公开(公告)号：US07049210B2

公开(公告)日：2006-05-23

申请号：US10754502

申请日：2004-01-12

申请人： Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

发明人： Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC分类号： H01L21/26

CPC分类号： H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/24507 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764

摘要： An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：US07282427B1

公开(公告)日：2007-10-16

申请号：US11417028

申请日：2006-05-04

申请人： Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

发明人： Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC分类号： H01L21/26 ,  H01L21/04

CPC分类号： H01J37/3171 ,  H01J37/304 ,  H01J2237/20228 ,  H01J2237/30488 ,  H01J2237/30494 ,  H01J2237/31703

摘要： An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：US06956223B2

公开(公告)日：2005-10-18

申请号：US10119290

申请日：2002-04-10

申请人： Theodore H. Smick ,  Frank D. Roberts ,  Marvin Farley ,  Geoffrey Ryding ,  Takao Sakase ,  Adrian Murrell ,  Peter Edwards ,  Bernard Harrison

发明人： Theodore H. Smick ,  Frank D. Roberts ,  Marvin Farley ,  Geoffrey Ryding ,  Takao Sakase ,  Adrian Murrell ,  Peter Edwards ,  Bernard Harrison

IPC分类号： H01J37/04 ,  H01J37/18 ,  H01J37/317 ,  H01L21/265 ,  H01L21/68 ,  B05C5/00

CPC分类号： H01J37/20 ,  H01J37/18 ,  H01J37/3171 ,  H01J2237/20 ,  H01J2237/2006 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20228 ,  H01J2237/20278 ,  H01L21/682 ,  H01L21/6835

摘要： Semiconductor processing apparatus is disclosed which provides for movement of a scanning arm 60 of a substrate or wafer holder 180, in at least two generally orthogonal directions (so-called X-Y scanning). Scanning in a first direction is longitudinally through an aperture 55 in a vacuum chamber wall. The arm 60 is reciprocated by one or more linear motors 90A, 90B. The arm 60 is supported relative to a slide 100 using gimballed air bearings so as to provide cantilever support for the arm relative to the slide 100. A compliant feedthrough 130 into the vacuum chamber for the arm 60 then acts as a vacuum seal and guide but does not itself need to provide bearing support. A Faraday 450 is attached to the arm 60 adjacent the substrate holder 180 to allow beam profiling to be carried out both prior to and during implant. The Faraday 450 can instead or additionally be mounted adjacent the rear of the substrate holder or at 90° to it to allow beam profiling to be carried out prior to implant, with the substrate support reversed or horizontal and out of the beam line.

摘要翻译： 公开了半导体处理装置，其提供基板或晶片保持器180的扫描臂60在至少两个大致正交的方向（所谓的X-Y扫描）上的移动。 沿着第一方向进行的扫描纵向地穿过真空室壁中的孔口55。 臂60由一个或多个线性电动机90A，90B往复运动。臂60相对于滑块100被支撑，使用支撑的空气轴承，以便相对于滑块100为臂提供悬臂支撑。 进入用于臂60的真空室中的柔性馈通件130然后用作真空密封和引导件，但本身不需要提供轴承支撑件。 法拉第450附接到靠近基板保持器180的臂60，以允许在植入之前和期间执行光束轮廓。 法拉第450可以替代地或附加地安装在靠近衬底保持器的后部或与其相邻的90°处，以允许在植入之前执行光束轮廓，其中衬底支撑件反向或水平并且离开光束线。

公开(公告)号：US08124946B2

公开(公告)日：2012-02-28

申请号：US12477631

申请日：2009-06-03

申请人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

发明人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

IPC分类号： H01J37/317 ,  H01J49/30 ,  H01J49/42

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1523 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/24528 ,  H01J2237/31705

摘要： A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.

摘要翻译： 提供了一种用于在离子注入工件期间对离子束进行磁过滤的系统和方法，其中离子从离子源发射并且将离子加速离开离子源以形成离子束。 离子束通过质量分析器进行质量分析，其中选择离子。 一旦离子束被质量分析，离子束然后通过减速器减速，并且离子束进一步对减速度下游的离子束进行磁过滤。 磁滤波由四极磁能滤波器提供，其中形成磁场以截取离开减速器的离子束中的离子，以选择性地过滤不需要的离子和快速中性粒子。

