公开(公告)号：US20100193710A1

公开(公告)日：2010-08-05

申请号：US12580523

申请日：2009-10-16

申请人： Osamu Wakabayashi ,  Akira Endo ,  Krzysztof Nowak ,  Takashi Suganuma ,  Masato Moriya

发明人： Osamu Wakabayashi ,  Akira Endo ,  Krzysztof Nowak ,  Takashi Suganuma ,  Masato Moriya

IPC分类号： H05G2/00 ,  H01S3/10 ,  H01S3/22 ,  H01S3/0941

CPC分类号： H01S3/2316 ,  B82Y20/00 ,  G03F7/70033 ,  H01S3/0007 ,  H01S3/107 ,  H01S3/2232 ,  H01S3/235 ,  H01S5/02284 ,  H01S5/0654 ,  H01S5/06837 ,  H01S5/0687 ,  H01S5/141 ,  H01S5/3402 ,  H01S5/4012 ,  H01S5/4062 ,  H01S5/4087

摘要： An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.

摘要翻译： 一种极紫外光源装置包括具有输出一个或多个纵模式激光灯的主振荡器的激光装置，具有分子气体的放大器作为放大器，放大其中包​​含波长的纵模式激光， 以及调节主振荡器的控制器，使得从主振荡器输出的纵模激光的波长包括在可放大线之一中，激光装置用作驱动激光器，其中激光装置照射 具有用于产生等离子体的激光的目标材料，并且从等离子体发射极紫外光并从极紫外光源装置输出。

公开(公告)号：US20100171049A1

公开(公告)日：2010-07-08

申请号：US12382964

申请日：2009-03-27

申请人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

IPC分类号： H05G2/00 ,  G01N21/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光生成室内的激光束聚焦光学元件中的光学元件的劣化。 该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器 一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

公开(公告)号：US20100117009A1

公开(公告)日：2010-05-13

申请号：US12612861

申请日：2009-11-05

申请人： Masato Moriya ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Osamu Wakabayashi

IPC分类号： G21K5/00 ,  H01S3/10 ,  H01J7/30

CPC分类号： H05G2/008 ,  H01S3/0007 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/08095 ,  H01S3/1305 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2316 ,  H05G2/003

摘要： [Problem]An extreme ultraviolet light source device in accordance with the present invention corrects an optical performance of a laser beam in an appropriate manner.[Means for Resolution]A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system 30 that amplifies a laser beam that is output from a driver laser oscillator 20. The guide laser beam is output from a laser device 50 as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror 52. A sensor 44 detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller 60 outputs a signal to a wave front correction part 34 based on a measured result of a sensor 36. The wave front correction part 34 corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller 60.

摘要翻译： [问题]根据本发明的极紫外光源装置以适当的方式校正激光束的光学性能。 [分辨装置]具有光轴和与激光脉冲激光束的光束直径基本相等的光束直径的引导激光束被引入到放大从驱动激光振荡器20输出的激光束的放大系统30中。 引导激光束作为连续光从激光装置50输出，并且通过引导激光束引入反射镜52被引入到驱动脉冲激光束的光路中。传感器44检测激光束的角度（方向） 激光束和波前曲率的变化。 波前校正控制器60基于传感器36的测量结果将信号输出到波前校正部34。波前校正部34根据指令将激光束的波前校正为预定波阵面 来自波前校正控制器60。

公开(公告)号：US20100090133A1

公开(公告)日：2010-04-15

申请号：US12569194

申请日：2009-09-29

申请人： Akira ENDO ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

发明人： Akira ENDO ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

IPC分类号： G21K5/00

CPC分类号： G21K5/00 ,  G03F7/70033 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.

摘要翻译： 一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶， 在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。

公开(公告)号：US20080181262A1

公开(公告)日：2008-07-31

申请号：US11822126

申请日：2007-07-02

申请人： Osamu Wakabayashi ,  Takahito Kumazaki ,  Toru Suzuki ,  Masashi Shinbori ,  Masaya Yoshino

发明人： Osamu Wakabayashi ,  Takahito Kumazaki ,  Toru Suzuki ,  Masashi Shinbori ,  Masaya Yoshino

IPC分类号： H01S3/10

CPC分类号： G03F7/2006 ,  H01S3/08036 ,  H01S3/106 ,  H01S3/137 ,  H01S3/139 ,  H01S3/225

摘要： An upper limit and a lower limit are preliminarily set for a spectral line width common to a plurality of narrow-band laser devices. When delivered or subjected to maintenance, the narrow-band laser device is caused to laser oscillate to detect its spectral line width before it is used as a light source for semiconductor exposure. A spectral line width adjustment unit provided in the narrow-band laser device is adjusted so that the spectral line width assumes a value between the upper limit and the lower limit. The present invention is able to suppress the variation in spectral line width such as E95 bandwidth caused by machine differences during the manufacture of the laser device, or by replacement or maintenance of the laser device, whereby the quality of integrated circuit patterns formed by the semiconductor exposure tool can be stabilized.

