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    Process and apparatus for integrating sheet resistance measurements and reflectance measurements of a thin film in a common apparatus
    21.
    发明授权
    Process and apparatus for integrating sheet resistance measurements and reflectance measurements of a thin film in a common apparatus 有权
    用于在普通设备中集成薄膜电阻测量和薄膜反射测量的方法和装置

    公开(公告)号：US07050160B1

    公开(公告)日：2006-05-23

    申请号：US10407669

    申请日：2003-04-03

    Applicant: Walter H. Johnson ,  Jagadish Kalyanam ,  Shankar Krishnan ,  Murali K. Narasimhan

    Inventor： Walter H. Johnson ,  Jagadish Kalyanam ,  Shankar Krishnan ,  Murali K. Narasimhan

    IPC: G01N21/00

    CPC classification number: G01N21/8422 ,  G01B7/06 ,  G01B11/0625 ,  G01N21/55

    Abstract: A process for measuring both the reflectance and sheet resistance of a thin film, such as a metal film or a doped semiconductor, in a common apparatus comprises: directing a beam of radiation from a radiation source on the common apparatus onto a portion of the surface of the thin film, sensing the amount of radiation reflected from the surface of the thin film, and contacting the surface of the thin film with a sheet resistance measurement apparatus on the apparatus at a portion of the surface of the thin film coincident with or adjacent to the portion of the thin film contacted by the radiation beam to measure the sheet resistance of the thin film. The sheet resistance measurement apparatus may, by way of example, comprise a 4 point probe or an eddy current measurement apparatus. The respective measurements may be carried out either simultaneously or sequentially. By deriving the resistivity of the thin film from the measured reflectance at any particular region of the thin film surface, the thickness of the thin film, at that region of the film, may be obtained by dividing the derived resistivity by the measured sheet resistance for that same region.

    Abstract translation: 用于在公共装置中测量诸如金属膜或掺杂半导体的薄膜的反射率和薄层电阻的方法包括：将来自辐射源的辐射束引导到公共装置上的表面的一部分上 感测从薄膜表面反射的辐射量，并且在薄膜表面的与或相邻的薄膜的表面的一部分处的薄膜电阻测量装置接触薄膜表面 到由辐射束接触的薄膜的部分以测量薄膜的薄层电阻。 作为示例，薄层电阻测量装置可以包括4点探针或涡流测量装置。 相应的测量可以同时或顺序地进行。 通过从薄膜表面的任何特定区域处的测量的反射率导出薄膜的电阻率，可以通过将导电电阻率除以测得的薄层电阻值来获得薄膜的该薄膜的该区域的厚度 同一地区。

    Method and apparatus to simultaneously measure emissivities and thermodynamic temperatures of remote objects
    22.
    发明授权
    Method and apparatus to simultaneously measure emissivities and thermodynamic temperatures of remote objects 失效
    同时测量远程物体的发射率和热力学温度的方法和装置

    公开(公告)号：US5011295A

    公开(公告)日：1991-04-30

    申请号：US422644

    申请日：1989-10-17

    Applicant: Shankar Krishnan ,  George P. Hansen ,  Robert H. Hauge ,  John L. Margrave ,  Charles A. Rey

    Inventor： Shankar Krishnan ,  George P. Hansen ,  Robert H. Hauge ,  John L. Margrave ,  Charles A. Rey

    IPC: G01J4/00 ,  G01J5/00 ,  G01J5/58 ,  G01N21/21

    CPC classification number: G01J5/58 ,  G01J4/04 ,  G01J5/0003 ,  G01J5/0096 ,  G01J5/04 ,  G01J5/047 ,  G01J5/08 ,  G01J5/0809 ,  G01J5/0825 ,  G01J5/0834 ,  G01J5/0846 ,  G01J5/0896 ,  G01J2005/0048 ,  G01J2005/0074 ,  G01J2005/0077 ,  G01N2021/1793 ,  G01N21/21 ,  G01N2201/0696

    Abstract: Method and apparatus for accurately and instantaneously determining the thermodynamic temperature of remote objects by continuous determination of the emissivity, the reflectivity, and optical constants, as well as the apparent or brightness temperature of the sample with a single instrument. The emissivity measurement is preferably made by a complex polarimeter including a laser that generates polarized light, which is reflected from the sample into a detector system. The detector system includes a beamsplitter, polarization analyzers, and four detectors to measure independently the four Stokes vectors of the reflected radiation. The same detectors, or a separate detector in the same instrument, is used to measure brightness temperature. Thus, the instrument is capable of measuring both the change in polarization upon reflection as well as the degree of depolarization and hence diffuseness. This enables correction for surface roughness of the sample and background radiation, which could otherwise introduce errors in temperature measurement.

