公开(公告)号：US20050245382A1

公开(公告)日：2005-11-03

申请号：US11172872

申请日：2005-07-05

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03B20/00 ,  C03C3/06 ,  C03C3/076 ,  C03C4/00 ,  H01L21/027

CPC classification number: C03C4/0085 ,  C03C3/06 ,  C03C2201/23 ,  C03C2201/42

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., an OH group concentration of at most 600 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其具有至多1200℃的假想温度，至多600ppm的OH基浓度和0±200ppb /℃的热膨胀系数 0至100℃

公开(公告)号：US20050187092A1

公开(公告)日：2005-08-25

申请号：US11064341

申请日：2005-02-22

Applicant: Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Lisa Moore ,  Susan Schiefelbein

Inventor： Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Lisa Moore ,  Susan Schiefelbein

IPC: C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C21/00 ,  C03C23/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/21 ,  C03C2201/23

Abstract: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm2. The synthetic silica glass optical material of the present invention comprises OH concentration levels of less than about 600 ppm, preferably less than 200 ppm, and H2 concentration levels less than about 5.0×1017 molecules/cm3,and preferably less than about 2.0×1017 molecules/cm3.

Abstract translation: 公开了一种合成石英玻璃光学材料，其特征在于波长小于约250nm，特别是具有低激光诱导波前失真的紫外线波长范围内具有高抗紫外线辐射的光学损伤， 特别是在经受100nm脉冲激光在约193nm下操作的激光诱导波前失真（在633nm处），介于约-1.0和1.0nm / cm之间，并且流量约为70μJ/ cm 2 。 本发明的合成石英玻璃光学材料包含小于约600ppm，优选小于200ppm的OH浓度水平和小于约5.0×10 17 H 2 O 2浓度水平， SUP>分子/ cm 3，优选小于约2.0×10 17分子/ cm 3。

公开(公告)号：US20050155388A1

公开(公告)日：2005-07-21

申请号：US11034359

申请日：2005-01-10

Applicant: Gerald Burke ,  Steven Dawes ,  V. Srikant ,  Pushkar Tandon

Inventor： Gerald Burke ,  Steven Dawes ,  V. Srikant ,  Pushkar Tandon

IPC: C03B37/018 ,  C03B19/14 ,  C03B37/012 ,  C03B37/014 ,  C03C3/06 ,  F23D14/22 ,  F23D14/32 ,  G03F1/00 ,  G03F7/20

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/12 ,  C03B2203/22 ,  C03B2207/02 ,  C03B2207/06 ,  C03B2207/08 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/42 ,  C03B2207/46 ,  C03B2207/54 ,  C03B2207/70 ,  C03B2207/81 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  F23D14/22 ,  F23D14/32 ,  G03F1/60 ,  G03F7/70958

Abstract: Methods, apparatus and precursors for producing substantially water-free silica soot, preforms and glass. The methods and apparatus make substantially water-free fused silica preforms or glass by removing water as a reaction product, removing water from the atmosphere, removing water from the transport process, or combinations thereof. In a first embodiment, substantially water-free soot, preforms or glass are achieved by using a hydrogen-free fuel, such as carbon monoxide, in the deposition process. In another embodiment, a soot producing burner has parameters that enable operation on a substantially hydrogen-free fuel. End burners, which minimize water production, are also described. Such water-free methods are useful in depositing fluorine-doped soot because of the low water present and the efficiency in which fluorine is incorporated. In another embodiment, glassy barrier layer methods and apparatus are described for minimizing dopant migration, especially fluorine. Laser and induction methods and apparatus for forming the barrier layer are depicted. A chlorine, fluorine and silica precursor, such as chlorofluorosilane, may be utilized to form fluorinated soot. Other methods and apparatus are directed to combinations of conventional and substantially water-free processes. One embodiment is directed to combustion enhancing additives for addition to the substantially hydrogen-free fuels. The methods and apparatus in accordance with the invention are particularly useful for producing photomask substrates and optical fiber preforms.

公开(公告)号：US06835683B2

公开(公告)日：2004-12-28

申请号：US10311233

申请日：2002-12-17

Applicant: Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

Inventor： Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

IPC: C03C306

CPC classification number: C03C4/0071 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/00 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  G02B1/02 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958

Abstract: A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1×1016 molecules/cm3 nor more than 5×1018 molecules/cm3, and wherein a difference A−B between an absorption coefficient A immediately before an end of irradiation with 1×104 pulses of ArF excimer laser light in an average one-pulse energy density of 2 mJ/cm2 and a second absorption coefficient B at 600 seconds after a stop of the irradiation with the ArF excimer laser light is not more than 0.002 cm−1. When this silica glass member is applied to an illumination optical system and/or a projection optical system in projection exposure apparatus, it becomes feasible to implement uniform exposure while reducing variation in illuminance on a reticle surface and in an exposure area on a wafer.

