公开(公告)号：US20160266488A1

公开(公告)日：2016-09-15

申请号：US15158848

申请日：2016-05-19

Applicant: FUJIFILM Corporation

Inventor： Masafumi KOJIMA ,  Akiyoshi GOTO ,  Akinori SHIBUYA ,  Keita KATO ,  Kei YAMAMOTO

IPC: G03F7/038 ,  G03F7/32 ,  G03F7/20

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (P) having a partial structure represented by General Formula (X), and a compound capable of generating an acid upon irradiation with actinic ray or radiation.

Abstract translation: 该活性光敏性或辐射敏感性树脂组合物含有：具有由通式（X）表示的部分结构的树脂（P）; 以及当用活性光或辐射照射时产生酸的化合物。

公开(公告)号：US20160033862A1

公开(公告)日：2016-02-04

申请号：US14881478

申请日：2015-10-13

Applicant: FUJIFILM Corporation

Inventor： Akinori SHIBUYA

IPC: G03F7/039 ,  G03F7/32 ,  G03F7/20

CPC classification number: G03F7/039 ,  C07C381/12 ,  C08F220/10 ,  C08F220/30 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/32

Abstract: Provided is an active light-sensitive or radiation-sensitive resin composition with excellent exposure latitude and pattern roughness such as line width roughness, and a pattern-forming method using the same. The active light-sensitive or radiation-sensitive resin composition of the present invention contains (A) at least one type of a compound which is represented by General Formula (I) below and which generates an acid by irradiation with active light or radiation and (B) at least one type of a resin which includes a repeating unit which is represented by General Formula (1) below and of which, due to being decomposed by an action of an acid, the solubility increases with respect to an alkali developer.

Abstract translation: 提供了具有优异的曝光宽容度和图案粗糙度（例如线宽粗糙度）的主动感光或辐射敏感性树脂组合物，以及使用其的图案形成方法。 本发明的主动感光性或辐射敏感性树脂组合物含有（A）至少一种下述通式（I）表示的化合物，其通过用活性光或辐射照射产生酸， B）至少一种树脂，其包含由下述通式（1）表示的重复单元，并且由于通过酸的作用而分解，所述溶解度相对于碱性显影剂而言增加。

公开(公告)号：US20150111135A1

公开(公告)日：2015-04-23

申请号：US14580686

申请日：2014-12-23

Applicant: FUJIFILM Corporation

Inventor： Shohei KATAOKA ,  Akinori SHIBUYA ,  Akiyoshi GOTO ,  Tomoki MATSUDA ,  Toshiaki FUKUHARA

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325

Abstract: The pattern forming method of the present invention includes: (i) forming a film including an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) represented by General Formula (I) shown below; a resin (P) capable of decreasing solubility with respect to a developer including organic solvent by the action of an acid; and a compound (B) capable of generating an acid by irradiation of actinic rays or radiation; (ii) irradiating the film with actinic rays or radiation; (iii) developing the film irradiated with the actinic rays or radiation using a developer including an organic solvent. [Chem. 1] RN-A−X+  (I)

Abstract translation: 本发明的图案形成方法包括：（i）形成含有由下述通式（I）表示的化合物（A）的光化射线敏感性或辐射敏感性树脂组合物的膜; 能够通过酸的作用降低对包含有机溶剂的显影剂的溶解度的树脂（P）; 和能够通过光化射线或辐射的照射产生酸的化合物（B）; （ii）用光化射线或辐射照射薄膜; （iii）使用包含有机溶剂的显影剂显影用光化射线或辐射照射的薄膜。 [Chem。 1] RN-A-X +（I）

公开(公告)号：US20220009153A1

公开(公告)日：2022-01-13

申请号：US17484582

申请日：2021-09-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Naoya SHIMOJU ,  Akinori SHIBUYA ,  Akihiro HAKAMATA

IPC: B29C59/02 ,  C08F2/50 ,  C08F220/10 ,  G03F7/20 ,  G03F7/004

Abstract: Provided are: a composition for forming a pattern, which contains a polymerizable compound, a photopolymerization initiator, and a sensitizer containing two or more of at least one kind of atom selected from the group consisting of a nitrogen atom and a sulfur atom, in which a length of a specific atom chain from one atom to another atom among the two or more atoms is 2 or 3 in terms of the number of atoms; a kit to which the composition for forming a pattern is applied; a cured film; a laminate; a pattern producing method; and a method for manufacturing a semiconductor element.

