公开(公告)号：US09081279B2

公开(公告)日：2015-07-14

申请号：US14158490

申请日：2014-01-17

Applicant: FUJIFILM Corporation

Inventor： Hiromi Kanda ,  Shinichi Kanna

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/075 ,  G03F7/20 ,  G03F7/30 ,  C07C69/653

CPC classification number: G03F7/0397 ,  C07C69/653 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322

Abstract: A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.

Abstract translation: 正型抗蚀剂组合物包括：（A）在酸的作用下在碱性显影剂中的溶解度增加的树脂; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; （C）具有氟原子和硅原子中的至少一个的树脂; 和（D）溶剂; 以及使用正性抗蚀剂组合物的图案形成方法。

公开(公告)号：US08883378B2

公开(公告)日：2014-11-11

申请号：US13970749

申请日：2013-08-20

Applicant: FUJIFILM Corporation

Inventor： Shinichi Kanna ,  Kazuya Oota ,  Masaru Yoshikawa ,  Yoshihiko Fujie ,  Shigekazu Suzuki

IPC: G02B5/20 ,  G03F7/004 ,  G02F1/1335

CPC classification number: G02B5/223 ,  C07D207/335 ,  C07D207/34 ,  C07D403/06 ,  C09B23/0008 ,  C09B23/04 ,  C09B57/00 ,  C09B67/0033 ,  C09B69/105 ,  G02B1/04 ,  G03C1/735 ,  G03F7/0007 ,  G03F7/105

Abstract: The present invention provides a colored curable composition including a phthalocyanine pigment, a dioxazine pigment, a dye, a polymerization initiator, a polymerizable compound and a solvent; and a colored curable composition including a phthalocyanine pigment, a dye multimer having a polymerizable group and a group derived from a dipyrromethene dye, a polymerization initiator, a polymerizable compound and a solvent.

Abstract translation: 本发明提供了包含酞菁颜料，二恶嗪颜料，染料，聚合引发剂，聚合性化合物和溶剂的着色固化性组合物。 以及包含酞菁颜料，具有可聚合基团的染料多聚体和衍生自二吡咯亚甲基染料的聚合引发剂，可聚合化合物和溶剂的着色固化组合物。

公开(公告)号：US11669013B2

公开(公告)日：2023-06-06

申请号：US15898318

申请日：2018-02-16

Applicant: FUJIFILM Corporation

Inventor： Shinichi Kanna

IPC: G03F7/027 ,  G03F7/033 ,  G03F7/038 ,  C08F265/06 ,  C09D4/06 ,  G06F3/041 ,  C08F2/48 ,  G06F3/044 ,  C07D251/32 ,  C07D403/12 ,  C08F222/20 ,  C08J5/18 ,  G03F7/004 ,  G03F7/031

CPC classification number: G03F7/033 ,  C07D251/32 ,  C07D403/12 ,  C08F2/48 ,  C08F222/20 ,  C08F265/06 ,  C08J5/18 ,  C09D4/06 ,  G03F7/0045 ,  G03F7/027 ,  G03F7/031 ,  G06F3/041 ,  G06F3/0443 ,  G06F3/0446 ,  G06F3/0448 ,  G06F3/04164 ,  C08J2335/02 ,  G06F2203/04103 ,  G06F2203/04111 ,  C09D4/06 ,  C08F265/06 ,  C08F265/06 ,  C08F222/10

Abstract: A composition for an electrode protective film of an electrostatic capacitance-type input device including (a) a binder polymer, (b) a photopolymerizable compound having an ethylenic unsaturated group, (c) a photopolymerization initiator, and (d) a compound capable of reacting with acidic groups or alcoholic hydroxy groups by heating, in which (b) the photopolymerizable compound having an ethylenic unsaturated group includes (b1) a photopolymerizable compound in which a value obtained by dividing a weight-average molecular weight by an average number of polymerizable groups is 270 or more can be used to form electrode protective films of electrostatic capacitance-type input devices having favorable bending resistance; an electrode protective film of an electrostatic capacitance-type input device; a transfer film; a laminate; an electrostatic capacitance-type input device; and an image display device.

公开(公告)号：US11567410B2

公开(公告)日：2023-01-31

申请号：US16752080

申请日：2020-01-24

Applicant: FUJIFILM Corporation

Inventor： Shinichi Kanna ,  Takashi Aridomi

IPC: H05K3/00 ,  G03F7/26 ,  G03F7/09 ,  G06F3/041 ,  H05K3/06

Abstract: Provided are a pattern formation method including a step of preparing a base material which has an etching layer transparent to an exposure wavelength on each of two surfaces thereof and is transparent to the exposure wavelength, a step of forming a photosensitive resin layer, in which an optical density to the exposure wavelength is in a range of 0.50 to 2.50, on the etching layer on each of the two surfaces of the base material, a step of pattern-exposing the photosensitive resin layer, a step of developing the photosensitive resin layer to form a resist pattern on two surfaces, a step of removing the etching layer on a portion that is not coated with the resist pattern, and a step of peeling the resist pattern off, in this order, a laminate, and a method of producing a touch panel.

