公开(公告)号：US09477160B2

公开(公告)日：2016-10-25

申请号：US14624167

申请日：2015-02-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Matthijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

公开(公告)号：US20140253894A1

公开(公告)日：2014-09-11

申请号：US14346530

申请日：2012-08-23

Applicant: Jan Bernard Plechelmus Van Schoot ,  Hermanus Johannes Maria Kreuwel ,  Vadim Yevgenyevich Banine ,  Andrei Mikhailovich Yakunin ,  Johannes Hubertus Josephina Moors ,  Olav Waldimir Frijns ,  Gerardus Hubertus Petrus Maria Swinkels ,  Ivo Vanderhallen ,  Uwe Bruno Heini Stamm

Inventor： Jan Bernard Plechelmus Van Schoot ,  Hermanus Johannes Maria Kreuwel ,  Vadim Yevgenyevich Banine ,  Andrei Mikhailovich Yakunin ,  Johannes Hubertus Josephina Moors ,  Olav Waldimir Frijns ,  Gerardus Hubertus Petrus Maria Swinkels ,  Ivo Vanderhallen ,  Uwe Bruno Heini Stamm

IPC: H05G2/00 ,  G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

Abstract: A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

Abstract translation: 一种具有燃料流发生器（110）的辐射源，其产生并引导燃料流（102）沿轨迹朝向等离子体形成位置（104）。 预脉冲激光辐射组件将等离子体形成位置处的燃料流处的第一激光辐射束（100）引导以产生经修改的燃料靶（106）。 主脉冲激光辐射组件在等离子体形成位置处引导在修改的燃料靶处的第二激光辐射束（108）以产生辐射产生等离子体（117）。 收集器（122）收集辐射并沿辐射源的光轴（105）引导辐射。 激光辐射的第一束基本上沿着光轴指向燃料流。

公开(公告)号：US20130057840A1

公开(公告)日：2013-03-07

申请号：US13698171

申请日：2011-04-06

Applicant: Vadim Iourievich Timoshkov ,  Jan Bernard Plechelmus Van Schoot ,  Antonius Theodorus Wilhelmu Kempen ,  Andrei Mikhailovich Yakunin ,  Edgar Alberto Osorio Oliveros

Inventor： Vadim Iourievich Timoshkov ,  Jan Bernard Plechelmus Van Schoot ,  Antonius Theodorus Wilhelmu Kempen ,  Andrei Mikhailovich Yakunin ,  Edgar Alberto Osorio Oliveros

IPC: G02B1/10 ,  C23C14/14 ,  G03B27/70

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  C23C14/48 ,  C23C14/586 ,  G21K1/062

Abstract: There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.

Abstract translation: 提供了包括第一材料（84）和硅层（82）的层的多层反射镜（80）。 第一材料层和硅层形成一叠层。 硅层的暴露区域包括被设置为改善暴露的硅区域的鲁棒性的修改。

公开(公告)号：US07862756B2

公开(公告)日：2011-01-04

申请号：US11392950

申请日：2006-03-30

Applicant: Sander Frederik Wuister ,  Johan Frederik Dijksman ,  Yvonne Wendela Kruijt-Stegeman ,  Ivar Schram

Inventor： Sander Frederik Wuister ,  Johan Frederik Dijksman ,  Yvonne Wendela Kruijt-Stegeman ,  Ivar Schram

IPC: B29C43/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0017

Abstract: A method of making a substantial replica of a first imprint template which bears a first pattern is disclosed. The method includes filling recesses of the first pattern with a first material, removing the first material from the first imprint template to form a second imprint template which bears a second pattern, the second pattern being the substantial inverse of the first pattern, filling recesses of the second pattern with a photo-curable medium, curing the photo-curable medium by illuminating it with radiation, and removing the cured medium from the second imprint template to form a third imprint template which bears a pattern that is a substantial replica of the first pattern.

Abstract translation: 公开了制作承载第一图案的第一印模模板的实质复制品的方法。 该方法包括用第一材料填充第一图案的凹部，从第一印模模板移除第一材料以形成承载第二图案的第二印模模板，第二图案是第一图案的实质倒数， 所述第二图案具有可光固化介质，通过用辐射照射光固化介质来固化光固化介质，以及从第二压印模板中除去固化介质以形成第三印模模板，该模板具有第一印模模板， 模式。

公开(公告)号：US20060256309A1

公开(公告)日：2006-11-16

申请号：US11485958

申请日：2006-07-14

Applicant: Cheng-Qun Gui ,  Pieter de Jager

Inventor： Cheng-Qun Gui ,  Pieter de Jager

IPC: G03B27/52

CPC classification number: G03F7/7025 ,  G03F7/70258 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70791 ,  G03F7/70816 ,  G03F7/70825 ,  G03F7/7085

Abstract: An arrangement for adjusting the position on a substrate of a patterned beam generated by a light engine relative to the substrate. The arrangement moves an array of focusing elements, each of which focuses a portion of the patterned beam onto a point on the substrate, relative to an array of individually controllable elements to impart the pattern to the patterned beam.