Abstract translation: 本发明的石英玻璃构件是当其组成由SiO x表示时，x不小于1.85或不大于1.95，其中包含的氢分子的浓度不小于1×10 16分子/ cm <3>不超过5×10 18分子/ cm 3，并且其中在照射结束之前的吸收系数A与平均单脉冲中的1×10 4个ArF准分子激光脉冲之间的差AB 用ArF准分子激光照射停止600秒后的能量密度为2mJ / cm 2，第二吸收系数B为0.002cm -1以下。 当将该石英玻璃构件应用于投影曝光装置中的照明光学系统和/或投影光学系统时，可以实现均匀曝光，同时减小掩模版面和晶片上的曝光区域中的照度变化。

公开(公告)号：US06833949B2

公开(公告)日：2004-12-21

申请号：US10238099

申请日：2002-09-09

Applicant: Robert L. Maier ,  Lisa A. Moore ,  Charlene M. Smith

Inventor： Robert L. Maier ,  Lisa A. Moore ,  Charlene M. Smith

IPC: G02B1314

CPC classification number: C03C17/02 ,  C03B19/1453 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03C3/06 ,  C03C17/3452 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/46 ,  G02B1/105 ,  G02B1/14 ,  G02B5/208 ,  G03F7/70958

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract translation: 本发明提供涂覆光学光刻元件和涂覆光学元件的方法，特别是用于使用不大于约193nm的真空紫外光（VUV）光刻波长的240nm以下的光学光刻系统的光学光刻元件，例如VUV投影光刻系统 利用193nm或157nm区域中的波长。 光学器件利用沉积的氟氧化硅膜操纵小于250nm的真空紫外光刻光。 沉积的氟氧化硅光学涂层有助于对入射光的操纵并保护底层的光学材料，层和表面。

公开(公告)号：US20040160189A1

公开(公告)日：2004-08-19

申请号：US10775218

申请日：2004-02-11

Applicant: Ushiodenki Kabushiki Kaisha

Inventor： Kensuke Fukushima

IPC: H01J017/16 ,  H01J061/30

CPC classification number: H01J61/86 ,  C03C3/06 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/32 ,  H01J61/302 ,  H01J61/822

Abstract: An ultra-high pressure discharge lamp in which the disadvantage of the reduction of the illuminance maintenance factor due to formation of blackening and milky opacification in the discharge vessel and the disadvantage of formation of cracks in the discharge vessel is eliminated by the discharge vessel being made of a silica glass that contains 0.1 ppm by weight to 290 ppm by weight hydrogen. Further advantages are obtained by the silica glass having a content of OH radicals that is at most 1 ppm by weight and a content of aluminum in a range of 2 ppm by weight to 30 ppm by weight.

Abstract translation: 通过放电容器被消除，由于在放电容器中形成黑化和乳白色混浊而导致的照度维持系数降低的缺点和放电容器中形成裂缝的缺点的超高压放电灯 的含有0.1重量ppm至290重量ppm氢的二氧化硅玻璃。 通过具有至多1重量ppm的OH基含量的二氧化硅玻璃和在2重量ppm至30重量ppm的范围内的铝的含量可获得其它优点。

公开(公告)号：US06709997B2

公开(公告)日：2004-03-23

申请号：US09998328

申请日：2001-12-03

Applicant: Akira Urano ,  Toshio Danzuka ,  Tatsuhiko Saito ,  Yasuhiko Shishido ,  Masaharu Mogi ,  Michihisa Kyoto

Inventor： Akira Urano ,  Toshio Danzuka ,  Tatsuhiko Saito ,  Yasuhiko Shishido ,  Masaharu Mogi ,  Michihisa Kyoto

IPC: C03C1304

CPC classification number: G02B6/102 ,  C03B19/1453 ,  C03B32/00 ,  C03B37/01446 ,  C03B37/14 ,  C03B37/15 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0085 ,  C03C13/045 ,  C03C23/002 ,  C03C23/0025 ,  C03C23/003 ,  C03C23/0035 ,  C03C23/0095 ,  C03C25/6208 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/50 ,  G02B6/02 ,  Y02P40/57 ,  Y10S501/905

Abstract: A process of manufacturing a silica glass article comprising the steps of: (1) irradiating a silica glass article with electromagnetic waves to generate defects therein; and (2) immersing the thus irradiated silica glass article in an atmosphere comprising a hydrogen gas, thereby providing the resulting silica glass article with a characteristic that is effective for preventing it substantially from increasing its absorption within an ultraviolet region due to ultraviolet ray irradiation. Also disclosed are a silica glass article or a glass fiber produced according to the manufacturing process.

Abstract translation: 一种制造石英玻璃制品的方法，包括以下步骤：（1）用电磁波照射石英玻璃制品以在其中产生缺陷; 和（2）将这样照射的二氧化硅玻璃制品浸入包括氢气的气氛中，从而使得到的石英玻璃制品具有有效地防止紫外线辐射在紫外线区域内大幅吸收的特征。 还公开了根据制造方法制造的石英玻璃制品或玻璃纤维。

公开(公告)号：US20030195107A1

公开(公告)日：2003-10-16

申请号：US10317068

申请日：2002-12-12

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

IPC: C03C010/16 ,  C03C003/112

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/16 ,  Y10S501/90 ,  Y10S501/905

Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cmnull1 (I2250) to the scattering peak intensity of 800 cmnull1 (I800), i.e. I2250/I800, of at most 1null10null4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2null10null3 cmnull1.

