公开(公告)号：US12113326B2

公开(公告)日：2024-10-08

申请号：US17817839

申请日：2022-08-05

Applicant: Gigaphoton Inc.

Inventor： Yoichi Sasaki ,  Kouji Kakizaki ,  Hakaru Mizoguchi

IPC: H01S3/036 ,  G03F7/20 ,  H01S3/038

CPC classification number: H01S3/036 ,  G03F7/2006 ,  H01S3/038

Abstract: A laser device according to an aspect of the present disclosure includes a chamber into which laser gas is introduced; a pair of electrodes arranged in the chamber; a power source configured to apply a voltage between the electrodes; a nozzle structure which includes an internal passage for receiving the laser gas and a slit connected to the internal passage and is configured to generate flow of the laser gas between the electrodes due to the laser gas blowing out from the slit; a gas flow path which has a suction port through which the laser gas in the chamber is suctioned and introduces, to the nozzle structure, the laser gas suctioned through the suction port; and a blower device configured to cause the laser gas to blow toward the internal passage of the nozzle structure through the gas flow path.

公开(公告)号：US09954339B2

公开(公告)日：2018-04-24

申请号：US15040645

申请日：2016-02-10

Applicant: GIGAPHOTON INC.

Inventor： Takashi Suganuma ,  Hakaru Mizoguchi ,  Osamu Wakabayashi

IPC: H01S3/00 ,  H05G2/00 ,  G02B27/28 ,  H01S3/23 ,  H01S3/038 ,  G03F7/20

CPC classification number: H01S3/005 ,  G02B27/286 ,  G03F7/70033 ,  G03F7/70041 ,  H01S3/038 ,  H01S3/2316 ,  H05G2/008

Abstract: There is provided a laser unit that may include: a master oscillator configured to output a linear-polarized laser light beam; a first polarization device disposed in a light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a polarization direction of the linearly-polarized incident laser light beam; a second polarization device disposed in the light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a direction of the polarization axis of the first polarization device; and a laser amplifier disposed between the first polarization device and the second polarization device in the light path of the linear-polarized laser light beam and including a pair of discharge electrodes disposed to oppose each other, an opposing direction of the pair of discharge electrodes being substantially aligned with the direction of the polarization axis of the first polarization device.

公开(公告)号：US09877378B2

公开(公告)日：2018-01-23

申请号：US15278629

申请日：2016-09-28

Applicant: Gigaphoton Inc.

Inventor： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC: H05G2/00 ,  H01S3/104 ,  H01S3/16 ,  H01S3/223 ,  H01S3/23 ,  H01S3/11 ,  H01S3/09 ,  H01S3/102 ,  H01S3/00

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/09 ,  H01S3/102 ,  H01S3/104 ,  H01S3/1106 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1673 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2366 ,  H01S3/2391 ,  H05G2/003 ,  H05G2/005

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US09507248B2

公开(公告)日：2016-11-29

申请号：US13681744

申请日：2012-11-20

Applicant: Gigaphoton Inc.

Inventor： Shinji Okazaki ,  Hakaru Mizoguchi ,  Junichi Fujimoto ,  Takashi Matsunaga ,  Kouji Kakizaki ,  Osamu Wakabayashi

IPC: G03F7/20 ,  G03B27/52

CPC classification number: G03B27/522 ,  G03F7/70408

Abstract: A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.

Abstract translation: 双光束干涉装置可以包括其上可以设置晶片的晶片台，分束器，用于将第一激光分离成具有沿晶片表面内的第一方向延伸的光束强度分布的第二和第三激光， 以及将第二和第三激光引导到晶片上的光学系统。 从垂直于第一方向的第二方向照射第二激光，从与第一方向垂直但与第二方向不同的第三方向照射第三激光，从而引起第二和第三激光的干涉 光在晶圆上。 该装置增加了双光束干涉曝光的精度。

公开(公告)号：US09465307B2

公开(公告)日：2016-10-11

申请号：US13907818

申请日：2013-05-31

Applicant: GIGAPHOTON INC.

