公开(公告)号：US6120656A

公开(公告)日：2000-09-19

申请号：US887512

申请日：1997-07-02

申请人： Manabu Okano

发明人： Manabu Okano

IPC分类号： C23C14/34 ,  C23C14/04 ,  C23C14/35 ,  H01J37/34 ,  H02M7/06

CPC分类号： H01J37/3444 ,  C23C14/042 ,  H01J37/3402 ,  H01J37/3405

摘要： Both methods and apparatus are presented for achieving topologically precise thin film coating. The system focuses on coating systems to create compact discs using DC magnetron sputtering to avoid the occurrence of mousebites or visual imperfections at the termination edge on a masked substrate. Circuit elements are added to a switch-mode power supply which acts to substantially reduce reverse currents after the signal is conditioned by rectifying and filtering a switched output. Fast acting diodes, placed in either series or parallel arrangements within the circuit involving the cathode and anode, are used with a low energy storage switch-mode power supply to completely eliminate the occurrence of mousebites on the aluminum coating or the polycarbonate substrate of the compact disc.

摘要翻译： 提出了两种方法和设备，用于实现拓扑精确的薄膜涂层。 该系统专注于涂层系统以使用DC磁控溅射来制造光盘，以避免在掩蔽的基板上的终端边缘处出现小鼠或视觉缺陷。 电路元件被添加到开关模式电源，其在通过对开关输出进行整流和滤波来调节信号之后基本上减小反向电流。 在低电能存储开关模式电源中使用放置在涉及阴极和阳极的电路内的串联或并联装置中的快速作用二极管，以完全消除紧凑的铝涂层或聚碳酸酯基底上的老鼠的发生 光盘。

公开(公告)号：US06113760A

公开(公告)日：2000-09-05

申请号：US355450

申请日：1999-07-28

申请人： Noboru Kuriyama ,  Yutaka Yatsu ,  Nobuaki Utsunomiya ,  Yuji Yasumoto

发明人： Noboru Kuriyama ,  Yutaka Yatsu ,  Nobuaki Utsunomiya ,  Yuji Yasumoto

IPC分类号： H01J37/34 ,  C23C14/34 ,  C23C14/54 ,  H01L21/203 ,  H01L21/285

CPC分类号： H01J37/3444 ,  H01J37/34

摘要： The present invention provides a sputtering power supply apparatus which realizes stable sputtering at a pressure lower than the discharge start pressure, so that scattering of sputtering particles due to collision with sputtering inert gas can be reduced, thereby improving the step coverage and the denseness of the sputter film. According to the present invention, there is provided a sputtering power supply apparatus comprising a sputtering DC power source (A), a constant current circuit (B) connected to the DC power source, a sputtering source (21) connected to the constant current circuit (B), and a control unit (11) for controlling a current output from the constant current circuit (B) so as to be a constant current.

摘要翻译： PCT No.PCT / JP98 / 00692 Sec。 371日期1999年7月28日第 102（e）日期1999年7月28日PCT提交1998年2月19日PCT公布。 第WO98 / 37256号公报 日本1998年8月27日本发明提供一种溅射电源装置，其在低于放电开始压力的压力下实现稳定的溅射，从而可以减少与溅射惰性气体的碰撞引起的溅射颗粒的散射，从而改善步骤覆盖 和溅射膜的致密度。 根据本发明，提供了一种溅射电源装置，包括溅射直流电源（A），连接到直流电源的恒流电路（B），连接到恒流电路的溅射源 （B），以及用于控制从恒流电路（B）输出的电流作为恒定电流的控制单元（11）。

