公开(公告)号：US4001035A

公开(公告)日：1977-01-04

申请号：US619929

申请日：1975-10-06

申请人： Masahiko Ito ,  Hiromichi Wada ,  Fumio Kondo ,  Fukio Kai

发明人： Masahiko Ito ,  Hiromichi Wada ,  Fumio Kondo ,  Fukio Kai

IPC分类号： C09B63/00 ,  C09B67/20 ,  C09D17/00 ,  C08J3/22

CPC分类号： C09B63/00 ,  C09B67/006 ,  C09D17/00

摘要： A coloring composition which comprises a pigment, a carrier resin and an organic compound, such as a phenol or an amine, containing an active hydrogen atom, which composition is mixed under high shear stress.

公开(公告)号：US20100322834A1

公开(公告)日：2010-12-23

申请号：US12225410

申请日：2006-04-13

申请人： Takehiko Ito ,  Fumio Kondo

发明人： Takehiko Ito ,  Fumio Kondo

IPC分类号： B01D53/56 ,  B01J19/00

CPC分类号： B01D53/8625 ,  B01D2257/404 ,  Y02C20/10

摘要： An apparatus for treating gas containing nitrous oxide, according to the present invention, includes dampers (113-116, 118-120, and 123-125) for introducing gas to be treated and for exhausting treated gas; a plurality of heat accumulating layers (102) charged with ceramic heat storage media; a plurality of catalyst layers (103) arranged in accordance with the respective heat accumulating layers, heat-decomposing nitrous oxide contained in the introduced gas to be treated into nitrogen; and a heating device (107) for increasing a temperature of the introduced gas to be treated to a heat-decomposable temperature in the catalyst layers.

摘要翻译： 根据本发明的用于处理含有一氧化二氮的气体的设备包括用于引入待处理气体和排出处理气体的阻尼器（113-116,118-120和123-125） 装有陶瓷储热介质的多个蓄热层（102）; 根据各个蓄热层布置的多个催化剂层（103），将待处理的导入气体中所含的一氧化二氮分解成氮气; 以及用于将待处理的引入气体的温度升高到催化剂层中的可热分解温度的加热装置（107）。

公开(公告)号：US07223690B2

公开(公告)日：2007-05-29

申请号：US10976040

申请日：2004-10-29

申请人： Fumio Kondo ,  Koji Mishima ,  Akira Tanaka ,  Yoko Suzuki ,  Tetsuji Togawa ,  Hiroaki Inoue

发明人： Fumio Kondo ,  Koji Mishima ,  Akira Tanaka ,  Yoko Suzuki ,  Tetsuji Togawa ,  Hiroaki Inoue

IPC分类号： H01L21/4763 ,  H01L21/44 ,  H01L21/48 ,  H01L21/50

CPC分类号： H01L21/67161 ,  B24B37/005 ,  B24B37/042 ,  B24B37/245 ,  B24B37/345 ,  B24B41/061 ,  B24B49/16 ,  C23C18/1632 ,  C23C18/1653 ,  C25D7/123 ,  H01L21/02074 ,  H01L21/02087 ,  H01L21/0209 ,  H01L21/288 ,  H01L21/2885 ,  H01L21/3212 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67219 ,  H01L21/6723 ,  H01L21/67393 ,  H01L21/67396 ,  H01L21/67772 ,  H01L21/7684 ,  H01L21/76843 ,  H01L21/76849 ,  H01L21/76864 ,  H01L21/76873 ,  H01L21/76874 ,  H01L21/76877

摘要： A substrate processing method comprising steps for forming a copper film on a surface of a substrate. These steps includes the step of filling a first metal in the trenches so as to form a plated film of the first metal on an entire surface of the substrate by electroplating, wherein the electromagnetic field is adjusted by the virtual anode so that differences of thickness of the plated film between the central portion and the peripheral portion of the substrate being minimized, and polishing and removing the plated film by pressing the substrate to the polishing surface, wherein the pressures pressing the substrate to the polishing surface at a central portion and a peripheral portion are adjusted.

