Radiation base of an electric appliance
    11.
    发明授权
    Radiation base of an electric appliance 失效
    电器辐射底座

    公开(公告)号:US4462173A

    公开(公告)日:1984-07-31

    申请号:US306230

    申请日:1981-09-28

    IPC分类号: H05B3/70 D06F75/24 D06F75/38

    CPC分类号: D06F75/38 Y10T428/24339

    摘要: A radiation base of an iron comprises a baseplate, and an injection-molded layer integrally attached to one side of said baseplate, the layer being formed of synthetic resin with low friction properties, nonviscousness and heat resistance, such as polyphenylene sulfide resin, phenolic resin or fluoric resin.

    摘要翻译: 铁的辐射基底包括基板和与所述基板的一侧整体连接的注射成型层,该层由合成树脂形成,具有低摩擦性能,非粘性和耐热性,例如聚苯硫醚树脂,酚醛树脂 或氟树脂。

    Fourier transform holography using pseudo-random phase shifting of
object illuminating beams and apodization
    12.
    发明授权
    Fourier transform holography using pseudo-random phase shifting of object illuminating beams and apodization 失效
    傅里叶变换全息术使用对象照明光束的伪随机相移和变迹

    公开(公告)号:US4013338A

    公开(公告)日:1977-03-22

    申请号:US652154

    申请日:1976-01-26

    申请人: Isao Sato Makoto Kato

    发明人: Isao Sato Makoto Kato

    IPC分类号: G03H1/22 G03H1/16

    摘要: A phase mask comprised of a square array of phase shifting areas arranged in pseudo-random pattern is illuminated with a beam of electromagnetic radiation, as a result of which an array of pseudo-randomly phase shifted beams emerges from the phase mask and impinges upon an object transparency to be intensity-modulated thereby and come to a focus on a Fourier transform plane. The power spectrum of the beams distributes in orthogonal directions on the Fourier transform plane from its center maxima in a distinct pattern of series of fringes. The technique of apodization is employed to suppress the fringes to thereby reduce the coherent noise of a hologram to a minimum.

    摘要翻译: 以伪随机图案排列的由正方形排列的相移区域组成的相位掩模被电磁辐射束照射,结果是从相位掩模中出现伪随机相移光束的阵列并撞击到 对象透明度由此进行强度调制,并将其重点放在傅立叶变换平面上。 光束的功率谱在傅里叶变换平面上以正交方向从其中心最大值以一系列条纹的不同图案分布。 采用变迹技术来抑制边缘,从而将全息图的相干噪声降至最低。

    Sealing structure using a liquid gasket
    14.
    发明授权
    Sealing structure using a liquid gasket 有权
    密封结构采用液体垫片

    公开(公告)号:US08864140B2

    公开(公告)日:2014-10-21

    申请号:US12861483

    申请日:2010-08-23

    IPC分类号: F02F11/00 F16J15/14

    CPC分类号: F16J15/14

    摘要: A sealing structure using a liquid gasket, having a liquid gasket interposed in the form of a thin film between mating surfaces of a first member and a second member, thereby preventing the movement of oil via the mating surfaces, the sealing structure, includes at oil-side end portions of the mating surfaces, a gasket lump portion that is formed of an excess of the thin-film liquid gasket squeezed out from the mating surfaces, and an oil-shielding portion that covers a boundary portion where the gasket lump portion and the first member come into contact, thereby preventing a flow of the oil from directly striking the boundary portion, and is provided on an oil-flow upstream side from the boundary portion.

    摘要翻译: 一种使用液体垫圈的密封结构,其具有在第一构件和第二构件的配合表面之间以薄膜形式插入的液体垫圈,从而防止油经由配合表面的运动,所述密封结构包括在油 配合表面的两侧端部,由从配合表面挤出的多余的薄膜液体衬垫形成的垫圈块部,以及覆盖垫圈块部和 第一构件接触,从而防止油流直接撞击边界部分,并且设置在从边界部分的油流上游侧。

    Film-forming composition
    15.
    发明授权
    Film-forming composition 有权
    成膜组合物

    公开(公告)号:US07914854B2

    公开(公告)日:2011-03-29

    申请号:US12160176

    申请日:2006-12-19

    IPC分类号: C08L83/04 B05D3/02

    摘要: An SiO2-based film-forming composition giving a protective film which, after impurity diffusion, can be easily stripped off and which has a higher protective effect. The film-forming composition is one for forming a protective film which in the diffusion of an impurity into a silicon wafer, serves to partly prevent the impurity diffusion. This film-forming composition comprises a high-molecular silicon compound and a compound having a protective element which undergoes covalent bonding to the element to be diffused in the impurity diffusion and thereby comes to have eight valence electrons. The protective element is preferably gallium or aluminum when phosphorus is used as the element to be diffused, and is preferably tantalum, niobium, arsenic, or antimony when boron is used as the diffusion element.

