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    ANALYTE DETECTION METHOD AND ANALYTE DETECTION INTEGRATED CIRCUIT
    11.
    发明申请
    ANALYTE DETECTION METHOD AND ANALYTE DETECTION INTEGRATED CIRCUIT 审中-公开
    分析检测方法和分析检测集成电路

    公开(公告)号：US20130053268A1

    公开(公告)日：2013-02-28

    申请号：US13570864

    申请日：2012-08-09

    Applicant: Filip FREDERIX ,  Friso Jacobus JEDEMA ,  David VAN STEENWINCKEL ,  Hilco SUY

    Inventor： Filip FREDERIX ,  Friso Jacobus JEDEMA ,  David VAN STEENWINCKEL ,  Hilco SUY

    IPC: C40B30/04 ,  C40B40/10 ,  C40B40/06 ,  C40B50/14

    CPC classification number: G01N33/5438 ,  C12Q1/6825 ,  G01N27/4145

    Abstract: A method for providing an integrated circuit such that first and second sensing electrodes respectively have at their surfaces first and second receptor molecules for selectively binding to first and second analytes of interest; exposing the integrated circuit to a sample potentially comprising at least one of the first and second analytes, providing a first bead having a first electrical signature attached to a first molecule having a conformation/affinity for binding to the first sensing electrode dependent on the presence of the first analyte; providing a second bead having a second electrical signature attached to a second molecule having a conformation/affinity for binding to the second sensing electrode dependent on the presence of the second analyte; and determining the presence of the electrical signature of the first and/or second bead(s) on the first and second sensing electrodes respectively. An IC for implementing this method.

    Abstract translation: 一种用于提供集成电路的方法，使得第一感测电极和第二感测电极在其表面分别具有第一和第二受体分子，用于选择性地结合感兴趣的第一和第二分析物; 将集成电路暴露于潜在地包含第一和第二分析物中的至少一种分析物的样品，提供第一珠，其具有连接到具有结合/亲和力的第一分子的第一电特征，所述第一分子具有结合到第一感测电极，取决于是否存在 第一个分析物; 根据第二分析物的存在，提供第二珠，其具有连接到具有与第二感测电极结合的构象/亲和力的第二分子的第二电特征; 以及分别确定第一和第二感测电极上的第一和/或第二珠的电特征的存在。 用于实现该方法的IC。

    Display Device
    12.
    发明申请
    Display Device 有权
    显示设备

    公开(公告)号：US20120105311A1

    公开(公告)日：2012-05-03

    申请号：US13056116

    申请日：2009-07-27

    Applicant: Benoit Bataillou ,  Radu Surdeanu ,  Pascal Bancken ,  David van Steenwinckel ,  Viet Nguyen Hoang

    Inventor： Benoit Bataillou ,  Radu Surdeanu ,  Pascal Bancken ,  David van Steenwinckel ,  Viet Nguyen Hoang

    IPC: G09G3/00

    CPC classification number: G02F1/19 ,  G02F1/0147 ,  G02F1/23 ,  G02F2203/10 ,  G09G2300/00

    Abstract: A display device comprises a substrate which carries an array of pixels. Each pixel comprises an array of apertures in the substrate, each aperture of the array having a maximum opening dimension less than the wavelength of the light to be transmitted through the aperture. The effective dielectric constant of the aperture and/or the dielectric constant of the substrate is varied, thereby to vary the light transmission characteristics of the pixel between transmission of at least one frequency in the visible spectrum and transmission of substantially no frequency in the visible spectrum.

    Abstract translation: 显示装置包括承载像素阵列的基板。 每个像素包括衬底中的孔阵列，阵列的每个孔具有小于要透过孔的光的波长的最大开口尺寸。 孔的有效介电常数和/或介质的介电常数发生变化，从而改变可见光谱中的至少一个频率的透射之间像素的透光特性以及可见光谱中基本上没有频率的透射 。

    Lithographic method
    13.
    发明授权
    Lithographic method 有权
    平版印刷法

    公开(公告)号：US07897324B2

    公开(公告)日：2011-03-01

    申请号：US12065926

    申请日：2006-09-05

    Applicant: Peter Zandbergen ,  Jeroen H Lammers ,  David Van Steenwinckel

    Inventor： Peter Zandbergen ,  Jeroen H Lammers ,  David Van Steenwinckel

    IPC: G03F7/40 ,  G03F1/00

    CPC classification number: G03F7/0392

    Abstract: The present invention provides a method of lithographic patterning in order to the strength of the patterned photoresist. The method comprises: applying to a surface to be patterned a photoresist (18) comprising a polymer resin, a photocatalyst generator which generates a catalyst on exposure to actinic radiation, and a quencher; and exposing the photoresist (18) to actinic radiation through a mask pattern (12). This is followed, in either order, by carrying out a post-exposure bake; and developing the photoresist (18) with a developer to remove a portion of the photoresist which has been exposed to the actinic radiation. The polymer resin is substantially insoluble in the developer prior to exposure to actinic radiation and rendered soluble in the developer by the action of the catalyst, and wherein the polymer resin is crosslinked by the action of the quencher during the bake.