摘要翻译： 一种基板处理方法，包括在基板的表面上形成铜膜的步骤。 这些步骤包括在沟槽中填充第一金属以便通过电镀在基板的整个表面上形成第一金属的镀膜的步骤，其中电磁场由虚拟阳极调节，使得厚度差异 基板的中心部分和周边部分之间的镀膜最小化，并且通过将基板压在研磨表面上来研磨和去除镀膜，其中将基板压在抛光表面的压力在中心部分和周边 部分进行调整。

公开(公告)号：US06828225B2

公开(公告)日：2004-12-07

申请号：US10787218

申请日：2004-02-27

申请人： Fumio Kondo ,  Koji Mishima ,  Akira Tanaka ,  Yoko Suzuki ,  Tetsuji Togawa ,  Hiroaki Inoue

发明人： Fumio Kondo ,  Koji Mishima ,  Akira Tanaka ,  Yoko Suzuki ,  Tetsuji Togawa ,  Hiroaki Inoue

IPC分类号： H01L214763

CPC分类号： H01L21/67161 ,  B24B37/005 ,  B24B37/042 ,  B24B37/245 ,  B24B37/345 ,  B24B41/061 ,  B24B49/16 ,  C23C18/1632 ,  C23C18/1653 ,  C25D7/123 ,  H01L21/02074 ,  H01L21/02087 ,  H01L21/0209 ,  H01L21/288 ,  H01L21/2885 ,  H01L21/3212 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67219 ,  H01L21/6723 ,  H01L21/67393 ,  H01L21/67396 ,  H01L21/67772 ,  H01L21/7684 ,  H01L21/76843 ,  H01L21/76849 ,  H01L21/76864 ,  H01L21/76873 ,  H01L21/76874 ,  H01L21/76877

摘要： A substrate procesing method comprising steps for forming a copper film on a surface of a substrate. These steps includes the step of filling a first metal in the trenches so as to form a plated film of the first metal on an entire surface of the substrate by electroplating, wherein the electromagnetic field is adjusted by the virtual anode so that differences of thickness of the plated film between the central portion and the peripheral portion of the substrate being minimized, and polishing and removing the plated film by pressing the substrate to the polishing surface, wherein the pressures pressing the substrate to the polishing surface at a central portion and a peripheral portion are adjusted.

摘要翻译： 一种基板处理方法，包括在基板的表面上形成铜膜的步骤。 这些步骤包括在沟槽中填充第一金属以便通过电镀在基板的整个表面上形成第一金属的镀膜的步骤，其中电磁场由虚拟阳极调节，使得厚度差异 基板的中心部分和周边部分之间的镀膜最小化，并且通过将基板压在研磨表面上来研磨和去除镀膜，其中将基板压在抛光表面的压力在中心部分和周边 部分进行调整。

公开(公告)号：US06790763B2

公开(公告)日：2004-09-14

申请号：US10182835

申请日：2002-10-11

申请人： Fumio Kondo ,  Koji Mishima ,  Akira Tanaka ,  Yoko Suzuki ,  Tetsuji Togawa ,  Hiroaki Inoue

发明人： Fumio Kondo ,  Koji Mishima ,  Akira Tanaka ,  Yoko Suzuki ,  Tetsuji Togawa ,  Hiroaki Inoue

IPC分类号： H01L214763

CPC分类号： H01L21/67161 ,  B24B37/005 ,  B24B37/042 ,  B24B37/245 ,  B24B37/345 ,  B24B41/061 ,  B24B49/16 ,  C23C18/1632 ,  C23C18/1653 ,  C25D7/123 ,  H01L21/02074 ,  H01L21/02087 ,  H01L21/0209 ,  H01L21/288 ,  H01L21/2885 ,  H01L21/3212 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67219 ,  H01L21/6723 ,  H01L21/67393 ,  H01L21/67396 ,  H01L21/67772 ,  H01L21/7684 ,  H01L21/76843 ,  H01L21/76849 ,  H01L21/76864 ,  H01L21/76873 ,  H01L21/76874 ,  H01L21/76877

摘要： A substrate processing method comprising steps for forming a copper film on a surface of a substrate. These steps includes the step of filling a first metal in the trenches so as to form a plated film of the first metal on an entire surface of the substrate by electroplating, wherein the electromagnetic field is adjusted by the virtual anode so that differences of thickness of the plated film between the central portion and the peripheral portion of the substrate being minimized, and polishing and removing the plated film by pressing the substrate to the polishing surface, wherein the pressures pressing the substrate to the polishing surface at a central portion and a peripheral portion are adjusted.