公开(公告)号：US6096174A

公开(公告)日：2000-08-01

申请号：US990953

申请日：1997-12-15

申请人： Gotz Teschner ,  Joachim Szczyrbowski

发明人： Gotz Teschner ,  Joachim Szczyrbowski

IPC分类号： C23C14/34 ,  C23C14/35 ,  H01J37/34 ,  H01L21/316 ,  H01L21/318 ,  C23C14/32 ,  C23C14/54

CPC分类号： H01J37/3444 ,  C23C14/3464 ,  C23C14/352 ,  H01J37/3408 ,  H01L21/31604 ,  H01L21/318

摘要： An apparatus is provided for coating a substrate (24) with thin layers from targets (12, 13) between which a gas discharge plasma is sustained in order to produce the ions necessary for the bombardment of the targets (12, 13) connected to alternating current. The process chamber (6) contains a gas under a specific partial pressure. The targets (12, 13) are connected to a power source in such a circuit so that they alternately form the cathode and anode of the gas discharge. The reversal of the current direction is performed through an H bridge (4) formed of four switches (16 to 19), the conductor (14) connecting the H bridge (4) to a first power source (3) being connected through a branch line (21) to a second power source which can be connected by a switch (20) to ground. All switches (19 to 20) are operated by a control circuit in a regular and variable mode, the ion energy being controlled by the level of the potential difference between the cathode and the coating and the number of ions through the duration of this potential

摘要翻译： 提供了一种用于从其上维持气体放电等离子体的目标（12,13）的薄层涂覆基底（24）的装置，以产生用于轰击连接到交替的靶（12,13）所必需的离子 当前。 处理室（6）含有特定分压下的气体。 目标（12,13）在这种电路中连接到电源，使得它们交替地形成气体放电的阴极和阳极。 通过由四个开关（16至19）形成的H桥（4）进行电流方向的反转，将H桥（4）连接到第一电源（3）的导体（14）通过分支 线路（21）连接到能够通过开关（20）连接到地的第二电源。 所有的开关（19到20）由一个常规和可变模式的控制电路操作，离子能量由阴极和涂层之间的电位差水平控制，并且在该电位的持续时间内离子的数量

公开(公告)号：US5698082A

公开(公告)日：1997-12-16

申请号：US746437

申请日：1996-11-08

申请人： Gotz Teschner ,  Jurgen Bruch

发明人： Gotz Teschner ,  Jurgen Bruch

IPC分类号： H01J37/34 ,  C23C14/34

CPC分类号： H01J37/3444 ,  H01J37/34 ,  H01J2237/0206

摘要： In an apparatus for coating substrates, having sputtering cathodes (4, 5) disposed in a vacuum chamber (1), sputtering targets (6, 7), a medium-frequency generator (9) connected to the cathodes (4, 5), and a system (16) for detecting and suppressing undesired arcing, a cycle of the medium-frequency signal of the medium-frequency generator (9) is divided into a plurality of time segments, the electrical values of current and voltage for a predetermined time segment being determined so as to form a measured value signal and being entered into a ground-free meter island (16). The meter island (16) is tied as a remote station into a circular network (9, 16, 17, 18, 19, 11) whose master station is situated in the control unit (11) present in the generator (9). The blocking of the generator (9) when an arc occurs takes place through a line (19) connecting the meter island (16) to the generator (9). The parameters of the arc surveillance and the detection of measured values are preset through the network (17, 18, 19) by means of software.

摘要翻译： 在用于涂布基板的设备中，具有设置在真空室（1）中的溅射阴极（4,5），溅射靶（6,7），连接到阴极（4,5）的中频发生器（9） 以及用于检测和抑制不期望的电弧的系统（16），中频发生器（9）的中频信号的周期被划分为多个时间段，电流和电压的电值在预定时间 被确定为形成测量值信号并被输入无地面计量岛（16）。 仪表岛（16）作为远程站被连接到其主站位于存在于发电机（9）中的控制单元（11）中的圆形网络（9,16,17,18,19.11）中。 当发生电弧时发电机（9）的阻塞通过将仪表岛（16）连接到发电机（9）的线（19）发生。 通过软件通过网络（17,18,19）预设电弧监视的参数和测量值的检测。

