公开(公告)号：US20060023178A1

公开(公告)日：2006-02-02

申请号：US11179665

申请日：2005-07-13

Applicant: Erik Loopstra ,  Leon Levasier ,  Rene Oesterholt

Inventor： Erik Loopstra ,  Leon Levasier ,  Rene Oesterholt

IPC: G03B27/42

CPC classification number: G03F7/70775 ,  G03F7/70458 ,  G03F7/70516 ,  G03F9/7011 ,  G03F9/7019

Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. Some of the optical encoders may be connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is presented.

Abstract translation: 光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。 运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。 为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值 的三维。 一些光学编码器可以在三维坐标系中的不同位置处连接到基板台。 运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向 至少6个位置值中的3个。 此外，提出了一种用于校准位置检测器的方法。

公开(公告)号：US20050243297A1

公开(公告)日：2005-11-03

申请号：US10836613

申请日：2004-05-03

Applicant: Vadim Banine ,  Levinus Bakker ,  Jeroen Jonkers ,  Erik Loopstra

Inventor： Vadim Banine ,  Levinus Bakker ,  Jeroen Jonkers ,  Erik Loopstra

IPC: G02B5/08 ,  G03B27/54 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70008 ,  G03F7/7005

Abstract: A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and distribution means which are arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distribution means in a first direction by a mirror surface. The distribution means further comprise a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.

Abstract translation: 光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，衬底台和投影系统。 此外，光刻设备包括用于向照明系统提供EUV辐射的多个EUV源和被布置成将来自每个EUV源的EUV辐射转换成中间辐射束的分配装置。 中间的辐射束通过镜面从第一方向从分布装置引导。 分配装置还包括旋转驱动的反射镜装置，旋转轴线不平行于镜面。

公开(公告)号：US20050170296A1

公开(公告)日：2005-08-04

申请号：US10766526

申请日：2004-01-29

Applicant: Albert Johannes Jansen ,  Jan Kuit ,  Erik Loopstra ,  Raymond Laurentius Schrijver

Inventor： Albert Johannes Jansen ,  Jan Kuit ,  Erik Loopstra ,  Raymond Laurentius Schrijver

IPC: H01L21/027 ,  G03F7/00 ,  G03F7/20

CPC classification number: G03F7/70066 ,  G03F7/70425 ,  G03F7/70475 ,  G03F7/707

Abstract: A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.

Abstract translation: 光刻设备具有适于在至少两个位置容纳掩模的掩模台，使得具有大于曝光场的图案区域的掩模可以通过首先在掩模的第一位置进行曝光，然后执行第二 第二位置的面罩曝光。

公开(公告)号：US20050157281A1

公开(公告)日：2005-07-21

申请号：US10918700

申请日：2004-08-16

Applicant: Johannes Jasper ,  Erik Loopstra ,  Theodorus Modderman ,  Gerrit Nijmeijer ,  Nicholaas Van Asten ,  Frederik Heuts ,  Jacobus Gemen ,  Richard Du Croo De Jongh ,  Marcus Boonman ,  Jacob Klinkhamer ,  Thomas Castenmiller

Inventor： Johannes Jasper ,  Erik Loopstra ,  Theodorus Modderman ,  Gerrit Nijmeijer ,  Nicholaas Van Asten ,  Frederik Heuts ,  Jacobus Gemen ,  Richard Du Croo De Jongh ,  Marcus Boonman ,  Jacob Klinkhamer ,  Thomas Castenmiller

IPC: G01B9/02 ,  G01B11/00 ,  G01B11/02 ,  G01B11/245 ,  G01B11/25 ,  G01B11/30 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

公开(公告)号：US20050132914A1

公开(公告)日：2005-06-23

申请号：US10743266

申请日：2003-12-23

Applicant: Johannes Mulkens ,  Marinus Van Den Brink ,  Erik Loopstra

Inventor： Johannes Mulkens ,  Marinus Van Den Brink ,  Erik Loopstra

IPC: G03F7/20 ,  B41C1/10 ,  B41N3/00 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70341 ,  B41C1/1075 ,  B41C1/1083 ,  G03F7/70258 ,  G03F9/7026

Abstract: A detector detects liquid in the path of a projection beam or alignment beam. A controller then determines which one or more of a plurality of compensating optical elements may be provided in the optical path of the projection beam or alignment beam in order to focus the projection beam or alignment beam on the surface of the substrate. The appropriate optical element may be placed in the path of the projection beam or alignment beam directly as a final element of the projection system or alignment system respectively.

