公开(公告)号：US20070257207A1

公开(公告)日：2007-11-08

申请号：US10576547

申请日：2004-10-19

Applicant: Jurgen Frosien ,  Stefan Lanio ,  Helmut Banzhof

Inventor： Jurgen Frosien ,  Stefan Lanio ,  Helmut Banzhof

IPC: H01J37/09

CPC classification number: H01J37/09 ,  H01J2237/0455

Abstract: The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.

Abstract translation: 本发明涉及一种用于检查或构造包括带电粒子束源（5）以产生带电粒子束（7）的样本（3）的带电粒子束装置（1），聚焦透镜（9） 带电粒子束（7）到样品（3）上，以及孔径系统（13），用于限定带电粒子束（7）的孔（6）。 孔径系统（13）包括阻挡带电粒子束源（5）和聚焦透镜（9）之间的带电粒子束（7）的第一部分（7a）的第一构件（20），第二构件 （30）阻挡所述带电粒子束源（5）和所述聚焦透镜（9）之间的带电粒子束（7）的第二部分（7b），用于移动所述第一构件（20）的第一装置（24） 以调节带电粒子束（7）的阻塞的第一部分（7a）的尺寸，以及用于独立于第一部分（7b）移动第二部件（30）的第二装置（34）。 利用这种孔径系统（13），可以在操作期间自由地调整孔径（6）的尺寸并将其对准光轴（8）。

公开(公告)号：US07282711B2

公开(公告)日：2007-10-16

申请号：US10491939

申请日：2002-10-04

Applicant: Dieter Winkler ,  Pavel Adamec ,  Achim Göhl ,  Helmut Banzhof

Inventor： Dieter Winkler ,  Pavel Adamec ,  Achim Göhl ,  Helmut Banzhof

IPC: H01J37/21

CPC classification number: H01J37/28 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/216 ,  H01J2237/2446 ,  H01J2237/2826 ,  H01J2237/30433 ,  H01J2237/3045

Abstract: The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to generate multiple primary electron beams (14), an electron sensor (12) with electron sensor segments (12a) to detect electrons of the primary electron beams (14) and at least one anode (7) to direct the primary electron beams (14) towards the electron sensor (12). The electron sensor (12) serves to inspect the primary electron beams (14), calibrate the positions of the primary electron beams (14) and possibly adjust final focus length (13) and currents of the primary electron beams before or after a probing or structuring the upper surface (20a) of a non-transparent specimens (20). Further, methods to inspect primary electron beams (14), to adjust final focus lengths (13) and to calibrate the multiple electron beam device (1) are provided.

Abstract translation: 本发明提供了用于用具有电子束源阵列（3）的一次电子束（14）探测或构造非透明样品（20）以产生多个一次电子束（14）的电子多光束装置（1）， 电子传感器（12），其具有用于检测一次电子束（14）的电子和至少一个阳极（7）的电子传感器段（12a），以将一次电子束（14）引向电子传感器（12）。 电子传感器（12）用于检查一次电子束（14），校准一次电子束（14）的位置，并可能在探测之前或之后校准一次电子束的最终聚焦长度（13）和电流 构造不透明样品（20）的上表面（20a）。 此外，提供了检查一次电子束（14），调整最终聚焦长度（13）和校准多个电子束装置（1）的方法。

公开(公告)号：US20110253893A1

公开(公告)日：2011-10-20

申请号：US13089059

申请日：2011-04-18

Applicant: Helmut BANZHOF

Inventor： Helmut BANZHOF

IPC: G01N23/225

CPC classification number: H01J37/28 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/2809 ,  H01J2237/2814

Abstract: A charged particle beam device is provided, including: a charged particle beam source adapted to generate a charged particle beam on an axis; an optical aberration correction device and an objective lens device, which define a corrected beam aperture angle adjusted to reduce diffraction; and a charged particle beam tilting device; wherein the optical aberration correction device and the objective lens device are adapted to provide the charged particle beam with a beam aperture angle smaller than the corrected beam aperture angle; and wherein the charged particle beam tilting device is adapted to provide a beam tilt angle which is equal or less than the corrected beam aperture angle. Further, a method of operating a charged particle beam device is provided.

