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    Composition and process for the production of a porous layer using the composition
    112.
    发明申请
    Composition and process for the production of a porous layer using the composition 失效
    使用该组合物生产多孔层的组合物和方法

    公开(公告)号：US20020198277A1

    公开(公告)日：2002-12-26

    申请号：US10180438

    申请日：2002-06-26

    Inventor： Recai Sezi

    IPC: C08J009/00

    CPC classification number: H01L21/02118 ,  C08J9/26 ,  C08J2201/046 ,  C08J2379/04 ,  H01L21/02203 ,  H01L21/02282 ,  H01L21/312 ,  H01L21/31695

    Abstract: Production of a porous layer includes using a composition which includes a first polymer component and a second polymer component, the first polymer component being polyhydroxyamide and/or polybenzoxazole and stable at a temperature at which the second polymer component decomposes and volatilizes. If the composition is heated to the decomposition temperature of the second polymer component, the second component volatilizes and a porous layer that contains the first component remains.

    Abstract translation: 多孔层的制造包括使用包含第一聚合物组分和第二聚合物组分的组合物，第一聚合物组分是聚羟基酰胺和/或聚苯并恶唑，并且在第二聚合物组分分解和挥发的温度下是稳定的。 如果将组合物加热至第二聚合物组分的分解温度，则第二组分挥发，并且残留含有第一组分的多孔层。

    Particle-dispersed polyimide precursor solution, method for producing porous polyimide film, and porous polyimide film
    118.
    发明授权
    Particle-dispersed polyimide precursor solution, method for producing porous polyimide film, and porous polyimide film 有权

    公开(公告)号：US12018128B2

    公开(公告)日：2024-06-25

    申请号：US17380016

    申请日：2021-07-20

    Applicant: FUJIFILM Business Innovation Corp.

    Inventor： Tomoya Sasaki ,  Hidekazu Hirose ,  Kosaku Yoshimura ,  Yasunobu Kashima ,  Hajime Sugahara ,  Kosuke Nakada ,  Tomoyo Okubo

    IPC: C08G73/10 ,  C08J5/18 ,  C08J9/26

    CPC classification number: C08G73/1067 ,  C08G73/1021 ,  C08G73/1032 ,  C08G73/1042 ,  C08J5/18 ,  C08J9/26 ,  C08J2201/046 ,  C08J2379/08

    Abstract: A particle-dispersed polyimide precursor solution contains a polyimide precursor having a unit represented by the following formula (I), particles, and a solvent, in which the particle-dispersed polyimide precursor solution satisfies both the following conditions (1) and (2),






    (in the formula (I), A represents a tetravalent organic group, and B represents a divalent organic group represented by any of the following formulas (B1) to (B4)),










    (in the formulas (B1) to (B4), Ar1, Ar10, and Ar11 each independently represent a trivalent aromatic group which may have a substituent, Ar2, Ar4, Ar5, Ar7 and Ar8 each independently represent a divalent aromatic group which may have a substituent, Ar3 and Ar6 each independently represent a tetravalent aromatic group which may have a substituent or a group represented by the following formula (II), Ar9 represents a divalent aromatic group which may have a substituent or a group represented by the following formula (III), X1 to X7 each independently represent NRa, O, or S, Ra represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group, and * represents a bonding site with an adjacent linking group), and










    (in the formulas (II) and (III), Ar12 and Ar13 each independently represent a trivalent aromatic group which may have a substituent, Ar14 and Ar15 each independently represent a divalent aromatic group which may have a substituent, Y and Z each independently represent O, S, S(═O)2, or CRbRc, Rb and Rc each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group, and * represents a bonding site with an adjacent linking group),
    Condition (1): a total content of the groups represented by the formulas (B1) to (B4) is 1% by mass or more and 40% by mass or less with respect to a total amount of the polyimide precursor, and
    Condition (2): a content of the particles is 5% by mass or more and 90% by mass or less with respect to a total content of the polyimide precursor and the particles.

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