公开(公告)号：US20090130842A1

公开(公告)日：2009-05-21

申请号：US12289035

申请日：2008-10-17

Applicant: Dong-Won Hwang ,  Kook-Joo Kim ,  Yang-koo Lee ,  Hun-Jung Yi

Inventor： Dong-Won Hwang ,  Kook-Joo Kim ,  Yang-koo Lee ,  Hun-Jung Yi

IPC: H01L21/4763 ,  H01L21/302

CPC classification number: H01L27/10814 ,  H01L21/31111 ,  H01L21/76804 ,  H01L27/10817 ,  H01L27/10855

Abstract: A contact hole forming method and a method of manufacturing semiconductor device using the same may include forming a layer on a substrate; anisotropically etching the layer to form a dummy contact hole exposing the substrate; isotropically etching a sidewall of the dummy contact hole to form a contact hole by alternatively and repeatedly supplying an etching solution including a fluoride salt in a low-polarity organic solvent and deionized water to the dummy contact hole. The methods increase reliability of semiconductor memory devices.

Abstract translation: 接触孔形成方法和使用其的半导体器件的制造方法可以包括在衬底上形成层; 各向异性地蚀刻该层以形成暴露该衬底的虚拟接触孔; 各向同性地蚀刻虚拟接触孔的侧壁，通过交替地反复地提供包含氟化物盐在低极性有机溶剂中的蚀刻溶液和去离子水形成接触孔到虚拟接触孔。 这些方法提高了半导体存储器件的可靠性。

公开(公告)号：US20060151269A1

公开(公告)日：2006-07-13

申请号：US11073390

申请日：2005-03-04

Applicant: Toshimichi Ikeda ,  Yang Koo Lee

Inventor： Toshimichi Ikeda ,  Yang Koo Lee

IPC: F16F15/03

CPC classification number: F15B15/222 ,  F15B15/226

Abstract: A cylinder cushion device is provided for a hydraulic cylinder of an excavator, to prevent a piston from colliding with an end boss and absorb shock due to collision. Pressure higher than design strength of the hydraulic cylinder does not occur even if external force is given to the hydraulic cylinder. The cylinder cushion device includes a tube constituting a receiving chamber of hydraulic oil, a rod performing straight line motion, a piston fixed onto the rod and dividing the receiving chamber of the tube, an end boss, a cushion sleeve provided on the rod to be adjacent to the piston, for generating a predetermined cushion pressure inside the rod-side chamber if the piston is adjacent to the end boss during straight line motion of the rod, and an elastic body provided on the cushion sleeve for preventing the piston from colliding with the end boss and absorbing shock by means of its elasticity.

Abstract translation: 为挖掘机的液压缸提供气缸缓冲装置，以防止活塞与端部凸台碰撞并且吸收由于碰撞引起的冲击。 即使对液压缸施加外力，也不会发生高于液压缸的设计强度的压力。 气缸缓冲装置包括构成液压油接收室的管，直线运动的杆，固定在杆上的活塞和分配管的接收室的活塞，端部凸起，设置在杆上的缓冲套筒 如果在杆的直线运动期间活塞靠近端部凸台，则在杆侧室内产生预定的缓冲压力，以及设置在缓冲套筒上的用于防止活塞与活塞碰撞的弹性体 终端老板，通过弹性吸收冲击。

公开(公告)号：US07678751B2

公开(公告)日：2010-03-16

申请号：US11296000

申请日：2005-12-06

Applicant: Jung-Dae Park ,  Sang-Eon Lee ,  Sang-Mun Chon ,  Yang-Koo Lee ,  Dong-Chul Heo ,  Pil-Kwon Jun

Inventor： Jung-Dae Park ,  Sang-Eon Lee ,  Sang-Mun Chon ,  Yang-Koo Lee ,  Dong-Chul Heo ,  Pil-Kwon Jun

IPC: C11D7/50

CPC classification number: C11D7/264 ,  C11D7/5009 ,  C11D7/5013 ,  C11D7/5022 ,  C11D11/0047

Abstract: Disclosed are a composition for removing photoresist, a method of removing photoresist and a method of manufacturing a semiconductor device using a composition. The composition may include a ketone compound and a first polar aprotic solvent. The composition may also include the ketone compound and a second polar aprotic solvent. Moreover, the composition may include the first polar aprotic solvent and a second polar aprotic solvent with or without the ketone compound. The first polar aprotic solvent has at least one of an ether compound and an ester compound, and the second polar aprotic solvent has at least one of a sulfur-containing compound and a nitrogen-containing compound.