    摘要翻译: 提供保护膜的SiO 2系膜形成组合物,其在杂质扩散后容易剥离并具有较高的保护效果。 成膜组合物是用于形成保护膜的组合物,其在将杂质扩散到硅晶片中用于部分地防止杂质扩散。 该成膜组合物包含高分子硅化合物和具有保护元素的化合物,该保护元素与待杂质扩散的元素进行共价键合,从而具有8价电子。 当使用磷作为扩散元件时,保护元件优选为镓或铝,并且当使用硼作为扩散元件时,保护元件优选为钽,铌,砷或锑。

    Network monitoring program, network monitoring method, and network monitoring apparatus
    17.
    发明申请
    Network monitoring program, network monitoring method, and network monitoring apparatus 有权
    网络监控程序,网络监控方法和网络监控设备

    公开(公告)号:US20050144505A1

    公开(公告)日:2005-06-30

    申请号:US10834461

    申请日:2004-04-29

    摘要: A network monitoring program automatically sorts fault producing locations on a network. A memory unit stores a fault location determining table containing events indicative of failures of communications via the network, the events being associated with classified elements which can be causes of faults on the network. A communication situation monitoring unit monitors communication situations with respect to other apparatus on the network. A failure detecting unit detects an event indicative of a failure from a communication situation detected by the communication situation monitoring unit. A fault location determining unit determines an element which is responsible for the event detected by the failure detecting unit by referring to the fault location determining table. A fault information output unit outputs fault information representative of a determined result from the fault location determining unit.

    摘要翻译: 网络监控程序自动对网络中的故障产生位置进行排序。 存储单元存储包含指示经由网络的通信故障的事件的故障位置确定表,所述事件与可能是网络上的故障原因的分类元件相关联。 通信情况监视单元监视与网络上的其他设备的通信情况。 故障检测单元从由通信状况监视单元检测到的通信状况检测表示故障的事件。 故障位置确定单元通过参照故障位置确定表来确定负责故障检测单元检测到的事件的单元。 故障信息输出单元从故障位置确定单元输出表示确定结果的故障信息。

    Master cylinder body and die for molding master cylinder body
    19.
    发明授权
    Master cylinder body and die for molding master cylinder body 失效
    主缸体和模具用于成型主缸体

    公开(公告)号:US06817178B2

    公开(公告)日:2004-11-16

    申请号:US10226219

    申请日:2002-08-23

    IPC分类号: B60T1120

    CPC分类号: B60T11/16 Y10T29/49236

    摘要: A master cylinder body and a die for molding the master cylinder body which is unlikely worn out by a flow of the melt and improves the life duration of the die. A rib provided from a first outlet port projected from right external peripheral surface of the master cylinder body to an end portion of a front end portion via a second outlet port is formed deviated from a line connecting a central axial lines of the first and the second outlet ports. Likewise, a rib provided from the first outlet port formed on a left external peripheral surface of the master cylinder body to the end portion of the front end portion via the second outlet port is formed deviated from the line connecting the central axial lines of the first and the second outlet ports.

    摘要翻译: 主缸体和用于模制主缸体的模具,其不会因熔体流动而磨损,并且提高了模具的使用寿命。 从从主缸体的右外周面突出到第一出口的前端部的端部的第一出口设置的肋形成为从连接第一和第二出口的中心轴线的线 出口端口 同样地,从主缸主体的左外周面上形成的第一出口形成的肋经由第二出口形成在前端部的端部,与从连接第一 和第二个出口。

    Method for processing coating film and method for manufacturing semiconductor element with use of the same method
    20.
    发明授权
    Method for processing coating film and method for manufacturing semiconductor element with use of the same method 有权
    使用相同方法处理涂膜的方法和半导体元件的制造方法

    公开(公告)号:US06746963B2

    公开(公告)日:2004-06-08

    申请号:US10136744

    申请日:2002-04-30

    IPC分类号: H01L21302

    摘要: A method for processing a coating film includes the steps of forming a silica group coating film having a low dielectric constant on a substrate, conducting an etching process to the silica group coating film through a photoresist pattern, and processing the silica group coating film with plasma induced from helium gas. With this, it is possible to prevent the silica group coating film from being damaged when a wet stripping process is conducted to remove the photoresist pattern as a subsequent process, and to maintain the low dielectric constant of the coating film.

    摘要翻译: 一种涂膜的处理方法,其特征在于,在基板上形成介电常数低的二氧化硅系涂膜,通过光致抗蚀剂图案对二氧化硅基涂膜进行蚀刻处理,并对该二氧化硅基涂膜进行等离子体处理 由氦气引起。 由此,当进行湿剥离处理以除去作为后续工艺的光致抗蚀剂图案时,可以防止二氧化硅基涂膜损坏,并且保持涂膜的低介电常数。