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公开(公告)号:US20200296852A1
公开(公告)日:2020-09-17
申请号:US16888069
申请日:2020-05-29
Applicant: Intel Corporation
Inventor: Srikant Nekkanty , Zhichao Zhang , Kemal Aygun
Abstract: An interposer and method of providing spatial and arrangement transformation are described. An electronic system has an electronic package, a motherboard and an interposer between the package and the motherboard. The interposer has signal and ground contacts on opposing surfaces that are respectively connected. The contacts opposing the package has a higher signal to ground contact ratio than the contacts opposing the motherboard, as well as different arrangements. Ground shielding vias in the interposer, which are connected to a ground plane, electrically isolate the signals through the interposer. The package may be mounted on a shielded socket such that signal and ground pins are mounted respectively in signal and ground socket mountings, ground shielding vias are between the signal socket mountings, and the ground socket mountings contain plated socket housings.
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公开(公告)号:US10716231B2
公开(公告)日:2020-07-14
申请号:US16146908
申请日:2018-09-28
Applicant: Intel Corporation
Inventor: Srikant Nekkanty , Zhichao Zhang , Kemal Aygun
Abstract: An interposer and method of providing spatial and arrangement transformation are described. An electronic system has an electronic package, a motherboard and an interposer between the package and the motherboard. The interposer has signal and ground contacts on opposing surfaces that are respectively connected. The contacts opposing the package has a higher signal to ground contact ratio than the contacts opposing the motherboard, as well as different arrangements. Ground shielding vias in the interposer, which are connected to a ground plane, electrically isolate the signals through the interposer. The package may be mounted on a shielded socket such that signal and ground pins are mounted respectively in signal and ground socket mountings, ground shielding vias are between the signal socket mountings, and the ground socket mountings contain plated socket housings.
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公开(公告)号:US10692847B2
公开(公告)日:2020-06-23
申请号:US15755533
申请日:2015-08-31
Applicant: Intel Corporation
Inventor: Daniel Sobieski , Kristof Darmawikarta , Sri Ranga Sai Boyapati , Merve Celikkol , Kyu Oh Lee , Kemal Aygun , Zhiguo Qian
IPC: H01L25/18 , H01L23/14 , H01L25/065 , H01L23/538 , H01L23/00
Abstract: Discussed generally herein are methods and devices for multichip packages that include an inorganic interposer. A device can include a substrate including low density interconnect circuitry therein, an inorganic interposer on the substrate, the inorganic interposer including high density interconnect circuitry electrically connected to the low density interconnect circuitry, the inorganic interposer including inorganic materials, and two or more chips electrically connected to the inorganic interposer, the two or more chips electrically connected to each other through the high density interconnect circuitry.
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公开(公告)号:US20200168553A1
公开(公告)日:2020-05-28
申请号:US16774508
申请日:2020-01-28
Applicant: Intel Corporation
Inventor: Henning Braunisch , Kemal Aygun , Ajay Jain , Zhiguo Qian
IPC: H01L23/538 , H01L23/00 , H01L23/498 , H01L21/48
Abstract: Discussed generally herein are methods and devices including or providing a high density interconnect structure. A high density interconnect structure can include a stack of alternating dielectric layers and metallization layers comprising at least three metallization layers including conductive material with low k dielectric material between the conductive material, and at least two dielectric layers including first medium k dielectric material with one or more first vias extending therethrough, the at least two dielectric layers situated between two metallization layers of the at least three metallization layers, a second medium k dielectric material directly on a top surface of the stack, a second via extending through the second medium k dielectric material, the second via electrically connected to conductive material in a metallization layer of the three or more metallization layers, and a pad over the second medium k dielectric material and electrically connected to the second via.
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公开(公告)号:US10375832B2
公开(公告)日:2019-08-06
申请号:US14956214
申请日:2015-12-01
Applicant: Intel Corporation
Inventor: Digvijay A. Raorane , Kemal Aygun , Daniel N. Sobieski , Drew W. Delaney
IPC: H05K1/02 , H05K1/18 , H05K3/00 , H05K3/02 , H05K3/30 , H05K3/46 , C23C14/14 , H01L21/48 , H01L21/56 , H01L23/00 , H01L23/31 , H01L23/498 , H01L23/538 , H01L23/552
Abstract: An apparatus including a die including a device side with contact points and lateral sidewalls defining a thickness of the die; a build-up carrier coupled to the die, the build-up carrier including a plurality of alternating layers of patterned conductive material and insulating material, wherein at least one of the layers of patterned conductive material is coupled to one of the contact points of the die; and an interference shield including a conductive material disposed on the die and a portion of the build-up carrier. The apparatus may be connected to a printed circuit board. A method including forming a build-up carrier adjacent a device side of a die including a plurality of alternating layers of patterned conductive material and insulating material; and forming a interference shield on a portion of the build-up carrier.
