Hiroyuki Nakayama ,  Hiroshi Nagaike

IPC分类号： C23C16/00 ,  C23F1/00 ,  B65G21/677 ,  H01L21/306

CPC分类号： H01L21/67201 ,  H01L21/67017 ,  H01L21/67253 ,  H01L21/67748 ,  Y10S414/135 ,  Y10S414/139

摘要： A computer readable storage medium storing a program for performing an operation method of a substrate processing apparatus is provided. The operation method includes the steps of introducing a nonreactive gas into the vacuum preparation chamber before the gate valve is opened while the substrate is transferred between the vacuum preparation chamber of the vacuum processing unit and the transfer unit, stopping introducing the nonreactive gas when an inner pressure of the vacuum preparation chamber becomes same as an atmospheric pressure, starting an evacuation process of the corrosive gas in the vacuum preparation chamber and then opening to atmosphere performed by letting the vacuum preparation chamber communicate with an atmosphere, and opening the gate valve after the step of opening to atmosphere.

摘要翻译： 提供一种存储用于执行基板处理装置的操作方法的程序的计算机可读存储介质。 操作方法包括以下步骤：在基板在真空处理单元的真空处理室和转印单元的真空准备室之间转移时，在闸阀打开之前将非反应性气体引入真空准备室中，当内部 真空制备室的压力与大气压力相同，开始真空制备室中的腐蚀性气体的抽空处理，然后通过使真空制备室与大气连通而进入大气，并在该真空制备室之后打开闸阀 向大气开放的一步。

公开(公告)号：US08125714B2

公开(公告)日：2012-02-28

申请号：US12392297

申请日：2009-02-25

申请人： Kazuhiro Yamada ,  Hiroyuki Nakayama ,  Mineta Suzuki

发明人： Kazuhiro Yamada ,  Hiroyuki Nakayama ,  Mineta Suzuki

IPC分类号： G02B1/10

CPC分类号： G02B1/115 ,  G02B2207/107

摘要： An anti-reflection coating comprising first to seventh layers formed on a substrate in this order, the first layer being an alumina-based layer, the seventh layer being a porous, silica-based layer, and each of the first to seventh layers having predetermined refractive index and optical thickness in a wavelength range of 400-700 nm.

公开(公告)号：US20120029863A1

公开(公告)日：2012-02-02

申请号：US13175219

申请日：2011-07-01

申请人： Kunio Miyauchi ,  Hiroyuki Nakayama

发明人： Kunio Miyauchi ,  Hiroyuki Nakayama

IPC分类号： G06F17/18 ,  G06F15/00

CPC分类号： G01N15/0625 ,  G01N15/0227 ,  G06K9/6212 ,  G06K9/6218 ,  H01L22/20

摘要： There is provided a support method for a particle distribution analysis for a substrate. In the support method, histogram data of inter-particle distances are created for all particles on a target substrate subjected to the particle distribution analysis from particle coordinate data of the target substrate. Further, histogram data of inter-particle distances are created for multiple virtual substrates each having the same number of randomly distributed particles as the particles on the target substrate. Based on a difference between the histogram data of the target substrate and the histogram data of each of the virtual substrates, determination data are created by quantifying a distance between the histogram data of the target substrate and the histogram data of the multiple virtual substrates, and the determination data are displayed on a display unit.

摘要翻译： 提供了用于衬底的粒子分布分析的支持方法。 在支持方法中，通过目标基板的粒子坐标数据，对经过粒子分布分析的目标基板上的所有粒子产生粒子间距离的直方图数据。 此外，针对每个具有与目标衬底上的粒子相同数量的随机分布的粒子的多个虚拟衬底创建颗粒间距离的直方图数据。 基于目标基板的直方图数据和每个虚拟基板的直方图数据之间的差异，通过量化目标基板的直方图数据与多个虚拟基板的直方图数据之间的距离来创建确定数据，以及 确定数据显示在显示单元上。

