公开(公告)号：US20050136470A1

公开(公告)日：2005-06-23

申请号：US11048918

申请日：2005-02-03

申请人： Keiichi Sato ,  Mitsuhiro Tachibana ,  Toshiki Morita ,  Motonao Nakao

发明人： Keiichi Sato ,  Mitsuhiro Tachibana ,  Toshiki Morita ,  Motonao Nakao

IPC分类号： G01N33/53 ,  C12M1/00 ,  C12M1/34 ,  C12N15/09 ,  C12Q1/68 ,  G01N21/01 ,  G01N21/03 ,  G01N27/447 ,  G01N33/566

CPC分类号： G01N27/44704 ,  C12Q1/6825 ,  G01N27/44721 ,  G01N27/4473 ,  C12Q2565/607 ,  C12Q2565/518

摘要： Provided is an apparatus for detecting biopolymers (DNA) capable of total analysis including non-reacted samples without complicated operations such as washing. A DNA probe is fixed to one of electrodes and direct current voltage is placed between the electrodes, so that it becomes possible to separate complementary strand sample DNA and non-complementary strand sample DNA. By analyzing from a ratio in the whole reaction system, it is possible to obtain clearer results. Further, by using electrophoresis by gel together, it is possible to separate reacted samples and non-reacted samples to perform measurements therefor in the same reaction field.

摘要翻译： 提供了一种用于检测能够进行总体分析的生物聚合物（DNA）的装置，包括没有复杂操作如洗涤的未反应样品。 将DNA探针固定在电极之一中，并且将直流电压置于电极之间，使得可以分离互补链样品DNA和非互补链样品DNA。 通过从整个反应系统的比例分析，可以获得更清楚的结果。 此外，通过使用凝胶电泳在一起，可以在相同的反应场中分离反应的样品和未反应的样品以进行测量。

公开(公告)号：US06875603B2

公开(公告)日：2005-04-05

申请号：US10001012

申请日：2001-11-30

申请人： Keiichi Sato ,  Mitsuhiro Tachibana ,  Toshiki Morita ,  Motonao Nakao

发明人： Keiichi Sato ,  Mitsuhiro Tachibana ,  Toshiki Morita ,  Motonao Nakao

IPC分类号： G01N33/53 ,  C12M1/00 ,  C12M1/34 ,  C12N15/09 ,  C12Q1/68 ,  G01N21/01 ,  G01N21/03 ,  G01N27/447 ,  G01N33/566 ,  C12M3/00

CPC分类号： G01N27/44704 ,  C12Q1/6825 ,  G01N27/44721 ,  G01N27/4473 ,  C12Q2565/607 ,  C12Q2565/518

摘要： Provided is an apparatus for detecting biopolymers (DNA) capable of total analysis including non-reacted samples without complicated operations such as washing.A DNA probe is fixed to one of electrodes and direct current voltage is placed between the electrodes, so that it becomes possible to separate complementary strand sample DNA and non-complementary strand sample DNA. By analyzing from a ratio in the whole reaction system, it is possible to obtain clearer results. Further, by using electrophoresis by gel together, it is possible to separate reacted samples and non-reacted samples to perform measurements therefor in the same reaction field.

摘要翻译： 本发明提供一种用于检测能够进行总体分析的生物聚合物（DNA）的装置，包括未进行复杂操作的洗涤等未反应的样品。将DNA探针固定在电极中的一个上，并将直流电压置于电极之间， 分离互补链样品DNA和非互补链样品DNA。 通过从整个反应系统的比例分析，可以获得更清楚的结果。 此外，通过使用凝胶电泳在一起，可以在相同的反应场中分离反应的样品和未反应的样品以进行测量。

公开(公告)号：US20050069641A1

公开(公告)日：2005-03-31

申请号：US10673910

申请日：2003-09-30

申请人： Tsukasa Matsuda ,  Taro Ikeda ,  Tatsuo Hatano ,  Mitsuhiro Tachibana ,  Hideaki Yamasaki ,  Gert Leusink ,  Fenton McFeely ,  Sandra Malhotra ,  Andrew Simon ,  John Yurkas

