公开(公告)号：US20130089948A1

公开(公告)日：2013-04-11

申请号：US13633664

申请日：2012-10-02

Applicant: First Solar, Inc.

Inventor： Gang Xiong ,  John Barden

IPC: H01L21/365 ,  B05B1/24

CPC classification number: C23C14/246 ,  C23C14/0629 ,  C23C14/228 ,  C23C16/45568

Abstract: An improved feeder system and method for vapor transport deposition that includes at least two vaporizers couple to a common distributor for vaporizing and co-depositing at least any two vaporizable materials as a material layer on a substrate. Composition of the material layer can be controlled by changing the flow of vapors from the respective vaporizers into the distributor to adjust the proportion of respective vapors in the combined vapor prior to deposition. Flow of the vapors from the respective vaporizers into the distributor may be controlled by adjusting the flow of carrier gas transporting the raw material into the vaporizer and/or by adjusting the vibration speed and/or amplitude of the powder feeders that process the raw material.

Abstract translation: 一种用于蒸气传输沉积的改进的馈送系统和方法，其包括至少两个蒸发器，其耦合到共同的分配器，用于将至少任意两种可蒸发材料作为材料层共沉积在基板上。 材料层的组成可以通过将蒸气从各蒸发器的流动改变为分布器来控制，以在沉积之前调节蒸气中各蒸气的比例。 可以通过调节将原料输送到蒸发器中的载气的流动和/或通过调节处理原料的粉末进料器的振动速度和/或振幅来控制从相应的蒸发器到分配器的蒸气的流动。

公开(公告)号：US20200270744A1

公开(公告)日：2020-08-27

申请号：US16758258

申请日：2018-10-24

Applicant: First Solar, Inc.

Inventor： Zhigang Ban ,  John Barden ,  Jerry Drennan ,  Litian Liu ,  Rick Powell ,  Nirav Vora ,  Yaojun Xu

IPC: C23C14/24

Abstract: Distributor assemblies for vapor transport deposition systems, and methods of conducting vapor transport deposition, are described.

公开(公告)号：US09337376B2

公开(公告)日：2016-05-10

申请号：US14551707

申请日：2014-11-24

Applicant: First Solar, Inc.

Inventor： Arnold Allenic ,  Zhigang Ban ,  John Barden ,  Benjamin Milliron ,  Rick C. Powell

IPC: H01L21/00 ,  H01L31/18 ,  C23C14/22 ,  H01L21/02 ,  C23C14/06 ,  C23C14/24 ,  H01L31/0296

CPC classification number: H01L31/1828 ,  C23C14/0629 ,  C23C14/228 ,  C23C14/243 ,  C23C14/246 ,  H01L21/02557 ,  H01L21/02562 ,  H01L21/0257 ,  H01L21/02573 ,  H01L21/02581 ,  H01L21/02617 ,  H01L21/02631 ,  H01L31/02963

Abstract: A multi-stage method and apparatus for vaporizing and depositing a tellurium containing semiconductor material on a substrate.

Abstract translation: 一种用于在衬底上蒸发并沉积含碲的半导体材料的多级方法和装置。

公开(公告)号：US20150171258A1

公开(公告)日：2015-06-18

申请号：US14625649

申请日：2015-02-19

Applicant: First Solar, Inc.

Inventor： Arnold Allenic ,  John Barden ,  Feng Liao ,  Xilin Peng ,  Rick C. Powell ,  Kenneth M. Ring ,  Gang Xiong

IPC: H01L31/18 ,  C23C16/455 ,  H01J37/34 ,  C23C16/48 ,  C23C16/448 ,  C23C16/28 ,  C23C16/52 ,  C23C16/40

CPC classification number: H01L31/18 ,  C23C16/28 ,  C23C16/40 ,  C23C16/402 ,  C23C16/407 ,  C23C16/4488 ,  C23C16/455 ,  C23C16/483 ,  C23C16/52 ,  H01J37/3476 ,  H01J2237/332 ,  H01L21/02551 ,  H01L21/02568 ,  H01L21/02573 ,  H01L21/0262 ,  H01L31/02963 ,  H01L31/073 ,  Y02E10/543

Abstract: A method and system for controlling the amount of a second material incorporated into a first material by controlling the amount of a third material which can interact with the second material.

Abstract translation: 一种用于通过控制可与第二材料相互作用的第三材料的量来控制结合到第一材料中的第二材料的量的方法和系统。

公开(公告)号：US09006020B2

公开(公告)日：2015-04-14

申请号：US13739183

申请日：2013-01-11

Applicant: First Solar, Inc.

