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44 条记录 (耗时 0.04 秒)

    Optical device, laser apparatus, and extreme ultraviolet light generation system
    11.
    发明授权
    Optical device, laser apparatus, and extreme ultraviolet light generation system 有权
    光学装置，激光装置和极紫外光发生系统

    公开(公告)号：US08891161B2

    公开(公告)日：2014-11-18

    申请号：US13817818

    申请日：2012-02-17

    申请人： Hakaru Mizoguchi ,  Takashi Suganuma ,  Hideo Hoshino ,  Osamu Wakabayashi

    发明人： Hakaru Mizoguchi ,  Takashi Suganuma ,  Hideo Hoshino ,  Osamu Wakabayashi

    IPC分类号： H01S3/101

    CPC分类号： H01S3/0071 ,  H01S3/0014 ,  H01S3/10061 ,  H01S3/1305 ,  H05G2/008

    摘要： An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.

    摘要翻译： 光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 设置在所述光束传送路径中用于调节所述激光束的光束传送路径的光束调节单元; 设置在所述光束传送路径中用于检测所述光束传送路径的测量单元; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。

    Gas supplementation method of excimer laser apparatus
    14.
    发明授权
    Gas supplementation method of excimer laser apparatus 失效
    准分子激光装置的气体补充方法

    公开(公告)号：US6130904A

    公开(公告)日：2000-10-10

    申请号：US669332

    申请日：1996-06-20

    申请人： Takanobu Ishihara ,  Junichi Fujimoto ,  Hakaru Mizoguchi

    发明人： Takanobu Ishihara ,  Junichi Fujimoto ,  Hakaru Mizoguchi

    IPC分类号： H01S3/036 ,  H01S3/104 ,  H01S3/134 ,  H01S3/225 ,  H01S3/22

    CPC分类号： H01S3/036 ,  H01S3/225 ,  H01S3/104 ,  H01S3/134

    摘要： In an excimer laser apparatus in which halogen gas, rare gas and buffer gas are fed into the laser chamber, before laser oscillation, the oscillation stop time is calculated, and, if the calculated oscillation stop time exceeds a prescribed time, the calculated oscillation stop time is used to calculate a feeding amount of mixed gas comprising rare gas or buffer gas, and the mixed gas is fed, prior to laser oscillation, in the calculated feeding amount; stable laser output is thereby obtained from the initial period of laser oscillation.

    摘要翻译： PCT No.PCT / JP94 / 02187 Sec。 371日期：1996年6月20日 102（e）日期1996年6月20日PCT 1994年12月22日PCT PCT。 公开号WO95 / 18477 日期：1995年6月7日在激光振荡前将卤素气体，稀有气体和缓冲气体供给到激光室的准分子激光装置中，计算振荡停止时间，如果计算出的振荡停止时间超过规定时间 使用计算出的振荡停止时间来计算包含稀有气体或缓冲气体的混合气体的进料量，并且在激光振荡之前将所述混合气体以计算的进料量进料; 从激光振荡的初始阶段得到稳定的激光输出。

    Excimer laser apparatus
    15.
    发明授权
    Excimer laser apparatus 失效
    准分子激光装置

    公开(公告)号：US5373523A

    公开(公告)日：1994-12-13

    申请号：US136448

    申请日：1993-10-14

    申请人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Yoshiho Amada ,  Osamu Wakabayashi

    发明人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Yoshiho Amada ,  Osamu Wakabayashi

    IPC分类号： H01S3/034 ,  H01S3/036 ,  H01S3/225 ,  H01S3/22

    CPC分类号： H01S3/0346 ,  H01S3/036 ,  H01S3/225

    摘要： An excimer laser apparatus is provided with a compact high efficiency dust particle removal means which is capable of maintaining the windows clean with only a small volume of purging gas, and which prevents deterioration of aperture masks without having to increase the cavity length or risking the possibility of leakage from piping connections. The excimer laser apparatus uses, as dust particle removal means, filters (13a and 13b) made of metal or ceramic which is non-reactive with fluorine. A ground potential dust collector can be provided at a downstream side of a static dust particle remover, having an anode and a cathode, for collecting any dust particles which have passed through the static dust particle remover. In addition, clean laser medium gas can be introduced into subchambers (14a and 14b) through gas introducing passages (11a and 11b) provided in the walls of the housing (1) and then into the laser chamber (12) through labyrinths (8a and 8b) without disturbing the clean gas which stays near the internal surfaces of the windows (6a and 6b).