公开(公告)号：US08053014B2

公开(公告)日：2011-11-08

申请号：US12093676

申请日：2006-11-14

申请人： Shin Koike ,  Koichi Okisaka ,  Jun Kohori ,  Yoko Seo ,  Noboru Shirahata ,  Hiroyuki Nakayama ,  Atsushi Suzuki ,  Ryuji Ochiai

发明人： Shin Koike ,  Koichi Okisaka ,  Jun Kohori ,  Yoko Seo ,  Noboru Shirahata ,  Hiroyuki Nakayama ,  Atsushi Suzuki ,  Ryuji Ochiai

IPC分类号： A23L1/238 ,  A23L1/237

CPC分类号： A23L17/00 ,  A23L27/40 ,  A23L27/50 ,  A23L27/60 ,  A23L33/105

摘要： The present invention is a liquid seasoning containing the following (A), (B), and (C): (A) 0.4 to 8% by mass of sodium (B) 0.01 to 4% by mass of flavonoid (C) 1 to 10% by mass of ethanol wherein, the flavonoid (B) satisfies the formula (1) and/or has one or more OH groups on the A-ring or B-ring in a molecule and no OH group at the position adjacent to the OH group (ortho position). Y/(X+Y)=0.05 to 1  formula (1) wherein, X and Y represent the following numbers, respectively: X; the number of OH group bonded to benzene rings in a molecule of the flavonoid, Y; the number of OCH3 group bonded to benzene rings in a molecule of the flavonoid.

摘要翻译： 本发明是含有下述（A），（B）和（C）的液体调味料：（A）0.4〜8质量％的钠（B）0.01〜4质量％的类黄酮（C） 10质量％的乙醇，其中类黄酮（B）满足式（1）和/或在分子中在A环或B环上具有一个或多个OH基，并且在与 OH基（邻位）。 Y /（X + Y）= 0.05〜1式（1）其中，X和Y分别表示如下数：X; 在一类黄酮分子中与苯环键合的OH基数Y; 在类黄酮分子中与苯环键合的OCH 3基团的数目。

公开(公告)号：US20110234731A1

公开(公告)日：2011-09-29

申请号：US13072070

申请日：2011-03-25

申请人： Takamitsu Fujimaki ,  Hiroyuki Nakayama

发明人： Takamitsu Fujimaki ,  Hiroyuki Nakayama

IPC分类号： B41J2/01

CPC分类号： B41J15/046 ,  B41J15/042

摘要： Paper jams and paper cutting problems are prevented by limiting sideways movement of the recording medium because wrinkles and sags in the recording medium produced by pulling sideways on the recording medium are caught by a notch unit. A recording device that pulls and records on a recording medium that is wound in a roll has a discharge guide unit that forms a discharge path for the recorded recording medium. The discharge guide unit has a discharge guide surface facing a surface of the recording medium, and has a notch unit disposed to the discharge-side end of the discharge guide surface.

摘要翻译： 通过限制记录介质的横向移动来防止卡纸和切纸问题，因为通过在记录介质上侧向拉动而产生的记录介质中的褶皱和下垂被凹口单元卡住。 在卷绕在卷筒上的记录介质上拉和记录的记录装置具有形成记录的记录介质的排出路径的排出引导单元。 排出引导单元具有面向记录介质的表面的排出引导表面，并且具有设置在排出引导表面的排放侧端部的切口单元。

公开(公告)号：US20110094680A1

公开(公告)日：2011-04-28

申请号：US12985099

申请日：2011-01-05

申请人： Tsuyoshi Moriya ,  Hiroyuki Nakayama

发明人： Tsuyoshi Moriya ,  Hiroyuki Nakayama

IPC分类号： H01L21/465 ,  G01N21/84

CPC分类号： H01J37/32935 ,  B08B9/08 ,  G01N15/0272 ,  G01N15/06 ,  G01N2015/0693 ,  Y10T428/30 ,  Y10T428/315 ,  Y10T428/8305

摘要： A particle monitoring apparatus includes a housing disposed on a gas exhaust line, a laser beam source for emitting a laser beam to particles in the gas exhaust line, a window member disposed at the housing for monitoring the particles in the gas exhaust line. The window member has a transparent base which is formed of a transparent resin or glass containing silicon and has a gas contact surface which faces a gas within the gas exhaust line, and a surface treatment layer formed on the gas contact surface of the transparent base, wherein the surface treatment layer contains one material selected from the group consisting of yttrium and calcium fluoride.

