公开(公告)号：US06480275B2

公开(公告)日：2002-11-12

申请号：US09772293

申请日：2001-01-29

申请人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith

发明人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith

IPC分类号： G01J318

CPC分类号： G01J3/12 ,  G01J1/4257 ,  G01J3/22 ,  G01J3/26 ,  G01J9/02

摘要： A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the monochromator and scanning the laser wavelength over a range which includes the monochromator slit wavelength.

摘要翻译： 高分辨率标准光栅单色仪。 优选的实施例在紫外范围内呈现非常狭窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。 激光束的带宽可以通过激光束的引导部分进入单色仪并且在包括单色器狭缝波长的范围内扫描激光波长而被非常精确地测量。

公开(公告)号：US06317447B1

公开(公告)日：2001-11-13

申请号：US09490835

申请日：2000-01-25

申请人： William N. Partlo ,  Igor V. Fomenkov ,  Jean-Marc Hueber ,  Zsolt Bor ,  Eckehard D. Onkels ,  Michael C. Cates ,  Richard C. Ujazdowski ,  Vladimir B. Fleurov ,  Dmitri V. Gaidarenko

发明人： William N. Partlo ,  Igor V. Fomenkov ,  Jean-Marc Hueber ,  Zsolt Bor ,  Eckehard D. Onkels ,  Michael C. Cates ,  Richard C. Ujazdowski ,  Vladimir B. Fleurov ,  Dmitri V. Gaidarenko

IPC分类号： H01S322

CPC分类号： G03F7/70025 ,  G03F7/70575 ,  G03F7/708 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0381 ,  H01S3/0382

摘要： Methods and structural changes in gas discharge lasers for minimizing wavelength chirp at high pulse rates. Applicants have identified the major cause of wavelength chirp in high pulse rate gas discharge lithography lasers as pressure waves from a discharge reflecting back to the discharge region coincident with a subsequent discharge. The timing of the arrival of the pressure wave is determined by the temperature of the laser gas through which the wave is traveling. During burst mode operation, the laser gas temperature in prior art lasers changes by several degrees over periods of a few milliseconds. These changing temperatures change the location of the coincident pressure waves from pulse to pulse within the discharge region causing a variation in the pressure of the laser gas which in turn affects the index of refraction of the discharge region causing the laser beam exiting the rear of the laser to slightly change direction. This change in beam direction causes the grating in the LNP to reflect back to the discharge region light at a slightly different wavelength causing the wavelength chirp. Solution to the problem is to include in the laser chamber structural elements to moderate or disperse the pressure waves and to maintain the laser gas temperature as close as feasible to constant values.

摘要翻译： 气体放电激光器的方法和结构变化，以最大限度地减少高脉冲波长啁啾。 申请人已经确定了在高脉冲气体放电光刻激光器中的波长啁啾的主要原因，因为从反射回到放电区域的放电的压力波与随后的放电一致。 压力波的到达时间由波浪行进的激光气体的温度决定。 在突发模式操作期间，现有技术的激光器中的激光气体温度在几毫秒的时间内改变了几度。 这些变化的温度改变了放电区域内重合压力波从脉冲到脉冲的位置，导致激光气体的压力变化，这反过来影响放电区域的折射率，导致激光束离开 激光稍微改变方向。 光束方向的这种变化导致LNP中的光栅以稍微不同的波长反射回到放电区域，导致波长啁啾。 解决问题的方法是在激光室结构元件中包括中压或分散压力波，并将激光气体温度保持在尽可能接近的恒定值。

公开(公告)号：US5748656A

公开(公告)日：1998-05-05

申请号：US583302

申请日：1996-01-05

申请人： Tom A. Watson ,  William N. Partlo ,  Donald G. Larson ,  Igor V. Fomenkov ,  Anthony J. de Ruyter ,  Palash P. Das

发明人： Tom A. Watson ,  William N. Partlo ,  Donald G. Larson ,  Igor V. Fomenkov ,  Anthony J. de Ruyter ,  Palash P. Das

IPC分类号： H01S3/03 ,  H01S3/036 ,  H01S3/04 ,  H01S3/041 ,  H01S3/225 ,  H01S3/045

CPC分类号： H01S3/036 ,  H01S3/04 ,  H01S3/041 ,  F28D2021/0077 ,  H01S3/225

摘要： Disclosed is a laser useful in, e.g., photolithography or medical surgery. In one embodiment, the laser comprises a discharge chamber and heat-generating electronics that are enclosed in a baffled enclosure that requires less cooling air to reliably cool the components in the enclosure than previous unbaffled enclosures. A method of reducing the amount of conditioned air is also provided. In a further embodiment, the laser has a heat-exchange system that acts quickly in response to changes in laser gas temperature by adjusting a flow-proportioning valve regulating water flow through a heat exchanger, thereby providing a continuously variable rate of heat exchange through the heat exchanger to maintain the lasing gas temperature constant. Methods of providing a laser beam and of improving the uniformity of a laser beam are disclosed, as are photolithography methods utilizing a laser and method of this invention.

