公开(公告)号：US20240004293A1

公开(公告)日：2024-01-04

申请号：US18468245

申请日：2023-09-15

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Akiyoshi GOTO ,  Hideyuki ISHIHARA ,  Michihiro SHIRAKAWA ,  Yosuke BEKKI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08F220/18 ,  C08F220/38 ,  C08F220/28 ,  C08F220/36 ,  C08F212/14

CPC classification number: G03F7/039 ,  C08F220/282 ,  G03F7/038 ,  C08F220/1809 ,  C08F220/382 ,  C08F220/281 ,  C08F220/1808 ,  C08F220/283 ,  C08F220/365 ,  C08F220/1807 ,  C08F220/1806 ,  C08F220/1811 ,  C08F212/22 ,  C08F220/1818 ,  G03F7/0045

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin which is decomposed by action of acid to increase polarity; and (B) a compound which generates an acid by irradiation with an actinic ray or a radiation, in which the resin (A) and the acid generated from the compound (B) form a bond by the actinic ray or the radiation or by the action of acid.

公开(公告)号：US20230400769A1

公开(公告)日：2023-12-14

申请号：US18457908

申请日：2023-08-29

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Hideyuki ISHIHARA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA

IPC: G03F7/039

CPC classification number: G03F7/039

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition containing, (A) a resin which is decomposed by action of acid to increase polarity; and an ionic compound, in which the ionic compound contains (B) an ionic compound which generates an acid by irradiation with an actinic ray or a radiation and (C) an ionic compound which is decomposed by irradiation with an actinic ray or a radiation to reduce acid-trapping property, or contains (D) an ionic compound which generates an acid by irradiation with an actinic ray or a radiation and is decomposed by irradiation with an actinic ray or a radiation to reduce acid-trapping property, and the resin (A) has a repeating unit represented by the Formula (1).

公开(公告)号：US20230043143A1

公开(公告)日：2023-02-09

申请号：US17896712

申请日：2022-08-26

Applicant: FUJIFILM Corporation

Inventor： Aina USHIYAMA ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA

IPC: G03F7/029 ,  G03F7/30

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a salt including a sulfonium cation having an aryl group substituted with an acid-decomposable group-containing group and having at least three fluorine atoms; and a resin having a polarity that increases through decomposition by an action of an acid, in which the acid-decomposable group-containing group includes a group having a polarity that increases through decomposition by an action of an acid, and the acid-decomposable group-containing group includes no fluorine atom.

公开(公告)号：US20220382153A1

公开(公告)日：2022-12-01

申请号：US17877316

申请日：2022-07-29

Applicant: FUJIFILM Corporation

Inventor： Akira TAKADA ,  Akiyoshi GOTO ,  Kazunari YAGI ,  Michihiro SHIRAKAWA ,  Kazuhiro MARUMO

IPC: G03F7/039 ,  G03F7/20

Abstract: The present invention provides a positive tone resist composition containing (A) an ionic compound and (B) a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays; a resist film formed of the positive tone resist composition; a pattern forming method; and a method for manufacturing an electronic device.

公开(公告)号：US20220082938A1

公开(公告)日：2022-03-17

申请号：US17536085

申请日：2021-11-28

Applicant: FUJIFILM Corporation

Inventor： Aina USHIYAMA ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Keita KATO ,  Hironori OKA

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C381/12 ,  C07C309/12 ,  C07C309/42 ,  C07D283/00 ,  C07C309/06 ,  C07C309/29 ,  C07C309/19

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including one or more specific compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3), and an acid-decomposable resin.

公开(公告)号：US20180275518A1

公开(公告)日：2018-09-27

申请号：US15994521

申请日：2018-05-31

Applicant: FUJIFILM Corporation

Inventor： Naoki INOUE ,  Naohiro TANGO ,  Michihiro SHIRAKAWA ,  Akiyoshi GOTO

IPC: G03F7/11 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  G03F7/40 ,  C08F220/16 ,  C08F220/28

CPC classification number: G03F7/11 ,  C08F220/16 ,  C08F220/28 ,  C08F2220/283 ,  G03F7/091 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

Abstract: One embodiment of the present invention provides a pattern forming method including a step for forming an actinic ray-sensitive or radiation-sensitive film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition, a step for forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film using a composition for forming an upper layer film, a step for exposing a laminate film including the actinic ray-sensitive or radiation-sensitive film and the upper layer film, and a step for developing the exposed laminate film using a developer including an organic solvent. The composition for forming an upper layer film contains a resin (XA), a resin (XB) containing fluorine atoms, a basic compound (XC), and a solvent (XD), and the resin (XA) is a resin not containing fluorine atoms, or in a case where the resin (XA) contains fluorine atoms, the resin (XA) is a resin having a lower content of fluorine atoms than that in the resin (XB), based on a mass.