    Abstract translation: 本发明提供了一种平版印刷图案化方法，以便图案化光致抗蚀剂的强度。 该方法包括：向待图案化的表面施加包含聚合物树脂的光致抗蚀剂（18），在曝光于光化辐射时产生催化剂的光催化剂产生剂和猝灭剂; 以及通过掩模图案（12）将光致抗蚀剂（18）暴露于光化辐射。 接下来，按照任何顺序，通过进行曝光后烘烤; 以及用显影剂显影光致抗蚀剂（18）以去除已经暴露于光化辐射的光致抗蚀剂的一部分。 聚合物树脂在暴露于光化辐射之前基本上不溶于显影剂，并通过催化剂的作用使其溶解在显影剂中，并且其中聚合物树脂在烘烤期间通过猝灭剂的作用而交联。

    Lithographic Method
    15.
    发明申请
    Lithographic Method 有权
    平版方法

    公开(公告)号：US20080131820A1

    公开(公告)日：2008-06-05

    申请号：US11720315

    申请日：2005-11-10

    Applicant: David Van Steenwinckel ,  Peter Zandbergen

    Inventor： David Van Steenwinckel ,  Peter Zandbergen

    IPC: G03F7/40

    CPC classification number: G03F7/30 ,  G03F7/095 ,  G03F7/32

    Abstract: A method of achieving frequency doubled lithographic patterning is described. An optical pattern (16) having a first period (p1) is used to expose conventional acid-catalysed photoresist (18) on substrate (20), leaving regions of high exposure (24), regions of low exposure (26) and intermediate regions (22). Processing proceeds leaving regions (24) which received high exposure very polar, i.e. hydrophilic, regions (26) of low exposure very apolar, i.e. hydrophobic, and the intermediate regions having intermediate polarity. A developer propylene glycol methyl ether acetate is then used to dissolve only the intermediate regions (22) leaving photoresist patterned to have a pitch (p2) half that of the optical period (p1). Alternatively, the photoresist is removed from the apolar and polar regions leaving only the intermediate regions (22) again with the same pitch (p2) half that of the optical period (p1).

    Abstract translation: 描述了实现倍频光刻图案的方法。 使用具有第一周期（p <1> 1）的光学图案（16）来曝光基底（20）上的常规酸催化的光致抗蚀剂（18），留下高曝光区域（24） 低曝光（26）和中间区域（22）。 处理进行离开区域（24），其接收高暴露非常极性，即亲水性低暴露非极性（即疏水性）的区域（26），并且具有中等极性的中间区域。 然后使用显影剂丙二醇甲基醚乙酸酯仅溶解中间区域（22），使光致抗蚀剂图案化成具有光学周期（p <1> / SUB>）。 或者，光致抗蚀剂从非极性区域和极性区域移除，仅再次以中间区域（22）的光学周期（p <1/2）的相同间距（p <2> 2） SUB>）。

    Analyte detection method and analyte detection integrated circuit
    16.
    发明授权
    Analyte detection method and analyte detection integrated circuit 有权

    公开(公告)号：US10041940B2

    公开(公告)日：2018-08-07

    申请号：US13570864

    申请日：2012-08-09

    Applicant: Filip Frederix ,  Friso Jacobus Jedema ,  David Van Steenwinckel ,  Hilco Suy

    Inventor： Filip Frederix ,  Friso Jacobus Jedema ,  David Van Steenwinckel ,  Hilco Suy

    IPC: G01N33/543 ,  C12Q1/6825 ,  G01N27/414

    Abstract: A method for providing an integrated circuit such that first and second sensing electrodes respectively have at their surfaces first and second receptor molecules for selectively binding to first and second analytes of interest; exposing the integrated circuit to a sample potentially comprising at least one of the first and second analytes, providing a first bead having a first electrical signature attached to a first molecule having a conformation/affinity for binding to the first sensing electrode dependent on the presence of the first analyte; providing a second bead having a second electrical signature attached to a second molecule having a conformation/affinity for binding to the second sensing electrode dependent on the presence of the second analyte; and determining the presence of the electrical signature of the first and/or second bead(s) on the first and second sensing electrodes respectively. An IC for implementing this method.

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