公开(公告)号：US20060126036A1

公开(公告)日：2006-06-15

申请号：US11007580

申请日：2004-12-09

申请人： Alexander Kremer ,  Marcel Mathijs Marie Dierichs ,  Erik Loopstra

发明人： Alexander Kremer ,  Marcel Mathijs Marie Dierichs ,  Erik Loopstra

IPC分类号： G03B27/52

CPC分类号： G03F7/70083 ,  G03F7/70066 ,  G03F7/70558

摘要： A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.

摘要翻译： 一种用于改善具有两个长边和两个短边的矩形照明狭缝中的辐射分布的均匀性的均匀性校正模块，包括沿着照明狭缝的每个长边布置的多个可动刀片和包含流体的腔室，其中所述可移动 叶片至少部分地浸没在所述流体中，并且其中每个叶片的折射率与所述流体的折射率之间的差异足够小以防止在每个叶片的表面处的显着的反射和折射。

公开(公告)号：US20050243297A1

公开(公告)日：2005-11-03

申请号：US10836613

申请日：2004-05-03

申请人： Vadim Banine ,  Levinus Bakker ,  Jeroen Jonkers ,  Erik Loopstra

发明人： Vadim Banine ,  Levinus Bakker ,  Jeroen Jonkers ,  Erik Loopstra

IPC分类号： G02B5/08 ,  G03B27/54 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70008 ,  G03F7/7005

摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and distribution means which are arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distribution means in a first direction by a mirror surface. The distribution means further comprise a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.

摘要翻译： 光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，衬底台和投影系统。 此外，光刻设备包括用于向照明系统提供EUV辐射的多个EUV源和被布置成将来自每个EUV源的EUV辐射转换成中间辐射束的分配装置。 中间的辐射束通过镜面从第一方向从分布装置引导。 分配装置还包括旋转驱动的反射镜装置，旋转轴线不平行于镜面。

公开(公告)号：US20050170296A1

公开(公告)日：2005-08-04

申请号：US10766526

申请日：2004-01-29

申请人： Albert Johannes Jansen ,  Jan Kuit ,  Erik Loopstra ,  Raymond Laurentius Schrijver

发明人： Albert Johannes Jansen ,  Jan Kuit ,  Erik Loopstra ,  Raymond Laurentius Schrijver

IPC分类号： H01L21/027 ,  G03F7/00 ,  G03F7/20

CPC分类号： G03F7/70066 ,  G03F7/70425 ,  G03F7/70475 ,  G03F7/707

摘要： A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.

摘要翻译： 光刻设备具有适于在至少两个位置容纳掩模的掩模台，使得具有大于曝光场的图案区域的掩模可以通过首先在掩模的第一位置进行曝光，然后执行第二 第二位置的面罩曝光。

公开(公告)号：US20050157281A1

公开(公告)日：2005-07-21

申请号：US10918700

申请日：2004-08-16

申请人： Johannes Jasper ,  Erik Loopstra ,  Theodorus Modderman ,  Gerrit Nijmeijer ,  Nicholaas Van Asten ,  Frederik Heuts ,  Jacobus Gemen ,  Richard Du Croo De Jongh ,  Marcus Boonman ,  Jacob Klinkhamer ,  Thomas Castenmiller

发明人： Johannes Jasper ,  Erik Loopstra ,  Theodorus Modderman ,  Gerrit Nijmeijer ,  Nicholaas Van Asten ,  Frederik Heuts ,  Jacobus Gemen ,  Richard Du Croo De Jongh ,  Marcus Boonman ,  Jacob Klinkhamer ,  Thomas Castenmiller

IPC分类号： G01B9/02 ,  G01B11/00 ,  G01B11/02 ,  G01B11/245 ,  G01B11/25 ,  G01B11/30 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

摘要： In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

公开(公告)号：US20050132914A1

公开(公告)日：2005-06-23

申请号：US10743266

申请日：2003-12-23

申请人： Johannes Mulkens ,  Marinus Van Den Brink ,  Erik Loopstra

发明人： Johannes Mulkens ,  Marinus Van Den Brink ,  Erik Loopstra

IPC分类号： G03F7/20 ,  B41C1/10 ,  B41N3/00 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/70341 ,  B41C1/1075 ,  B41C1/1083 ,  G03F7/70258 ,  G03F9/7026