摘要翻译： 公开了一种可用于例如光刻或医疗手术中的激光。 在一个实施例中，激光器包括放电室和发热电子器件，其封闭在挡板外壳中，其需要较少的冷却空气以可靠地冷却外壳中的部件比先前的未封闭的外壳。 还提供了减少调节空气量的方法。 在另一个实施例中，激光器具有热交换系统，其响应于激光气体温度的变化而快速作用，通过调节调节通过热交换器的水流的流量比例阀，由此通过所述热交换系统提供连续可变的热交换速率 热交换器保持激光温度恒定。 公开了提供激光束并提高激光束的均匀性的方法，以及利用激光的光刻方法和本发明的方法。

公开(公告)号：US08379687B2

公开(公告)日：2013-02-19

申请号：US11173955

申请日：2005-06-30

申请人： Raymond F. Cybulski ,  Robert A. Bergstedt ,  William N. Partlo ,  Richard L. Sandstrom ,  Gon Wang

发明人： Raymond F. Cybulski ,  Robert A. Bergstedt ,  William N. Partlo ,  Richard L. Sandstrom ,  Gon Wang

IPC分类号： H01S3/08

CPC分类号： H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/1055 ,  H01S3/225

摘要： A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.

摘要翻译： 公开了一种窄气体放电激光系统及其操作方法，其可以包括分散中心波长选择元件; 包括多个折射元件的光束扩展器; 折射元件定位机构，其定位折射元件中的至少一个，以改变激光束在分散中心波长选择元件上的入射角; 分散中心波长选择元件和扩束器中的每一个彼此对准并且至少包含分散中心波长选择元件的壳体; 壳体定位机构相对于气体放电激光系统的光轴定位壳体。 色散元件可以包括光栅，并且光束扩展器可以包括多个棱镜。 壳体可以包含分散中心波长选择元件和扩束器。 壳体定位元件可以包括位置锁定机构。

公开(公告)号：US08126027B2

公开(公告)日：2012-02-28

申请号：US13086858

申请日：2011-04-14

申请人： J. Martin Algots ,  Robert A. Bergstedt ,  William N. Partlo ,  German E. Rylov ,  Richard L. Sandstrom

发明人： J. Martin Algots ,  Robert A. Bergstedt ,  William N. Partlo ,  German E. Rylov ,  Richard L. Sandstrom

IPC分类号： H01S3/22

CPC分类号： H01S3/1055 ,  G03F7/70025 ,  G03F7/70041 ,  H01S3/005 ,  H01S3/036 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/106 ,  H01S3/2251

摘要： An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source.

摘要翻译： 公开了一种可以包括接收光的光栅的装置，可以粗略地选择光栅入射角的第一棱镜和可精细选择光栅入射角的第二棱镜。 在一个应用中，该装置可以用作激光源的线窄化模块。

公开(公告)号：US07884303B2

公开(公告)日：2011-02-08

申请号：US11201877

申请日：2005-08-11

申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

IPC分类号： B23K26/00

CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

摘要： A high, energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.

摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统，并且扩展 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够的强度分布的倍率 陡峭的侧壁允许现场停止在工件处保持足够陡峭的梁轮廓。

公开(公告)号：US20090296755A1

公开(公告)日：2009-12-03

申请号：US11980288

申请日：2007-10-30

申请人： Daniel J. W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

发明人： Daniel J. W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

IPC分类号： H01S3/10 ,  H01S3/22

CPC分类号： H01S3/225 ,  G02F1/3534 ,  G02F1/37 ,  G03F7/70583 ,  H01S3/0057 ,  H01S3/0092 ,  H01S3/067 ,  H01S3/08004 ,  H01S3/0835 ,  H01S3/10092 ,  H01S3/1618 ,  H01S3/2258 ,  H01S3/2308 ,  H01S3/2383

摘要： A method and apparatus may comprise a laser light source system which may comprise a solid state laser seed beam source providing a seed laser output; a frequency conversion stage converting the seed laser output to a wavelength suitable for seeding an excimer or molecular fluorine gas discharge laser; an excimer or molecular fluorine gas discharge laser gain medium amplifying the converted seed laser output to produce a gas discharge laser output at approximately the converted wavelength. The excimer or molecular fluorine laser may be selected from a group comprising XeCl, XeF, KrF, ArF and F2 laser systems. The laser gain medium may comprise a power amplifier. The power amplifier may comprise a single pass amplifier stage, a multiple-pass amplifier stage, a ring power amplification stage or a power oscillator. The ring power amplification stage may comprise a bow-tie configuration or a race track configuration.