摘要翻译： 对于多个窄带激光装置共有的谱线宽度，预先设定上限和下限。 当交付或进行维护时，使窄带激光装置激光振荡，以便在用作半导体曝光的光源之前检测其光谱线宽度。 调整设置在窄带激光装置中的谱线宽度调节单元，使得谱线宽度呈现上限和下限之间的值。 本发明能够抑制激光装置的制造时的机器差异引起的E95带宽等的频谱线宽度的变化，或者通过更换或维护激光装置，能够抑制由半导体形成的集成电路图案的质量 曝光工具可以稳定。

公开(公告)号：US07006309B2

公开(公告)日：2006-02-28

申请号：US10280031

申请日：2002-10-25

申请人： Osamu Wakabayashi ,  Georg Soumagne ,  Takahito Kumazaki

发明人： Osamu Wakabayashi ,  Georg Soumagne ,  Takahito Kumazaki

IPC分类号： G02B5/04

CPC分类号： G02B5/04 ,  H01S3/08004 ,  H01S3/105

摘要： A prism unit, which is capable of firmly fixing a plurality of prism parts in a small space, and a laser device, which is capable of enhancing output power of laser light with use of the prism unit, are provided. For this purpose, a prism unit (28) includes a plurality of prism parts (35), which refract incident light (21), and a fixed part (36) which is fixed to or formed integrally with at least two of the plurality of prism parts. Further, a laser device includes the prism unit (28), and only a wavelength in a desired range out of a plurality of oscillation wavelengths is selectively oscillated by the prism unit.

摘要翻译： 提供了能够在小空间中牢固地固定多个棱镜部分的棱镜单元和能够使用棱镜单元增强激光输出功率的激光装置。 为此，棱镜单元（28）包括折射入射光（21）的多个棱镜部（35）和固定部（36），固定部（36）与多个 棱镜零件。 此外，激光装置包括棱镜单元（28），并且仅通过棱镜单元选择性地振荡多个振荡波长内的期望范围的波长。

公开(公告)号：US06741627B2

公开(公告)日：2004-05-25

申请号：US10330966

申请日：2002-12-27

申请人： Naoki Kitatochi ,  Tatsuya Ariga ,  Osamu Wakabayashi

发明人： Naoki Kitatochi ,  Tatsuya Ariga ,  Osamu Wakabayashi

IPC分类号： H01S322

CPC分类号： H01S3/2308 ,  G03F7/70025 ,  H01S3/134 ,  H01S3/22 ,  H01S3/2258

摘要： The invention provides a two-stage laser mode of photolithographic molecular fluorine laser system for matching the center wavelength of an oscillation-stage laser to the center wavelength of an amplification-stage laser, thereby oscillating a laser beam having a low spectral purity and a narrow linewidth. The laser system is of the two-stage mode comprising an oscillation-stage laser 10 and an amplification-stage mode 20. The center wavelength of a laser beam emitted out of the oscillation-stage laser 10 is compared with and substantially matched to the center wavelength of a laser beam emitted out of the amplification-stage laser 20 when the latter is oscillated by itself.

摘要翻译： 本发明提供了一种用于将振荡级激光器的中心波长与放大级激光器的中心波长匹配的光刻分子氟激光器系统的两级激光模式，从而振荡具有低光谱纯度和窄的激光束 行宽。 激光系统是包括振荡级激光器10和放大级模式20的两级模式。从振荡级激光器10发出的激光束的中心波长与中心 当放大级激光器20自身振荡时，从放大级激光器20发出的激光束的波长。

公开(公告)号：US06573989B2

公开(公告)日：2003-06-03

申请号：US09801001

申请日：2001-03-08

申请人： Toru Suzuki ,  Osamu Wakabayashi

发明人： Toru Suzuki ,  Osamu Wakabayashi

IPC分类号： G01J328

CPC分类号： G01J3/1809 ,  G01J3/1838 ,  G01J3/22

摘要： A spectrometer measures a spectrum of a light beam supplied from a light source so as to obtain fine information and coarse information of the spectrum easily. This spectrometer has a holographic grating, an Echelle grating, a rotation stage and a line sensor. In the case where a single pass beam is to be detected, a control processing unit controls the rotation stage so as to rotate the Echelle grating from the Littrow arrangement by a predetermined angle &dgr;1. On the other hand, in the case where a double pass beam is to be detected, the control processing unit controls the rotation stage so as to rotate the Echelle grating from the Littrow arrangement by a predetermined angle &dgr;2.

