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公开(公告)号：US20140340666A1
公开(公告)日：2014-11-20
申请号：US14357530
申请日：2012-12-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Butler , Arno Jan Bleeker , Pieter Renaat Marie Hennus , Martinus Hendricus Henricus Hoeks , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Ruud Antonius Catharina Maria Beerens , Olof Martinus Josephus Fischer , Wilhelmus Henricus Theodorus Maria Aangenent , Niels Johannes Maria Bosch
IPC: G03F7/20
CPC classification number: G03F7/70258 , G03F7/70275 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70558 , G03F7/70816 , G03F7/709
Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
Abstract translation: 一种曝光装置，包括被配置为将多个辐射束投影到目标上的投影系统; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。
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公开(公告)号：US11275316B2
公开(公告)日：2022-03-15
申请号：US17004916
申请日：2020-08-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens
IPC: G03F7/20
Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
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公开(公告)号：US11150560B2
公开(公告)日：2021-10-19
申请号：US16881109
申请日：2020-05-22
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Anton Bernhard Van Oosten , Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal
Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.
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公开(公告)号：US10761433B2
公开(公告)日：2020-09-01
申请号：US16290299
申请日：2019-03-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens
IPC: G03F7/20
Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
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公开(公告)号：US20150227060A1
公开(公告)日：2015-08-13
申请号：US14423405
申请日：2013-08-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Rob Johan Theodoor Rutten , Jan Steven Christiaan Westerlaken , Koen Jacobus Johannes Maria Zaal , Richard Henricus Adrianus Van Lieshout , Engelbertus Antonius Fransiscus Van Der Pasch
CPC classification number: G03F7/70725 , G01D5/34 , G01D5/38 , G03F7/70775 , G03F7/70933
Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.
Abstract translation: 舞台系统包括可移动舞台和用于测量舞台位置的编码器，其中编码器包括用于发射编码器光束的发射器，用于与编码器光束相互作用的光栅，以及用于检测具有相互影响的编码器光束的检测器 利用光栅，编码器光束在使用中沿光路传播; 至少部分地包围光路的清洗盖; 以及用于将清洗介质供给到清洗盖中的清洗介质供给装置。
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Patent Agency Ranking
公开(公告)号：US11669021B2
公开(公告)日：2023-06-06
申请号：US17692859
申请日：2022-03-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/7085 , G03F7/70341 , G03F7/70725 , G03F7/70775 , G03F7/70783 , G03F7/70858 , G03F7/70875
Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
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公开(公告)号：US09618859B2
公开(公告)日：2017-04-11
申请号：US14375457
申请日：2013-01-25
Applicant: ASML Netherlands B.V.
Inventor： Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Jan Bernard Plechelmus Van Schoot , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee
CPC classification number: G03F7/70891 , G03F7/70266 , G03F7/70775 , G03F7/70833 , G03F7/7085 , G03F7/70858
Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.
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公开(公告)号：US09581916B2
公开(公告)日：2017-02-28
申请号：US14942679
申请日：2015-11-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
CPC classification number: G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
Abstract: A substrate handling system for an apparatus, the substrate handling system including a substrate table constructed to hold a substrate, a surrounding structure configured to surround the substrate, a sensor configured to determine a thickness of the substrate, and a control system configured to configure the apparatus responsive to a determination that the determined thickness is outside a thickness range associated with the surrounding structure.
Abstract translation: 一种用于装置的基板处理系统，所述基板处理系统包括构造成保持基板的基板台，构造成围绕所述基板的周围结构，被配置为确定所述基板的厚度的传感器以及被配置为 响应于确定所确定的厚度在与周围结构相关联的厚度范围之外的装置。
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公开(公告)号：US09494869B2
公开(公告)日：2016-11-15
申请号：US14357530
申请日：2012-12-05
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Arno Jan Bleeker , Pieter Renaat Maria Hennus , Martinus Hendricus Henricus Hoeks , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Ruud Antonius Catharina Maria Beerens , Olof Martinus Josephus Fischer , Wilhelmus Henricus Theodorus Maria Aangenent , Niels Johannes Maria Bosch
CPC classification number: G03F7/70258 , G03F7/70275 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70558 , G03F7/70816 , G03F7/709
Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
Abstract translation: 一种曝光装置，包括：投影系统，被配置为将多个辐射束投影到目标上; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。
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公开(公告)号：US20150034788A1
公开(公告)日：2015-02-05
申请号：US14382228
申请日：2013-01-30
Applicant: ASML Netherlands B.V.
Inventor： Arno Jan Bleeker , Thomas Josephus Maria Castenmill , Pieter Willem Herman De Jager , Heine Melle Mulder , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Danny Maria Hubertus Philips , Ruud Antonius Catharina Maria Beere , Roger Anton Marie Timmermans
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/20 , G03F7/7005 , G03F7/70075 , G03F7/70275 , G03F7/70291 , G03F7/70366 , G03F7/70383 , G03F7/70391 , G03F7/704 , G03F7/70425 , G03F7/70475
Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.
Abstract translation: 配置成将辐射束投影到目标上的投影系统包括可旋转的框架（8），其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在 只有切向或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。 作出规定以防止在由可旋转框架保持的镜片上施加力矩。
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