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    HEATED SHOWERHEAD ASSEMBLY
    23.
    发明申请
    HEATED SHOWERHEAD ASSEMBLY 有权
    加热淋浴组件

    公开(公告)号：US20090179085A1

    公开(公告)日：2009-07-16

    申请号：US11972072

    申请日：2008-01-10

    Applicant: JAMES D. CARDUCCI ,  Olga Regelman ,  Kallol Bera ,  Douglas A. Buchberger ,  Paul Brillhart

    Inventor： JAMES D. CARDUCCI ,  Olga Regelman ,  Kallol Bera ,  Douglas A. Buchberger ,  Paul Brillhart

    IPC: B05B1/24 ,  B05B1/14

    CPC classification number: H01J37/3244 ,  B32B43/00 ,  C23C16/4412 ,  C23C16/45565 ,  C23C16/4557 ,  C23C16/45591 ,  H01J37/32449 ,  H01J37/32724 ,  H01J2237/3343 ,  Y10T29/49815

    Abstract: The present invention generally comprises a heated showerhead assembly that may be used to supply processing gases into a processing chamber. The processing chamber may be an etching chamber. When processing gas is evacuated from the processing chamber, the uniform processing of the substrate may be difficult. As the processing gas is pulled away from the substrate and towards the vacuum pump, the plasma, in the case of etching, may not be uniform across the substrate. Uneven plasma may lead to uneven etching. To prevent uneven etching, the showerhead assembly may be separated into two zones each having independently controllable gas introduction and temperature control. The first zone corresponds to the perimeter of the substrate while the second zone corresponds to the center of the substrate. By independently controlling the temperature and the gas flow through the showerhead zones, etching uniformity of the substrate may be increased.

    Abstract translation: 本发明通常包括可用于将处理气体供应到处理室中的加热喷头组件。 处理室可以是蚀刻室。 当处理气体从处理室排出时，衬底的均匀处理可能是困难的。 当处理气体从衬底被拉离并且朝向真空泵时，在蚀刻的情况下，等离子体在衬底上可能不均匀。 不均匀的等离子体可能导致不均匀的蚀刻。 为了防止不均匀的蚀刻，喷头组件可以分成两个区域，每个区域具有独立可控的气体引入和温度控制。 第一区域对应于衬底的周边，而第二区域对应于衬底的中心。 通过独立地控制温度和通过喷头区域的气体流动，可以增加基板的蚀刻均匀性。

    Gas distribution showerhead for semiconductor processing
    25.
    发明授权
    Gas distribution showerhead for semiconductor processing 有权
    用于半导体加工的气体分配喷头

    公开(公告)号：US06983892B2

    公开(公告)日：2006-01-10

    申请号：US10772787

    申请日：2004-02-05

    Applicant: Hamid Noorbakhsh ,  James D. Carducci ,  Jennifer Y. Sun ,  Larry D. Elizaga

    Inventor： Hamid Noorbakhsh ,  James D. Carducci ,  Jennifer Y. Sun ,  Larry D. Elizaga

    IPC: A01G27/00 ,  B05B5/00 ,  B05B1/14 ,  F23D11/32

    CPC classification number: C23C16/45565

    Abstract: We have developed a gas distribution showerhead assembly, for use in a semiconductor processing chamber, which can be easily cleaned, with minimal chamber downtime. The gas distribution showerhead assembly includes an electrode having openings therethrough, and a gas distribution plate which includes a plurality of through-holes for delivering processing gases into the semiconductor processing chamber. The gas distribution plate is bonded to a first, lower major surface of the electrode. A removable insert which fits into an opening in the electrode through which gas flows. Spacing between surfaces of the removable insert and surfaces of the electrode is adequate to permit gas flow, but inadequate for plasma ignition within the opening. The removable insert can be easily removed during cleaning of the gas distribution showerhead, permitting the holes in the gas distribution plate to be easily accessed from both sides of the gas distribution plate.

    Abstract translation: 我们开发了一种用于半导体处理室的气体分配喷头组件，可以轻松清洁，并具有最小的室停机时间。 气体分配喷头组件包括具有开口的电极，以及气体分配板，其包括用于将处理气体输送到半导体处理室中的多个通孔。 气体分配板结合到电极的第一下表面。 可拆卸的插入件，其装配在气体流过的电极的开口中。 可拆卸插入件的表面与电极表面之间的间距足以允许气体流动，但不足以在开口内等离子体点火。 在清洁气体分配喷头时可以容易地移除可移除的插入物，从而容易从气体分配板的两侧接近气体分配板中的孔。

    Double slit-valve doors for plasma processing
    27.
    发明授权
    Double slit-valve doors for plasma processing 失效
    用于等离子体处理的双切口阀门

    公开(公告)号：US06647918B1

    公开(公告)日：2003-11-18

    申请号：US09711191

    申请日：2000-11-13

    Applicant: Michael D. Welch ,  Homgqing Shan ,  Paul E. Luscher ,  Evans Y. Lee ,  James D. Carducci ,  Siamak Salimian

    Inventor： Michael D. Welch ,  Homgqing Shan ,  Paul E. Luscher ,  Evans Y. Lee ,  James D. Carducci ,  Siamak Salimian