公开(公告)号：US5398481A

公开(公告)日：1995-03-21

申请号：US62853

申请日：1993-05-18

申请人： Noriyuki Takeuchi ,  Masaaki Kajiyama ,  Fumio Kondo ,  Masao Matsumura ,  Takeshi Yoshioka

发明人： Noriyuki Takeuchi ,  Masaaki Kajiyama ,  Fumio Kondo ,  Masao Matsumura ,  Takeshi Yoshioka

IPC分类号： H01L21/677 ,  H01L21/00 ,  B65B49/05

CPC分类号： H01L21/67772

摘要： Several vacuum process steps are applied to substrates such as a wafer using a vacuum container for storing and transporting the substrates under vacuum. The vacuum container comprises a container body having a main opening for inserting a substrate and taking out the substrate, a lid engageable with the container body for closing and sealing the main opening of the container body, and a gate provided on one of the container body and the lid for performing at least one of evacuating an interior of the vacuum container and raising the pressure of the interior of the vacuum container to ambient.

摘要翻译： 将几个真空处理步骤应用于诸如使用真空容器的晶片等基板，以在真空下储存和输送基板。 真空容器包括容器本体，其具有用于插入基板的主开口和取出基板，与容器主体接合的盖子，用于封闭和密封容器主体的主开口;以及门，其设置在容器主体中的一个上 以及用于执行至少一个抽真空容器的内部并将真空容器内部的压力提高到环境的盖子。

公开(公告)号：US5120618A

公开(公告)日：1992-06-09

申请号：US563252

申请日：1990-08-06

申请人： Kiju Mori ,  Nobuhisa Kanemitsu ,  Junichi Watanabe ,  Mitsuru Kagawa ,  Kazuhiro Hasegawa ,  Shigehiro Mochizuki ,  Fumio Kondo

发明人： Kiju Mori ,  Nobuhisa Kanemitsu ,  Junichi Watanabe ,  Mitsuru Kagawa ,  Kazuhiro Hasegawa ,  Shigehiro Mochizuki ,  Fumio Kondo

IPC分类号： H05B33/10

CPC分类号： H05B33/10 ,  Y10S428/917

摘要： An electroluminescent panel and a method of manufacturing the same which comprises: forming a roll of luminous base film which includes a luminous layer made of phosphors embedded in an insulating material, the luminous layer being laminated upon a conductive film; forming a roll of a transparent conductive film; passing the luminous base film and the transparent conductive film between a pair of rollers while sandwiching a power supply bus bar made of a metal film therebetween, to thereby form the luminous film, the transparent conductive film and the power supply bus bar into an integrated body by means of pressurized heating; cutting the integrated body into at least one piece having a predetermined length; and mounting a terminal to the at least one piece packaging the at least one piece with a moisture proof film.

公开(公告)号：US08047033B2

公开(公告)日：2011-11-01

申请号：US12078035

申请日：2008-03-26

申请人： Fumio Kondo ,  Shoichi Takenouchi ,  Takayuki Nakanishi ,  Osamu Matsui

发明人： Fumio Kondo ,  Shoichi Takenouchi ,  Takayuki Nakanishi ,  Osamu Matsui

IPC分类号： B21B37/48

CPC分类号： B21D43/04 ,  B21C49/00

摘要： A plurality of press devices 2 are arranged in a plastic working system. The plastic working system includes: a loop correction sensor 13 for watching a slack of a coil material C intermittently delivered from a preceding first press device 2a; and a second slack watching means 19 for watching a slack of the coil material C generated at the time of sending the coil material C to a succeeding second press device 2b. According to the slack generated by intermittent feeding of the coil material C sent from the first press device 2a, intermittent feeding is converted to continuous feeding by the feeding means 15. At the same time, the continuous feeding speed is subjected to speed increasing/decreasing control. On the other hand, by the second slack watching means 19, a slack of the coil material C is watched at the time of feeding the coil material C to the second press device 2b and the preceding first press device 2a is subjected to speed increasing/decreasing control.

摘要翻译： 多个按压装置2布置在塑料加工系统中。 塑料加工系统包括：环路校正传感器13，用于观察从前一个第一压制装置2a间歇地传送的线圈材料C的松弛; 以及第二松弛观察装置19，用于观察在将线圈材料C发送到后续的第二按压装置2b时产生的线圈材料C的松弛。 根据从第一按压装置2a发送的线圈材料C的间歇进给产生的松弛，通过进给装置15将间歇进给转换为连续进给。同时，连续进给速度经受加速/减小 控制。 另一方面，通过第二松弛观察装置19，在将线圈材料C馈送到第二压力装置2b时观察到线圈材料C的松弛，并且将前一个第一压制装置2a进行加速/ 减少控制。

