公开(公告)号：US06839373B1

公开(公告)日：2005-01-04

申请号：US09608964

申请日：2000-06-30

申请人： Kiwamu Takehisa ,  Hakaru Mizoguchi ,  Shinji Nagai ,  Tatsumi Gotou

发明人： Kiwamu Takehisa ,  Hakaru Mizoguchi ,  Shinji Nagai ,  Tatsumi Gotou

IPC分类号： H01S3/223 ,  B23K26/06 ,  H01S3/00 ,  H01S3/08 ,  H01S3/097 ,  H01S3/22 ,  H01S3/225 ,  H01S3/23

CPC分类号： H01S3/10092 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  H01S3/005 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/225 ,  H01S3/2325 ,  H01S3/2366

摘要： An ultra-narrow band fluorine laser apparatus is provided in which a line width of a fluorine laser can be narrowed to about 0.2 to 0.3 pm without using any band-narrowing element such as an etalon. In an oscillator 11, a laser chamber 15 is provided in a stable type resonator constituted by an output mirror 13 and a totally reflecting mirror 14. The laser chamber 15 is filled with a laser gas at about 0.8 atm. As a result, when discharge is caused in the laser chamber 15 to cause laser oscillation, laser light L10 in a bandwidth of about 0.3 pm is provided. The power of the laser light L10 is increased by an amplifier 12. The amplifier 12 emits laser light L20 in a bandwidth of about 0.3 pm having laser energy of 10 mJ or more.

公开(公告)号：US08507883B2

公开(公告)日：2013-08-13

申请号：US12559977

申请日：2009-09-15

申请人： Akira Endo ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Akira Endo ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21G4/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。

公开(公告)号：US20100090132A1

公开(公告)日：2010-04-15

申请号：US12559977

申请日：2009-09-15

申请人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动器激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。

公开(公告)号：US20080095209A1

公开(公告)日：2008-04-24

申请号：US11903111

申请日：2007-09-19

申请人： Osamu Wakabayashi ,  Tsukasa Hori ,  Takanobu Ishihara ,  Shinji Nagai ,  Hakaru Mizoguchi ,  Kouji Kakizaki

发明人： Osamu Wakabayashi ,  Tsukasa Hori ,  Takanobu Ishihara ,  Shinji Nagai ,  Hakaru Mizoguchi ,  Kouji Kakizaki

IPC分类号： H01S3/22

CPC分类号： H01S3/2333 ,  H01S3/005 ,  H01S3/036 ,  H01S3/0384 ,  H01S3/0385 ,  H01S3/073 ,  H01S3/08009 ,  H01S3/08045 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2316 ,  H01S3/2366

摘要： A high efficiency injection device 4, which injects oscillation stage laser light into an optical stable resonator of an amplification stage laser 20, is provided. A discharge electrode 1a is disposed in an oscillation stage laser 10, and is connected to a 12 kHz power supply 15 for discharging the discharge electrode 1a, and also a plurality of pairs of discharge electrodes 2a, 2b are disposed within the optical stable resonator of the amplification stage laser 20, and are connected to 6 kHz power supplies 25a, 25b for discharging the respective electrode pairs 2a, 2b. Discharge voltages are applied alternately to the two pairs of electrodes 2a, 2b in synchronization with the injected light to cause discharge.

摘要翻译： 提供了将振荡级激光注入到放大级激光器20的光稳定谐振器中的高效率注入装置4。 放电电极1a设置在振荡级激光器10中，并且连接到用于放电放电电极1a的12kHz电源15，并且多对放电电极2a，2b布置在 放大级激光器20的光稳定谐振器，并且连接到用于对各个电极对2a，2b进行放电的6kHz电源25a，25b。 与注入的光同步地将放电电压交替地施加到两对电极2a，2b，以引起放电。

公开(公告)号：US06628682B1

公开(公告)日：2003-09-30

申请号：US09716411

申请日：2000-11-21

申请人： Kiwamu Takehisa ,  Kouji Shio ,  Shinji Nagai ,  Yasuaki Iwata ,  Osamu Wakabayashi

发明人： Kiwamu Takehisa ,  Kouji Shio ,  Shinji Nagai ,  Yasuaki Iwata ,  Osamu Wakabayashi

IPC分类号： H01S313

CPC分类号： H01S3/225 ,  H01S3/137 ,  H01S3/139 ,  H01S3/2258

摘要： Of spontaneous emission beams emitted from a laser medium but not line-narrowed, a spontaneous emission beam whose wavelength approximates a narrowed emission beam and whose light intensity is equal to or higher than a certain level is used as a reference light.