Abstract translation: 一种用于光学用的合成石英玻璃，其用于通过在含有氟的紫外线区域至真空紫外线区域的范围内的光照射而使用，该散射峰强度比例为2250cm <上标> -1 >（I <下标> 2250 ）到800 cm <上标> -1>（I <下标> 800 ）的散射峰强度，即I <下标> 2250 / I 在激光拉曼光谱中，最多为1×10 <上标> -4>的<下标> 800 ，其吸光系数为245nm，最多为2×10 <上标> -3> cm -1>。

公开(公告)号：US06564585B2

公开(公告)日：2003-05-20

申请号：US09851126

申请日：2001-05-09

Applicant: Jun Abe ,  Seiki Ejima ,  Akira J. Ikushima ,  Takumi Fujiwara

Inventor： Jun Abe ,  Seiki Ejima ,  Akira J. Ikushima ,  Takumi Fujiwara

IPC: C03C2100

CPC classification number: C03C23/009 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/31 ,  C03B2203/26 ,  C03C3/06 ,  C03C23/002 ,  C03C23/007 ,  C03C23/0095 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/31 ,  C03C2203/54 ,  G02F1/3555 ,  G02F1/3558

Abstract: There is disclosed second-order nonlinear glass material wherein a part having second-order nonlinearity contains Ge, H and OH and has second-order nonlinear optical constant d of 1 pm/V or more, and a method for producing second-order nonlinear glass material comprising treating a porous glass material containing Ge with hydrogen, sintering it and subjecting it to a ultraviolet poling treatment. There can be provided second-order nonlinear glass material having second-order nonlinearity which is a sufficiently high and has a sufficiently long lifetime for a practical purpose, in use of the glass material for optical functional elements or the like.

Abstract translation: 公开了二阶非线性玻璃材料，其中具有二阶非线性的部分包含Ge，H和OH，并且具有1pm / V以上的二次非线性光学常数d，以及二阶非线性玻璃的制造方法 包括用氢处理含有Ge的多孔玻璃材料，烧结并对其进行紫外线处理。 在使用光学功能元件等的玻璃材料时，可以提供具有二次非线性的二阶非线性玻璃材料，该二次非线性度足够高并且在实际应用中具有足够长的使用寿命。

公开(公告)号：US06550277B1

公开(公告)日：2003-04-22

申请号：US09709168

申请日：2000-11-10

Applicant: Bruno Uebbing ,  Jan Vydra

Inventor： Bruno Uebbing ,  Jan Vydra

IPC: C03B1906

CPC classification number: C03C4/0085 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/075 ,  C03C3/06 ,  C03C2201/06 ,  C03C2201/08 ,  C03C2201/23 ,  C03C2203/40 ,  Y10S65/08 ,  Y10S65/16 ,  Y10S501/905

Abstract: The invention concerns a quartz glass body for an optical component for the transmission of UV radiation with a wavelength of 250 nm and less, especially for a wavelength of 157 nm, as well as a process for the manufacture of the quartz glass body where fine quartz glass particles are formed by flame hydrolysis of a silicon compound, deposited and vitrified. Suitability of a quartz glass as represented by high base transmission and radiation resistance depends on structural properties caused by local stoichiometric deviations, and on the chemical composition. The quartz glass body according to the inventions is distinguished by a uniform base transmission (relative change of base transmission ≦1%) in the wavelength range from 155 nm to 250 nm (radiation penetration depth of 10 mm) of at least 80%, a low OH content (less than 10 ppm by weight) and a glass structure substantially free from oxygen defect centers. A quartz glass body of this kind is manufactured by a process which allows bulk embedding of hydrogen or oxygen into the glass network in that at least a two stage heat treatment takes place at temperatures ranging from 850° C. to 1600° C. before the vitrification, the last stage comprising sintering at a temperature between 1300° C. and 1600° C. in an atmosphere containing hydrogen or oxygen, or a nonflammable mixture of these substances.

Abstract translation: 本发明涉及一种用于传输波长为250nm以下，特别是波长为157nm的紫外线的光学部件的石英玻璃体，以及用于制造石英玻璃体的方法，其中精细的石英 通过硅化合物的火焰水解形成玻璃颗粒，沉积并玻璃化。 由高碱性透射和耐辐射性表示的石英玻璃的适用性取决于由局部化学计量偏差引起的结构特性以及化学成分。 根据本发明的石英玻璃体的特征在于在155nm至250nm（辐射穿透深度为10mm）的波长范围内的均匀的基底透射率（基底透射率的相对变化<= 1％）为至少80％ 低OH含量（小于10ppm重量）和基本上不含氧缺陷中心的玻璃结构。 这种石英玻璃体是通过允许将氢气或氧气大量嵌入玻璃网络的方法来制造的，因为至少在两个阶段之间的热处理在850℃至1600℃之间的温度下进行 玻璃化，最后阶段包括在含有氢气或氧气的气氛中在1300℃和1600℃之间的温度下烧结，或这些物质的不可燃混合物。