公开(公告)号：US5645698A

公开(公告)日：1997-07-08

申请号：US296093

申请日：1994-08-25

申请人： Manabu Okano

发明人： Manabu Okano

IPC分类号： C23C14/34 ,  C23C14/04 ,  C23C14/35 ,  H01J37/34 ,  H02M7/06

CPC分类号： H01J37/3444 ,  C23C14/042 ,  H01J37/3402 ,  H01J37/3405

摘要： Both methods and apparatus for achieving topologically precise thin film coating. The system focuses on coating systems to create compact discs using DC magnetron sputtering to avoid the occurrence of mousebites or visual imperfections at the termination edge on a masked substrate. Circuit elements are added to a switch-mode power supply which act to substantially reduce reverse currents after the signal is conditioned by rectifying and filtering a switched output. Fast acting diodes, placed in either series or parallel arrangements within the circuit involving the cathode and anode, are used with a low energy storage switch-mode power supply to completely eliminate the occurrence of mousebites on the aluminum coating or the polycarbonate substrate of the compact disc.

摘要翻译： 用于实现拓扑精确薄膜涂层的方法和设备。 该系统专注于涂层系统以使用DC磁控溅射来制造光盘，以避免在掩蔽的基板上的终端边缘处出现小鼠或视觉缺陷。 电路元件被添加到开关模式电源，其在通过对开关输出进行整流和滤波来调节信号之后基本上减小反向电流。 在低电能存储开关模式电源中使用放置在涉及阴极和阳极的电路内的串联或并联装置中的快速作用二极管，以完全消除紧凑的铝涂层或聚碳酸酯基底上的老鼠的发生 光盘。

公开(公告)号：US12112931B2

公开(公告)日：2024-10-08

申请号：US17335011

申请日：2021-05-31

申请人： Advanced Energy Industries, Inc.

发明人： Doug Pelleymounter

IPC分类号： H01J37/34 ,  C23C14/34 ,  C23C14/35 ,  C23C14/56 ,  C23C14/08

CPC分类号： H01J37/3476 ,  C23C14/3485 ,  C23C14/35 ,  C23C14/352 ,  C23C14/562 ,  H01J37/3405 ,  H01J37/3438 ,  H01J37/3444 ,  H01J37/3467 ,  C23C14/083 ,  H01J2237/2485 ,  H01J2237/327 ,  H01J2237/332

摘要： A pulsed power system and a pulsed power sputtering system are disclosed. The pulsed power system includes a first power source that is configured to apply a first voltage at a first power lead that alternates between positive and negative relative to a second power lead during each of multiple cycles. A second power source is coupled to a third power lead and the second power lead, and the second power source is configured to apply a second voltage to the third power lead that alternates between positive and negative relative to the second power lead during each of the multiple cycles. A controller is configured to control the first power source and the second power source to phase-synchronize the first voltage with the second voltage, so both, the first voltage and the second voltage, are simultaneously negative during a portion of each cycle and simultaneously positive relative to the second power lead during another portion of each cycle.

公开(公告)号：US12051578B2

公开(公告)日：2024-07-30

申请号：US17906068

申请日：2021-03-10

申请人： Slovenka Technicka Univerzita V. Bratilasve

发明人： Roman Sykora ,  Jan Sykora ,  Lubomir Caplovic ,  Jana Bohovicova ,  Marcel Mesko

IPC分类号： H01J37/34

CPC分类号： H01J37/3444 ,  H01J37/3405 ,  H01J37/3467

摘要： Connection includes transistor, transistor exciter controlled by the frequency generator and/or programmable unit, the power source of voltage, the unit with capacitors. The voltage power source is connected to the transistor through the unit with capacitors. The stabilizing non-inductive resistor is connected to the power supply branch for the magnetron with transistor. The power stabilizing non-inductive resistor is a resistor with the wire wound by Ayrton-Perry-type winding and/or the resistor with low value of the parasitic inductance on the basis of thin layers. The electronic control circuits of the gate of the transistor include a frequency generator with the cut-off switch and with support elements and also include an exciter with support elements. The connection with the stabilizing non-inductive resistor is used in case of the bipolar and/or multi-circuit pulse plasma generator. The depolarization voltage is led from the outside source through the capacitor to the depolarization block.