公开(公告)号：US20080302153A1

公开(公告)日：2008-12-11

申请号：US12078035

申请日：2008-03-26

申请人： Fumio Kondo ,  Shoichi Takenouchi ,  Takayuki Nakanishi ,  Osamu Matsui

发明人： Fumio Kondo ,  Shoichi Takenouchi ,  Takayuki Nakanishi ,  Osamu Matsui

IPC分类号： B21B41/10 ,  B21D43/00 ,  B21C47/34 ,  B21B37/48

CPC分类号： B21D43/04 ,  B21C49/00

摘要： A plurality of press devices 2 are arranged in a plastic working system. The plastic working system includes: a loop correction sensor 13 for watching a slack of a coil material C intermittently delivered from a preceding first press device 2a; and a second slack watching means 19 for watching a slack of the coil material C generated at the time of sending the coil material C to a succeeding second press device 2b. According to the slack generated by intermittent feeding of the coil material C sent from the first press device 2a, intermittent feeding is converted to continuous feeding by the feeding means 15. At the same time, the continuous feeding speed is subjected to speed increasing/decreasing control. On the other hand, by the second slack watching means 19, a slack of the coil material C is watched at the time of feeding the coil material C to the second press device 2b and the preceding first press device 2a is subjected to speed increasing/decreasing control.

摘要翻译： 多个按压装置2布置在塑料加工系统中。 塑料加工系统包括：环路校正传感器13，用于观察从前一个第一压制装置2a间歇地传送的线圈材料C的松弛; 以及第二松弛观察装置19，用于观察在将线圈材料C发送到后续的第二按压装置2b时产生的线圈材料C的松弛。 根据从第一按压装置2a发送的线圈材料C的间歇进给产生的松弛，通过进给装置15将间歇进给转换为连续进给。同时，连续进给速度经受加速/减小 控制。 另一方面，通过第二松弛观察装置19，在将线圈材料C馈送到第二压力装置2b时观察到线圈材料C的松弛，并且前一个第一压制装置2a经受增速/ 减少控制。

公开(公告)号：US5641054A

公开(公告)日：1997-06-24

申请号：US362451

申请日：1995-03-07

申请人： Satoshi Mori ,  Masao Matsumura ,  Yoichi Kanemitsu ,  Takeshi Yoshioka ,  Masaaki Kajiyama ,  Fumio Kondo ,  Yuji Shirao ,  Masato Eguchi ,  Hiroyuki Shinozaki ,  Yukio Ikeda ,  Masayoshi Hirose ,  Masaru Nakaniwa ,  Norio Kimura ,  Katsuaki Usui ,  Katsuyuki Aoki

发明人： Satoshi Mori ,  Masao Matsumura ,  Yoichi Kanemitsu ,  Takeshi Yoshioka ,  Masaaki Kajiyama ,  Fumio Kondo ,  Yuji Shirao ,  Masato Eguchi ,  Hiroyuki Shinozaki ,  Yukio Ikeda ,  Masayoshi Hirose ,  Masaru Nakaniwa ,  Norio Kimura ,  Katsuaki Usui ,  Katsuyuki Aoki

IPC分类号： H01L21/00 ,  H01L21/677 ,  B65G35/00

CPC分类号： H01L21/67167 ,  H01L21/67184 ,  H01L21/67709 ,  H01L21/67736

摘要： A magnetic levitation conveyor apparatus has levitation electromagnets, linear motors, and displacement sensors which are disposed outside of a tunnel, and a carriage of simple structure which is movable in the tunnel. The carriage is of canned structure for preventing gases from being generated. The carriage of canned structure allows the tunnel to have a reduced cross-sectional area and to be filled with a highly purified atmosphere such as of a high vacuum. The tunnel has substantially orthogonal branches at a branched point. In the branched point, the carriage can move, while being lifted out of contact with the tunnel partition, with a directional change from a main conveyor passage into a branched conveyor passage. The magnetic levitation conveyor apparatus is highly practical as it can control the carriage to be lifted and moved as described above.

摘要翻译： PCT No.PCT / JP93 / 00930 Sec。 371日期：1995年3月7日 102（e）1995年3月7日PCT PCT 1993年7月6日PCT公布。 第WO94 / 01354号公报 日期1994年1月20日磁悬浮输送装置具有设置在隧道外部的悬浮电磁体，线性电动机和位移传感器，以及可在隧道中移动的简单结构的滑架。 滑架是用于防止产生气体的罐头结构。 罐头结构的支架允许隧道具有减小的横截面积，并且填充有高度净化的气氛，例如高真空。 隧道在分支点处具有大致正交的分支。 在分支点，托架可以在与主输送机通道分支输送通道的方向改变的同时被提升而不与隧道隔板接触。 磁悬浮输送装置是高度实用的，因为它可以如上所述地控制滑架被提升和移动。