Abstract:
A memory device comprises a reference conductor, and a stack of conductive strips separated by insulating strips, where the conductive strips in the stack extend in a first direction, and the stack is disposed on the reference conductor. The memory device comprises a plurality of hemi-cylindrical vertical channel structures extending through respective vias in the conductive strips in the stack, and comprising semiconductor films in electrical contact with the reference conductor having outside surfaces. Each of the hemi-cylindrical vertical channel structures has a divided elliptical cross section with a major axis tilted relative to the first direction. The memory device comprises data storage structures between the outside surfaces of the semiconductor films and sidewalls of the vias in the conductive strips.
Abstract:
A memory device that includes: a memory controller; a control unit; and a memory cell array that includes memory blocks, each memory block comprising: memory cells, word lines respectively coupled to the memory cells, signal lines to transfer signals to perform programming operations to one or more memory cells of the memory cells, a first metal layer coupled to a first group of lines and configured to route the first group of the lines to the control unit, the lines comprising the word lines and the signal lines, and a second metal layer coupled to a second group of the lines and configured to route the second group of the lines to the control unit, wherein the memory controller is configured to: control the control unit to (i) select particular memory cells and (ii) program data to the particular memory cells is disclosed.
Abstract:
A memory device is provided. The memory device includes a bottom conductive line, a stacked structure, a side oxide layer, a dielectric layer and a side semiconductor layer. The stacked structure is disposed on the bottom conductive line, and includes a first semiconductor layer, a second semiconductor layer disposed above the first semiconductor layer, and a plurality of oxide layers alternately stacked with the first semiconductor layer and the second semiconductor layer. The side oxide layer is disposed on both side walls of the first conductive layer. The dielectric layer is disposed on the stacked structure. The side semiconductor layer is disposed on the dielectric layer.
Abstract:
A memory device which can be configured as a 3D NAND flash memory, includes a plurality of stacks of conductive strips, including even stacks and odd stacks having sidewalls. Some of the conductive strips in the stacks are configured as word lines. Data storage structures are disposed on the sidewalls of the even and odd stacks. Active pillars between corresponding even and odd stacks of conductive strips include even and odd semiconductor films having outside surfaces and inside surfaces, the outside surfaces disposed on the data storage structures on the sidewalls of the corresponding even and odd stacks in the plurality of stacks forming a 3D array of memory cells, the inside surfaces are separated by an insulating structure that can include a gap. The semiconductor films can be thin-films.
Abstract:
A method is provided for operating a NAND array that includes a plurality of blocks of memory cells. A block of memory cells in the plurality of blocks includes a plurality of NAND strings having channel lines between first string select switches and second string select switches. The plurality of NAND strings shares a set of word lines between the first and second string select switches. A channel-side erase voltage is applied to the channel lines through the first string select switches in a selected block. Word line-side erase voltages are applied to a selected subset including more than one member of the set of word lines shared by NAND strings in the selected block to induce tunneling in memory cells coupled to the selected subset, while tunneling is inhibited in memory cells coupled to an unselected subset including more than one member of the set of word lines.
Abstract:
A memory device includes a plurality of strings of memory cells. A plurality of stacks of conductive strips includes first upper strips configured as first string select lines for the strings in the plurality of strings, second upper strips configured as second string select lines for the strings in the plurality of strings, and intermediate strips configured as word lines for the strings in the plurality of strings. The memory device includes control circuitry coupled to the first string select lines and the second string select lines, and configured to select a particular string in the plurality of strings by applying a first turn-on voltage to a first string select line in the first string select lines coupled to the particular string, and a second turn-on voltage to a second string select line in the second string select lines coupled to the particular string.
Abstract:
A memory device and a manufacturing method of the same are provided. The memory device includes a substrate, a 3D memory array, a periphery circuit, and a conductive connection structure. The 3D memory array and the periphery circuit are stacked on the substrate. The periphery circuit includes a patterned metal layer and a contact structure electrically connected to the patterned metal layer. The conductive connection structure is electrically connected to the patterned metal layer. The 3D memory array is electrically connected to the periphery circuit via the conductive connection structure.
Abstract:
A semiconductor device is provided, comprising a substrate; a first well having a first conductive type and extending down from a surface of the substrate; a diffusion region doped with impurity of the first conductive type and extending down from a surface of the first well; and a plurality of active devices formed within the diffusion region, and the active devices arranged separately from each other. The active devices are electrically isolated from each other by the diffusion region. The active device is self-isolated by a conductive guarding structure, and the semiconductor device comprising embodied STI-free active devices solves STI edge issues.
Abstract:
A high voltage (HV) semiconductor device is provided, comprising a substrate, a first well having a first conductive type and extending down from a surface of the substrate; a plurality of active devices respectively formed on the substrate, and the adjacent active devices electrically separated from each other by an insulation. One of the active devices comprises a diffusion region doped with impurity of the first conductive type and extending down from a surface of the first well, a ring gate formed in the diffusion region, and a light doping region having a second conductive type and extending down from a surface of the diffusion region. The light doping region is offset from an edge of the insulation.
Abstract:
A memory device includes a semiconductor body having a first conductivity type, a first terminal in the semiconductor body having a second conductivity type, a channel region having the first conductivity type surrounding the first terminal, and a second terminal having the second conductivity type surrounding the channel region. A connector is in contact with the first terminal, and can be connected to a bit line in an overlying patterned conductor layer. Memory material is disposed over the channel region, and can include a dielectric charge storage structure. A control gate surrounds the first terminal and is disposed over the memory material. A conductive line surrounds the control gate and is in contact with the second terminal. The control gate and the conductive line can be ring shaped.