公开(公告)号：US20180222164A1

公开(公告)日：2018-08-09

申请号：US15940321

申请日：2018-03-29

Applicant: FUJIFILM Corporation

Inventor： Yu IWAI ,  Takeshi KAWABATA ,  Akinori SHIBUYA

IPC: B32B27/08 ,  H01L23/14 ,  G03F7/038 ,  B32B27/28 ,  B32B15/08 ,  B32B15/20

Abstract: Provided is a laminate that excels in adhesion among a plurality of resin layers formed as insulating layers containing polyimide and so forth, a method for manufacturing the laminate, a semiconductor device, and, a method for manufacturing the semiconductor device. The laminate comprises a substrate, and at least two resin layers, each of the resin layers is independently brought into contact, in at least a part of the surface thereof, with other resin layer, and the layers independently has a Young's modulus exceeding 2.8 GPa and not exceeding 5.0 GPa, and, an elongation after fracture exceeding 50% and not exceeding 200%, and further has a three-dimensional radical crosslinked structure, and at least one of the resin layers contains at least either polyimide or polybenzoxazole.

公开(公告)号：US20180079864A1

公开(公告)日：2018-03-22

申请号：US15824360

申请日：2017-11-28

Applicant: FUJIFILM Corporation

Inventor： Takeshi KAWABATA ,  Takuma AMEMIYA ,  Hidekazu OOHASHI ,  Yu IWAI ,  Akinori SHIBUYA

IPC: C08G73/10 ,  C08F290/14 ,  G03F7/031 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  G03F7/037 ,  H01L23/29

Abstract: Provided are a photosensitive resin composition using a polyimide precursor composition, a cured film, a method for producing a cured film, a semiconductor device, and a method for producing a polyimide precursor composition.A polyimide precursor composition in which the molar ratio of repeating units represented by General Formula (1-2) among structural isomers of the polyimide precursor is 60% to 90% by mole; in General Formula (1-2), A1 and A2 each independently represent an oxygen atom or NH, R111 and R112 each independently represent a single bond or a divalent organic group, and R113 and R114 each independently represent a hydrogen atom or a monovalent organic group.

公开(公告)号：US20170199455A1

公开(公告)日：2017-07-13

申请号：US15470003

申请日：2017-03-27

Applicant: FUJIFILM Corporation

Inventor： Masafumi KOJIMA ,  Akiyoshi GOTO ,  Akinori SHIBUYA ,  Keita KATO ,  Keiyu OU

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/16 ,  H01L21/027 ,  G03F7/38 ,  G03F7/09 ,  G03F7/32 ,  G03F7/30 ,  C08F220/18 ,  G03F7/20

CPC classification number: G03F7/038 ,  C08F220/12 ,  C08F220/18 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/3021 ,  G03F7/325 ,  G03F7/327 ,  G03F7/38 ,  H01L21/0274 ,  H01L21/0276

Abstract: The present invention has an object to provide a method for forming a negative tone pattern in which DOF of a resist composition used is high and shrinkage of a film in post exposure bake is suppressed; a method for manufacturing an electronic device including the pattern forming method; and an active-light-sensitive or radiation-sensitive resin composition. The method for forming a negative tone pattern of the present invention including: a film formation step of forming a resist film on a substrate, using a resist composition; an exposing step of irradiating the film with active light or radiation; a heating treatment step of performing a heating treatment on the film irradiated with active light or radiation; and a developing step of developing the heating-treated film using a developer including an organic solvent, in which the resist composition includes a resin A having a repeating unit A with a group represented by a specific formula, a resin B having a repeating unit B with a group represented by a specific formula, and a compound that generates an acid upon irradiation with active light or radiation.