公开(公告)号：US10507630B2

公开(公告)日：2019-12-17

申请号：US14721126

申请日：2015-05-26

Applicant: FUJIFILM Corporation

Inventor： Shinichi Kanna ,  Hideaki Ito

IPC: B32B27/08 ,  B32B27/00 ,  B32B27/20 ,  B32B27/30 ,  B32B37/14 ,  B32B37/24 ,  B32B37/26 ,  B32B38/10 ,  B32B7/02 ,  B32B37/00 ,  B32B37/02 ,  B32B38/00 ,  G06F3/044 ,  G06F3/041 ,  B32B3/10

Abstract: A transfer film has a temporary support, a first curable transparent resin layer, a second curable transparent resin layer which is disposed adjacent to the first curable transparent resin layer in this order. The refractive index of the second curable transparent resin layer is higher than the refractive index of the first curable transparent resin layer and equal to or greater than 1.6.

公开(公告)号：US20190137874A1

公开(公告)日：2019-05-09

申请号：US16238673

申请日：2019-01-03

Applicant: FUJIFILM Corporation

Inventor： Takashi ARIDOMI ,  Shinichi Kanna ,  Satoru Yamada

IPC: G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32

Abstract: Provided is a photosensitive composition including: a polymer (P) which includes a structural unit derived from a vinylbenzene derivative, a structural unit including a radical polymerizable group, and a structural unit including at least one kind of functional group selected from the group consisting of a primary hydroxyl group and an amino group, and in which the content of the structural unit derived from the vinylbenzene derivative is equal to or greater than 30% by mol; and a radical polymerization initiator.

公开(公告)号：US10157695B2

公开(公告)日：2018-12-18

申请号：US15347780

申请日：2016-11-10

Applicant: FUJIFILM CORPORATION

Inventor： Shinichi Kanna

IPC: C09D131/04 ,  H01B3/30 ,  C09D129/04 ,  C09D133/08 ,  C09D133/12 ,  C09D175/14 ,  G06F3/044 ,  H05K3/00 ,  H05K3/46 ,  C08G18/67 ,  C08G18/80 ,  C08L33/06 ,  C09D4/06

Abstract: A transfer material and a method of manufacturing the same, the transfer material including, in this order, a temporary support body, a first resin layer, and a second resin layer, the first resin layer not being water soluble, the second resin layer including a water soluble polymer, the second resin layer including a compound that has a heteroaromatic ring including a nitrogen atom as a ring member, and a content of the compound that has a heteroaromatic ring including a nitrogen atom as a ring member in the second resin layer being 3.0% by mass or greater with respect to a total solid content of the second resin layer. A laminated body including a substrate; an electrode pattern that is positioned above the substrate and that includes a metal in at least part of the electrode pattern; a second resin layer positioned above the electrode pattern; and a first resin layer positioned above the second resin layer, the second resin layer including a compound that has a heteroaromatic ring including a nitrogen atom as a ring member.

公开(公告)号：US09354514B2

公开(公告)日：2016-05-31

申请号：US13923537

申请日：2013-06-21

Applicant: FUJIFILM Corporation

Inventor： Toshiyuki Saie ,  Shinichi Kanna ,  Makoto Kubota ,  Yuzo Nagata

IPC: G03F7/004 ,  G02B5/20 ,  H01L27/14 ,  H01L31/0232 ,  G03F7/00 ,  G03F7/027 ,  G03F7/033 ,  G03F7/031

CPC classification number: G03F7/004 ,  G02B5/20 ,  G02B5/201 ,  G03F7/0007 ,  G03F7/0047 ,  G03F7/027 ,  G03F7/031 ,  G03F7/033 ,  H01L31/0232

Abstract: There is provided a photosensitive transparent composition for a color filter of a solid-state imaging device, containing (A) a photopolymerization initiator, (B) a polymerizable compound, and (C) an alkali-soluble resin, wherein the cured film obtained from the photosensitive transparent composition has a refractive index of 1.60 to 1.90 for light at a wavelength of 633 nm.

Abstract translation: 提供了一种用于固态成像装置的滤色器的光敏透明组合物，其包含（A）光聚合引发剂，（B）可聚合化合物和（C）碱溶性树脂，其中由 光敏透明组合物对于波长为633nm的光具有1.60至1.90的折射率。

公开(公告)号：US09291904B2

公开(公告)日：2016-03-22

申请号：US14549164

申请日：2014-11-20

Applicant: FUJIFILM Corporation

Inventor： Hideaki Tsubaki ,  Shinichi Kanna

IPC: G03F7/20 ,  G03F7/30 ,  G03F7/32 ,  G03F7/039 ,  G03F7/40

CPC classification number: G03F7/325 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/2002 ,  G03F7/2024 ,  G03F7/30 ,  G03F7/32 ,  G03F7/40 ,  Y10T428/24802

Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.

公开(公告)号：US11604413B2

公开(公告)日：2023-03-14

申请号：US16238673

申请日：2019-01-03

Applicant: FUJIFILM Corporation

Inventor： Takashi Aridomi ,  Shinichi Kanna ,  Satoru Yamada

IPC: G03F7/038 ,  G03F7/16 ,  G06F3/041 ,  C08F290/12 ,  G03F7/027 ,  H05K3/28 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

Abstract: Provided is a photosensitive composition including: a polymer (P) which includes a structural unit derived from a vinylbenzene derivative, a structural unit including a radical polymerizable group, and a structural unit including at least one kind of functional group selected from the group consisting of a primary hydroxyl group and an amino group, and in which the content of the structural unit derived from the vinylbenzene derivative is equal to or greater than 30% by mol; and a radical polymerization initiator.