Circuit substrate and producing method of the same
    14.
    发明授权
    Circuit substrate and producing method of the same 失效
    电路基板及其制造方法相同

    公开(公告)号:US4916261A

    公开(公告)日:1990-04-10

    申请号:US648304

    申请日:1984-09-07

    CPC classification number: C04B35/01 H05K1/0306

    Abstract: A circuit substrate comprises a sintered oxide body of barium, tin and boron as an insulating body which is able to be fired at a temperature less than 1300.degree. C. The circuit substrate is further improved in moisture resistance by containing titanium or securing substantially the composition of BaSn(BO.sub.3).sub.2.

    Abstract translation: 电路基板包括作为绝缘体的钡,锡和硼的烧结氧化物体,其能够在低于1300℃的温度下被烧制。电路基板通过包含钛或基本上确保组合物进一步改善耐湿性 的BaSn(BO3)2。

    Vacuum-heat processing method
    17.
    发明授权
    Vacuum-heat processing method 有权
    真空加热法

    公开(公告)号:US6068872A

    公开(公告)日:2000-05-30

    申请号:US412324

    申请日:1999-10-05

    Abstract: The vacuum-heat processing apparatus according to the present invention includes: a vacuum container forming a vacuum chamber; a hopper into which an object to be processed and a processing liquid adjusted to a first temperature are thrown, the hopper being arranged above and communicating with an intake port formed in an upper end portion of the vacuum container; a sealing member arranged between the hopper and the intake port of the vacuum container to keep the vacuum chamber airtight; a transport conveyor installed in the vacuum chamber below the intake port to receive at one end side thereof the object flowing down the hopper from the intake port through the sealing member and carry it to the other end side; a processing liquid showering nozzles installed in the vacuum chamber immediately above the transport conveyor to shower a processing liquid adjusted to a second temperature over the object on the transport conveyor; a processing liquid tank containing a processing liquid adjusted to a third temperature and installed in the vacuum chamber immediately below the transport conveyor to receive the object dropped from the transport conveyor; at least one liquid removing device provided immediately below and communicating with a discharge port formed in a lower end portion of the vacuum container to remove the processing liquid from the object; and a transport device installed in the vacuum chamber to carry the object in the processing liquid tank to the liquid removing device.

    Abstract translation: 根据本发明的真空热处理装置包括:形成真空室的真空容器; 将被处理物和调整到第一温度的处理液投入其中的料斗,料斗布置在真空容器的上端部中形成的进气口的上方并连通; 设置在所述料斗和所述真空容器的进气口之间以密封所述真空室的密封构件; 运送输送机,其安装在所述进气口下方的所述真空室中,以在所述真空室的一端侧从所述进气口通过所述密封构件接收从所述料斗下流的物体,并将其运送到所述另一端侧; 处理液体喷淋喷嘴,其安装在运输输送机正上方的真空室中,以便在运输输送机上淋浴被调节到物体上的第二温度的处理液体; 处理液罐,其容纳调整到第三温度的处理液体,并且安装在运输输送机正下方的真空室中,以接收从运输输送机掉落的物体; 至少一个液体去除装置,其紧靠下方设置并与形成在真空容器的下端部中的排出口连通,以从处理物体中除去处理液体; 以及安装在真空室中的运送装置,用于将处理液罐中的物体运送到液体移除装置。

    Vacuum-heat processing apparatus
    18.
    发明授权
    Vacuum-heat processing apparatus 失效
    真空加热装置

    公开(公告)号:US5988051A

    公开(公告)日:1999-11-23

    申请号:US106305

    申请日:1998-06-29

    Abstract: The vacuum-heat processing apparatus according to the present invention includes: a vacuum container forming a vacuum chamber; a hopper into which an object to be processed and a processing liquid adjusted to a first temperature are thrown, the hopper being arranged above and communicating with an intake port formed in an upper end portion of the vacuum container; a sealing member arranged between the hopper and the intake port of the vacuum container to keep the vacuum chamber airtight; a transport conveyor installed in the vacuum chamber below the intake port to receive at one end side thereof the object flowing down the hopper from the intake port through the sealing member and carry it to the other end side; a processing liquid showering nozzles installed in the vacuum chamber immediately above the transport conveyor to shower a processing liquid adjusted to a second temperature over the object on the transport conveyor; and a processing liquid tank containing a processing liquid adjusted to a third temperature and installed in the vacuum chamber immediately below the transport conveyor to receive the object dropped from the transport conveyor.

    Abstract translation: 根据本发明的真空热处理装置包括:形成真空室的真空容器; 将被处理物和调整到第一温度的处理液投入其中的料斗,料斗布置在真空容器的上端部中形成的进气口的上方并连通; 设置在所述料斗和所述真空容器的进气口之间以密封所述真空室的密封构件; 运送输送机,其安装在所述进气口下方的所述真空室中,以在所述真空室的一端侧从所述进气口通过所述密封构件接收从所述料斗下流的物体,并将其运送到所述另一端侧; 处理液体喷淋喷嘴,其安装在运输输送机正上方的真空室中,以便在运输输送机上淋浴被调节到物体上的第二温度的处理液体; 以及处理液罐,其含有调整到第三温度的处理液,并且安装在运送输送机正下方的真空室中,以接收从运送输送机掉落的物体。

    Circuit board
    20.
    发明授权
    Circuit board 失效
    电路板

    公开(公告)号:US5326623A

    公开(公告)日:1994-07-05

    申请号:US10298

    申请日:1993-01-28

    Abstract: A circuit board including a circuit pattern adhered firmly to a ceramic substrate and capable of eliminating an increase in resistivity due to an influence of an external environment, particularly, a thermal influence is disclosed. The circuit board comprises a ceramic substrate, and a circuit pattern formed on the substrate and having a multilayered structure in which a bonding layer comprising Ti and at least one element selected from the group consisting of N and O, a conductor layer consisting essentially of Cu, and a protective layer comprising Ti and at least one element selected from the group consisting of N and O are stacked in the order named.

    Abstract translation: 公开了一种电路板,其包括牢固地粘附在陶瓷基板上的电路图形,能够消除由外部环境的影响引起的电阻率的增加,特别是热影响。 电路板包括陶瓷基板和形成在基板上并具有多层结构的电路图案,其中包含Ti和至少一种选自N和O的元素的接合层,基本上由Cu组成的导体层 ,并且以所述顺序堆叠包含Ti和从N和O组成的组中选择的至少一种元素的保护层。

Patent Agency Ranking