Abstract translation: 公开了除去光致抗蚀剂的组合物，去除光刻胶的方法以及使用组合物制造半导体器件的方法。 组合物可以包括酮化合物和第一极性非质子溶剂。 组合物还可以包括酮化合物和第二极性非质子溶剂。 此外，组合物可以包括第一极性非质子溶剂和具有或不具有酮化合物的第二极性非质子溶剂。 第一极性非质子溶剂具有醚化合物和酯化合物中的至少一种，第二极性非质子溶剂具有含硫化合物和含氮化合物中的至少一种。

公开(公告)号：US07478531B2

公开(公告)日：2009-01-20

申请号：US11408261

申请日：2006-04-20

Applicant: Toshimichi Ikeda ,  Yang Koo Lee

Inventor： Toshimichi Ikeda ,  Yang Koo Lee

IPC: F16D31/02

CPC classification number: E02F9/2239 ,  E02F9/123 ,  E02F9/2292 ,  F15B11/16 ,  F15B11/17 ,  F15B2211/20538 ,  F15B2211/20576 ,  F15B2211/3116 ,  F15B2211/7053 ,  F15B2211/7058 ,  F15B2211/7128

Abstract: A hydraulic circuit for heavy construction equipment to reduce a speed of a swing apparatus while a working apparatus such as a boom is concurrently operated has a work control valve which controls a working apparatus cylinder; a confluence valve which combines a hydraulic fluid of the second hydraulic pump with the work unit flow path based on a positions switch; a swing control valve which controls the hydraulic swing motor; and a disconnection valve which disconnects the hydraulic fluid supplied to at least one of the swing motors.

Abstract translation: 用于在同时操作诸如吊杆的工作装置的同时降低摆动装置的速度的重型施工设备的液压回路具有控制工作装置缸的作业控制阀; 汇流阀，其基于位置开关将第二液压泵的液压流体与作业单元流路组合; 控制液压回转马达的回转控制阀; 以及断开阀，其将提供给至少一个回转马达的液压流体断开。

公开(公告)号：US20080121622A1

公开(公告)日：2008-05-29

申请号：US11771896

申请日：2007-06-29

Applicant: Dong-Won HWANG ,  Kook-Joo KIM ,  Jung-In LA ,  Pil-Kwon JUN ,  Seung-Ki CHAE ,  Yang-Koo LEE

Inventor： Dong-Won HWANG ,  Kook-Joo KIM ,  Jung-In LA ,  Pil-Kwon JUN ,  Seung-Ki CHAE ,  Yang-Koo LEE

IPC: C09K13/08 ,  C03C15/00

CPC classification number: C03C15/00 ,  C09K13/08 ,  H01L21/31133 ,  H01L21/76804 ,  H01L21/76897 ,  H01L27/10855

Abstract: In a composition for etching silicon oxide, and a method of forming a contact hole using the composition, the composition which includes from about 0.01 to about 2 percent by weight of ammonium bifluoride, from about 2 to about 35 percent by weight of an organic acid, from about 0.05 to about 1 percent by weight of an inorganic acid, and a remainder of a low polar organic solvent. The composition may reduce damages to a metal silicide pattern that may be exposed in an etching process performed for forming the contact hole.

Abstract translation: 在用于蚀刻氧化硅的组合物和使用该组合物形成接触孔的方法中，组合物包含约0.01至约2重量％的二氟化铵，约2至约35重量％的有机酸 ，约0.05至约1重量％的无机酸，以及剩余的低极性有机溶剂。 组合物可以减少在用于形成接触孔的蚀刻工艺中暴露的金属硅化物图案的损伤。

公开(公告)号：US20060122084A1

公开(公告)日：2006-06-08

申请号：US11296000

申请日：2005-12-06

Applicant: Jung-Dae Park ,  Sang-Eon Lee ,  Sang-Mun Chon ,  Yang-Koo Lee ,  Dong-Chul Heo ,  Pil-Kwon Jun

Inventor： Jung-Dae Park ,  Sang-Eon Lee ,  Sang-Mun Chon ,  Yang-Koo Lee ,  Dong-Chul Heo ,  Pil-Kwon Jun

IPC: C11D7/32

CPC classification number: C11D7/264 ,  C11D7/5009 ,  C11D7/5013 ,  C11D7/5022 ,  C11D11/0047

Abstract: Disclosed are a composition for removing photoresist, a method of removing photoresist and a method of manufacturing a semiconductor device using a composition. The composition may include a ketone compound and a first polar aprotic solvent. The composition may also include the ketone compound and a second polar aprotic solvent. Moreover, the composition may include the first polar aprotic solvent and a second polar aprotic solvent with or without the ketone compound. The first polar aprotic solvent has at least one of an ether compound and an ester compound, and the second polar aprotic solvent has at least one of a sulfur-containing compound and a nitrogen-containing compound.

