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    Preparation and properties of Cr-C-P hard coatings annealed at high temperature for high temperature applications
    12.
    发明授权
    Preparation and properties of Cr-C-P hard coatings annealed at high temperature for high temperature applications 有权
    用于高温应用的在高温下退火的Cr-C-P硬涂层的制备和性能

    公开(公告)号：US07910231B2

    公开(公告)日：2011-03-22

    申请号：US11977147

    申请日：2007-10-23

    申请人： Christopher A. Schuh ,  Marcelo J. L. Gines

    发明人： Christopher A. Schuh ,  Marcelo J. L. Gines

    IPC分类号： B32B9/00

    CPC分类号： C22C27/06 ,  C25D3/06 ,  C25D5/50 ,  Y10T428/24802

    摘要： Chromium plating from the trivalent state is relatively environmentally friendly as compared to a hexavalent chromium bath. Incorporation of non-metallic and metalloid elements into the coating should lead to enhanced properties. The relationship between composition, structure, and properties of annealed Cr—C—P layers electrodeposited from chromium-based trivalent baths is discussed. These coatings are amorphous in the as-deposited state, but upon thermal treatments, chromium nanocrystallization, as well as precipitation of carbides and phosphides occurs. Incorporation of phosphorous strongly influences the structural evolution and mechanical properties. Electroplated Cr—C alloy coatings exhibit significant increases in hardness and strength, when exposed to temperatures up to about 600° C., owing to the evolution of their nanostructure. This evolution can be shifted to higher temperatures (approaching 850° C.), through a ternary addition of phosphorous. The resulting Cr—C—P coatings may be suitable for applications at higher service temperatures, where more conventional Cr-based coatings soften rapidly.

    摘要翻译： 与六价铬浴相比，来自三价态的镀铬相对环境友好。 将非金属和准金属元素掺入涂层应导致增强的性能。 讨论了从铬基三价电泳沉积的退火Cr-C-P层的组成，结构和性能之间的关系。 这些涂层在沉积状态下是无定形的，但是在热处理时，会发生铬纳米结晶，以及碳化物和磷化物的析出。 磷的结合强烈地影响结构演化和机械性能。 由于其纳米结构的演变，电镀Cr-C合金涂层在暴露于高达约600℃的温度时表现出显着的硬度和强度增加。 这种演变可以通过三元加成磷转移到更高的温度（接近850℃）。 所得到的Cr-C-P涂层可能适用于较高使用温度的应用，其中更常规的Cr基涂层迅速软化。

    Methods for tailoring the surface topography of a nanocrystalline or amorphous metal or alloy and articles formed by such methods
    13.
    发明申请
    Methods for tailoring the surface topography of a nanocrystalline or amorphous metal or alloy and articles formed by such methods 审中-公开
    用于调整纳米晶体或无定形金属或合金的表面形貌的方法以及通过这些方法形成的制品

    公开(公告)号：US20100282613A1

    公开(公告)日：2010-11-11

    申请号：US11985569

    申请日：2007-11-15

    申请人： Christopher A. Schuh ,  Shiyun Ruan

    发明人： Christopher A. Schuh ,  Shiyun Ruan

    IPC分类号： C25D5/10 ,  C25F3/02 ,  C25D5/48

    CPC分类号： C25D5/48 ,  B23H9/008 ,  C25D5/18 ,  C25F3/08 ,  C25F3/14

    摘要： Electrochemical etching tailors topography of a nanocrystalline or amorphous metal or alloy, which may be produced by any method including, by electrochemical deposition. Common etching methods can be used. Topography can be controlled by varying parameters that produce the item or the etching parameters or both. The nanocrystalline article has a surface comprising at least two elements, at least one of which is metal, and one of which is more electrochemically active than the others. The active element has a definite spatial distribution in the workpiece, which bears a predecessor spatial relationship to the specified topography. Etching removes a portion of the active element preferentially, to achieve the specified topography. Control is possible regarding: roughness, color, particularly along a spectrum from silver through grey to black, reflectivity and the presence, distribution and number density of pits and channels, as well as their depth, width, size. Processing parameters that have been correlated in the Ni—W system to topography features include, for both the deposition phase and the etching phase of a nanocrystalline surface: duty cycle, current density, deposition duration, plating chemistry, polarity ratio. The relative influence of the processing parameters can be noted and correlated to establish a relationship between values for processing parameters and degree of topography feature. Control can be established over the topography features. Correlation can be made for any such system that exhibits a definite spatial distribution of an active element that bears a predecessor spatial relationship to a desired topography feature.