    摘要翻译： 准分子激光装置设置有紧凑的高效除尘装置，其能够仅利用少量清洗气体来保持窗户清洁，并且防止孔径掩模的劣化，而不必增加空腔长度或冒着可能性 从管道连接泄漏。 准分子激光装置使用与氟反应的金属或陶瓷制成的过滤器（13a，13b）作为除尘装置。 可以在具有阳极和阴极的静电除尘器的下游侧设置地电位集尘器，用于收集通过静电除尘器的任何灰尘颗粒。 此外，可以通过设置在壳体（1）的壁中的气体引入通道（11a和11b）将干净的激光介质气体引入到子室（14a和14b）中，然后通过迷宫（8a和8a）进入激光室 8b），而不干扰保持在窗口（6a和6b）的内表面附近的清洁气体。

    Arf excimer laser device, scanning type exposure device and ultraviolet laser device
    16.
    发明授权
    Arf excimer laser device, scanning type exposure device and ultraviolet laser device 有权
    Arf准分子激光装置，扫描型曝光装置和紫外线激光装置

    公开(公告)号：US06819699B1

    公开(公告)日：2004-11-16

    申请号：US09518639

    申请日：2000-03-03

    申请人： Tatsuo Enami ,  Osamu Wakabayashi ,  Katsutomo Terashima ,  Kiwamu Takehisa ,  Tsukasa Hori ,  Hakaru Mizoguchi

    发明人： Tatsuo Enami ,  Osamu Wakabayashi ,  Katsutomo Terashima ,  Kiwamu Takehisa ,  Tsukasa Hori ,  Hakaru Mizoguchi

    IPC分类号： H01S322

    CPC分类号： H01S3/225

    摘要： A buffer gas contained in a laser gas used for an ArF excimer laser mainly consists of He, and Xe is preferably added to the laser gas. Mixture piping divided by valves is disposed on piping running from a chamber to an excimer laser gas cylinder, the mixture piping and a Xe gas cylinder are connected, gas exhaust by a gas exhaust module and opening and closing of the valves are controlled by a gas controller to add a trace quantity of xenon gas to the excimer laser gas. Thus, to remedy a burst characteristic and a spike characteristic of the ultraviolet laser device by adding a trace quantity of xenon gas, the xenon gas can be supplied efficiently into the chamber without modifying existing laser gas supply equipment.

    摘要翻译： 用于ArF准分子激光器的激光气体中所含的缓冲气体主要由He构成，优选将Xe添加到激光气体中。 由阀门分隔的混合管道设置在从室到准分子激光气瓶的管道上，混合管道和Xe气瓶连接，气体排气模块排气和阀门的打开和关闭由气体 控制器向准分子激光气体添加痕量的氙气。 因此，为了通过添加痕量的氙气来补偿紫外激光装置的突发特性和尖峰特性，可以将氙气有效地供应到腔室中而不改变现有的激光气体供应装置。

    Laser appartus
    17.
    发明授权
    Laser appartus 失效
    激光appartus

    公开(公告)号：US6008497A

    公开(公告)日：1999-12-28

    申请号：US29218

    申请日：1998-02-25

    申请人： Hakaru Mizoguchi ,  Osamu Wakabayashi ,  Yukio Kobayashi ,  Yoshiho Amada ,  Tatsuo Mimura