    Abstract translation: 通过用单个仪器连续测定样品的发射率，反射率和光学常数以及样品的表观或亮度温度来准确和瞬时地确定远程物体的热力学温度的方法和设备。 发射率测量优选由包括产生偏振光的激光器的复合旋光计来进行，该偏振光从样品反射到检测器系统中。 检测器系统包括分束器，偏振分析器和四个检测器，以独立地测量反射辐射的四个斯托克斯矢量。 相同的检测器或相同仪器中的单独检测器用于测量亮度温度。 因此，该仪器能够测量反射时的极化的变化以及去极化的程度，从而测量扩散度。 这样可以校正样品的表面粗糙度和背景辐射，否则会导致温度测量误差。

    Selectably configurable multiple mode spectroscopic ellipsometry
    23.
    发明授权
    Selectably configurable multiple mode spectroscopic ellipsometry 有权
    可选择配置的多模光谱椭偏仪

    公开(公告)号：US09404872B1

    公开(公告)日：2016-08-02

    申请号：US13538552

    申请日：2012-06-29

    Applicant: Haiming Wang ,  Guorong V. Zhuang ,  Shankar Krishnan ,  Klaus Flock ,  Johannes D. de Veer

    Inventor： Haiming Wang ,  Guorong V. Zhuang ,  Shankar Krishnan ,  Klaus Flock ,  Johannes D. de Veer

    IPC: G01J4/00 ,  G01N21/55 ,  G01N21/88 ,  G01N21/21

    CPC classification number: G01N21/8806 ,  G01N21/211 ,  G01N21/274 ,  G01N21/93 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/213

    Abstract: The present invention may include an illumination source configured to illuminate a surface of a sample, a detector configured to detect at least a portion of light reflected from the surface of the sample, a selectably configurable optical system comprising: a rotatable polarizing element disposed in the illumination arm of the optical system, an analyzing element disposed in the collection arm of the optical system, and a rotatable-translatable compensator element disposed in the collection arm of the optical system, and a control system communicatively configured to selectably configure the optical system in the a rotating compensator (RCSE) mode, a rotating polarizer (RPSE) mode, or a rotating polarizer and compensator (RPRC) mode.

    Abstract translation: 本发明可以包括被配置为照亮样品的表面的照明源，被配置为检测从样品的表面反射的光的至少一部分的检测器，可选择地配置的光学系统，包括：可旋转偏振元件，其设置在 光学系统的照明臂，设置在光学系统的收集臂中的分析元件和设置在光学系统的收集臂中的可旋转平移补偿元件，以及通信地配置为可选择地将光学系统配置在 旋转补偿器（RCSE）模式，旋转偏振器（RPSE）模式或旋转偏振器和补偿器（RPRC）模式。

    System and method of image upsampling
    24.
    发明授权
    System and method of image upsampling 有权
    图像上采样的系统和方法

    公开(公告)号：US08571309B2

    公开(公告)日：2013-10-29

    申请号：US13296417

    申请日：2011-11-15

    Applicant: Shankar Krishnan ,  James Klosowski

    Inventor： Shankar Krishnan ,  James Klosowski

    IPC: G06K9/00

    CPC classification number: G06T3/4053

    Abstract: A method includes receiving an image having a first resolution and generating an upsampled image having a second resolution based on the image. A multi-dimensional data structure corresponding to a multi-dimensional image space is generated from the upsampled image. Each node of the data structure is determined based on a weighted sum of values of one or more pixels in the upsampled image. Each of the one or more pixels corresponds to a pixel in the received image and is located within a region of the image space having a vertex defined by the node. A filter modifies the values of the nodes and a second upsampled image is generated based on the modified values. Each pixel of the second upsampled image not corresponding to a pixel in the received image is determined based on a weighted sum of the modified values of one or more nodes.

    Abstract translation: 一种方法包括接收具有第一分辨率的图像并基于该图像生成具有第二分辨率的上采样图像。 从上采样图像生成对应于多维图像空间的多维数据结构。 基于上采样图像中的一个或多个像素的值的加权和来确定数据结构的每个节点。 一个或多个像素中的每一个对应于接收到的图像中的像素，并且位于具有由该节点定义的顶点的图像空间的区域内。 滤波器修改节点的值，并且基于修改的值生成第二上采样图像。 基于一个或多个节点的修改值的加权和来确定不对应于接收图像中的像素的第二上采样图像的每个像素。

    Measurement of Critical Dimension
    25.
    发明申请
    Measurement of Critical Dimension 有权
    关键尺寸的测量

    公开(公告)号：US20130003068A1

    公开(公告)日：2013-01-03

    申请号：US13174815

    申请日：2011-07-01

    Applicant: Shankar Krishnan ,  Haiming Wang

    Inventor： Shankar Krishnan ,  Haiming Wang

    IPC: G01N21/55 ,  G01J1/42

    CPC classification number: G01N21/55 ,  G01B11/065 ,  G01B2210/56 ,  G01J3/021 ,  G01J3/0229 ,  G01J3/42 ,  G01N21/00 ,  G01N21/211 ,  G01N2021/213 ,  G01N2021/214 ,  G01N2201/0675

    Abstract: A spectroscopic instrument for conducting multi-wavelength, multi-azimuth, multi-angle-of-incidence readings on a substrate, the instrument having a broadband light source for producing an illumination beam, an objective for directing the illumination onto the substrate at multiple azimuth angles and multiple angels-of-incidence simultaneously, thereby producing a reflection beam, an aperture plate having an illumination aperture and a plurality of collection apertures formed therein for selectively passing portions of the reflection beam having desired discreet combinations of azimuth angle and angle-of-incident, a detector for receiving the discreet combinations of azimuth angle and angle-of-incident and producing readings, and a processor for interpreting the readings.