公开(公告)号：US20100181470A1

公开(公告)日：2010-07-22

申请号：US12357688

申请日：2009-01-22

申请人： Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

发明人： Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

IPC分类号： G01D18/00 ,  A61N5/00 ,  H01J5/18

CPC分类号： H01J37/244 ,  H01J37/3171 ,  H01J2237/024 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/24535 ,  H01J2237/24542

摘要： An ion beam angle calibration and emittance measurement system, comprising a plate comprising an elongated slit therein, wherein the elongated slit positioned at a rotation center of the plate and configured to allow a first beam portion to pass therethrough. A beam current detector located downstream of the plate, wherein the beam current detector comprises a slit therein configured to permit a second beam portion of the first beam portion to pass therethrough, wherein the beam current detector is configured to measure a first beam current associated with the first beam portion. A beam angle detector is located downstream of the beam current detector and configured to detect a second beam current associated with the second beam portion. The plate, the current beam detector and the beam angle detector are configured to collectively rotate about the rotation center of the plate.

摘要翻译： 一种离子束角度校准和发射测量系统，包括其中包括细长狭缝的板，其中所述细长狭缝位于所述板的旋转中心并且被配置为允许第一梁部分通过。 一种位于板的下游的光束电流检测器，其中所述光束电流检测器包括其中的狭缝，其中构造成允许所述第一光束部分的第二光束部分穿过其中，其中所述光束电流检测器被配置为测量与 第一梁部分。 光束角检测器位于束电流检测器的下游，并被配置为检测与第二光束部分相关联的第二光束电流。 板，当前的束检测器和束角检测器构造成围绕板的旋转中心共同旋转。

公开(公告)号：US08168941B2

公开(公告)日：2012-05-01

申请号：US12357688

申请日：2009-01-22

申请人： Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

发明人： Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

IPC分类号： H01J3/00 ,  G01N27/62

CPC分类号： H01J37/244 ,  H01J37/3171 ,  H01J2237/024 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/24535 ,  H01J2237/24542

摘要： An ion beam angle calibration and emittance measurement system, comprising a plate comprising an elongated slit therein, wherein the elongated slit positioned at a rotation center of the plate and configured to allow a first beam portion to pass therethrough. A beam current detector located downstream of the plate, wherein the beam current detector comprises a slit therein configured to permit a second beam portion of the first beam portion to pass therethrough, wherein the beam current detector is configured to measure a first beam current associated with the first beam portion. A beam angle detector is located downstream of the beam current detector and configured to detect a second beam current associated with the second beam portion. The plate, the current beam detector and the beam angle detector are configured to collectively rotate about the rotation center of the plate.

摘要翻译： 一种离子束角度校准和发射测量系统，包括其中包括细长狭缝的板，其中所述细长狭缝位于所述板的旋转中心并且被配置为允许第一梁部分通过。 一种位于板的下游的光束电流检测器，其中所述光束电流检测器包括其中的狭缝，其中构造成允许所述第一光束部分的第二光束部分穿过其中，其中所述光束电流检测器被配置为测量与 第一梁部分。 光束角检测器位于束电流检测器的下游，并被配置为检测与第二光束部分相关联的第二光束电流。 板，当前的束检测器和束角检测器构造成围绕板的旋转中心共同旋转。

公开(公告)号：US20080142727A1

公开(公告)日：2008-06-19

申请号：US11589156

申请日：2006-10-30

申请人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

发明人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

IPC分类号： G01K1/08

CPC分类号： H01J37/3171 ,  H01J37/244 ,  H01J2237/24405 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/24578

摘要： This invention relates to a method of measuring a property of an ion beam, for example an ion beam current profile or the emittance of an ion beam. A Faraday array comprising an array of ion beam current sensors is employed. The array can provide an ion beam current profile at the plane of the array. The Faraday array is also used in conjunction with an occluding element that may be moved through the ion beam upstream of the Faraday array, there obscuring varying portions of the ion beam from the Faraday array. Suitable manipulation of the signals from the Faraday allows the ion beam current profile to be determined for the plane of the occluding element, and also for the emittance of the ion beam at the plane of the occluding element to be determined.

摘要翻译： 本发明涉及一种测量离子束的性质的方法，例如离子束电流分布或离子束的发射率。 采用包括离子束电流传感器阵列的法拉第阵列。 该阵列可以在阵列的平面处提供离子束电流分布。 法拉第阵列还与可以通过法拉第阵列上游的离子束移动的阻塞元件结合使用，这掩盖了来自法拉第阵列的离子束的变化部分。 适当地操纵来自法拉第的信号允许针对封闭元件的平面确定离子束电流轮廓，并且还确定待确定的阻塞元件平面处的离子束的发射率。

公开(公告)号：US20090321630A1

公开(公告)日：2009-12-31

申请号：US12477631

申请日：2009-06-03

申请人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

发明人： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

IPC分类号： B01D59/44 ,  A61N5/00 ,  H01J37/08

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1523 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/24528 ,  H01J2237/31705

摘要： A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.