Abstract translation: 公开了除去光致抗蚀剂的组合物，去除光刻胶的方法以及使用组合物制造半导体器件的方法。 组合物可以包括酮化合物和第一极性非质子溶剂。 组合物还可以包括酮化合物和第二极性非质子溶剂。 此外，组合物可以包括第一极性非质子溶剂和具有或不具有酮化合物的第二极性非质子溶剂。 第一极性非质子溶剂具有醚化合物和酯化合物中的至少一种，第二极性非质子溶剂具有含硫化合物和含氮化合物中的至少一种。

公开(公告)号：US5210056A

公开(公告)日：1993-05-11

申请号：US799052

申请日：1991-11-27

Applicant: Chil-kun Pong ,  Myeon-koo Kang ,  Yang-koo Lee ,  Dong-ho Shin

Inventor： Chil-kun Pong ,  Myeon-koo Kang ,  Yang-koo Lee ,  Dong-ho Shin

IPC: H01L29/78 ,  H01L21/28 ,  H01L21/306 ,  H01L21/316

CPC classification number: H01L21/28185 ,  H01L21/02046 ,  H01L21/02052 ,  H01L21/28211 ,  Y10S438/906 ,  Y10S438/981

Abstract: A fabrication method of a semiconductor device is disclosed. Particularly, in the process of forming a gate oxide film on a semiconductor substrate, the method for forming a gate oxide film of a semiconductor device comprises the steps of first-annealing the semiconductor substrate in a nitrogen (N.sub.2) atmosphere; forming a gate oxide film by wet-oxidizing the annealed semiconductor substrate at a low temperature in a mixed gas atmosphere of oxygen (O.sub.2) and hydrogen (H.sub.2); and second-annealing the semiconductor substrate where gate oxide film has been formed, at a high temperature in a nitrogen (N.sub.2) atmosphere. Accordingly, the thinning phenomenon of the gate oxide film near the field oxide film is prevented and the instability such V.sub.FB in the conventional field oxidation method is considerably recovered. Also, the field concentration phenomenon is decreased and tolerance to dielectric breakdown is increased.

Abstract translation: 公开了一种半导体器件的制造方法。 特别是在半导体衬底上形成栅氧化膜的工艺中，形成半导体器件的栅极氧化膜的方法包括以下步骤：在氮（N 2）气氛中对半导体衬底进行退火; 通过在氧气（O 2）和氢气（H 2）的混合气体气氛中在低温下对退火的半导体衬底进行湿氧化来形成栅氧化膜; 并在氮（N 2）气氛中在高温下对形成有栅极氧化膜的半导体衬底进行二次退火。 因此，防止了场氧化膜附近的栅极氧化膜的稀化现象，并且在常规场氧化法中的这种VFB的不稳定性被大大地恢复。 此外，场浓度现象降低，并且介电击穿的耐受性增加。

公开(公告)号：US20100000211A1

公开(公告)日：2010-01-07

申请号：US12492170

申请日：2009-06-26

Applicant: Toshimichi IKEDA ,  Yang Koo LEE

Inventor： Toshimichi IKEDA ,  Yang Koo LEE

IPC: F16D31/02

CPC classification number: E02F9/2239 ,  E02F9/2232 ,  E02F9/2282 ,  E02F9/2292 ,  E02F9/2296 ,  F15B11/17 ,  F15B2211/20576 ,  F15B2211/30525 ,  F15B2211/3116 ,  F15B2211/31588 ,  F15B2211/7135 ,  F15B2211/7142 ,  F15B2211/75

Abstract: A hydraulic circuit for an excavator is provided, which includes first to third hydraulic pumps, a first traveling control valve and a first boom control valve successively installed along a first center bypass line from a downstream side of the first hydraulic pump, a second traveling control valve and a second boom control valve successively installed along a second center bypass line from a downstream side of the second hydraulic pump, a swing control valve connected between the third hydraulic pump and a swing motor to control the operation of the swing motor in accordance with an external valve switching signal, and a confluence line connected between a third center bypass line and a flow path of the second boom control valve to make hydraulic fluid from the third hydraulic pump join hydraulic fluid in a neutral position of the swing control valve. According to the hydraulic control circuit, the swing motor can be controlled independently by the fluid pressure being applied through the third hydraulic pump, and the speed of actuators can be kept without insufficiency of the flow rate during the swing composite operation through joining of the hydraulic fluid from the hydraulic pump and the hydraulic fluid from the working devices such as the boom, arm, and the like.

