中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

1794 records (took 0.031 seconds)

    APPARATUS FOR PROCESSING A SUBSTRATE
    141.
    发明公开
    APPARATUS FOR PROCESSING A SUBSTRATE 审中-公开

    公开(公告)号：US20230201891A1

    公开(公告)日：2023-06-29

    申请号：US18063387

    申请日：2022-12-08

    Applicant: Semes Co., Ltd.

    Inventor： Youngkyu OH

    IPC: B08B9/032

    CPC classification number: B08B9/0325 ,  B08B9/0323 ,  B08B2209/032

    Abstract: An apparatus for processing a substrate may include a vacuum suction part including vacuum holes configured to apply a vacuum pressure to a rear face of a substrate while a predetermined process is performed on the substrate, and a cleaning part configured to clean the vacuum holes in a cleaning process of cleaning the vacuum holes. The cleaning part may include a cleaning solution supply part configured to provide a cleaning solution into the vacuum holes, and a cleaning solution discharge part configured to discharge the cleaning solution from the vacuum holes.

    Apparatus for treating substrate
    145.
    发明授权
    Apparatus for treating substrate 有权

    公开(公告)号：US11684956B2

    公开(公告)日：2023-06-27

    申请号：US17085988

    申请日：2020-10-30

    Applicant: SEMES CO., LTD.

    Inventor： Cheol Hwan Jeong

    IPC: B08B3/10 ,  B08B5/02 ,  B08B7/04 ,  H01L21/67 ,  B08B15/02

    CPC classification number: B08B3/10 ,  B08B5/02 ,  B08B7/04 ,  H01L21/6719 ,  H01L21/67051 ,  B08B15/02 ,  H01L21/67017

    Abstract: Embodiments of the inventive concept provides an apparatus for treating a substrate. The apparatus for treating a substrate comprises a housing having a process space therein, a substrate support unit supporting a substrate in the space, a liquid supply unit supplying a liquid to a substrate supported by the substrate support unit, an air flow generation unit generating an air flow in the process space, and the air flow generation unit comprises a first gas supply unit supplying a descending air flow of a first gas in the process space and a second gas supply unit supplying a second gas having lower humidity than the first gas in the space, and when viewed from above, the first gas supply unit and the second gas supply unit are not overlapped each other.

    ARTICLE STORAGE EQUIPMENT IN SEMICONDUCTOR FABRICATION FACILITY AND LOGISTICS SYSTEM INCLUDING SAME
    146.
    发明公开
    ARTICLE STORAGE EQUIPMENT IN SEMICONDUCTOR FABRICATION FACILITY AND LOGISTICS SYSTEM INCLUDING SAME 审中-公开

    公开(公告)号：US20230197494A1

    公开(公告)日：2023-06-22

    申请号：US18083635

    申请日：2022-12-19

    Applicant: SEMES CO., LTD.

    Inventor： Sung Ho LEE

    IPC: H01L21/677 ,  H01L21/673

    CPC classification number: H01L21/67769 ,  H01L21/67724 ,  H01L21/67709 ,  H01L21/67389 ,  H01L21/67766

    Abstract: Proposed are article storage equipment in a semiconductor fabrication facility, the article storage equipment being capable of power supply with a more simplified configuration, and a logistics system of a semiconductor fabrication facility including the same. Article storage equipment in a semiconductor fabrication facility according to one aspect includes a storage unit installed around a rail that provides a travel route of a transport vehicle and configured to store a transport container in which a wafer is accommodated, a purge unit configured to supply an inert gas into the transport container, a control unit configured to identify the transport container stored in the storage unit and control the purge unit to supply the inert gas into the transport container, and a power supply unit configured to supply a current induced from a power supply cable installed along the rail to the control unit.

    APPARATUS FOR TRANSPORTING ARTICLE
    147.
    发明公开
    APPARATUS FOR TRANSPORTING ARTICLE 审中-公开

    公开(公告)号：US20230192152A1

    公开(公告)日：2023-06-22

    申请号：US18066681

    申请日：2022-12-15

    Applicant: SEMES CO., LTD.

    Inventor： Nojae PARK

    IPC: B61B13/00 ,  H01L21/677

    CPC classification number: B61B13/00 ,  H01L21/67733

    Abstract: An article transport apparatus includes a traveling portion configured to travel along a rail portion and a mounting portion configured to have a structure suspended under a traveling portion to mount articles thereon, in particular, the rail portion includes a plurality of first straight rails extending in a first direction while being arranged parallel to each other at first intervals, a plurality of second straight rails extending in a second direction perpendicular to the first direction while being arranged parallel to each other at second intervals, and a connecting rail configured to connect between the first straight rails and the second straight rails, which perpendicularly face each other, so that the traveling portion travels between the first straight rails and the second straight rails perpendicularly facing each other.

    TRANSPORT VEHICLE CLEANING DEVICE AND ARTICLE TRANSPORT EQUIPMENT INCLUDING THE SAME
    148.
    发明公开
    TRANSPORT VEHICLE CLEANING DEVICE AND ARTICLE TRANSPORT EQUIPMENT INCLUDING THE SAME 审中-公开

    公开(公告)号：US20230178402A1

    公开(公告)日：2023-06-08

    申请号：US17990726

    申请日：2022-11-20

    Applicant: SEMES CO., LTD.

    Inventor： Sung Ho LEE ,  Ok Kyung KANG ,  No Jae PARK

    IPC: H01L21/677 ,  B08B5/02 ,  H01L21/67

    CPC classification number: H01L21/67733 ,  B08B5/023 ,  H01L21/67051

    Abstract: A transport vehicle cleaning device that cleans a transport vehicle incudes a housing including a cleaning space accommodating the transport vehicle for cleaning, a plurality of fans disposed at an upper part of the housing and generating a downward airflow in the cleaning space, a cleaning gas injector disposed at a ceiling of the housing and injecting a cleaning gas towards the transport vehicle in the cleaning space of the housing, an exhaust unit provided at a lower part of the housing and exhausting the cleaning gas supplied to the cleaning space and a foreign matter removed from the transport vehicle from the cleaning space, and a frame cover disposed in the housing and configured to completely cover opposite openings of the frame in the housing to form a closed internal space of the frame separated from the cleaning space.

    SYSTEM FOR SUPPLYING PHOTORESIST AND METHOD FOR MANAGING PHOTORESIST
    150.
    发明公开
    SYSTEM FOR SUPPLYING PHOTORESIST AND METHOD FOR MANAGING PHOTORESIST 审中-公开

    公开(公告)号：US20230176482A1

    公开(公告)日：2023-06-08

    申请号：US18060629

    申请日：2022-12-01

    Applicant: SEMES CO., LTD.

    Inventor： Hae Kyung KIM ,  Dae Sung Kim ,  Woo Sin Jung

    IPC: G03F7/16 ,  B05C11/10

    CPC classification number: G03F7/16 ,  B05C11/1026 ,  B05C11/1013 ,  B05C11/1036

    Abstract: Provided is a system for supplying a photoresist. In an embodiment, a system for supplying a photoresist includes a pressure adjustment container provided to a supply line connected from a chemical liquid bottle to a first tank, and the pressure adjustment container includes a housing having a space formed therein, a separator separating the space of the housing into a first space and a second space, an inflow port making a photoresist flow in the first space, a discharge port discharging the photoresist from the first space, and a pressurized fluid inflow port supplying a pressurized fluid to the second space, and a volume of the first space varies depending on the supply of the pressurized fluid.

Patent Agency Ranking