摘要翻译： 提供了一种用于在离子注入工件期间对离子束进行磁过滤的系统和方法，其中离子从离子源发射并且将离子加速离开离子源以形成离子束。 离子束通过质量分析器进行质量分析，其中选择离子。 一旦离子束被质量分析，离子束然后通过减速器减速，并且离子束进一步对减速度下游的离子束进行磁过滤。 磁滤波由四极磁能滤波器提供，其中形成磁场以截取离开减速器的离子束中的离子，以选择性地过滤不需要的离子和快速中性粒子。

公开(公告)号：US07479644B2

公开(公告)日：2009-01-20

申请号：US11589156

申请日：2006-10-30

申请人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

发明人： Geoffrey Ryding ,  Takao Sakase ,  Marvin Farley ,  Theodore Smick

IPC分类号： H01J37/317 ,  H01L21/265

CPC分类号： H01J37/3171 ,  H01J37/244 ,  H01J2237/24405 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/24578

摘要： This invention relates to a method of measuring a property of an ion beam, for example an ion beam current profile or the emittance of an ion beam. A Faraday array comprising an array of ion beam current sensors is employed. The array can provide an ion beam current profile at the plane of the array. The Faraday array is also used in conjunction with an occluding element that may be moved through the ion beam upstream of the Faraday array, there obscuring varying portions of the ion beam from the Faraday array. Suitable manipulation of the signals from the Faraday allows the ion beam current profile to be determined for the plane of the occluding element, and also for the emittance of the ion beam at the plane of the occluding element to be determined.

摘要翻译： 本发明涉及一种测量离子束的性质的方法，例如离子束电流分布或离子束的发射率。 采用包括离子束电流传感器阵列的法拉第阵列。 阵列可以在阵列的平面处提供离子束电流分布。 法拉第阵列还与可以通过法拉第阵列上游的离子束移动的阻塞元件结合使用，这掩盖了来自法拉第阵列的离子束的变化部分。 适当地操纵来自法拉第的信号允许针对封闭元件的平面确定离子束电流轮廓，并且还确定待确定的阻塞元件平面处的离子束的发射率。

公开(公告)号：US20050181584A1

公开(公告)日：2005-08-18

申请号：US11029646

申请日：2005-01-06

申请人： Majeed Foad ,  Bernard Harrison ,  Marvin Farley ,  Peter Kindersley ,  Stephen Wells ,  Geoffrey Ryding ,  Takao Sakase

发明人： Majeed Foad ,  Bernard Harrison ,  Marvin Farley ,  Peter Kindersley ,  Stephen Wells ,  Geoffrey Ryding ,  Takao Sakase

IPC分类号： H01L21/265 ,  G21K5/10 ,  H01J37/302 ,  H01J37/304 ,  H01J37/317 ,  H01L21/425 ,  H01L21/66

CPC分类号： H01J37/3171 ,  H01J37/08 ,  H01J37/3023 ,  H01J37/304 ,  H01J2237/082 ,  H01J2237/20228 ,  H01J2237/2485 ,  H01J2237/30455 ,  H01J2237/30488

摘要： This invention relates to a method of implanting ions in a substrate using an ion beam where instabilities in the ion beam may be present and to an ion implanter for use with such a method. This invention also relates to an ion source for generating an ion beam that can be switched off rapidly. In essence, the invention provides a method of implanting ions comprising switching off the ion beam when an instability has been detected whilst continuing motion of the substrate relative to the ion beam to leave an unimplanted portion of a scan line across the substrate, establishing a stable ion beam once more and finishing the scan line by implanting the unimplanted portion of the path.

摘要翻译： 本发明涉及一种使用其中离子束可能存在不稳定性的离子束和用于这种方法的离子注入机在衬底中注入离子的方法。 本发明还涉及用于产生能够快速切断的离子束的离子源。 实质上，本发明提供了一种注入离子的方法，包括在检测到不稳定性时切断离子束，同时衬底相对于离子束的持续运动，留下穿过衬底的扫描线的未被注入的部分，建立稳定的 离子束再次通过植入路径的未被注入的部分来完成扫描线。