    摘要翻译： 电化学蚀刻定制纳米晶体或非晶态金属或合金的形貌，其可以通过任何方法产生，包括通过电化学沉积。 可以使用常用的蚀刻方法。 地形可以通过产生项目或蚀刻参数的变化参数或两者来控制。 纳米晶体制品具有包括至少两个元素的表面，其中至少一个是金属，并且其中之一比其他元素更具有电化学活性。 活动元件在工件上具有一定的空间分布，与指定的地形具有先前的空间关系。 蚀刻优先移除有效元件的一部分，以实现指定的形貌。 控制是可能的：粗糙度，颜色，特别是从银色到灰色到黑色的光谱，反射率以及凹坑和通道的存在，分布和数量密度，以及它们的深度，宽度，尺寸。 在Ni-W系统中与地形特征相关的处理参数包括对于纳米晶体表面的沉积阶段和蚀刻阶段：占空比，电流密度，沉积持续时间，电镀化学，极性比。 可以注意和相关处理参数的相对影响，以建立处理参数值和地形特征度之间的关系。 可以在地形特征上建立控制。 可以对任何这样的系统进行相关性，该系统表现出与期望的地形特征呈现前一空间关系的有源元件的确定的空间分布。

    ELECTRODEPOSITION BATHS AND SYSTEMS
    18.
    发明申请
    ELECTRODEPOSITION BATHS AND SYSTEMS 审中-公开
    电沉积池和系统

    公开(公告)号：US20110220511A1

    公开(公告)日：2011-09-15

    申请号：US12723044

    申请日：2010-03-12

    申请人： Nazila Dadvand ,  Christopher A. Schuh ,  Alan C. Lund ,  Jonathan C. Trenkle ,  John Cahalen

    发明人： Nazila Dadvand ,  Christopher A. Schuh ,  Alan C. Lund ,  Jonathan C. Trenkle ,  John Cahalen

    IPC分类号： C25D3/56 ,  C25D17/00

    CPC分类号： C25D5/10 ,  C25D3/64 ,  C25D5/18

    摘要： Electrodeposition baths and systems. The baths and systems are useful for forming coated articles. The articles may include a base material and a coating comprising silver formed thereon. In some embodiments, the coating comprises a silver-based alloy, such as a silver-tungsten alloy. The coating may, in some instances, include at least two layers. For example, the coating may include a first layer comprising a silver-based alloy and a second layer comprising a precious metal. The coating can exhibit desirable properties and characteristics such as durability (e.g., wear), hardness, corrosion resistance, and high conductivity, which may be beneficial, for example, in electrical and/or electronic applications. In some cases, the coating may be applied using an electrodeposition process.

    摘要翻译： 电沉积浴和系统。 浴和系统对于形成涂层制品是有用的。 制品可以包括基材和包含形成在其上的银的涂层。 在一些实施例中，涂层包括银基合金，例如银 - 钨合金。 在一些情况下，涂层可以包括至少两层。 例如，涂层可以包括包含银基合金的第一层和包含贵金属的第二层。 涂层可以表现出期望的性能和特性，例如在电和/或电子应用中可能有益的耐久性（例如耐磨性），硬度，耐腐蚀性和高导电性。 在一些情况下，可以使用电沉积工艺涂覆涂层。

    ELECTRODEPOSITED ALLOYS AND METHODS OF MAKING SAME USING POWER PULSES
    19.
    发明申请
    ELECTRODEPOSITED ALLOYS AND METHODS OF MAKING SAME USING POWER PULSES 审中-公开
    电沉积合金及其使用电源脉冲制造相同方法