摘要翻译： 从激光介质发射而不是线窄的自发发射光束，其波长近似于发射光束并且光强度等于或高于某一水平的自发发射光束被用作参考光。

公开(公告)号：US08471227B2

公开(公告)日：2013-06-25

申请号：US13293914

申请日：2011-11-10

申请人： Kouji Kakizaki ,  Shinji Nagai ,  Tatsuya Yanagida

发明人： Kouji Kakizaki ,  Shinji Nagai ,  Tatsuya Yanagida

IPC分类号： G01N21/33 ,  G21K5/02 ,  H05H1/00

摘要： An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.

公开(公告)号：US08242474B2

公开(公告)日：2012-08-14

申请号：US13032172

申请日：2011-02-22

申请人： Shinji Nagai ,  Tamotsu Abe ,  Takanobu Ishihara ,  Osamu Wakabayashi

发明人： Shinji Nagai ,  Tamotsu Abe ,  Takanobu Ishihara ,  Osamu Wakabayashi

IPC分类号： G01N21/33 ,  H01J1/50 ,  G21K5/08

CPC分类号： H05G2/003 ,  G01J3/10 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.

摘要翻译： 一种与激光系统组合使用的极紫外光发生装置，该装置可以包括：设置有至少一个入口的腔室，用于将从激光系统输出的激光束引入腔室; 目标供给单元，其设置在所述室中，用于将所述目标材料供给到所述室内的预定区域，所述目标材料用所述激光束照射; 设置在所述室内的至少一个光学元件; 用于产生围绕预定区域的磁场的磁场产生单元; 离子收集单元，设置在所述磁场的磁力线的方向上，用于收集当所述靶材料被所述激光束照射并沿着所述磁力线流动时产生的离子; 以及用于将蚀刻气体引入到室中的气体引入单元。

公开(公告)号：US20120091893A1

公开(公告)日：2012-04-19

申请号：US13336749

申请日：2011-12-23

申请人： Tatsuya YANAGIDA ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

发明人： Tatsuya YANAGIDA ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

IPC分类号： H05H1/46

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.

摘要翻译： 在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

公开(公告)号：US08067756B2

公开(公告)日：2011-11-29

申请号：US12646075

申请日：2009-12-23

申请人： Yoshifumi Ueno ,  Georg Soumagne ,  Shinji Nagai ,  Akira Endo ,  Tatsuya Yanagida

发明人： Yoshifumi Ueno ,  Georg Soumagne ,  Shinji Nagai ,  Akira Endo ,  Tatsuya Yanagida

IPC分类号： H05G2/00 ,  G01J3/10

CPC分类号： H05G2/003 ,  H05G2/008

摘要： In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 20 is arranged for collecting the ion, and ion collision surfaces Sa and Sb of the ion collection cylinder 20 are provided with or coated with Si, which is a metal whose sputtering rate with respect to the ion is less than one atom/ion.

摘要翻译： 在极紫外光源装置中，通过用激光照射作为熔融Sn的液滴D而产生的等离子体产生极紫外光，并且控制在产生极紫外光时产生的离子的流动方向 通过磁场或电场照射光，离子收集筒20被布置成用于收集离子，离子收集筒20的离子碰撞表面Sa和Sb设置有或涂覆有Si，溅射速率 相对于离子小于一个原子/离子。

公开(公告)号：US07965756B2

公开(公告)日：2011-06-21

申请号：US12545495

申请日：2009-08-21

申请人： Osamu Wakabayashi ,  Shinji Nagai ,  Kouji Kakizaki ,  Satoshi Tanaka

发明人： Osamu Wakabayashi ,  Shinji Nagai ,  Kouji Kakizaki ,  Satoshi Tanaka

IPC分类号： H01S3/22

CPC分类号： H01S3/005 ,  G02B1/02 ,  H01S3/0057 ,  H01S3/08009 ,  H01S3/08054 ,  H01S3/10061 ,  H01S3/2251

摘要： At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.

摘要翻译： 进入平面或出射平面的光中的至少任一个平行于CaF 2晶体的（111）晶面，并且从入射平面入射的激光束穿过位于[111]轴和第一方位角 [001]轴围绕[111]轴的旋转轨迹的轴线，包括[111]轴和第一方位轴，位于旋转轨迹中的[111]轴和第二方位角轴之间的平面 围绕[111]轴的[010]轴线，并且包括[111]轴和第二方位角轴或位于[111]轴和第三方位角之间的平面 围绕[111]轴并且包括[111]轴和第三方位角轴并从出射平面离开。