公开(公告)号：US20230099422A1

公开(公告)日：2023-03-30

申请号：US17902202

申请日：2022-09-02

Applicant: FUJIFILM Corporation

Inventor： Takumi TANAKA ,  Takashi BANNAI ,  Takamitsu TOMIGA ,  Kohei HIGASHI ,  Fumihiro YOSHINO ,  Yuma KURUMISAWA

IPC: G03F7/00 ,  G03F7/028

Abstract: A method for producing a composition, the method being for producing a composition using a stirring device provided with a stirring tank and a stirrer, includes a mixing step of charging a resin, an acid generator, and a solvent into the stirring tank, and a stirring step of stirring the mixture accommodated in the stirring tank, using the stirrer, in which a ratio c of a content of the acid generator to a total mass of the mixture is 0.3% to 2.5% by mass, the stirrer is provided with a rotatable stirring shaft, a plurality of support parts attached to the stirring shaft, and a plurality of stirring elements attached to each of end parts of the plurality of support parts, the shape and the arrangement of the stirring elements are specified, and the positions of the plurality of stirring elements are specified so as to satisfy a specific Expression (1).

公开(公告)号：US20220137512A1

公开(公告)日：2022-05-05

申请号：US17578473

申请日：2022-01-19

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Yasunori YONEKUTA ,  Takamitsu TOMIGA ,  Kohei HIGASHI ,  Fumihiro YOSHINO

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/038 ,  G03F7/32 ,  G03F7/16 ,  G03F7/004 ,  G03F7/38 ,  G03F7/40

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, (B) a photoacid generator, and an anion (P) which is one or more anions selected from the group consisting of NO3−, SO42−, Cl−, and Br−, in which a content of the anion (P) is from 0.01 ppb to 100 ppm with respect to a total mass of the actinic ray-sensitive or radiation-sensitive resin composition, an actinic ray-sensitive or radiation-sensitive film formed from the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.

公开(公告)号：US20180246406A1

公开(公告)日：2018-08-30

申请号：US15968366

申请日：2018-05-01

Applicant: FUJIFILM Corporation

Inventor： Fumihiro YOSHINO

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  G03F7/40

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition, used for forming an actinic ray-sensitive or radiation-sensitive film having a film thickness of 1 μm or more, and for being exposed to actinic rays having a wavelength of 200 to 300 nm or radiation, in which the transmittance, with respect to light at a wavelength of 248 nm, of an actinic ray-sensitive or radiation-sensitive film having a film thickness of 12 μm, which is formed using the actinic ray-sensitive or radiation-sensitive resin composition, is 5% or more, and a pattern having an excellent sensitivity as well as an excellent cross-sectional shape can be formed by the actinic ray-sensitive or radiation-sensitive resin composition in a case where an actinic ray-sensitive or radiation-sensitive film having a film thickness of 1 μm or more is exposed to light at a wavelength of 200 to 300 nm.

公开(公告)号：US20170038685A1

公开(公告)日：2017-02-09

申请号：US15291538

申请日：2016-10-12

Applicant: FUJIFILM Corporation

Inventor： Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Keita KATO ,  Fumihiro YOSHINO ,  Kei YAMAMOTO

IPC: G03F7/039 ,  G03F7/16 ,  G03F7/40 ,  G03F7/38 ,  G03F7/32 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0397 ,  C07C309/06 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0274

Abstract: An active-light-sensitive or radiation-sensitive resin composition includes a resin (A) and a photoacid generator (B) capable of generating an acid upon irradiation with active light or radiation, in which the active-light-sensitive or radiation-sensitive resin composition contains at least a photoacid generator (B1) represented by the following General Formula (1) and a photoacid generator (B2) other than the photoacid generator (B1) as the photoacid generator (B).

Abstract translation: 本发明提供一种活性光敏或辐射敏感性树脂组合物，其包含当用活性光或辐射照射时产生酸的树脂（A）和光酸产生剂（B）。 光致酸产生剂（B）至少含有与光酸产生剂（B1）不同的由式（1）表示的光致酸产生剂（B1）和光酸产生剂（B2）。

公开(公告)号：US20230161253A1

公开(公告)日：2023-05-25

申请号：US18158781

申请日：2023-01-24

Applicant: FUJIFILM Corporation

Inventor： Fumihiro YOSHINO ,  Takamitsu Tomiga ,  Yuma Kurumisawa ,  Takumi Tanaka

IPC: G03F7/039 ,  G03F7/038 ,  C08F212/14 ,  C08F220/18

CPC classification number: G03F7/039 ,  G03F7/038 ,  C08F212/24 ,  C08F220/1804 ,  C08F220/1806

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) and a resin (B) which include a repeating unit having an acid-decomposable group, and the acid-decomposable group in the resin (A) and the acid-decomposable group in the resin (B) have the same structures. Regarding the resin (A) and the resin (B), |GA−GB| is from 5% by mole to 20% by mole, SA/SB is 10/90 to 90/10, |MwA−MwB| is from 100 to 5,000, and |MwA/MnA−MwB/MnB| is 0.05 or more.

公开(公告)号：US20180217497A1

公开(公告)日：2018-08-02

申请号：US15939295

申请日：2018-03-29

Applicant: FUJIFILM Corporation

Inventor： Fumihiro YOSHINO ,  Kenichi HARADA ,  Shinichi SUGIYAMA ,  Takamitsu TOMIGA

IPC: G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  G03F7/004 ,  G03F7/40 ,  G03F7/038

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: The present invention provides a pattern forming method which can be suitably applied to grayscale exposure since a deviation of the thickness among production lots is hardly generated, and an actinic ray-sensitive or radiation-sensitive resin composition. The pattern forming method of the present invention is a pattern forming method having a step A of forming a film having a thickness T on a substrate, using an actinic ray-sensitive or radiation-sensitive resin composition including a resin whose solubility in a developer changes by the action of an acid and an acid generator, a step B of exposing the film, and a step C of developing the exposed film using a developer to form a pattern, in which the film formed in the step A satisfies at least one of the following condition 1 or 2.Condition 1: In a case where the thickness T of the film is 800 nm or more, the value of γ is less than 10,000.Condition 2: In a case where the thickness T of the film is less than 800 nm, the value of γ is less than 5,000.