公开(公告)号：US20170322490A1

公开(公告)日：2017-11-09

申请号：US15657295

申请日：2017-07-24

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Keita KATO ,  Keiyu OU

IPC: G03F7/075 ,  G03F7/004 ,  G03F7/32 ,  G03F7/20 ,  G03F7/38 ,  G03F7/16

CPC classification number: G03F7/0758 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325 ,  G03F7/38

Abstract: A method for producing an electronic device includes the pattern forming method, and an actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development. Specifically, provided is a pattern forming method, including a film forming step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition, an exposure step of irradiating the film, and a development step of developing the film using a developer containing an organic solvent, in which the composition contains a resin containing a repeating unit having an Si atom and a repeating unit having an acid-decomposable group and a compound capable of generating an acid upon irradiation with actinic rays or radiation, the content of Si atoms in the resin is 1.0 to 30 mass %, and the content of the resin in the total solid content of the composition is 20 mass % or more.

公开(公告)号：US20170199461A1

公开(公告)日：2017-07-13

申请号：US15470113

申请日：2017-03-27

Applicant: FUJIFILM Corporation

Inventor： Kei YAMAMOTO ,  Naohiro TANGO ,  Naoki INOUE ,  Michihiro SHIRAKAWA ,  Akiyoshi GOTO

IPC: G03F7/11 ,  G03F7/16 ,  G03F7/32 ,  C08F220/18 ,  C08F220/28 ,  H01L21/027 ,  G03F7/20 ,  G03F7/38 ,  G03F7/40 ,  G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  G03F7/09

Abstract: The present invention has an object to provide a pattern forming method capable of providing good DOF and EL, a resist pattern formed by the pattern forming method, and a method for manufacturing an electronic device, including the pattern forming method. The pattern forming method of the present invention includes a step a of coating an active-light-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film, a step b of coating a composition for forming an upper layer film onto the resist film to form an upper layer film on the resist film, a step c of exposing the resist film having the upper layer film formed thereon, and a step d of developing the exposed resist film using a developer to form a pattern, in which the active-light-sensitive or radiation-sensitive resin composition contains a hydrophobic resin.

公开(公告)号：US20150253662A1

公开(公告)日：2015-09-10

申请号：US14721249

申请日：2015-05-26

Applicant: FUJIFILM Corporation

Inventor： Keita KATO ,  Michihiro SHIRAKAWA ,  Hidenori TAKAHASHI ,  Shoichi SAITOH ,  Fumihiro YOSHINO

IPC: G03F7/038 ,  C08F212/08 ,  C08F216/10 ,  C08F216/16 ,  C08F220/18 ,  C08F220/28

CPC classification number: G03F7/038 ,  C08F212/08 ,  C08F216/10 ,  C08F216/165 ,  C08F220/18 ,  C08F220/28 ,  C08F2220/1825 ,  C08F2220/283 ,  C08F2220/285 ,  C08L33/06 ,  G03F7/0397 ,  G03F7/325

Abstract: According to an exemplary embodiment of the present invention, there is provided an actinic ray-sensitive or radiation-sensitive resin composition includes an aromatic group and a resin (A) that may include (i) a repeating unit having a group capable of decomposing by the action of an acid to generate a polar group and (ii) a repeating unit having a polar group other than a phenolic hydroxyl group, wherein the total content of the repeating units (i) and (ii) is 51 mol % or more based on the entire repeating units in the resin (A).

Abstract translation: 根据本发明的示例性实施方案，提供了包含芳族基团和树脂（A）的光化射线敏感或辐射敏感性树脂组合物，其可以包括（i）具有能够通过以下方式分解的基团的重复单元： 酸的产生极性基团的作用和（ii）具有除酚羟基以外的极性基团的重复单元，其中重复单元（i）和（ii）的总含量为51摩尔％以上 在树脂（A）中的整个重复单元上。

公开(公告)号：US20150248056A1

公开(公告)日：2015-09-03

申请号：US14713215

申请日：2015-05-15

Applicant: FUJIFILM Corporation

Inventor： Michihiro SHIRAKAWA ,  Keita KATO ,  Tadahiro ODANI ,  Atsushi NAKAMURA ,  Hidenori TAKAHASHI ,  Kaoru IWATO

IPC: G03F7/095 ,  G03F7/075 ,  G03F7/038

CPC classification number: G03F7/095 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/091 ,  G03F7/094 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  H01L21/0271

Abstract: A pattern forming method contains: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）通过使用第一树脂组合物（I）在基材上形成第一膜的步骤，（ii）通过使用第二树脂组合物在第一膜上形成第二膜的步骤 II），（iii）暴露具有第一膜和第二膜的多层膜的步骤，和（iv）在暴露的第一膜和第二膜中显影第一膜和第二膜的步骤 通过使用含有机溶剂的显影剂形成负图案的多层膜。