    发明人： Hakaru Mizoguchi ,  Osamu Wakabayashi ,  Yukio Kobayashi ,  Yoshiho Amada ,  Tatsuo Mimura

    IPC分类号： B23K26/03 ,  B23K26/06 ,  B23K26/42 ,  G03F7/20 ,  H01S3/134 ,  H01S3/225 ,  B23K26/00

    CPC分类号： G03F7/70041 ,  B23K26/03 ,  B23K26/06 ,  B23K26/702 ,  G03F7/70025 ,  H01S3/134 ,  H01S3/225

    摘要： A laser apparatus comprises storage means for storing a power source voltage of each pulse at the time of continuous pulse oscillation for one cycle, with each voltage correlated with an identifier which specifies the respective pulse, and output control means for, when a pulse is generated, reading from the storage means the source voltage of a pulse having the same identifier, and performing pulse oscillation on the basis of the source voltage. Thus the influence of the spiking phenomenon during a burst mode operation is eliminated as much as possible, and thereby the accuracy of laser beam machining is still more improved.

    摘要翻译： PCT No.PCT / JP96 / 02820 Sec。 371日期：1998年2月25日 102（e）1998年2月25日PCT PCT 1996年9月27日PCT公布。 公开号WO97 / 11810PC。 日期1997年04月3日激光装置包括存储装置，用于在连续脉冲振荡时存储每个脉冲的电源电压一个周期，其中每个电压与指定相应脉冲的标识符相关，以及输出控制装置， 当产生脉冲时，从存储装置读取具有相同标识符的脉冲的源电压，并且基于源电压执行脉冲振荡。 因此，尽可能地消除了在突发模式操作期间的尖峰现象的影响，从而仍然进一步提高了激光束加工的精度。

    Excimer laser device
    18.
    发明授权
    Excimer laser device 失效
    准分子激光装置

    公开(公告)号：US5642374A

    公开(公告)日：1997-06-24

    申请号：US420132

    申请日：1995-04-10

    申请人： Osamu Wakabayashi ,  Hakaru Mizoguchi

    发明人： Osamu Wakabayashi ,  Hakaru Mizoguchi

    IPC分类号： H01S3/104 ,  H01S3/10 ,  H01S3/134 ,  H01S3/225 ,  H01S3/22 ,  H01S3/223

    CPC分类号： H01S3/134 ,  H01S3/225

    摘要： Aimed at preventing a laser light beam profile from fluctuating, and by using the fact that there is a substantially proportional relation between the beam profile and the charging voltage as well as between the beam profile and the composition or the total pressure of the laser gases, an excimer laser device comprises a laser chamber containing laser gases which are excited by initiating an electric discharge in the laser chamber to output laser light, a beam profile detector for detecting a beam profile of the output laser light, and a controller for controlling a electric discharge voltage (excitation intensity) and composition or total pressure of the prescribed types of laser gases in such a way that the beam profile is shaped as desired based on detection results of the beam profile detector. An excimer laser feedback control circuit detects the output laser beam width and controls the beam width by controlling one or more of the laser voltage, composition of the laser gas, pressure or partial pressure of the laser gas, or feed rate of a laser gas. The laser gas may comprise a halogen, buffer, or rare gas.

    摘要翻译： 旨在防止激光束轮廓波动，并且通过使用光束轮廓和充电电压之间以及光束轮廓与激光气体的组成或总压力之间存在实质上成比例关系的事实， 准分子激光装置包括激光室，其包含通过在激光室中引发放电而激发的激光气体输出激光，用于检测输出激光的光束分布的光束分布检测器，以及用于控制电 放电电压（激发强度）和规定类型的激光气体的组成或总压力，使得根据光束轮廓检测器的检测结果，根据需要对光束轮廓进行成形。 准分子激光反馈控制电路通过控制激光电压，激光气体的组成，激光气体的压力或分压或激光气体的进给速率中的一个或多个来检测输出激光束宽度并控制光束宽度。 激光气体可以包括卤素，缓冲剂或稀有气体。