Abstract translation: 提供了一种用于挖掘机的液压回路，其包括第一至第三液压泵，第一行进控制阀和第一起重臂控制阀，所述第一行程控制阀和第一起重臂控制阀从第一液压泵的下游侧沿着第一中心旁通管路依次安装，第二行驶控制 阀和第二起重臂控制阀，其从第二液压泵的下游侧沿着第二中心旁通管路依次安装，连接在第三液压泵和回转马达之间的回转控制阀，以根据 外部阀切换信号，以及连接在第三中心旁通管路和第二起重臂控制阀的流路之间的汇流管，以使来自第三液压泵的液压流体在回转控制阀的中立位置中接合液压流体。 根据液压控制回路，可以通过第三液压泵施加的流体压力独立地控制回转马达，并且通过液压连接可以保持在摆动复合操作期间的致动器的速度，而不会使挥杆复合操作中的流量不足 来自液压泵的流体和来自诸如起重臂，臂等的工作装置的液压流体。

公开(公告)号：US20080149827A1

公开(公告)日：2008-06-26

申请号：US11963662

申请日：2007-12-21

Applicant: Jae-Seok LEE ,  Heung-Bin LIM ,  Won-Kyung RYU ,  Seung-Ki CHAE ,  Yang-Koo LEE ,  Hun-Jung YI

Inventor： Jae-Seok LEE ,  Heung-Bin LIM ,  Won-Kyung RYU ,  Seung-Ki CHAE ,  Yang-Koo LEE ,  Hun-Jung YI

IPC: H01J49/26 ,  G01N21/00

CPC classification number: G01N21/94 ,  G01N21/718 ,  G01N21/9501 ,  H01L21/6838 ,  H01L21/68728 ,  H01L21/68785

Abstract: Provided is an apparatus and method for analyzing contaminants on a wafer. The apparatus includes: a wafer holder for supporting a wafer on which contaminants to be analyzed are located, a laser ablation device for irradiating a laser to the wafer to extract a discrete specimen from the wafer, an analysis cell for collecting a discrete specimen from the surface of the wafer by irradiating the laser, and an analysis device connected to the analysis cell for analyzing contaminants from the collected discrete specimen.

Abstract translation: 提供了一种用于分析晶片上的污染物的装置和方法。 该装置包括：晶片保持器，用于支撑要分析的污染物所在的晶片;激光烧蚀装置，用于将激光照射到晶片以从晶片提取离散的样本;分析单元，用于从 通过照射激光的晶片的表面，以及连接到分析单元的分析装置，用于分析来自收集的离散样本的污染物。

公开(公告)号：US20080145942A1

公开(公告)日：2008-06-19

申请号：US11955086

申请日：2007-12-12

Applicant: Hyun-Kee Hong ,  Jae-Seok Lee ,  Yang-Koo Lee ,  Hun-Jung Yi

Inventor： Hyun-Kee Hong ,  Jae-Seok Lee ,  Yang-Koo Lee ,  Hun-Jung Yi

IPC: G01N33/20

CPC classification number: G01N31/22 ,  G01N2021/7783

Abstract: Provided herein are metal detection reagents including at least one ammonium salt of Formula 1: wherein R1, R2, R3 and R4 are independently selected from the group consisting of hydrogen, C1-30 alkyl and C3-14 aryl, and X− is independently selected from the group consisting of bromide, chloride, iodide, fluoride, nitrate, phosphate and sulfate and methods of using the metal detection reagents to monitor one or more metal ion levels in a solution.

Abstract translation: 本文提供的金属检测试剂包括至少一种式1的铵盐：其中R 1，R 2，R 3和R 3 > 4 <！ - SIPO - >独立地选自氢，C 1-3 - 烷基和C 3-14-14芳基，X - SUP>独立地选自溴化物，氯化物，碘化物，氟化物，硝酸盐，磷酸盐和硫酸盐，以及使用金属检测试剂监测溶液中的一种或多种金属离子水平的方法。