公开(公告)号：US20160147156A1

公开(公告)日：2016-05-26

申请号：US15011870

申请日：2016-02-01

Applicant: FUJIFILM Corporation

Inventor： Fumihiro YOSHINO

IPC: G03F7/32 ,  G03F7/20 ,  G03F7/038

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041

Abstract: The pattern formation method includes the following steps (i) to (iii): (i) a step in which an active-light-sensitive or radiation-sensitive resin composition is used to form a film whose solubility in a developer increases as the exposure dose increases from an unexposed state but then decreases once a predetermined exposure dose has been reached; (ii) a step in which the film is exposed; and (iii) a step in which a developer containing an organic solvent in the amount of 80% by mass or more with respect to the total amount of the developer is used to develop the exposed film.

Abstract translation: 图案形成方法包括以下步骤（i）至（iii）：（i）使用活性光敏感或辐射敏感性树脂组合物形成其在显影剂中的溶解度随着曝光量增加而增加的步骤 剂量从未曝光状态增加，但随着达到预定曝光剂量后降低; （ii）曝光胶片的步骤; 和（iii）使用含有相对于显影剂总量的80质量％以上的有机溶剂的显影剂显影露出的膜的工序。

公开(公告)号：US20160004157A1

公开(公告)日：2016-01-07

申请号：US14853574

申请日：2015-09-14

Applicant: FUJIFILM CORPORATION

Inventor： Junichi ITO ,  Akinori SHIBUYA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Kei YAMAMOTO ,  Fumihiro YOSHINO

IPC: G03F7/038 ,  G03F7/32 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/038 ,  C07C381/12 ,  C08F220/14 ,  C08F220/18 ,  C08F220/26 ,  C08F220/28 ,  C08F220/30 ,  C08F220/36 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  H01L21/0274

Abstract: A method of forming a pattern includes (a) forming a film of an actinic-ray- or radiation-sensitive resin composition, (b) exposing the film to light, and (c) developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern. The actinic-ray- or radiation-sensitive resin composition includes (A) a resin whose solubility in the developer comprising an organic solvent is lowered when acted on by an acid, which resin contains a repeating unit with any of lactone structures of general formula (1) below, and (B) a compound that when exposed to actinic rays or radiation, generates an acid.

Abstract translation: 形成图案的方法包括（a）形成光化射线或辐射敏感性树脂组合物的膜，（b）将膜曝光，和（c）用包含有机溶剂的显影剂显影曝光的膜 从而形成负模式。 光化射线或辐射敏感性树脂组合物包括（A）当在含有有机溶剂的显影剂中的溶解度降低的树脂（A）作用于酸时，树脂含有具有通式（III）的内酯结构的重复单元 1）和（B）当暴露于光化射线或辐射时产生酸的化合物。

公开(公告)号：US20150331314A1

公开(公告)日：2015-11-19

申请号：US14811926

申请日：2015-07-29

Applicant: FUJIFILM CORPORATION

Inventor： Shuhei YAMAGUCHI ,  Takamitsu TOMIGA ,  Fumihiro YOSHINO ,  Hajime FURUTANI ,  Michihiro SHIRAKAWA ,  Mitsuhiro FUJITA

IPC: G03F7/004 ,  C07D409/02 ,  G03F7/32 ,  C07C311/48 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07C311/48 ,  C07C381/12 ,  C07C2601/16 ,  C07D409/02 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a group capable of decomposing by an action of an acid to produce a polar group, (C1) a compound containing a group capable of generating a first acidic functional group upon irradiation with an actinic ray or radiation and a group capable of generating a second acidic functional group different from the first acidic functional group upon irradiation with an actinic ray or radiation, and (C2) at least one compound containing two or more groups selected from the group consisting of the groups capable of generating the structures represented by the specific formulae upon irradiation with an actinic ray or radiation.

Abstract translation: 提供了一种光化射线敏感性或辐射敏感性树脂组合物，其包含：（A）具有能够通过酸的作用分解以产生极性基团的基团的树脂，（C1）含有能够产生的基团的化合物 通过光化射线或辐射照射后的第一酸性官能团和能够产生与光化射线或辐射照射时不同于第一酸性官能团的第二酸性官能团的基团，和（C2）至少一种含有两个 或更多选自由能够产生由光化射线或辐射照射的特定化学式表示的结构的基团组成的组。

公开(公告)号：US20140141360A1

公开(公告)日：2014-05-22

申请号：US14164389

申请日：2014-01-27

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Michihiro SHIRAKAWA ,  Fumihiro YOSHINO

IPC: G03F7/038

CPC classification number: G03F7/0382 ,  C08F20/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit represented by the following formula (I) or (II) as defined in the specification in an amount of 20 mol % or more based on all repeating units in the resin (P) and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, so as to form an exposed film; and (iii) a step of developing the exposed film by using a developer containing an organic solvent to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）从含有（P）具有（a1）由下式（I）表示的重复单元的树脂或（a1）由下式（I）表示的重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤， （II），基于树脂（P）中的所有重复单元为20摩尔％以上，（B）在光化射线或辐射照射时能够产生酸的化合物; （ii）曝光胶片的步骤，以形成曝光胶片; 和（iii）通过使用包含有机溶剂的显影剂形成负图案来显影所述曝光的薄膜的步骤。