摘要翻译： 粒子监测装置包括：设置在排气管上的壳体，用于向气体排出管线中的颗粒发射激光束的激光束源;设置在壳体处的用于监测排气管线中的颗粒的窗口部件。 窗构件具有由透明树脂或含硅的玻璃形成的透明基底，并且具有与气体排出管线内的气体相对的气体接触面，以及形成在透明基底的气体接触面上的表面处理层， 其中所述表面处理层含有选自钇和氟化钙的一种材料。

公开(公告)号：US07811428B2

公开(公告)日：2010-10-12

申请号：US11620289

申请日：2007-01-05

申请人： Shinya Nishimoto ,  Kouji Mitsuhashi ,  Hidehito Saigusa ,  Taira Takase ,  Hiroyuki Nakayama

发明人： Shinya Nishimoto ,  Kouji Mitsuhashi ,  Hidehito Saigusa ,  Taira Takase ,  Hiroyuki Nakayama

IPC分类号： C23C14/34 ,  C23C16/00

CPC分类号： H01L21/67069 ,  H01J37/32458 ,  H01J37/32495 ,  H01J37/32972

摘要： The present invention presents an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.

摘要翻译： 本发明提出了一种改进的光学窗口沉积屏蔽，用于通过沉积屏蔽件对等离子体处理系统中的处理空间进行光学访问，其中光学窗口沉积屏蔽的设计和制造有利地提供光学干净地访问处理等离子体 同时维持光学窗口沉积屏蔽的基本上最小的侵蚀。

公开(公告)号：US20090280723A1

公开(公告)日：2009-11-12

申请号：US12375371

申请日：2006-07-28

申请人： Norikazu Tabata ,  Kazuhiko Hashisaka ,  Masahiro Sugimura ,  Takuo Sakamoto ,  Masaki Ue ,  Hiroyuki Nakayama ,  Seiji Fukuda

发明人： Norikazu Tabata ,  Kazuhiko Hashisaka ,  Masahiro Sugimura ,  Takuo Sakamoto ,  Masaki Ue ,  Hiroyuki Nakayama ,  Seiji Fukuda

IPC分类号： B24B1/00 ,  C08G18/00 ,  C09K3/14 ,  B24D3/32 ,  B24D7/00

CPC分类号： B24B37/24 ,  B24D18/0027 ,  C08F2/38 ,  C08F2/40 ,  C08F265/04 ,  C08F283/00 ,  C08J3/246 ,  C08L33/10 ,  C08L75/00 ,  C08L2205/04 ,  C08L75/04

摘要： The present invention relates to a process for producing an interpenetrating polymer network structure, which comprises the steps of impregnating a polymer molding with a radical polymerizable composition containing an ethylenically unsaturated compound and a radical polymerization initiator; and polymerizing the ethylenically unsaturated compound in a swollen state of the polymer molding impregnated with the radical polymerizable composition; wherein a chain transfer agent and/or a radical polymerization inhibitor are added to the radical polymerizable composition and/or the polymer molding before impregnating the polymer molding with the radical polymerizable composition. According to the present invention, a highly uniform interpenetrating polymer network structure can be obtained. The present invention also provides a polishing pad which is exhibits high in-plane uniformity of a polishing rate during polishing, and also has excellent flattening properties and improved pad lifetime during polishing, and a process for producing the same.