公开(公告)号：US20240212980A1

公开(公告)日：2024-06-27

申请号：US18217889

申请日：2023-07-03

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Jaesuk KIM ,  Sangwook PARK ,  Gukrok YUN ,  Kyoungwhan OH

IPC分类号： H01J37/32 ,  H01J37/34

CPC分类号： H01J37/3211 ,  H01J37/3244 ,  H01J37/3444 ,  H01J37/3455 ,  H01J37/3461 ,  H01J37/3435

摘要： Provided a plasma process apparatus including a chamber including a plasma processing space, a substrate stage included in the chamber, the substrate stage including a seating surface, a target including deposition particles to be deposited on the substrate, a gas supplier configured to supply gas into the chamber, a plasma generator configured to generate plasma from the gas, the plasma generator configured to deposit the deposition particles on the substrate through the plasma, at least one permanent magnet on the target being rotatable and configured to distribute the plasma on the target through a magnetic field, and a coil assembly on an outer wall of the chamber and assembly including first through third side coils inclined and being configured to generate first through third vectors, respectively, and the coil assembly being configured to generate a magnetic field vector guiding the plasma through a combination of the first through third vectors.

公开(公告)号：US11823859B2

公开(公告)日：2023-11-21

申请号：US17127527

申请日：2020-12-18

申请人： IonQuest Corp.

发明人： Bassam Hanna Abraham

IPC分类号： H01J37/34 ,  C23C14/34 ,  C23C14/35 ,  C23C14/14 ,  C23C14/00 ,  C23C14/06 ,  H01J37/32

CPC分类号： H01J37/3444 ,  C23C14/0057 ,  C23C14/0605 ,  C23C14/14 ,  C23C14/345 ,  C23C14/3485 ,  C23C14/35 ,  C23C14/354 ,  H01J37/321 ,  H01J37/3405 ,  H01J37/345 ,  H01J37/3417 ,  H01J37/3426 ,  H01J37/3435 ,  H01J37/3452 ,  H01J37/3455 ,  H01J37/3464 ,  H01J37/3467

摘要： A method of sputtering a layer on a substrate using a high-energy density plasma (HEDP) magnetron includes positioning the magnetron in a vacuum with an anode, cathode target, magnet assembly, substrate, and feed gas; applying unipolar negative direct current (DC) voltage pulses from a pulse power supply with a pulse forming network (PFN) to a pulse converting network (PCN); and adjusting an amplitude and frequency associated with the plurality of unipolar negative DC voltage pulses causing a resonance mode associated with the PCN. The PCN converts the unipolar negative DC voltage pulses to an asymmetric alternating current (AC) signal that generates a high-density plasma discharge on the HEDP magnetron. An increase in amplitude or pulse duration of the plurality of unipolar negative DC voltage pulses causes an increase in the amplitude of a negative voltage of the asymmetric AC signal in response to the PCN being in the resonance mode, thereby causing sputtering discharge associated with the HEDP magnetron to form the layer from the cathode target on the substrate. A corresponding apparatus and computer-readable medium are disclosed.

公开(公告)号：US20180358213A1

公开(公告)日：2018-12-13

申请号：US16006357

申请日：2018-06-12

申请人： Starfire Industries LLC

发明人： David N. Ruzic ,  Robert Andrew Stubbers ,  Brian Edward Jurczyk

IPC分类号： H01J37/34

CPC分类号： H01J37/3467 ,  H01J37/3405 ,  H01J37/3414 ,  H01J37/3444

摘要： An electrical power pulse generator system and a method of the system's operation are described herein. A main energy storage capacitor supplies a negative DC power and a kick energy storage capacitor supplies a positive DC power. A main pulse power transistor is interposed between the main energy storage capacitor and an output pulse rail and includes a main power transmission control input for controlling power transmission from the main energy storage capacitor to the output pulse rail. A positive kick pulse power transistor is interposed between the kick energy storage capacitor and the output pulse rail and includes a kick power transmission control input for controlling power transmission from the kick energy storage capacitor to the output pulse rail. A positive kick pulse power transistor control line is connected to the kick power transmission control input of the positive kick pulse transistor.