公开(公告)号：US20150338736A1

公开(公告)日：2015-11-26

申请号：US14751669

申请日：2015-06-26

Applicant: FUJIFILM CORPORATION

Inventor： Takeshi KAWABATA ,  Hiroo TAKIZAWA ,  Akinori SHIBUYA ,  Akiyoshi GOTO ,  Masafumi KOJIMA ,  Keita KATO

IPC: G03F7/004 ,  C07C309/17 ,  C07D333/48 ,  C07D335/02 ,  C07D327/06 ,  C07C309/12 ,  C07D217/06 ,  G03F7/20 ,  C07D333/76

CPC classification number: G03F7/0045 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C309/29 ,  C07C311/48 ,  C07C317/04 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D217/06 ,  C07D295/185 ,  C07D327/06 ,  C07D333/46 ,  C07D333/48 ,  C07D333/76 ,  C07D335/02 ,  C07J9/005 ,  C07J17/00 ,  C07J31/006 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/20

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (A) and any of compounds (B) of general formula (I) below. (In general formula (I), Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X1 may be bonded to R1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group.)

Abstract translation: 本发明提供一种包含树脂（A）和下述通式（I）的任何化合物（B））的光化射线或辐射敏感性树脂组合物。 （通式（I）中，Rf表示氟原子或含有至少一个氟原子的一价有机基团; R1表示氢原子或不含氟原子的一价取代基; X1表示具有至少2个碳原子的1价有机基团 原子或其中任选地引入除氟原子以外的取代基的甲基，条件是X1可以与R 1键合，从而形成环; Z表示当暴露于光化射线或辐射时被转化为 磺酸基，亚氨基酸基或甲基酸基）。

公开(公告)号：US20150160559A1

公开(公告)日：2015-06-11

申请号：US14625782

申请日：2015-02-19

Applicant: FUJIFILM Corporation

Inventor： Akinori SHIBUYA ,  Shohei KATAOKA ,  Tomoki MATSUDA ,  Toshiaki FUKUHARA ,  Akiyoshi GOTO

IPC: G03F7/30 ,  G03F7/038

CPC classification number: G03F7/30 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/26 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  H01L21/0274

Abstract: There is provided a pattern forming method containing: forming a film by using a radiation-sensitive or actinic ray-sensitive resin composition containing: (A) a onium salt compound containing a nitrogen atom in a cationic moiety; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin capable of increasing the polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, exposing the film; and developing the exposed film by using a developer containing an organic solvent to form a negative pattern.

Abstract translation: 提供了一种图案形成方法，其包括：通过使用辐射敏感或光化射线敏感性树脂组合物形成膜，其包含：（A）阳离子部分中含有氮原子的鎓盐化合物; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）能够通过酸的作用增加极性以降低在含有有机溶剂的显影剂中的溶解性的树脂，使该膜曝光; 并通过使用含有有机溶剂的显影剂显影曝光的薄膜以形成负图案。

公开(公告)号：US20150111157A1

公开(公告)日：2015-04-23

申请号：US14581416

申请日：2014-12-23

Applicant: FUJIFILM CORPORATION

Inventor： Keita KATO ,  Michihiro SHIRAKAWA ,  Akinori SHIBUYA ,  Akiyoshi GOTO ,  Shohei KATAOKA ,  Tomoki MATSUDA

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/004 ,  C08F220/26 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325

Abstract: Provided is a method of forming a pattern, including forming a film comprising an actinic-ray- or radiation-sensitive resin composition comprising, resin (A) comprising any of repeating units of general formula (I) below, which resin when acted on by an acid, decreases its solubility in a developer comprising an organic solvent, and a compound (B) expressed by any of general formulae (B-1) to (B-3) below, which compound when exposed to actinic rays or radiation, generates an acid, exposing the film to actinic rays or radiation, and developing the exposed film with a developer comprising an organic solvent to thereby obtain a negative pattern.

Abstract translation: 提供了形成图案的方法，包括形成包含光化射线或辐射敏感性树脂组合物的膜，所述树脂组合物包含下列通式（I）的任何重复单元的树脂（A） 降低其在包含有机溶剂的显影剂中的溶解度，以及当暴露于光化射线或辐射时该化合物暴露于光化射线或辐射时由下述通式（B-1）至（B-3）表示的化合物（B） 酸，将膜暴露于光化射线或辐射，以及用包含有机溶剂的显影剂显影曝光的膜，从而获得负图案。