Abstract translation: 提供带电粒子束装置，包括：带电粒子束源，适于在轴上产生带电粒子束; 光学像差校正装置和物镜装置，其限定校正后的光束孔径角度，以减小衍射; 和带电粒子束倾斜装置; 其中所述光学像差校正装置和所述物镜装置适于为所述带电粒子束提供小于校正的光束孔径角的光束孔径角; 并且其中所述带电粒子束倾斜装置适于提供等于或小于所述校正光束孔径角的光束倾斜角度。 此外，提供了一种操作带电粒子束装置的方法。

公开(公告)号：US07800075B2

公开(公告)日：2010-09-21

申请号：US12194220

申请日：2008-08-19

Applicant: Benyamin Buller ,  William J. DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard L. Lozes ,  Henry Thomas Pearce-Percy ,  Dieter Winkler ,  Steven T. Coyle ,  Helmut Banzhof

Inventor： Benyamin Buller ,  William J. DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard L. Lozes ,  Henry Thomas Pearce-Percy ,  Dieter Winkler ,  Steven T. Coyle ,  Helmut Banzhof

IPC: G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/42

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31754

Abstract: A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.

Abstract translation: 用于电子束柱的多功能模块包括上电极和下电极以及中心环电极。 上电极和下电极具有多极并且能够偏转或校正通过电极的电子束的像差。 可以独立于施加到上电极和下电极的电压而将电压施加到中心环电极，以将电子束聚焦在衬底上。

公开(公告)号：US20100200748A1

公开(公告)日：2010-08-12

申请号：US12701463

申请日：2010-02-05

Applicant: Pavel ADAMEC ,  Helmut BANZHOF ,  Ivo LISKA

Inventor： Pavel ADAMEC ,  Helmut BANZHOF ,  Ivo LISKA

IPC: G01N23/22

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/2446

Abstract: It is provided a charged particle beam device for inspecting a specimen, comprising a charged particle beam source adapted to generate a primary charged particle beam; an objective lens device adapted to direct the primary charged particle beam onto the specimen; and a detector device comprising one or more charged particle detectors adapted to detect a secondary charged particle beam generated by the primary charged particle beam at the specimen and passing through the objective lens device, the secondary charged particle beam comprising a first group of secondary charged particles starting from the specimen with high starting angles and a second group of secondary charged particles starting from the specimen with low starting angles; wherein at least one of the charged particle detectors is adapted to detect depending on the starting angles one group of the first and the second groups of secondary charged particles.

Abstract translation: 提供了一种用于检查样本的带电粒子束装置，包括适于产生初级带电粒子束的带电粒子束源; 适于将初级带电粒子束引导到样本上的物镜装置; 以及检测器装置，其包括一个或多个带电粒子检测器，其适于检测在所述样本处由所述初级带电粒子束产生的并通过所述物镜装置的次级带电粒子束，所述次级带电粒子束包括第一组次级带电粒子 从具有较高起始角度的样品开始，第二组二次带电粒子从起始角低的样品开始; 其中所述带电粒子检测器中的至少一个适于根据起始角度检测一组第一和第二组次级带电粒子。

公开(公告)号：US20090146074A1

公开(公告)日：2009-06-11

申请号：US12277818

申请日：2008-11-25

Applicant: Helmut BANZHOF ,  Juergen FROSIEN ,  Dieter WINKLER

Inventor： Helmut BANZHOF ,  Juergen FROSIEN ,  Dieter WINKLER

IPC: H01J3/14

CPC classification number: H01J37/04 ,  H01J37/28 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/0492 ,  H01J2237/08 ,  H01J2237/0807

Abstract: A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.

Abstract translation: 描述了具有气体场离子源的聚焦离子束装置的操作方法。 根据一些实施例，该方法包括从气体场离子源发射离子束，在离子束列中提供高于最终光束能量的离子束柱离子束能量，使离子束减速以提供最终光束 将离子束撞击在1keV至4keV的样品上的能量，并对样品进行成像。

公开(公告)号：US20080308751A1

公开(公告)日：2008-12-18

申请号：US12194220

申请日：2008-08-19

Applicant: Benyamin Buller ,  William J. DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard L. Lozes ,  Henry Thomas Pearce-Percy ,  Dieter Winkler ,  Steven T. Coyle ,  Helmut Banzhof

Inventor： Benyamin Buller ,  William J. DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard L. Lozes ,  Henry Thomas Pearce-Percy ,  Dieter Winkler ,  Steven T. Coyle ,  Helmut Banzhof

IPC: A61N5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31754

Abstract: A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.

