SUBSTRATE COMPRISING IMPROVED VIA PAD PLACEMENT IN BUMP AREA
    13.
    发明申请
    SUBSTRATE COMPRISING IMPROVED VIA PAD PLACEMENT IN BUMP AREA 有权
    包括通过在BUG区域中的铺设位置改进的基础

    公开(公告)号:US20150179590A1

    公开(公告)日:2015-06-25

    申请号:US14251518

    申请日:2014-04-11

    Abstract: Some novel features pertain to an integrated device that includes a substrate, a first via, and a first bump pad. The first via traverses the substrate. The first via has a first via dimension. The first bump pad is on a surface of the substrate. The first bump pad is coupled to the first via. The first bump pad has a first pad dimension that is equal or less then the first via dimension. In some implementations, the integrated device includes a second via and a second bump pad. The second via traverses the substrate. The second via has a second via dimension. The second bump pad is on the surface of the substrate. The second bump pad is coupled to the second via. The second bump pad has a second pad dimension that is equal or less then the second via dimension.

    Abstract translation: 一些新颖的特征涉及包括基板,第一通孔和第一凸块焊盘的集成装置。 第一个通孔穿过基板。 第一个通孔具有第一通孔尺寸。 第一凸块焊盘位于基板的表面上。 第一碰撞焊盘耦合到第一通孔。 第一凸块焊盘具有等于或小于第一通孔尺寸的第一焊盘尺寸。 在一些实施方案中,集成器件包括第二通孔和第二凸点焊盘。 第二个通孔穿过基板。 第二通孔具有第二通孔尺寸。 第二凸点焊盘位于基板的表面上。 第二凸点焊盘耦合到第二通孔。 第二凸块焊盘具有等于或小于第二通孔尺寸的第二焊盘尺寸。

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