    公开(公告)号：US20110083967A1

    公开(公告)日：2011-04-14

    申请号：US12579062

    申请日：2009-10-14

    申请人： Shiyun Ruan ,  Christopher A. Schuh

    发明人： Shiyun Ruan ,  Christopher A. Schuh

    IPC分类号： C25D3/56 ,  C22C21/00

    CPC分类号： C25D3/665 ,  C25C3/06 ,  C25C3/18 ,  C25D3/44 ,  C25D3/56 ,  C25D3/66 ,  C25D5/10 ,  C25D5/18 ,  C25D21/12

    摘要： Power pulsing, such as current pulsing, is used to control the structures of metals and alloys electrodeposited in non-aqueous electrolytes. Using waveforms containing different types of pulses: cathodic, off-time and anodic, internal microstructure, such as grain size, phase composition, phase domain size, phase arrangement or distribution and surface morphologies of the as-deposited alloys can be tailored. Additionally, these alloys exhibit superior macroscopic mechanical properties, such as strength, hardness, ductility and density. Waveform shape methods can produce aluminum alloys that are comparably hard (about 5 GPa and as ductile (about 13% elongation at fracture) as steel yet nearly as light as aluminum; or, stated differently, harder than aluminum alloys, yet lighter than steel, at a similar ductility. Al—Mn alloys have been made with such strength to weight ratios. Additional properties can be controlled, using the shape of the current waveform.

    摘要翻译： 使用诸如电流脉冲的功率脉冲来控制电沉积在非水电解质中的金属和合金的结构。 使用包含不同类型脉冲的波形：阴极，关断时间和阳极，可以定制内部微结构，例如晶粒尺寸，相组成，相域尺寸，相位布置或分布以及沉积合金的表面形貌。 另外，这些合金表现出优异的宏观力学性能，例如强度，硬度，延展性和密度。 波形形状方法可以产生相当硬（约5GPa）和作为延性（约13％的断裂伸长率）的铝合金，但几乎与铝一样轻;或者说不同于铝合金比钢更硬， 以类似的延展性制造Al-Mn合金，其重量比可以通过使用电流波形的形状来控制。

    Preparation and properties of CR-C-P hard coatings annealed at high temperature for high temperature applications
    20.
    发明申请
    Preparation and properties of CR-C-P hard coatings annealed at high temperature for high temperature applications 有权
    用于高温应用的高温退火的CR-C-P硬质涂层的制备和性能

    公开(公告)号：US20080166531A1

    公开(公告)日：2008-07-10

    申请号：US11977147

    申请日：2007-10-23

    申请人： Christopher A. Schuh ,  Marcelo J.L. Gines

    发明人： Christopher A. Schuh ,  Marcelo J.L. Gines

    IPC分类号： B32B33/00 ,  C23C16/52

    CPC分类号： C22C27/06 ,  C25D3/06 ,  C25D5/50 ,  Y10T428/24802

    摘要： Chromium plating from the trivalent state is relatively environmentally friendly as compared to a hexavalent chromium bath. Incorporation of non-metallic and metalloid elements into the coating should lead to enhanced properties. The relationship between composition, structure, and properties of annealed Cr—C—P layers electrodeposited from chromium-based trivalent baths is discussed. These coatings are amorphous in the as-deposited state, but upon thermal treatments, chromium nanocrystallization, as well as precipitation of carbides and phosphides occurs. Incorporation of phosphorous strongly influences the structural evolution and mechanical properties. Electroplated Cr—C alloy coatings exhibit significant increases in hardness and strength, when exposed to temperatures up to about 600° C., owing to the evolution of their nanostructure. This evolution can be shifted to higher temperatures (approaching 850° C.), through a ternary addition of phosphorous. The resulting Cr—C—P coatings may be suitable for applications at higher service temperatures, where more conventional Cr-based coatings soften rapidly.

    摘要翻译： 与六价铬浴相比，来自三价态的镀铬相对环境友好。 将非金属和准金属元素掺入涂层应导致增强的性能。 讨论了从铬基三价电泳沉积的退火Cr-C-P层的组成，结构和性能之间的关系。 这些涂层在沉积状态下是无定形的，但是在热处理时，会发生铬纳米结晶，以及碳化物和磷化物的析出。 磷的结合强烈地影响结构演化和机械性能。 由于其纳米结构的演变，电镀Cr-C合金涂层在暴露于高达约600℃的温度时表现出显着的硬度和强度增加。 这种演变可以通过三元加成磷转移到更高的温度（接近850℃）。 所得到的Cr-C-P涂层可能适用于较高使用温度的应用，其中更常规的Cr基涂层迅速软化。