Abstract translation: 检测器检测投影光束或对准光束的路径中的液体。 然后，控制器确定在投影光束或对准光束的光路中可以设置多个补偿光学元件中的哪一个或多个，以便将投影光束或对准光束聚焦在基板的表面上。 可以将适当的光学元件直接放置在投影光束或对准光束的路径中，作为投影系统或对准系统的最终元件。

公开(公告)号：US20050094119A1

公开(公告)日：2005-05-05

申请号：US10927531

申请日：2004-08-27

Applicant: Erik Loopstra ,  Johannes Baselmans ,  Marcel Mathijs Theodore Dierichs ,  Johannes Jasper ,  Hendricus Meijer ,  Uwe MicKan ,  Johannes Catharinus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

Inventor： Erik Loopstra ,  Johannes Baselmans ,  Marcel Mathijs Theodore Dierichs ,  Johannes Jasper ,  Hendricus Meijer ,  Uwe MicKan ,  Johannes Catharinus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

IPC: H01L21/027 ,  G02B1/10 ,  G03F7/20 ,  G03B27/54

CPC classification number: G03F7/70966 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70983 ,  Y10S430/162

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

Abstract translation: 公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。 公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF 2 2的双组分最终光学元件。

公开(公告)号：US20050068511A1

公开(公告)日：2005-03-31

申请号：US10994669

申请日：2004-11-23

Applicant: Paulus Liebregts ,  Arno Bleeker ,  Erik Loopstra ,  Harry Borggreve

Inventor： Paulus Liebregts ,  Arno Bleeker ,  Erik Loopstra ,  Harry Borggreve

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/54

CPC classification number: G03F7/70991 ,  G03F7/70291

Abstract: A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.

公开(公告)号：US20050036121A1

公开(公告)日：2005-02-17

申请号：US10831370

申请日：2004-04-26

Applicant: Christiaan Hoogendam ,  Sjoerd Donders ,  Hans Jansen ,  Jacobus Johannus Leonardus Verspay ,  Antonius Theodorus Derksen ,  Joeri Lof ,  Erik Loopstra ,  Johannes Catharinus Mulkens ,  Alexander Straaijer ,  Bob Streefkerk

Inventor： Christiaan Hoogendam ,  Sjoerd Donders ,  Hans Jansen ,  Jacobus Johannus Leonardus Verspay ,  Antonius Theodorus Derksen ,  Joeri Lof ,  Erik Loopstra ,  Johannes Catharinus Mulkens ,  Alexander Straaijer ,  Bob Streefkerk

IPC: G03F7/20 ,  G03F9/00 ,  G03B27/52

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectively close and open the aperture. In an embodiment, the shutter may comprise a channel in a surface of the shutter facing the aperture and/or the shutter may be displaced from the liquid supply system when connected to the liquid supply system. Further, in a lithographic apparatus, there is provided a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between a projection system and a substrate and a controller configured to control application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.

Abstract translation: 在光刻投影设备中，提供了一种液体供应系统，其包括至少部分地限定投影系统和基板之间的空间的容器，该容器在其中具有可选择的可开启和关闭的孔，以及关闭构造成选择性地关闭和打开 光圈。 在一个实施例中，快门可以包括位于快门面向孔的表面中的通道和/或当连接到液体供应系统时活门可以从液体供应系统移位。 此外，在光刻设备中，提供了一种液体供应系统，其配置为在投影系统和基板之间的空间中提供待投射的光束的液体，以及被配置为控制对投影系统的应用的控制器 与由液体供给系统的构件产生的重量传递有关的力。