摘要翻译： 光谱仪测量从光源提供的光束的光谱，以便容易地获得光谱的精细信息和粗略信息。 该光谱仪具有全息光栅，Echelle光栅，旋转台和线传感器。 在要检测单程光束的情况下，控制处理单元控制旋转阶段，以使Echelle光栅从Littrow布置旋转预定角度δ1。 另一方面，在要检测双通光束的情况下，控制处理单元控制旋转台，以便将梯形光栅从Littrow布置旋转预定角度δ2。

公开(公告)号：US06526086B1

公开(公告)日：2003-02-25

申请号：US09423197

申请日：1999-11-04

申请人： Osamu Wakabayashi ,  Hirokazu Tanaka ,  Tatsuya Ariga

发明人： Osamu Wakabayashi ,  Hirokazu Tanaka ,  Tatsuya Ariga

IPC分类号： H01S309

CPC分类号： H01S3/1055 ,  H01S3/106 ,  H01S3/1305 ,  H01S3/136 ,  H01S3/139

摘要： A band narrowing laser having a band narrowing module which narrows by a band narrowing element a band of the laser beam generated from a laser medium, in which wavefront correction means (10) that corrects the wavefront of an incident laser beam and and projects the corrected beam is intalled in the band narrowing module (6) to produce a laser beam with a narrow and stable spectral line width.

摘要翻译： 一种带式变窄激光器，其具有由带状窄化元件使由激光介质产生的激光束的波段变窄的波段变窄模块，其中波前校正装置（10）校正入射激光束的波前并且投影校正的波长 光束在带狭窄模块（6）中被安置，以产生具有窄且稳定的光谱线宽度的激光束。

公开(公告)号：US06418155B1

公开(公告)日：2002-07-09

申请号：US09297372

申请日：1999-06-17

申请人： Osamu Wakabayashi ,  Tatsuya Ariga ,  Toru Igarashi ,  Shoichi Sakanishi ,  Tomokazu Takahashi

发明人： Osamu Wakabayashi ,  Tatsuya Ariga ,  Toru Igarashi ,  Shoichi Sakanishi ,  Tomokazu Takahashi

IPC分类号： H01S310

CPC分类号： H01S3/131 ,  H01S3/134 ,  H01S5/06216

摘要： A laser device which repeats a cycle of burst mode operation in each of which continuous oscillating operations for continuously pulsatively oscillating laser light by a prescribed number of times and stopping operations for stopping the pulsative oscillation for a prescribed pausing time are alternately executed, controls the power supply voltage of the laser device so that each output energy of the pulsative oscillation can become coincide with a target value, finds the difference between the output voltage of each pulse and the target value at every pulse and, for a pulse for which the difference exceeds tolerance limits, corrects and updates the power supply voltage value stored in the voltage data table means corresponding to the pulse number of the pulse and the measured oscillation pausing time by using the control gain of a control gain setting means set in the block corresponding to the pulse number and the measured oscillation pausing time and the difference, so as to always make the pulse energy of all pulses for the continuous pulsative oscillation constant and further improves the accuracy of optical machining.

摘要翻译： 重复进行突发模式操作的周期的激光装置，其中每个激光装置交替地执行连续振荡操作以连续脉动振荡激光规定次数和停止操作以停止脉动振荡达规定的暂停时间，控制功率 激光装置的电源电压使得脉冲振荡的每个输出能量可以与目标值一致，找出每个脉冲的每个脉冲的输出电压与目标值之间的差，并且对于该差超过的脉冲 通过使用设置在对应于所述脉冲数的块中的控制增益设定装置的控制增益来校正和更新存储在与脉冲的脉冲数相对应的电压数据表装置中的电源电压值和测量的振荡暂停时间 脉冲数和测量的振荡暂停时间和差值，以便始终 使所有脉冲的脉冲能量连续脉动振荡恒定，进一步提高光学加工精度。