发明人： Tsukasa Matsuda ,  Taro Ikeda ,  Tatsuo Hatano ,  Mitsuhiro Tachibana ,  Hideaki Yamasaki ,  Gert Leusink ,  Fenton McFeely ,  Sandra Malhotra ,  Andrew Simon ,  John Yurkas

IPC分类号： C23C16/16 ,  C23C16/44 ,  C23C16/455 ,  H01L21/285 ,  B05D3/02 ,  C23C16/00

CPC分类号： C23C16/4408 ,  C23C16/16 ,  C23C16/45523 ,  H01L21/28562

摘要： A method for depositing metal layers with good surface morphology using sequential flow deposition includes alternately exposing a substrate in a process chamber to a metal-carbonyl precursor gas and a reducing gas. During exposure with the metal-carbonyl precursor gas, a thin metal layer is deposited on the substrate, and subsequent exposure of the metal layer to the reducing gas aids in the removal of reaction by-products from the metal layer. The metal-carbonyl precursor gas and a reducing gas exposure steps can be repeated until a metal layer with a desired thickness is achieved. The metal-carbonyl precursor can, for example, be selected from W(CO)6, Ni(CO)4, Mo(CO)6, Co2(CO)8, Rh4(CO)12, Re2(CO)10, Cr(CO)6, and Ru3(CO)12.

摘要翻译： 使用顺序流动沉积沉积具有良好表面形态的金属层的方法包括将处理室中的衬底交替地暴露于羰基金属前体气体和还原气体。 在用羰基金属前驱体气体曝光的同时，在基板上沉积薄金属层，随后将金属层暴露于还原气体有助于从金属层除去反应副产物。 可以重复金属羰基前体气体和还原气体暴露步骤，直到达到具有所需厚度的金属层。 金属羰基前体可以例如选自W（CO）6，Ni（CO）4，Mo（CO）6，Co2（CO）8，Rh4（CO）12，Re2（CO） （CO）6和Ru 3（CO）12。

公开(公告)号：US06465347B2

公开(公告)日：2002-10-15

申请号：US09988327

申请日：2001-11-19

申请人： Hotaka Ishizuka ,  Mitsuhiro Tachibana

发明人： Hotaka Ishizuka ,  Mitsuhiro Tachibana

IPC分类号： H01L214763

CPC分类号： H01L21/76876 ,  C23C16/0281 ,  C23C16/14 ,  H01L21/28556 ,  H01L21/76843 ,  H01L21/76856 ,  H01L21/76877 ,  H01L23/53266 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method of forming a tungsten film is capable of forming a tungsten film having a low resistivity. The method of forming a tungsten film (50) on a surface of a workpiece by a vacuum processing system (2) comprises, in sequential steps: a seed crystal growing process for growing tungsten seed crystal grains (48) on the surface of the workpiece in an atmosphere of a film forming gas containing tungsten atoms; a boron-exposure process for exposing the workpiece to an atmosphere of a boron-containing gas for a short time; and a tungsten film forming process for forming a tungsten film by making the tungsten seed crystal grains grow in an atmosphere of a gas containing a film forming gas containing tungsten atoms, and a hydrogen-diluted boron-containing gas. The tungsten film has a low resistivity.

