Wind turbine pitch control system
    16.
    发明授权
    Wind turbine pitch control system 有权
    风机变桨控制系统

    公开(公告)号:US09115694B2

    公开(公告)日:2015-08-25

    申请号:US13595001

    申请日:2012-08-27

    IPC分类号: F03D9/00 F03D7/02

    摘要: A pitch control system for a wind turbine is disclosed. The pitch control system may generally include a motor having an armature and a winding and a grid power source configured to supply electrical power to the motor. The pitch control system may also include a plurality of switching components configured to control a first current through the armature independent of a second current through the winding. In addition, the pitch control system may include an auxiliary switching component electrically coupled between the grid power source and at least a portion of the switching components. The auxiliary switching component may be configured to be opened when a grid voltage of the grid power source exceeds a first voltage threshold.

    摘要翻译: 公开了一种用于风力涡轮机的俯仰控制系统。 变桨控制系统通常可以包括具有电枢和绕组的电动机和被配置为向电动机供电的电网电源。 俯仰控制系统还可以包括多个开关部件,其被配置为控制通过电枢的第一电流,而不管通过绕组的第二电流。 此外,俯仰控制系统可以包括电耦合在电网电源和至少一部分开关部件之间的辅助开关部件。 辅助开关部件可以被配置为当电网电源的电网电压超过第一电压阈值时打开。

    Light emitting diode utilizing a physical pattern
    19.
    发明授权
    Light emitting diode utilizing a physical pattern 有权
    使用物理图案的发光二极管

    公开(公告)号:US07262550B2

    公开(公告)日:2007-08-28

    申请号:US10724033

    申请日:2003-11-26

    IPC分类号: H01J1/62 H01J63/04

    摘要: Light-emitting devices, and related components, systems and methods are disclosed. In some embodiments, the light-emitting devices include of multi-stack materials. The multi-stack may include a light-generating region and a first layer supported by the light-generating region. A material in contact with the surface of the first layer may have an index of a refraction less than about 1.5.

    摘要翻译: 公开了发光器件及相关部件,系统和方法。 在一些实施例中,发光装置包括多堆叠材料。 多层堆叠可以包括发光区域和由发光区域支撑的第一层。 与第一层的表面接触的材料可以具有小于约1.5的折射率。

    Light emitting device methods
    20.
    发明授权
    Light emitting device methods 有权
    发光装置的方法

    公开(公告)号:US07074631B2

    公开(公告)日:2006-07-11

    申请号:US10794452

    申请日:2004-03-05

    IPC分类号: H01L21/00

    摘要: A method includes disposing a planarization layer on a surface of a layer of semiconductor material and disposing a lithography layer on a surface of the planarization layer. The method also includes performing nanolithography to remove at least a portion of the planarization layer, at least a portion of the lithography layer and at least a portion of the layer of semiconductor material, thereby forming a dielectric function in the surface of the layer of semiconductor material that varies spatially according to a pattern.

    摘要翻译: 一种方法包括在半导体材料层的表面上设置平坦化层并在平坦化层的表面上设置光刻层。 该方法还包括进行纳米光刻以去除平坦化层的至少一部分,光刻层的至少一部分和半导体材料层的至少一部分,从而在半导体层的表面形成介电功能 根据图案在空间上变化的材料。