Inventor： Gang Xiong ,  Rick C. Powell ,  Xilin Peng ,  John Barden ,  Arnold Allenic ,  Feng Liao ,  Kenneth M. Ring

IPC: H01L31/18 ,  H01L21/02 ,  H01L31/0296 ,  H01L31/073

CPC classification number: H01L31/18 ,  C23C16/28 ,  C23C16/40 ,  C23C16/402 ,  C23C16/407 ,  C23C16/4488 ,  C23C16/455 ,  C23C16/483 ,  C23C16/52 ,  H01J37/3476 ,  H01J2237/332 ,  H01L21/02551 ,  H01L21/02568 ,  H01L21/02573 ,  H01L21/0262 ,  H01L31/02963 ,  H01L31/073 ,  Y02E10/543

Abstract: A method and system for controlling the amount of a second material incorporated into a first material by controlling the amount of a third material which can interact with the second material.

Abstract translation: 一种用于通过控制可与第二材料相互作用的第三材料的量来控制结合到第一材料中的第二材料的量的方法和系统。

公开(公告)号：US20150079725A1

公开(公告)日：2015-03-19

申请号：US14551707

申请日：2014-11-24

Applicant: First Solar, Inc.

Inventor： Arnold Allenic ,  Zhigang Ban ,  John Barden ,  Benjamin Milliron ,  Rick C. Powell

IPC: H01L31/18 ,  H01L21/02 ,  H01L31/0296

CPC classification number: H01L31/1828 ,  C23C14/0629 ,  C23C14/228 ,  C23C14/243 ,  C23C14/246 ,  H01L21/02557 ,  H01L21/02562 ,  H01L21/0257 ,  H01L21/02573 ,  H01L21/02581 ,  H01L21/02617 ,  H01L21/02631 ,  H01L31/02963

Abstract: A multi-stage method and apparatus for vaporizing and depositing a tellurium containing semiconductor material on a substrate.

Abstract translation: 一种用于在衬底上蒸发并沉积含碲的半导体材料的多级方法和装置。

公开(公告)号：US08921147B2

公开(公告)日：2014-12-30

申请号：US13966663

申请日：2013-08-14

Applicant: First Solar, Inc.

Inventor： Arnold Allenic ,  Zhigang Ban ,  John Barden ,  Benjamin Milliron ,  Rick C. Powell

IPC: H01L21/00 ,  H01L21/02 ,  C23C14/22 ,  C23C14/24 ,  H01L31/18

CPC classification number: H01L31/1828 ,  C23C14/0629 ,  C23C14/228 ,  C23C14/243 ,  C23C14/246 ,  H01L21/02557 ,  H01L21/02562 ,  H01L21/0257 ,  H01L21/02573 ,  H01L21/02581 ,  H01L21/02617 ,  H01L21/02631 ,  H01L31/02963

Abstract: A multi-stage method and apparatus for vaporizing and depositing a tellurium containing semiconductor material on a substrate.

Abstract translation: 一种用于在衬底上蒸发并沉积含碲的半导体材料的多级方法和装置。

公开(公告)号：US20140051206A1

公开(公告)日：2014-02-20

申请号：US13966663

申请日：2013-08-14

Applicant: First Solar, Inc

Inventor： Arnold Allenic ,  Zhigang Ban ,  John Barden ,  Benjamin Milliron ,  Rick C. Powell

IPC: H01L31/18

CPC classification number: H01L31/1828 ,  C23C14/0629 ,  C23C14/228 ,  C23C14/243 ,  C23C14/246 ,  H01L21/02557 ,  H01L21/02562 ,  H01L21/0257 ,  H01L21/02573 ,  H01L21/02581 ,  H01L21/02617 ,  H01L21/02631 ,  H01L31/02963

Abstract: A multi-stage method and apparatus for vaporizing and depositing a tellurium containing semiconductor material on a substrate.

Abstract translation: 一种用于在衬底上蒸发并沉积含碲的半导体材料的多级方法和装置。

公开(公告)号：US20130183794A1

公开(公告)日：2013-07-18

申请号：US13739183

申请日：2013-01-11

Applicant: First Solar, Inc.

Inventor： Gang Xiong ,  Rick C. Powell ,  Xilin Peng ,  John Barden ,  Arnold Allenic ,  Feng Liao ,  Kenneth M. Ring

IPC: H01L31/18

CPC classification number: H01L31/18 ,  C23C16/28 ,  C23C16/40 ,  C23C16/402 ,  C23C16/407 ,  C23C16/4488 ,  C23C16/455 ,  C23C16/483 ,  C23C16/52 ,  H01J37/3476 ,  H01J2237/332 ,  H01L21/02551 ,  H01L21/02568 ,  H01L21/02573 ,  H01L21/0262 ,  H01L31/02963 ,  H01L31/073 ,  Y02E10/543

Abstract: A method and system for controlling the amount of a second material incorporated into a first material by controlling the amount of a third material which can interact with the second material.