    IPC: C23C1600

    CPC classification number: H01L21/67011 ,  H01J37/32458 ,  H01J2237/186 ,  Y10S156/916 ,  Y10S414/139

    Abstract: In a substrate vacuum processing chamber, a second inner slit passage door apparatus and method to supplement the normal slit valve and its door at the outside of the chamber. The inner slit passage door, blocks the slit passage at or adjacent the substrate processing location in a vacuum processing chamber to prevent process byproducts from depositing on the inner surfaces of the slit passage beyond the slit passage door and improves the uniformity of plasma in the processing chamber by eliminating a large cavity adjacent to the substrate processing location into which the plasma would otherwise expand. The inner slit passage door is configured and positioned in such a way as to avoid generating particles from the opening and closing motion of the second slit valve door, as it does not rub against any element of the chamber during its motion and the inner slit passage door is positioned with a predetermined gap from adjacent pieces and the door configuration includes beveled surfaces to further reduce the chance for particle generation, even when there is deposition of process byproducts on the door and its adjacent surfaces.

    Abstract translation: 在基板真空处理室中，第二内狭缝通道门装置和方法，用于在室的外部补充普通狭缝阀及其门。 内部狭缝通道门在真空处理室中阻挡基板处理位置处或邻近的狭缝通道，以防止加工副产物沉积在狭缝通道的内表面上方超过狭缝通道门并改善处理中的等离子体的均匀性 通过消除与衬底处理位置相邻的大空腔，等离子体将在其中膨胀。 内狭缝通道门的构造和定位方式是避免从第二狭缝阀门的打开和关闭运动产生颗粒，因为它在其运动期间不会摩擦室内的任何元件，并且内部狭缝通道 门与相邻的件之间具有预定的间隙定位，并且门配置包括斜面以进一步减少颗粒产生的机会，即使在门及其相邻表面上沉积了工艺副产物。

    Configurable single substrate wet-dry integrated cluster cleaner
    28.
    发明授权
    Configurable single substrate wet-dry integrated cluster cleaner 失效

    公开(公告)号：US06589361B2

    公开(公告)日：2003-07-08

    申请号：US09882132

    申请日：2001-06-15

    Applicant: Paul E Luscher ,  James D Carducci ,  Siamak Salimian

    Inventor： Paul E Luscher ,  James D Carducci ,  Siamak Salimian

    IPC: B08B700

    CPC classification number: H01L21/67017 ,  B08B3/04 ,  H01L21/67028 ,  Y10S134/902

    Abstract: The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes an upper plate, a lower plate and a gas manifold disposed there between. A substrate is disposed in the processing cavity without contacting other chamber components by a Bernoulli effect and/or by a fluid cushion above and/or below the substrate. Fluid is flowed into the processing cavity at an angle relative to a radial line of the substrate to induce rotation of the substrate during a cleaning and drying process. A cleaning process involves flowing one or more fluids onto a surface of the substrate during its rotation. One-sided and two-sided cleaning and drying is provided.

    Reconfigurable multi-zone gas delivery hardware for substrate processing showerheads
    30.
    发明授权
    Reconfigurable multi-zone gas delivery hardware for substrate processing showerheads 有权
    可重新配置的多区域气体输送硬件，用于衬底处理花洒

    公开(公告)号：US09540731B2

    公开(公告)日：2017-01-10

    申请号：US12899062

    申请日：2010-10-06

    Applicant: Hamid Noorbakhsh ,  James D. Carducci

    Inventor： Hamid Noorbakhsh ,  James D. Carducci

    IPC: C23C16/455 ,  H01J37/32

    CPC classification number: C23C16/45565 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32449 ,  Y10T29/49716

    Abstract: Reconfigurable showerheads used in process chambers for substrate processing are provided herein. In some embodiments, a reconfigurable showerhead may include a body having one or more plenums disposed therein; and one or more inserts configured to be disposed within the one or more plenums, wherein the one or more inserts divide the reconfigurable showerhead into a plurality of zones. In some embodiments, a substrate processing system may include a process chamber having a reconfigurable showerhead coupled to a gas supply for providing one or more process gases to the process chamber, the reconfigurable showerhead including a body having one or more plenums disposed therein and one or more inserts configured to be disposed within the one or more plenums, wherein the one or more inserts divide the reconfigurable showerhead into a plurality of zones.

    Abstract translation: 本文提供了用于基板处理的处理室中的可重新配置的喷头。 在一些实施例中，可重新配置的喷头可以包括具有设置在其中的一个或多个增压室的主体; 以及一个或多个插入件，其构造成设置在所述一个或多个增压室内，其中所述一个或多个插入件将所述可重新配置的喷头分成多个区域。 在一些实施例中，衬底处理系统可以包括处理室，其具有耦合到气体供应的可重新配置的喷头，用于向处理室提供一个或多个处理气体，所述可重新配置的喷头包括具有设置在其中的一个或多个增压室的主体， 更多的插入件构造成设置在一个或多个增压室内，其中所述一个或多个插入件将可重新配置的喷头分成多个区域。

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