公开(公告)号：US06346425B1

公开(公告)日：2002-02-12

申请号：US09651186

申请日：2000-08-30

申请人： Natsuko Ito ,  Tsuyoshi Moriya ,  Fumihiko Uesugi ,  Shuji Moriya ,  Masaru Aomori ,  Yoshinori Kato ,  Mitsuhiro Tachibana

发明人： Natsuko Ito ,  Tsuyoshi Moriya ,  Fumihiko Uesugi ,  Shuji Moriya ,  Masaru Aomori ,  Yoshinori Kato ,  Mitsuhiro Tachibana

IPC分类号： H01L2100

CPC分类号： H01L22/26 ,  C23C16/4401 ,  C23C16/52 ,  G01N21/47 ,  H01L21/28556

摘要： A method for processing a substrate includes the steps of determining an allowable margin of process condition such that a substrate is processed without forming particles, selecting a process condition of a substrate for a production process such that the process condition falls in the allowable margin in the production process, and carrying out a processing of the substrate in the production process at the selected process condition, wherein the step of determining the allowable margin includes the steps of introducing an optical beam to an atmosphere in which the substrate is processed in the step of determining the allowable margin, and detecting scattering of the optical beam.

摘要翻译： 一种处理衬底的方法包括以下步骤：确定工艺条件的允许余量，使得在不形成颗粒的情况下处理衬底，选择用于生产工艺的衬底的工艺条件，使得工艺条件落在 在所选择的处理条件下在生产过程中进行基板的处理，其中确定允许余量的步骤包括以下步骤：将光束引入到其中处理基板的气氛中的步骤 确定容许余量，并检测光束的散射。

公开(公告)号：US07592256B2

公开(公告)日：2009-09-22

申请号：US10486794

申请日：2002-08-07

申请人： Kazuya Okubo ,  Mitsuhiro Tachibana ,  Cheng Fang ,  Kohichi Sato ,  Hotaka Ishizuka

发明人： Kazuya Okubo ,  Mitsuhiro Tachibana ,  Cheng Fang ,  Kohichi Sato ,  Hotaka Ishizuka

IPC分类号： H01L21/44

CPC分类号： C23C16/45523 ,  C23C16/0281 ,  C23C16/14 ,  C23C16/4408 ,  H01L21/28556 ,  H01L21/76877

摘要： A method of forming a tungsten film on a surface of an object to be processed in a vessel capable of being vacuumized, includes the steps of forming a tungsten film by alternately repeating a reduction gas supplying process for supplying a reduction gas and a tungsten gas supplying process for supplying a tungsten-containing gas with an intervening purge process therebetween for supplying an inert gas while vacuumizing the vessel. A reduction gas supplying period of a reduction gas supplying process among the repeated reduction gas supplying processes is set to be longer than that of the remaining reduction gas supplying processes.

摘要翻译： 在能够被真空化的容器中的待处理物体的表面上形成钨膜的方法包括以下步骤：通过交替重复用于供给还原气体的还原气体供给工序和供给钨的气体来形成钨膜 用于在含有钨的气体之间进行中间吹扫处理以在对容器抽真空的同时供应惰性气体的方法。 在反复进行的还原气体供给工序之间的还原气体供给工序的还原气体供给期间比剩余的还原气体供给工序的时间长。

公开(公告)号：US07135331B2

公开(公告)日：2006-11-14

申请号：US11048918

申请日：2005-02-03

申请人： Keiichi Sato ,  Mitsuhiro Tachibana ,  Toshiki Morita ,  Motonao Nakao

发明人： Keiichi Sato ,  Mitsuhiro Tachibana ,  Toshiki Morita ,  Motonao Nakao

IPC分类号： C12M1/34

CPC分类号： G01N27/44704 ,  C12Q1/6825 ,  G01N27/44721 ,  G01N27/4473 ,  C12Q2565/607 ,  C12Q2565/518

摘要： Provided is an apparatus for detecting biopolymers (DNA) capable of total analysis including non-reacted samples without complicated operations such as washing.A DNA probe is fixed to one of electrodes and direct current voltage is placed between the electrodes, so that it becomes possible to separate complementary strand sample DNA and non-complementary strand sample DNA. By analyzing from a ratio in the whole reaction system, it is possible to obtain clearer results. Further, by using electrophoresis by gel together, it is possible to separate reacted samples and non-reacted samples to perform measurements therefor in the same reaction field.