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公开(公告)号:US10283453B2
公开(公告)日:2019-05-07
申请号:US15297005
申请日:2016-10-18
Applicant: Intel Corporation
Inventor: Zhiguo Qian , Kemal Aygun , Dae-Woo Kim
IPC: H01L21/768 , H01L23/538 , G06F17/50 , H01L21/48 , H01L25/065 , H01L23/00
Abstract: Embodiments of the present disclosure are directed toward interconnect routing configurations and associated techniques. In one embodiment, an apparatus includes a substrate, a first routing layer disposed on the substrate and having a first plurality of traces, and a second routing layer disposed directly adjacent to the first routing layer and having a second plurality of traces, wherein a first trace of the first plurality of traces has a width that is greater than a width of a second trace of the second plurality of traces. Other embodiments may be described and/or claimed.
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公开(公告)号:US20190098764A1
公开(公告)日:2019-03-28
申请号:US16081487
申请日:2016-04-02
Applicant: INTEL CORPORATION
Inventor: ERIC LI , Kemal Aygun , Kai Xiao , Gong Ouyang , Zhichao Zhang
Abstract: Fine feature formation techniques for printed circuit boards are described. In one embodiment, for example, a method may comprise fabricating a conductive structure 306 on a low density interconnect (LDI) printed circuit board (PCB) 150 according to an LDI fabrication process and forming one or more fme conductive features on the LDI PCB by performing a fme feature formation (FFF) process, the FFF process to comprise removing conductive material of the conductive structure along an excision path to form a fme gap region 308 within the conductive structure. Other embodiments are described and claimed.
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公开(公告)号:US10205292B2
公开(公告)日:2019-02-12
申请号:US15716356
申请日:2017-09-26
Applicant: INTEL CORPORATION
Inventor: Dhanya Athreya , Gaurav Chawla , Kemal Aygun , Glen P. Gordon , Sarah M. Canny , Jeffory L. Smalley , Srikant Nekkanty , Michael Garcia , Joshua D. Heppner
IPC: H01R33/76 , H01L23/32 , H01L23/498
Abstract: Embodiments of the present disclosure are directed towards socket contact techniques and configurations. In one embodiment, an apparatus may include a socket substrate having a first side and a second side disposed opposite to the first side, an opening formed through the socket substrate, an electrical contact disposed in the opening and configured to route electrical signals between the first side and the second side of the socket substrate, the electrical contact having a cantilever portion that extends beyond the first side, wherein the first side and surfaces of the socket substrate in the opening are plated with a metal. Other embodiments may be described and/or claimed.
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公开(公告)号:US20180315688A1
公开(公告)日:2018-11-01
申请号:US16026824
申请日:2018-07-03
Applicant: Intel Corporation
Inventor: Zhiguo Qian , Kemal Aygun , Yu Zhang
IPC: H01L23/498 , H01L21/48
CPC classification number: H01L23/49827 , H01L21/486 , H01L23/49816 , H01L23/49838 , H01L2924/0002 , H01L2924/00
Abstract: Embodiments of the present disclosure are directed towards techniques and configurations for ground via clustering for crosstalk mitigation in integrated circuit (IC) assemblies. In some embodiments, an IC package assembly may include a first package substrate configured to route input/output (I/O) signals and ground between a die and a second package substrate. The first package substrate may include a plurality of contacts disposed on one side of the first package substrate and at least two ground vias of a same layer of vias, and the at least two ground vias may form a cluster of ground vias electrically coupled with an individual contact. Other embodiments may be described and/or claimed.
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公开(公告)号:US09971089B2
公开(公告)日:2018-05-15
申请号:US14964426
申请日:2015-12-09
Applicant: Intel Corporation
Inventor: Zhichao Zhang , Kemal Aygun , Robert L. Sankman
CPC classification number: G02B6/12004 , G02B6/4257 , G02B6/428 , G02B6/4295 , G02B2006/12121 , G02B2006/12142 , G02B2006/12147
Abstract: Techniques and mechanisms for providing a bridge between integrated circuit (IC) chips. In an embodiment, the bridge device comprises a semiconductor substrate having disposed thereon contacts to couple the bridge device to two IC chips. Circuit structures and photonic structures of a bridge link are integrated with the substrate. The structures include an optical waveguide coupled between an electrical-to-optical signal conversion mechanism and an optical-to-electrical conversion mechanism. The bridge device converts signaling from an electrical domain to an optical domain and back to an electrical domain. In another embodiment, optical signals received via different respective contacts of an IC chip are converted by the bridge device, where the optical signals are multiplexed with each other and variously propagated with the same optical waveguide.
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