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公开(公告)号:US09842745B2
公开(公告)日:2017-12-12
申请号:US14600595
申请日:2015-01-20
Applicant: Invensas Corporation
Inventor: Ilyas Mohammed , Masud Beroz
IPC: H01L21/48 , H01L23/14 , H01L23/00 , H01L21/52 , H01L21/768 , H01L23/495
CPC classification number: H01L21/4853 , H01L21/486 , H01L21/52 , H01L21/768 , H01L23/142 , H01L23/49568 , H01L24/97 , H01L2224/16225 , H01L2224/45124 , H01L2224/45139 , H01L2224/45144 , H01L2224/45147 , H01L2224/48091 , H01L2224/48472 , H01L2224/73265 , H01L2924/01322 , H01L2924/12041 , H01L2924/19107 , H01L2924/00014 , H01L2924/00 , H01L2924/00011
Abstract: Heat spreading substrate with embedded interconnects. In an embodiment in accordance with the present invention, an apparatus includes a metal parallelepiped comprising a plurality of wires inside the metal parallelepiped. The plurality of wires have a different grain structure than the metal parallelepiped. The plurality of wires are electrically isolated from the metal parallelepiped. The plurality of wires may be electrically isolated from one another.
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公开(公告)号:US20170179046A1
公开(公告)日:2017-06-22
申请号:US15449993
申请日:2017-03-05
Applicant: Invensas Corporation
Inventor: Liang Wang , Ilyas Mohammed , Masud Beroz
IPC: H01L23/00 , H01L23/544 , H01L21/02
CPC classification number: H01L23/562 , H01L21/02002 , H01L21/02035 , H01L21/02378 , H01L21/02381 , H01L21/02389 , H01L21/02392 , H01L21/02395 , H01L21/02414 , H01L21/6835 , H01L23/544 , H01L24/19 , H01L24/32 , H01L24/83 , H01L25/50 , H01L27/0207 , H01L33/005 , H01L33/0062 , H01L2924/12041 , H01L2924/12042 , H01L2924/13091 , H01L2924/351 , H01L2924/00
Abstract: In accordance with a first method embodiment, a plurality of piggyback substrates are attached to a carrier substrate. The edges of the plurality of the piggyback substrates are bonded to one another. The plurality of piggyback substrates are removed from the carrier substrate to form a substrate assembly. The substrate assembly is processed to produce a plurality of integrated circuit devices on the substrate assembly. The processing may use manufacturing equipment designed to process wafers larger than individual instances of the plurality of piggyback substrates.
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公开(公告)号:US20150171265A1
公开(公告)日:2015-06-18
申请号:US14629487
申请日:2015-02-23
Applicant: Invensas Corporation
Inventor: Liang Wang , Ilyas Mohammed , Masud Beroz
CPC classification number: H01L33/0075 , B82Y20/00 , H01L31/035236 , H01L31/105 , H01L33/0025 , H01L33/0066 , H01L33/06 , H01L33/24 , H01L33/32 , H01L33/62 , H01L2933/0033 , H01L2933/0066 , H01S5/2009 , H01S5/3205 , H01S5/3407 , H01S5/34333
Abstract: Improved quantum efficiency of multiple quantum wells. In accordance with an embodiment of the present invention, an article of manufacture includes a p side for supplying holes and an n side for supplying electrons. The article of manufacture also includes a plurality of quantum well periods between the p side and the n side, each of the quantum well periods includes a quantum well layer and a barrier layer, with each of the barrier layers having a barrier height. The plurality of quantum well periods include different barrier heights.
Abstract translation: 提高多量子阱的量子效率。 根据本发明的实施例,制品包括用于供应空穴的p侧和用于提供电子的n侧。 制品还包括在p侧和n侧之间的多个量子阱周期,每个量子阱周期包括量子阱层和阻挡层,其中每个势垒层具有势垒高度。 多个量子阱周期包括不同的屏障高度。
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