公开(公告)号：US06726883B2

公开(公告)日：2004-04-27

申请号：US10441095

申请日：2003-05-20

申请人： Seiichiro Ito ,  Mitsuhiro Tachibana ,  Naoki Yokokawa

发明人： Seiichiro Ito ,  Mitsuhiro Tachibana ,  Naoki Yokokawa

IPC分类号： B41J225

CPC分类号： B01L3/0255 ,  B01J2219/00387 ,  B01J2219/00608 ,  B01J2219/0061 ,  B01J2219/00612 ,  B01J2219/00677 ,  B01L2400/025 ,  B82Y30/00 ,  C40B60/14 ,  Y10T436/2575

摘要： Identically shaped spots can be formed sequentially and stably by a spotting pin comprising a bar-like plunger 20. Four projections each formed in the shape of a top portion of a quadrangular pyramid are formed on the head of the plunger 20. The apexes 21 of the quadrangular pyramids constituting the projections are located inside a virtual plane extending from the peripheral wall of the plunger.

摘要翻译： 相同形状的斑点可以通过包括棒状柱塞20的斑点针顺序地且稳定地形成。在柱塞20的头部上形成四边形金字塔顶部形状的四个突起。顶点21 构成突起的四角锥体位于从柱塞的周壁延伸的虚拟平面内。

公开(公告)号：US06582954B2

公开(公告)日：2003-06-24

申请号：US10062132

申请日：2002-01-30

申请人： Keiichi Sato ,  Mitsuhiro Tachibana ,  Toshiki Morita ,  Motonao Nakao

发明人： Keiichi Sato ,  Mitsuhiro Tachibana ,  Toshiki Morita ,  Motonao Nakao

IPC分类号： C12M136

CPC分类号： C12Q1/6825

摘要： Disclosed is a biopolymer (DNA) detector capable of performing overall analysis including an unreacted sample without needing any complex work such as washing or the like. A DNA probe 66 is fixed to an electrode plate 22, and the electrode plate 22 is displaced by applying a DC voltage between electrode plates 22 and 23. Thus, sample DNA 63 to be detected can be separated. It becomes possible to obtain a clearer result by performing analysis based on a ratio of an entire reaction system.

公开(公告)号：US06399484B1

公开(公告)日：2002-06-04

申请号：US09425971

申请日：1999-10-25

申请人： Hideaki Yamasaki ,  Satoshi Yonezawa ,  Susumu Arima ,  Yumiko Kawano ,  Mitsuhiro Tachibana ,  Keizo Hosoda

发明人： Hideaki Yamasaki ,  Satoshi Yonezawa ,  Susumu Arima ,  Yumiko Kawano ,  Mitsuhiro Tachibana ,  Keizo Hosoda

IPC分类号： H01L214763

CPC分类号： C23C16/45565 ,  C23C16/0281 ,  C23C16/34 ,  C23C16/4404 ,  C23C16/4405 ,  C23C16/4557 ,  C23C16/45574 ,  H01L21/28556 ,  H01L21/28568 ,  H01L21/32051

摘要： A semiconductor device fabricating method includes a preparatory process that brings a first source gas containing tungsten atoms into contact with a workpiece and that does not bring a second source gas containing nitrogen atoms into contact with the workpiece, and a film forming process that forms a tungsten nitride film on the workpiece by using the first and the second source gases so as to fabricate a semiconductor device. The semiconductor device fabricating method is capable of preventing the tungsten nitride film from peeling off from a layer underlying the same when the tungsten nitride film is subjected to heat treatment.

摘要翻译： 一种半导体器件制造方法，包括使含有钨原子的第一源气体与工件接触并且不会使含有氮原子的第二源气体与工件接触的制备方法，以及形成钨 通过使用第一和第二源气体在工件上形成氮化物膜，以制造半导体器件。 当氮化钨膜进行热处理时，半导体器件制造方法能够防止氮化钨膜从其下面的层剥离。