摘要翻译： 方法和装置可以包括激光光源系统，其可以包括提供种子激光输出的固态激光种子光源; 将种子激光输出转换成适合于接种准分子或分子氟气放电激光的波长的变频级; 放大转换的种子激光输出的准分子或分子氟气放电激光增益介质，以产生大致转换波长的气体放电激光输出。 受激准分子或分子氟激光可以选自包括XeCl，XeF，KrF，ArF和F2激光系统的组。 激光增益介质可以包括功率放大器。 功率放大器可以包括单通放大器级，多通道放大级，环形功率放大级或功率振荡器。 环形功率放大级可以包括弓形配置或赛道配置。

公开(公告)号：US20090067468A1

公开(公告)日：2009-03-12

申请号：US11980172

申请日：2007-10-30

申请人： Daniel J.W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

发明人： Daniel J.W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

IPC分类号： H01S3/22

CPC分类号： H01S3/2383 ,  G03F7/70583 ,  H01S3/0057 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/10092 ,  H01S3/225 ,  H01S3/2325

摘要： A method/apparatus may comprise a laser light source which may comprise a solid state seed laser system producing a seed laser output having a nominal center wavelength at a pulse repetition rate; a first and a second gas discharge laser amplifier gain medium each operating at a pulse repetition rate less than that of the seed laser system; a beam divider providing each of the respective first and second amplifier gain mediums with seed laser output pulses; a frequency converter modifying the nominal center wavelength of the output of the seed laser to essentially the nominal center wavelength of the amplifier gain medium; a beam combiner combining the outputs of the respective amplifier gain mediums to provide a light source output having the pulse repetition rate of the seed laser; a coherence buster operating on either or both of the output of the seed laser or amplifier gain mediums.

摘要翻译： 方法/装置可以包括激光光源，其可以包括固态种子激光器系统，其产生具有脉冲重复率的标称中心波长的种子激光器输出; 第一和第二气体放电激光放大器增益介质，每个以比种子激光器系统的脉冲重复频率工作; 一个分束器，为每个相应的第一和第二放大器增益介质提供种子激光输出脉冲; 变频器将种子激光器的输出的标称中心波长修改为基本上放大器增益介质的标称中心波长; 组合各个放大器增益介质的输出以提供具有种子激光器的脉冲重复率的光源输出的光束组合器; 在种子激光器或放大器增益介质的输出中的任一个或两者上工作的相干致动器。

公开(公告)号：US20080151944A1

公开(公告)日：2008-06-26

申请号：US12074079

申请日：2008-02-28

申请人： J. Martin Algots ,  Robert A. Bergstedt ,  Walter D. Gillespie ,  Vladimir A. Kulgeyko ,  William N. Partlo ,  German E. Rylov ,  Richard L. Sandstrom ,  Brian Strate ,  Timothy S. Dyer

发明人： J. Martin Algots ,  Robert A. Bergstedt ,  Walter D. Gillespie ,  Vladimir A. Kulgeyko ,  William N. Partlo ,  German E. Rylov ,  Richard L. Sandstrom ,  Brian Strate ,  Timothy S. Dyer

IPC分类号： H01S3/10

CPC分类号： H01S3/1055 ,  G03F7/70025 ,  G03F7/70041 ,  H01S3/005 ,  H01S3/036 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/106 ,  H01S3/2251

摘要： A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic.

摘要翻译： 一种用于窄带DUV大功率高重复率气体放电激光器的线窄化方法和模块，其产生具有标称光路的脉冲串中的输出激光束脉冲束脉冲，其可以包括：分散中心波长选择光学器件 可移动地安装在线路窄化模块的光路内，为至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定的每个脉冲选择至少一个中心波长; 第一调谐机构部分地通过选择包含脉冲朝向分散中心的激光束的透射角度来选择包含分散中心波长选择光学器件上的各个脉冲的激光束的入射角 波长选择光学元件。

公开(公告)号：US07061959B2

公开(公告)日：2006-06-13

申请号：US10884547

申请日：2004-07-01

申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

IPC分类号： H01S3/22

CPC分类号： H01S3/0818 ,  B23K26/042 ,  B23K26/0622 ,  B23K26/0738 ,  B23K26/705 ,  H01L21/02532 ,  H01L21/02675 ,  H01S3/225 ,  H01S3/2255 ,  H01S3/2308 ,  H01S3/2366

摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.

摘要翻译： 公开了一种气体放电激光结晶装置和方法，用于在工件上的膜中进行晶体补偿或取向的变换，其可以包括主振荡器功率放大器MOPA或功率振荡器功率放大器，配置XeF激光系统，产生激光输出光 脉冲束以高重复率和高功率脉冲到脉冲剂量控制; 从激光输出光脉冲光束产生细长脉冲工作光束的光学系统。 该装置还可以包括激光系统被配置为POPA激光系统，并且还包括：可操作地将来自第一激光PO单元的第一输出激光束脉冲光束引导到第二激光器PA单元中的中继光学器件; 并且定时和控制模块定时在正或负3ns内在第一和第二激光单元中产生气体放电，以产生第二激光输出光脉冲束作为第一激光输出光脉冲光束的放大。 该系统可以包括振荡器激光单元中的发散控制。 发散控制可以包括不稳定的谐振器装置。 该系统还可以包括在激光和工件之间的光束指向控制机构和在激光和工件之间的光束位置控制机构。 光束参数测量可以向光束指向机构提供主动反馈控制，并向光束位置控制机构提供主动反馈控制。