Abstract translation: 一种用于调整由光引擎相对于衬底产生的图案化光束的衬底上的位置的装置。 该排列移动一组聚焦元件，每个聚焦元件相对于独立可控元件的阵列将图案化束的一部分聚焦到衬底上的一个点上，以将图案赋予图案化的束。

公开(公告)号：US20060215134A1

公开(公告)日：2006-09-28

申请号：US11086667

申请日：2005-03-23

Applicant: Erik Buurman ,  Thomas Castenmiller ,  Johannes Wilhelmus Teeuwsen ,  Bearrach Moest ,  Mare Haast

Inventor： Erik Buurman ,  Thomas Castenmiller ,  Johannes Wilhelmus Teeuwsen ,  Bearrach Moest ,  Mare Haast

IPC: G03F7/20

CPC classification number: G03F7/70575 ,  G03F7/70641 ,  G03F9/7026

Abstract: A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.

公开(公告)号：US20060132742A1

公开(公告)日：2006-06-22

申请号：US11013939

申请日：2004-12-17

Applicant: Karel Van Der Mast ,  Kars Troost

Inventor： Karel Van Der Mast ,  Kars Troost

IPC: G03B27/68

CPC classification number: G03F7/70183 ,  G03F7/70216 ,  G03F7/70258 ,  G03F7/70291 ,  G03F7/70425

Abstract: A system and method are provided including different moveable lenses within a projection system that can be placed in the path of a radiation beam to change a magnification of the projection system. By changing the magnification of the projection system an area of a substrate exposed per pixel can be adjusted, and a throughput of the system optimized.

Abstract translation: 提供了一种系统和方法，其包括在投影系统内的不同的可移动透镜，其可以放置在辐射束的路径中以改变投影系统的放大率。 通过改变投影系统的放大倍数，可以调整每像素曝光的衬底的面积，并优化系统的吞吐量。

公开(公告)号：US20050248746A1

公开(公告)日：2005-11-10

申请号：US10837914

申请日：2004-05-04

Applicant: Koen Jacobus Zaal ,  Aschwin Lodewijk Van Meer ,  Joost Ottens

Inventor： Koen Jacobus Zaal ,  Aschwin Lodewijk Van Meer ,  Joost Ottens

IPC: H01L21/683 ,  G03B27/62 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/707

Abstract: A lithographic apparatus having an illumination system for providing a projection beam of radiation; an article support member for supporting an article to be placed in a beam path of the projection beam of radiation on the article support; and a clamp for providing a clamping pressure for clamping the article against the article support during projection. The article support member includes a section that is trimmed for locally adjusting a clamping pressure.

Abstract translation: 一种具有用于提供投影射线束的照明系统的光刻设备; 物品支撑构件，用于支撑将物品放置在所述物品支撑件上的所述投影射束的光束路径中; 以及用于在投影期间提供用于将物品夹紧在物品支撑件上的夹紧压力的夹具。 物品支撑构件包括用于局部调整夹紧压力的部分。

公开(公告)号：US11644755B2

公开(公告)日：2023-05-09

申请号：US17279648

申请日：2019-09-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Bearrach Moest ,  Rowin Meijerink ,  Thijs Schenkelaars ,  Norbertus Josephus Martinus Van Den Nieuwelaar ,  Laurentius Johannes Adrianus Van Bokhoven

IPC: G03F7/20

CPC classification number: G03F7/705 ,  G03F7/706 ,  G03F7/70358 ,  G03F7/70983

Abstract: A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.

公开(公告)号：US08817228B2

公开(公告)日：2014-08-26

申请号：US12750337

申请日：2010-03-30

Applicant: Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Turk ,  Allard Eelco Kooiker ,  Nico Antonius Hubertus Johannes Boonen

Inventor： Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Turk ,  Allard Eelco Kooiker ,  Nico Antonius Hubertus Johannes Boonen

IPC: G03B27/52

CPC classification number: G03B27/52 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/70858 ,  H01L21/67109

Abstract: A cooling arrangement is described and includes a heat sink having a first thermal contact surface, an object having a second thermal contact surface and a resilient wall. The first thermal contact surface and the second thermal contact surface face each other and define a gap. The resilient wall is part of an enclosure that surrounds a space at least comprising the gap, and the cooling arrangement includes a facility to maintain a pressure difference between the space and an environment of the cooling arrangement. Additionally, a lithographic apparatus comprising such a cooling arrangement is described.

Abstract translation: 描述了冷却装置，并且包括具有第一热接触表面的散热器，具有第二热接触表面的物体和弹性壁。 第一热接触表面和第二热接触表面彼此面对并限定间隙。 弹性壁是围绕至少包括间隙的空间的外壳的一部分，并且冷却装置包括维持空间与冷却装置的环境之间的压力差的设备。 另外，描述了包括这种冷却装置的光刻设备。