    Abstract translation: 一种用于在衬底上进行多波长，多方位角，多角度入射读数的光谱仪器，该仪器具有用于产生照明光束的宽带光源，用于将多个方位角的照明引导到衬底上的物镜 角度和多个入射角，从而产生反射光束，具有照明孔的孔板和形成在其中的多个收集孔，用于选择性地通过具有期望的方位角和角度的离散组合的反射光束的部分 - 用于接收方位角和入射角的离散组合并产生读数的检测器，以及用于解释读数的处理器。

    Global Registration of Multiple 3D Point Sets Via Optimization on a Manifold
    26.
    发明申请
    Global Registration of Multiple 3D Point Sets Via Optimization on a Manifold 有权
    通过在一个歧管上优化的多个3D点集的全局注册

    公开(公告)号：US20110012898A1

    公开(公告)日：2011-01-20

    申请号：US12893404

    申请日：2010-09-29

    Applicant: Shankar Krishnan ,  Pei Yean Lee ,  John Barrett Moore ,  Suresh Venkatasubramanian

    Inventor： Shankar Krishnan ,  Pei Yean Lee ,  John Barrett Moore ,  Suresh Venkatasubramanian

    IPC: G06T15/00

    CPC classification number: G06K9/00214 ,  G06K9/6211 ,  G06T7/30 ,  G06T17/00 ,  G06T2207/10028

    Abstract: A method for registering multiple 3D point sets by determining optimal relative positions and orientations of the 3D point sets. Initial values are determined for the rotation matrices corresponding to the relative orientations of reference frames of the 3D point sets. A registration error cost function is optimized on a product manifold of all of the rotation matrices to determine optimal values of the rotation matrices. The optimal values of the rotation matrices are used to determine optimal values for translation vectors corresponding to the relative positions of the reference frames of the 3D point sets. The 3D point sets are registered on a common reference frame using the optimal rotation matrices and the optimal translation vectors.

    Abstract translation: 一种用于通过确定3D点集合的最佳相对位置和取向来登记多个3D点集的方法。 对于与3D点集的参考帧的相对取向相对应的旋转矩阵确定初始值。 在所有旋转矩阵的乘积歧管上优化注册误差成本函数，以确定旋转矩阵的最佳值。 旋转矩阵的最佳值用于确定对应于3D点集的参考帧的相对位置的平移向量的最优值。 使用最佳旋转矩阵和最优平移向量将3D点集登记在公共参考帧上。

    Systems and methods for measuring stress in a specimen
    29.
    发明授权
    Systems and methods for measuring stress in a specimen 有权
    用于测量样品中应力的系统和方法

    公开(公告)号：US07274440B1

    公开(公告)日：2007-09-25

    申请号：US10936019

    申请日：2004-09-08

    Applicant: Gary Janik ,  Shankar Krishnan

    Inventor： Gary Janik ,  Shankar Krishnan

    IPC: G01B11/16 ,  G01J4/00

    CPC classification number: G01L1/241 ,  G01J3/021 ,  G01J3/0229 ,  G01J3/447 ,  G01J4/00 ,  G01N2203/0641 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Systems and methods for measuring stress in a specimen are provided. One system includes an optical subsystem configured to measure stress-induced birefringence in patterned structures formed on the specimen. In some embodiments, the optical subsystem may be configured as a spectroscopic ellipsometer, a multi-angle laser ellipsometer, a polarimeter, a polarized reflectometer, or some combination thereof. The system also includes a processor coupled to the optical subsystem. The processor is configured to determine stress in a material of the patterned structures using the stress-induced birefringence measurements. One method includes measuring stress-induced birefringence in patterned structures formed on the specimen using an optical technique. The method also includes determining stress in a material of the patterned structures using the stress-induced birefringence measurements.

    Abstract translation: 提供了用于测量样品中应力的系统和方法。 一个系统包括被配置为测量形成在样本上的图案化结构中的应力诱导双折射的光学子系统。 在一些实施例中，光学子系统可以被配置为分光椭偏仪，多角度激光椭偏仪，偏振计，偏振反射计或其某种组合。 该系统还包括耦合到光学子系统的处理器。 处理器被配置为使用应力诱导的双折射测量来确定图案化结构的材料中的应力。 一种方法包括使用光学技术来测量在样品上形成的图案化结构中的应力诱导双折射。 该方法还包括使用应力诱导的双折射测量来确定图案化结构的材料中的应力。

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