Inventor： Hakaru Mizoguchi ,  Shinji Nagai

IPC: G03F7/20

CPC classification number: G03F7/70925

Abstract: A cleaning method for an EUV light generation apparatus may include closing a connection portion so that a chamber interior and the interior of an exposure apparatus do not communicate when EUV light is not being generated, supplying an etchant gas for etching debris that has accumulated on a reflective surface of an optical element to the chamber interior in a state where the connection portion is closed, and exhausting the chamber interior using an exhaust apparatus while supplying the etchant gas.

Abstract translation: EUV发光装置的清洁方法可以包括：关闭连接部分，使得当不产生EUV光时，室内部和曝光装置的内部不通信，提供用于蚀刻积聚在 在连接部分关闭的状态下将光学元件的反射表面连接到室内部，并且在供应蚀刻剂气体的同时使用排气装置排出室内部。

公开(公告)号：US09402297B2

公开(公告)日：2016-07-26

申请号：US14724737

申请日：2015-05-28

Applicant: GIGAPHOTON INC.

Inventor： Osamu Wakabayashi ,  Tatsuya Yanagida ,  Hakaru Mizoguchi

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003

Abstract: An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.

Abstract translation: 与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标供应源，用于将来自该区域中的激光装置的激光束聚焦的激光束聚焦光学系统，以及光学系统 用于控制激光束的光束强度分布。

公开(公告)号：US20150246848A1

公开(公告)日：2015-09-03

申请号：US14715189

申请日：2015-05-18

Applicant: Kyushu University, National University Corporation ,  Gigaphoton Inc.

Inventor： Hiroshi Ikenoue ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC: C03C23/00 ,  B23K26/03 ,  C03B33/02 ,  B23K26/06

CPC classification number: C03C23/0025 ,  B23K26/034 ,  B23K26/0622 ,  C03B33/0222 ,  H01S3/0092 ,  H01S3/0971 ,  H01S3/10015 ,  H01S3/1055 ,  H01S3/115 ,  H01S3/1301 ,  H01S3/134 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2375 ,  H01S3/2391 ,  Y02P40/57

Abstract: Included are a laser light source (10) configured to output pulsed laser light with an intensity peak in a wavelength range from 8 μm to 11 μm and a pulse width of 30 ns or less, an optical system (40) configured to condense the pulsed laser light toward a workpiece (70) and allow the workpiece to be irradiated with the condensed pulsed laser light, and a controller (60) configured to control a repetition frequency of the pulsed laser light that is to be outputted from the laser light source (10) to be 25 kHz or greater. This suppresses thermal diffusion and increases an absorption coefficient of a laser irradiated part of the workpiece (70), and suppresses a formed hole from being in a tapered shape and suppresses formation of uplifting around the hole upon performing of minute drilling.

Abstract translation: 包括：激光源（10），被配置为输出具有8μm至11μm的波长范围内的强度峰值和30ns或更小的脉冲宽度的脉冲激光;光学系统（40），被配置为使脉冲 激光朝向工件（70）并且允许工件用凝结的脉冲激光照射;以及控制器（60），其被配置为控制将从激光光源输出的脉冲激光的重复频率（ 10）为25kHz以上。 这抑制了热扩散并增加了工件（70）的激光照射部分的吸收系数，并且抑制了形成为锥形的孔，并且在进行微小钻孔时抑制了在孔附近形成隆起。

公开(公告)号：US08785895B2

公开(公告)日：2014-07-22

申请号：US13929668

申请日：2013-06-27

Applicant: Gigaphoton Inc.

Inventor： Hiroshi Umeda ,  Taku Yamazaki ,  Hakaru Mizoguchi ,  Toshihiro Nishisaka

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/20 ,  G03F7/70033 ,  H05G2/001 ,  H05G2/006

Abstract: A target supply apparatus mounted in a chamber in which extreme ultraviolet light is generated by introducing a target material and a laser beam into the chamber may include a target generator having a nozzle, a first pipe configured to cover the nozzle, a cover opening provided in the first pipe to allow the target material to pass through the first pipe, and a first valve configured to open and close the cover opening.

Abstract translation: 安装在通过将目标材料和激光束引入室中而产生极紫外光的室中的目标供给装置可以包括具有喷嘴的目标发生器，被配置为覆盖喷嘴的第一管， 允许目标材料通过第一管的第一管和构造成打开和关闭盖开口的第一阀。