Abstract translation: 用于电子束柱的多功能模块包括上电极和下电极以及中心环电极。 上电极和下电极具有多极并且能够偏转或校正通过电极的电子束的像差。 可以独立于施加到上电极和下电极的电压而将电压施加到中心环电极，以将电子束聚焦在衬底上。

公开(公告)号：US20080258060A1

公开(公告)日：2008-10-23

申请号：US11923407

申请日：2007-10-24

Applicant: JUERGEN FROSIEN ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

Inventor： JUERGEN FROSIEN ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

IPC: G01N23/00

CPC classification number: H01J37/1478 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/2448 ,  H01J2237/26 ,  H01J2237/2806 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.

Abstract translation: 提供带电粒子束装置，其包括用于产生初级带电粒子束的带电粒子束柱; 聚焦组件，例如带电粒子透镜，例如静电透镜，用于将初级带电粒子束聚焦在样本上; 用于检测从样本出现的带电信号颗粒的检测器; 以及用于偏转初级带电粒子束的偏转器装置。 偏转器布置布置在聚焦组件的下游，并且适于允许带电信号颗粒通过其中。 检测器在由后聚焦偏转器布置限定的偏转方向上相对于光轴横向移位。

公开(公告)号：US07427765B2

公开(公告)日：2008-09-23

申请号：US11243363

申请日：2005-10-03

Applicant: Benyamin Buller ,  William J. DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard L. Lozes ,  Henry Thomas Pearce-Percy ,  Dieter Winkler ,  Steven T. Coyle ,  Helmut Banzhof

Inventor： Benyamin Buller ,  William J. DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard L. Lozes ,  Henry Thomas Pearce-Percy ,  Dieter Winkler ,  Steven T. Coyle ,  Helmut Banzhof

IPC: A61N5/00 ,  G21G5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31754

Abstract: An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.

Abstract translation: 电子束柱包括产生电子束的热场发射电子源，电子束消除器，光束整形模块和包括多个电子束透镜的电子束光学器件。 在一个版本中，电子束消隐器，光束整形模块和电子束光学器件的光学参数被设置为实现约¼至约3mrads的接受半角β，其中接受半角β是一半 在写平面处电子束对着的角度。 光束成形模块也可以使用上下投影透镜作为单个透镜进行操作。 还描述了用于电子束柱的多功能模块。

公开(公告)号：US20080185514A1

公开(公告)日：2008-08-07

申请号：US11925598

申请日：2007-10-26

Applicant: JUERGEN FROSIEN ,  Helmut Banzhof

Inventor： JUERGEN FROSIEN ,  Helmut Banzhof

IPC: B01D59/44

CPC classification number: H01J49/288 ,  H01J37/05 ,  H01J37/08 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/0805 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: An ion beam device is described. The ion beam device includes an ion beam source for generating an ion beam, the ion beam being emitted along a first axis, an aperture unit adapted to shape the ion beam, and an achromatic deflection unit adapted to deflect ions of the ion beam having a predetermined mass by a deflecting angle. The achromatic deflection unit includes: an electric field generating component for generating an electric field, and a magnetic field generating component for generating a magnetic field substantially perpendicular to the electric field. The device further includes a mass separation aperture adapted for blocking ions with a mass different from the predetermined mass and for allowing ions having the predetermined mass to trespass the mass separator, and an objective lens having a second optical axis, wherein the second optical axis is inclined with regard to the first axis.

Abstract translation: 描述了离子束装置。 离子束装置包括用于产生离子束的离子束源，沿着第一轴发射的离子束，适于使离子束成形的孔单元，以及适于使离子束的离子偏转的消色差偏转单元， 预定质量的偏转角。 无彩色偏转单元包括：用于产生电场的电场产生部件和用于产生基本上垂直于电场的磁场的磁场产生部件。 该装置还包括质量分离孔，其适于阻挡具有不同于预定质量的质量的离子，并允许具有预定质量的离子侵入质量分离器，以及具有第二光轴的物镜，其中第二光轴为 相对于第一轴倾斜。