摘要翻译： 本发明涉及一种互穿聚合物网状结构体的制造方法，其特征在于，包括使含有烯键式不饱和化合物和自由基聚合引发剂的自由基聚合性组合物浸渍聚合物成型体的工序; 并在浸渍有自由基聚合性组合物的聚合物成型体的溶胀状态下聚合烯属不饱和化合物; 其中在用可自由基聚合的组合物浸渍聚合物模制品之前，将链转移剂和/或自由基聚合抑制剂加入到可自由基聚合的组合物和/或聚合物模制品中。 根据本发明，可以获得高度均匀的互穿聚合物网络结构。 本发明还提供一种研磨抛光时的研磨速度平面均匀性高的抛光垫，并且还具有优异的平坦化性能和抛光时的垫寿命的改善及其制造方法。

公开(公告)号：US20090246406A1

公开(公告)日：2009-10-01

申请号：US12412039

申请日：2009-03-26

申请人： Hiroyuki Nakayama ,  Tsuyoshi Moriya

发明人： Hiroyuki Nakayama ,  Tsuyoshi Moriya

IPC分类号： H05H1/24 ,  C23C16/00

CPC分类号： H01J37/32642 ,  H01J37/32467 ,  H01J37/32623 ,  H01J37/32963

摘要： A plasma processing apparatus that can accurately detect the longevity of a chamber internal part to eliminate the waste of the replacement of the chamber internal part that has not reached its end of longevity and prevent the occurrence of troubles caused by continuously using the chamber internal part that has reached its end of longevity. In the chamber internal part, at least one longevity detecting elemental layer comprised of an element different from a constituent material of the chamber internal part is buried.

摘要翻译： 一种等离子体处理装置，其可以精确地检测室内部的寿命，以消除更换室内部件的浪费，该室内部件尚未达到其寿命结束，并且防止由连续使用室内部件引起的故障的发生， 已经到了长寿的终结。 在腔室内部，埋设由不同于室内部件的构成材料的元件构成的至少一个寿命检测元件层。

公开(公告)号：US20090242127A1

公开(公告)日：2009-10-01

申请号：US12411001

申请日：2009-03-25

申请人： Chishio KOSHIMIZU ,  Manabu IWATA ,  Masanobu HONDA ,  Hiroyuki NAKAYAMA

发明人： Chishio KOSHIMIZU ,  Manabu IWATA ,  Masanobu HONDA ,  Hiroyuki NAKAYAMA

IPC分类号： H01L21/306

CPC分类号： H01L21/31138 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32642 ,  H01J37/32697

摘要： A plasma etching apparatus includes a processing vessel; a lower electrode on which a target substrate is mounted in the processing vessel; an upper electrode disposed in the processing vessel to face the lower electrode in parallel; a processing gas supply unit configured to supply a processing gas into a processing space between the upper and the lower electrode; a first radio frequency power supply unit configured to apply, to the lower electrode, a first radio frequency power for generating plasma of the processing gas; a focus ring covering a top surface peripheral portion of the lower electrode protruding toward a radial outside of the substrate; a DC power supply configured to output a variable DC voltage; and a DC voltage supply network that connects the DC power supply to either one of the focus ring and the upper electrode or both depending on processing conditions of plasma etching.

摘要翻译： 等离子体蚀刻装置包括处理容器; 将目标基板安装在处理容器中的下电极; 设置在所述处理容器中以与所述下电极平行地面对的上电极; 处理气体供给单元，被配置为将处理气体供应到上部和下部电极之间的处理空间; 第一射频电源单元，被配置为向下部电极施加用于产生处理气体的等离子体的第一射频功率; 覆盖所述下电极的顶表面周边部分的朝向所述基板的径向外侧突出的聚焦环; DC电源，被配置为输出可变DC电压; 以及根据等离子体蚀刻的处理条件将直流电源连接到焦点环和上部电极中的任一个或两者的直流电压供给网络。