摘要： A detector detects liquid in the path of a projection beam or alignment beam. A controller then determines which one or more of a plurality of compensating optical elements may be provided in the optical path of the projection beam or alignment beam in order to focus the projection beam or alignment beam on the surface of the substrate. The appropriate optical element may be placed in the path of the projection beam or alignment beam directly as a final element of the projection system or alignment system respectively.

摘要翻译： 检测器检测投影光束或对准光束的路径中的液体。 然后，控制器确定在投影光束或对准光束的光路中可以设置多个补偿光学元件中的哪一个或多个，以便将投影光束或对准光束聚焦在基板的表面上。 可以将适当的光学元件直接放置在投影光束或对准光束的路径中，作为投影系统或对准系统的最终元件。

公开(公告)号：US20050094119A1

公开(公告)日：2005-05-05

申请号：US10927531

申请日：2004-08-27

申请人： Erik Loopstra ,  Johannes Baselmans ,  Marcel Mathijs Theodore Dierichs ,  Johannes Jasper ,  Hendricus Meijer ,  Uwe MicKan ,  Johannes Catharinus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

发明人： Erik Loopstra ,  Johannes Baselmans ,  Marcel Mathijs Theodore Dierichs ,  Johannes Jasper ,  Hendricus Meijer ,  Uwe MicKan ,  Johannes Catharinus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

IPC分类号： H01L21/027 ,  G02B1/10 ,  G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70966 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70983 ,  Y10S430/162

摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

摘要翻译： 公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。 公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF 2 2的双组分最终光学元件。

公开(公告)号：US20050068511A1

公开(公告)日：2005-03-31

申请号：US10994669

申请日：2004-11-23

申请人： Paulus Liebregts ,  Arno Bleeker ,  Erik Loopstra ,  Harry Borggreve

发明人： Paulus Liebregts ,  Arno Bleeker ,  Erik Loopstra ,  Harry Borggreve

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/54

CPC分类号： G03F7/70991 ,  G03F7/70291

摘要： A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.

公开(公告)号：US20050036121A1

公开(公告)日：2005-02-17

申请号：US10831370

申请日：2004-04-26

申请人： Christiaan Hoogendam ,  Sjoerd Donders ,  Hans Jansen ,  Jacobus Johannus Leonardus Verspay ,  Antonius Theodorus Derksen ,  Joeri Lof ,  Erik Loopstra ,  Johannes Catharinus Mulkens ,  Alexander Straaijer ,  Bob Streefkerk

发明人： Christiaan Hoogendam ,  Sjoerd Donders ,  Hans Jansen ,  Jacobus Johannus Leonardus Verspay ,  Antonius Theodorus Derksen ,  Joeri Lof ,  Erik Loopstra ,  Johannes Catharinus Mulkens ,  Alexander Straaijer ,  Bob Streefkerk

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

摘要： In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectively close and open the aperture. In an embodiment, the shutter may comprise a channel in a surface of the shutter facing the aperture and/or the shutter may be displaced from the liquid supply system when connected to the liquid supply system. Further, in a lithographic apparatus, there is provided a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between a projection system and a substrate and a controller configured to control application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.

摘要翻译： 在光刻投影设备中，提供了一种液体供应系统，其包括至少部分地限定投影系统和基板之间的空间的容器，该容器在其中具有可选择的可开启和关闭的孔，以及关闭构造成选择性地关闭和打开 光圈。 在一个实施例中，快门可以包括位于快门面向孔的表面中的通道和/或当连接到液体供应系统时活门可以从液体供应系统移位。 此外，在光刻设备中，提供了一种液体供应系统，其配置为在投影系统和基板之间的空间中提供待投射的光束的液体，以及被配置为控制对投影系统的应用的控制器 与由液体供给系统的构件产生的重量传递有关的力。